JP2019072925A - Workpiece holding tool, electronic component processing device, and manufacturing method of electronic component - Google Patents

Workpiece holding tool, electronic component processing device, and manufacturing method of electronic component Download PDF

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JP2019072925A
JP2019072925A JP2017200583A JP2017200583A JP2019072925A JP 2019072925 A JP2019072925 A JP 2019072925A JP 2017200583 A JP2017200583 A JP 2017200583A JP 2017200583 A JP2017200583 A JP 2017200583A JP 2019072925 A JP2019072925 A JP 2019072925A
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workpiece
contact surface
work
holding jig
processing
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JP6988358B2 (en
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佐藤 孝輝
Takateru Sato
孝輝 佐藤
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TDK Corp
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TDK Corp
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Priority to KR1020180117500A priority patent/KR102121033B1/en
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
    • H01G13/00Apparatus specially adapted for manufacturing capacitors; Processes specially adapted for manufacturing capacitors not provided for in groups H01G4/00 - H01G11/00
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41FPRINTING MACHINES OR PRESSES
    • B41F15/00Screen printers
    • B41F15/14Details
    • B41F15/16Printing tables
    • B41F15/18Supports for workpieces
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C13/00Means for manipulating or holding work, e.g. for separate articles
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41KSTAMPS; STAMPING OR NUMBERING APPARATUS OR DEVICES
    • B41K3/00Apparatus for stamping articles having integral means for supporting the articles to be stamped
    • B41K3/44Means for handling copy matter
    • B41K3/46Means for handling copy matter for locating when stationary
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
    • H01G4/00Fixed capacitors; Processes of their manufacture
    • H01G4/30Stacked capacitors

Abstract

To provide a workpiece holding tool, an electronic component processing device, and a manufacturing method of an electronic component by which continuous processing of a plurality of surfaces to be processed of a workpiece can be carried out with high precision.SOLUTION: A workpiece holding tool 1 includes a workpiece holding mechanism 10 for holding a workpiece 50. The workpiece holding mechanism 10 includes a workpiece housing part 13 having a first abutting surface 131, a second abutting surface 132, and a third abutting surface 133 on which three surfaces of the workpiece 50 abut. An opposite side to the first abutting surface 131 and an opposite side of the second abutting surface 132 of the workpiece housing part 13 are opened so as to expose at least the two surfaces to be processed (an end surface 52a3 of a flange part 52a, and upper surfaces 52a1, 52a2 of flange parts 52a, 52b) of the workpiece 50 housed in the workpiece housing part 13.SELECTED DRAWING: Figure 1B

Description

本発明は、ワークを保持するワーク保持機構を有するワーク保持治具、当該ワーク保持治具を有する電子部品処理装置、および当該ワーク保持治具を用いた電子部品の製造方法に関する。   The present invention relates to a workpiece holding jig having a workpiece holding mechanism for holding a workpiece, an electronic component processing apparatus having the workpiece holding jig, and a method of manufacturing an electronic component using the workpiece holding jig.

電子部品の製造時には、特許文献1の図7等に記載されているようなワーク保持治具に複数のワークを保持させ、スキージ等によって、一度に複数のワークの処理予定面に電極膜(端子電極)を形成する場合がある。   At the time of manufacturing an electronic component, a plurality of workpieces are held by a workpiece holding jig as described in FIG. 7 and the like of Patent Document 1, and an electrode film (terminal Electrode) may be formed.

複数の処理予定面を具備する電子部品において、各処理予定面に電極膜を形成するには、処理予定面に電極膜を形成する都度、ワーク保持治具からワークを取り外し、電極膜の形成されていない処理予定面が印刷用スクリーン等を向くように、向きを変える必要がある。   In an electronic component having a plurality of processing planned surfaces, in order to form an electrode film on each processing planned surface, each time an electrode film is formed on the processing planned surface, the workpiece is removed from the workpiece holding jig to form an electrode film. It is necessary to change the direction so that the not-to-be-treated surface faces the printing screen or the like.

しかしながら、一旦、ワーク保持治具からワークを取り外すと、そのワークを元の位置に正確に再配置することは容易ではない。位置ずれした状態で電極膜の形成を行うと、所望の位置に電極膜が形成されなかったり、所望の形状の電極膜が得られなかったり、あるいは電極膜の一部に欠損が生じたりするなど、不具合が生じるおそれがある。   However, once the work is removed from the work holding jig, it is not easy to accurately reposition the work in its original position. If the electrode film is formed in a misaligned state, the electrode film can not be formed at a desired position, or an electrode film having a desired shape can not be obtained, or a defect occurs in part of the electrode film, etc. , There is a risk of problems.

特開平7−201653号公報Japanese Patent Application Laid-Open No. 7-201653

本発明は、このような実状に鑑みてなされ、その目的は、ワークの複数の処理予定面に連続した処理を高精度で行うことができるワーク保持治具、電子部品処理装置および電子部品の製造方法を提供することである。   The present invention has been made in view of such circumstances, and an object thereof is to manufacture a workpiece holding jig, an electronic component processing apparatus, and an electronic component capable of performing processing continuously on a plurality of processing planned surfaces of the workpiece with high accuracy. It is to provide a method.

上記目的を達成するために、本発明に係るワーク保持治具は、
ワークを保持するワーク保持機構を有するワーク保持治具であって、
前記ワーク保持機構は、前記ワークの3面が当接する第1当接面と、第2当接面と、第3当接面とを持つワーク収容部を有し、
前記ワーク収容部は、前記ワーク収容部に収容されるワークの少なくとも2つの処理予定面が露出するように、少なくとも前記第1当接面の反対側と、前記第2当接面の反対側とが開放していることを特徴とする。
In order to achieve the above object, a work holding jig according to the present invention is:
A workpiece holding jig having a workpiece holding mechanism for holding a workpiece, wherein
The workpiece holding mechanism has a workpiece storage portion having a first contact surface on which the three surfaces of the workpiece contact, a second contact surface, and a third contact surface.
The work storage portion is at least opposite to the first contact surface and opposite to the second contact surface such that at least two planned processing surfaces of the workpiece stored in the work storage portion are exposed. Are open.

本発明に係るワーク保持治具は、ワークを保持するワーク保持機構を有する。そして、ワーク保持機構は、第1当接面と、第2当接面と、第3当接面とを持つワーク収容部を有し、ワーク収容部は、ワーク収容部に収容されるワークの少なくとも2つの処理予定面が露出するように、少なくとも第1当接面の反対側と、第2当接面の反対側とが開放している。そのため、ワーク収容部にワークを収容すると、ワークの少なくとも2つの処理予定面が、少なくともワーク収容部の第1当接面の反対側と、第2当接面の反対側とから露出する。   The workpiece holding jig according to the present invention has a workpiece holding mechanism for holding a workpiece. The workpiece holding mechanism has a workpiece storage portion having a first contact surface, a second contact surface, and a third contact surface, and the workpiece storage portion is a portion of the workpiece stored in the workpiece storage portion. The opposite side of at least the first contact surface and the opposite side of the second contact surface are open so that the at least two planned treatment surfaces are exposed. Therefore, when the workpiece is accommodated in the workpiece accommodating portion, at least two planned processing surfaces of the workpiece are exposed at least from the opposite side of the first abutment surface of the workpiece accommodating portion and the opposite side of the second abutment surface.

本発明では、このワーク収容部から露出したワークの処理予定面を印刷用スクリーン等に向けることで、当該処理予定面に電極膜を形成することが可能である。そして、ワーク収容部から露出したワークのいずれかの処理予定面(たとえば、第1当接面の反対側から露出した処理予定面)に電極膜を形成した後は、ワーク保持治具を所定角度だけ回転させ、ワーク収容部から露出した他のいずれかの処理予定面(たとえば、第2当接面の反対側から露出した処理予定面)を印刷用スクリーン等に向けることで、当該処理予定面に電極膜を形成することができる。   In the present invention, it is possible to form an electrode film on the processing scheduled surface by directing the processing scheduled surface of the workpiece exposed from the workpiece storage portion to a printing screen or the like. Then, after an electrode film is formed on one of the processing scheduled surfaces of the workpiece exposed from the workpiece storage portion (for example, the processing scheduled surface exposed from the opposite side of the first contact surface), the workpiece holding jig is at a predetermined angle By rotating only one of the other processing scheduled surfaces exposed from the workpiece storage unit (for example, the processing scheduled surface exposed from the opposite side of the second contact surface) to the printing screen etc. Can form an electrode film.

すなわち、本発明では、従来とは異なり、処理予定面に電極膜を形成する都度、ワークをワーク保持治具から取り外し、ワークの向きを変える必要がなく、ワーク収容部から露出した少なくとも2つの処理予定面に、連続的に電極膜を形成することが可能である。したがって、ワークの取り外しに起因して生じ得る電極膜の位置ずれや欠損等の不具合を防止し、ワークの所定位置に電極膜を高精度で形成することができる。   That is, in the present invention, unlike the prior art, it is not necessary to remove the workpiece from the workpiece holding jig and change the orientation of the workpiece each time the electrode film is formed on the processing planned surface, and at least two processes exposed from the workpiece storage portion It is possible to form an electrode film continuously on a planned surface. Therefore, it is possible to prevent a defect such as a positional deviation or a defect of the electrode film which may occur due to the removal of the work, and to form the electrode film at a predetermined position of the work with high accuracy.

また、本発明に係るワーク保持治具を用いることにより、ワークの処理予定面に、電極膜だけではなく、その他の機能被膜(たとえば、絶縁膜)を形成することも可能である。また、処理予定面には、被膜形成処理だけではなく、その他の処理(たとえば、エッチング等の表面処理)を行うことも可能である。いずれの処理についても、上述した要領でワーク保持治具を所定角度だけ回転させ、処理対象の処理予定面を順次シフトしていくことにより、ワークの複数の処理予定面に連続した処理を高精度で行うことができる。   Moreover, it is also possible to form not only an electrode film but other functional films (for example, an insulating film) on the processing planned surface of the workpiece by using the workpiece holding jig according to the present invention. Moreover, it is also possible to perform not only a film formation process but other processes (for example, surface treatment such as etching) on the surface to be treated. In any of the processes, the workpiece holding jig is rotated by a predetermined angle as described above, and the processing planned surface of the processing target is sequentially shifted, so that the processing continuous to a plurality of processing planned surfaces of the workpiece is highly accurate. Can be done with

また、ワークが第1当接面と、第2当接面と、第3当接面とで位置決めされることにより、ワークの位置ずれを防止し、ワークの複数の処理予定面に連続した処理をより高精度で行うことができる。   In addition, by positioning the work with the first contact surface, the second contact surface, and the third contact surface, displacement of the work is prevented, and processing continuous to a plurality of processing planned surfaces of the work is performed. Can be done with higher accuracy.

また、複数のワーク保持治具(たとえば、2つの第1および第2の保持治具)を配列して、これらに保持されたワークの別々の処理予定面に同時に処理を行ってもよい。たとえば、第1のワーク保持治具のワークの第1当接面とは反対側の処理予定面と、第2のワーク保持治具のワークの第2当接面とは反対側の処理予定面とが略面一になるように配置してもよい。このような構成とすることにより、2つのワークの処理予定面に同時に電極膜形成処理などの処理を行うことができる。   Alternatively, a plurality of workpiece holding jigs (for example, two first and second holding jigs) may be arranged to simultaneously process different processing scheduled surfaces of the workpiece held by these. For example, the processing scheduled surface opposite to the first contact surface of the work of the first workpiece holding jig and the processing scheduled surface opposite to the second contact surface of the work of the second workpiece holding jig You may arrange | position so that it may become substantially flush. With such a configuration, processing such as electrode film formation processing can be performed simultaneously on the processing planned surfaces of two workpieces.

好ましくは、前記ワーク収容部に収容してあるワークの2つの前記処理予定面が、それぞれ前記第1当接面の反対側と、前記第2当接面の反対側とから露出するように、前記ワークが前記ワーク収容部に収容される。このような構成とすることにより、第1当接面の反対側から露出した処理予定面と、第2当接面の反対側から露出した処理予定面とに、上述した要領で、連続した処理をより高精度で行うことができる。   Preferably, the two processing planned surfaces of the workpiece stored in the workpiece storage unit are exposed from the opposite side of the first contact surface and the opposite side of the second contact surface, respectively. The work is accommodated in the work accommodation portion. By adopting such a configuration, continuous processing is performed in the above-described manner on the planned treatment surface exposed from the opposite side of the first contact surface and the planned treatment surface exposed from the opposite side of the second contact surface. Can be done with higher accuracy.

好ましくは、2つの前記処理予定面が、前記ワーク収容部の外側に突出するように、前記ワークが前記ワーク収容部に収容される。このような構成とすることにより、ワーク収容部の外側にワークの各処理予定面が突出し、スキージ等によって、各処理予定面に電極膜形成処理などの処理を容易に行うことができる。   Preferably, the workpiece is accommodated in the workpiece accommodating portion such that the two processing planned surfaces project outside the workpiece accommodating portion. With such a configuration, each processing scheduled surface of the work protrudes to the outside of the workpiece accommodating portion, and processing such as electrode film forming processing can be easily performed on each processing scheduled surface by a squeegee or the like.

好ましくは、前記第1当接面の反対側から突出したワークの処理予定面の突出量と、前記第2当接面の反対側から突出したワークの処理予定面の突出量とが略等しい。このような構成とすることにより、ワーク保持治具を所定角度だけ回転させたときに、いずれの処理予定面が印刷用スクリーン等を向いたとしても、印刷用スクリーン等とワークの処理予定面の間の距離が、常に一定となるように調整しやすくなる。したがって、ワーク保持治具を所定角度だけ回転させる都度、上記距離を調整する必要がなく、スキージ等によって、容易にワークの処理予定面に電極膜を形成することができる。   Preferably, the amount of projection of the processing planned surface of the workpiece protruding from the opposite side of the first contact surface is substantially equal to the amount of projection of the processing planned surface of the workpiece protruding from the opposite side of the second contact surface. With such a configuration, when the work holding jig is rotated by a predetermined angle, even if any of the processing planned surfaces faces the printing screen etc. It becomes easy to adjust the distance between them so that it is always constant. Therefore, it is not necessary to adjust the above-mentioned distance each time the workpiece holding jig is rotated by a predetermined angle, and an electrode film can be easily formed on the processing scheduled surface of the workpiece by a squeegee or the like.

好ましくは、前記ワーク保持機構は、複数の前記ワーク収容部を具備する。このような構成とすることにより、複数のワークの各々を各ワーク収容部に配置することが可能となり、一度に複数のワークに端子電極を高精度で形成することができる。   Preferably, the work holding mechanism includes a plurality of work receiving portions. With such a configuration, each of a plurality of works can be disposed in each work storage portion, and terminal electrodes can be formed on a plurality of works with high accuracy at one time.

好ましくは、前記第2当接面には、前記ワーク収容部に収容されるワークとは反対側に向かって凹む凹部が形成してある。このような構成とすることにより、処理予定面に所定の処理を行った後、凹部にピン等を挿入し、このピン等で掻き出すように、第2当接面に固定してあるワークを押し出すことにより、ワーク収容部からワークを取り出すことができる。   Preferably, the second contact surface is formed with a recess which is recessed toward the side opposite to the workpiece accommodated in the workpiece accommodation portion. With such a configuration, after performing predetermined processing on the processing scheduled surface, a pin or the like is inserted into the recess, and the work fixed on the second contact surface is pushed out so as to scrape with this pin or the like Thus, the workpiece can be taken out of the workpiece storage unit.

好ましくは、前記ワーク保持機構は、第1ワーク保持部と、前記第1ワーク保持部に分離可能に取り付けられる第2ワーク保持部とを有し、前記第1当接面と前記第3当接面とが、前記第1ワーク保持部に形成してあり、前記第2当接面が、前記第2ワーク保持部に形成してある。このような構成とすることにより、下記のような態様で処理を行うことが可能となる。   Preferably, the work holding mechanism includes a first work holding portion and a second work holding portion detachably attached to the first work holding portion, and the first contact surface and the third contact are provided. A surface is formed in the first work holding portion, and the second contact surface is formed in the second work holding portion. With such a configuration, processing can be performed in the following manner.

すなわち、予め、ワーク収容部のサイズ(第1当接面および第3当接面の面積)が各々異なる複数の第1ワーク保持部を準備しておき、処理を行うワークのサイズに応じて、所望のサイズのワーク収容部を有する第1ワーク保持部を選択する。この第1ワーク保持部を第2ワーク保持部に装着して処理を行えば、第2ワーク保持部を変えずに済むため、他品種の電子部品の生産性を向上させることができる。   That is, according to the size of the work to be processed, a plurality of first work holding parts having different sizes of the work storage parts (areas of the first contact surface and the third contact surface) are prepared in advance. A first workpiece holding unit having a desired size of workpiece holding unit is selected. If the first work holding unit is attached to the second work holding unit and processing is performed, the second work holding unit does not need to be changed, and therefore, the productivity of electronic components of other types can be improved.

好ましくは、前記ワーク収容部に収容してあるワークは、前記第2当接面と、前記第3当接面とがなす角部の内側に配置される。このような構成とすることにより、ワーク収容部の角部の内側にワークが固定され、ワークの位置決めを容易に行うことが可能となる。したがって、ワークの位置ずれを防止し、ワークの複数の処理予定面に連続した処理をより高精度で行うことができる。   Preferably, the workpiece accommodated in the workpiece accommodation portion is disposed inside a corner formed by the second abutment surface and the third abutment surface. With such a configuration, the work is fixed inside the corner of the work storage portion, and the work can be easily positioned. Therefore, positional deviation of the workpiece can be prevented, and processing continuous to a plurality of processing planned surfaces of the workpiece can be performed with higher accuracy.

また、ワーク保持治具は、長手方向に垂直な断面形状が略正方形状であってもよい。このような構成とすることにより、ワーク保持治具を所定角度回転させたときに、印刷用スクリーン等とワークの処理予定面との間の距離を、常に一定とすることが容易になる。   The workpiece holding jig may have a substantially square cross-sectional shape perpendicular to the longitudinal direction. With such a configuration, when the workpiece holding jig is rotated by a predetermined angle, it is easy to always keep the distance between the printing screen or the like and the processing planned surface of the workpiece constant.

また、複数のワーク保持治具を隣り合うように配列した場合、各ワーク保持治具を所定角度だけ回転させたときに、隣り合うワーク保持治具間で、保持されるワークの処理予定面を略面一にしやすくなり、スクリーン印刷などの処理が行いやすくなる。   Further, when a plurality of workpiece holding jigs are arranged adjacent to each other, when the workpiece holding jigs are rotated by a predetermined angle, the processing scheduled surface of the workpiece held between the adjacent workpiece holding jigs is displayed. It becomes easy to make it substantially flush and it becomes easy to perform processing such as screen printing.

前記ワーク収容部に収容してあるワークは、前記第2当接面と、前記第3当接面とがなす角部の外側に配置してもよい。このような構成とすることにより、ワーク収容部の角部の外側にワークが固定され、ワークの位置決めを行うことが可能となる。したがって、ワークの位置ずれを防止し、ワークの複数の処理予定面に連続した処理をより高精度で行うことができる。   The workpiece accommodated in the workpiece accommodation portion may be disposed outside the corner formed by the second abutment surface and the third abutment surface. With such a configuration, the workpiece is fixed to the outside of the corner of the workpiece accommodating portion, and the workpiece can be positioned. Therefore, positional deviation of the workpiece can be prevented, and processing continuous to a plurality of processing planned surfaces of the workpiece can be performed with higher accuracy.

また、上記のような構成とすることにより、ワーク収容部にワークを配置すると、ワーク収容部からワークの少なくとも3つの処理予定面が、第1当接面の反対側と、2つの第2当接面の反対側とから露出する。したがって、上述した要領でワーク保持治具を所定角度だけ回転させ、処理対象の少なくとも3つの処理予定面を順次シフトしていくことにより、ワークの複数の処理予定面に連続した処理を高精度で行うことができる。   In addition, when the work is placed in the work storage unit by the above-mentioned configuration, at least three planned processing surfaces of the work from the work storage unit are opposite to the first contact surface and two second contact surfaces. Exposed from the opposite side of the contact surface. Therefore, the workpiece holding jig is rotated by a predetermined angle as described above, and at least three processing target surfaces to be processed are sequentially shifted, whereby processing continuous to a plurality of processing target surfaces of the workpiece is performed with high accuracy. It can be carried out.

また、複数のワーク保持治具(たとえば、3つの第1〜第3の保持治具)を配列して、これらに保持されたワークの別々の処理予定面に同時に処理を行ってもよい。たとえば、第1のワーク保持治具のワークの第1当接面とは反対側の処理予定面と、第2のワーク保持治具のワークの第2当接面とは反対側の処理予定面と、第3のワーク保持治具のワークの第2当接面とは反対側の処理予定面とが略面一になるように配置してもよい。このような構成とすることにより、3つのワークの処理予定面に同時に電極膜形成処理などの処理を行うことができる。   In addition, a plurality of work holding jigs (for example, three first to third holding jigs) may be arranged to simultaneously process different processing planned surfaces of the work held by these. For example, the processing scheduled surface opposite to the first contact surface of the work of the first workpiece holding jig and the processing scheduled surface opposite to the second contact surface of the work of the second workpiece holding jig And the processing scheduled surface on the opposite side of the second contact surface of the workpiece of the third workpiece holding jig may be substantially flush with each other. With such a configuration, processing such as electrode film formation processing can be performed simultaneously on the processing planned surfaces of the three workpieces.

好ましくは、前記ワーク収容部に収容してあるワークを、前記第2当接面および前記第3当接面に当接するように引き寄せる引き寄せ手段をさらに有する。このような構成とすることにより、ワーク収容部に収容してあるワークを第2当接面および第3当接面に当接するように引き寄せることが可能となり、ワーク保持治具に対するワークの位置決め精度を向上させることができる。   Preferably, the apparatus further comprises pulling means for pulling the work stored in the work storage portion into contact with the second contact surface and the third contact surface. With such a configuration, it is possible to draw the workpiece stored in the workpiece storage portion into contact with the second contact surface and the third contact surface, and the positioning accuracy of the workpiece with respect to the workpiece holding jig Can be improved.

なお、補助部材をワーク保持機構と着脱自在に構成してもよく、この場合、ワーク保持治具の内部等に塵等(フェライトの粉や欠け等)が蓄積した場合であっても、補助部材をワーク保持機構から取り外し、ワーク保持治具の内部等を掃除することができる。   The auxiliary member may be configured to be detachable from the workpiece holding mechanism. In this case, even if dust or the like (ferrite powder, chipping, or the like) accumulates inside the workpiece holding jig, the auxiliary member Can be removed from the workpiece holding mechanism to clean the inside of the workpiece holding jig and the like.

電子部品処理装置にワーク保持治具を複数具備させてもよい。電子部品処理装置としては、たとえば印刷装置や捺印装置、あるいは塗布装置等が挙げられる。   A plurality of workpiece holding jigs may be provided in the electronic component processing apparatus. Examples of the electronic component processing apparatus include a printing apparatus, a sealing apparatus, and a coating apparatus.

好ましくは、本発明に係る電子部品の製造方法は、上述したいずれかのワーク保持治具を用いて、少なくとも2つの処理予定面がワーク収容部から露出したワークのいずれかの処理予定面に処理を行う工程と、前記ワーク保持治具を所定角度だけ回転させ、当該ワークの他のいずれかの処理予定面に処理を行う工程とを有する。このような方法で電子部品を製造することにより、ワークの複数の処理予定面に連続した処理を高精度で行うことができる。   Preferably, in the method of manufacturing an electronic component according to the present invention, at least two processing planned surfaces are processed on any of the processing planned surfaces of the workpiece exposed from the workpiece storage unit using any of the above-described workpiece holding jigs. And rotating the workpiece holding jig by a predetermined angle to perform processing on any other planned surface of the workpiece. By manufacturing the electronic component by such a method, continuous processing can be performed with high accuracy on a plurality of processing planned surfaces of the workpiece.

あるいは、本発明に係る電子部品の製造方法は、上述したいずれかのワーク保持治具を、隣り合う一方のワーク保持治具のワーク収容部の第1当接面と、隣り合う他方のワーク保持治具のワーク収容部の第2当接面とが同一方向を向くように、所定角度だけ回転させて配列する工程と、
前記一方のワーク保持治具の前記第1当接面の反対側から露出したワークの処理予定面と、前記他方のワーク保持治具の前記第2当接面の反対側から露出したワークの処理予定面とに処理を行う工程とを有していてもよい。
Alternatively, in the method of manufacturing an electronic component according to the present invention, any one of the work holding jigs described above is held by the first contact surface of the work storage portion of one adjacent work holding jig and the other work holding adjacent thereto. Arranging them by rotating them by a predetermined angle so that the second contact surface of the workpiece accommodating portion of the jig faces in the same direction;
Processing of the work scheduled to be processed of the workpiece exposed from the opposite side of the first contact surface of the one work holding jig and the workpiece exposed from the opposite side of the second contact surface of the other work holding jig It may have a process which processes to a plan side.

このような方法で電子部品を製造することにより、スキージ等によって、隣り合う一方のワーク保持治具のワーク収容部の第1当接面の反対側に露出した処理予定面と、隣り合う他方のワーク保持治具のワーク収容部の第2当接面の反対側に露出した処理予定面とに、連続した処理をまとめて高精度で行うことができる。   By manufacturing the electronic component by such a method, the processing scheduled surface exposed on the opposite side of the first contact surface of the workpiece accommodating portion of one adjacent workpiece holding jig by the squeegee etc. and the other adjacent The continuous processing can be performed collectively with high accuracy on the processing scheduled surface exposed on the opposite side of the second contact surface of the workpiece holding portion of the workpiece holding jig.

図1Aは本発明の第一実施形態に係るワーク保持治具の全体斜視図である。FIG. 1A is an overall perspective view of a workpiece holding jig according to a first embodiment of the present invention. 図1Bは図1Aに示すワーク保持治具の部分拡大図である。FIG. 1B is a partially enlarged view of the workpiece holding jig shown in FIG. 1A. 図1Cは図1Aに示すワークの拡大図である。FIG. 1C is an enlarged view of the work shown in FIG. 1A. 図1Dは図1Cに示すワークの変形例を示す拡大図である。FIG. 1D is an enlarged view showing a modified example of the work shown in FIG. 1C. 図2Aは図1Aに示すワーク保持治具を用いて電子部品に端子電極を形成する過程を示す側面図である。FIG. 2A is a side view showing a process of forming a terminal electrode on an electronic component using the workpiece holding jig shown in FIG. 1A. 図2Bは図2Aの続きの工程を示す側面図である。FIG. 2B is a side view showing the process following FIG. 2A. 図2Cは図2Bの続きの工程を示す側面図である。FIG. 2C is a side view showing the process following FIG. 2B. 図2Dは図2Cの続きの工程を示す側面図である。FIG. 2D is a side view showing the process continued from FIG. 2C. 図2Eは本発明の第二実施形態に係るワーク保持治具を用いて電子部品に異なる態様の端子電極を形成する過程を示す側面図である。FIG. 2E is a side view showing a process of forming terminal electrodes of different modes on an electronic component using a workpiece holding jig according to a second embodiment of the present invention. 図2Fは図2Eの続きの工程を示す側面図である。FIG. 2F is a side view showing the process following FIG. 2E. 図2Gは図2Fの続きの工程を示す側面図である。FIG. 2G is a side view showing the process following FIG. 2F. 図2Hは図2Gの続きの工程を示す側面図である。FIG. 2H is a side view showing the process following FIG. 2G. 図3は図1Aに示すワーク保持治具の分解斜視図である。FIG. 3 is an exploded perspective view of the workpiece holding jig shown in FIG. 1A. 図4Aは図1Aに示すワーク保持治具の異なる配置態様を示す全体斜視図である。FIG. 4A is an overall perspective view showing a different arrangement of the workpiece holding jig shown in FIG. 1A. 図4Bは図4Aに示すワーク保持治具を回転させたときの全体斜視図である。FIG. 4B is an overall perspective view when the workpiece holding jig shown in FIG. 4A is rotated. 図5Aは本発明の第三実施形態に係るワーク保持治具の全体斜視図である。FIG. 5A is an overall perspective view of a work holding jig according to a third embodiment of the present invention. 図5Bは図5Aに示すワーク保持治具の部分拡大図である。FIG. 5B is a partially enlarged view of the workpiece holding jig shown in FIG. 5A. 図6Aは図5Aに示すワーク保持治具を用いて電子部品に端子電極を形成する過程を示す側面図である。FIG. 6A is a side view showing a process of forming a terminal electrode on an electronic component using the workpiece holding jig shown in FIG. 5A. 図6Bは図6Aの続きの工程を示す側面図である。FIG. 6B is a side view showing the process following FIG. 6A. 図6Cは図6Bの続きの工程を示す側面図である。FIG. 6C is a side view showing the process continued from FIG. 6B.

以下、本発明を、図面に示す実施形態に基づき説明する。   Hereinafter, the present invention will be described based on embodiments shown in the drawings.

第1実施形態
図1Aに示すように、本発明の第一実施形態に係るワーク保持治具1A,1Bは、ワーク保持機構10と、ワーク保持機構10に着脱自在に構成してある補助部材20とを有する。電子部品処理装置では、複数のワーク保持治具1A,1Bが、図1Aに示すように、各々配列された状態で備えられる。図1Aに示す例では、2つのワーク保持治具1A,1Bが、それぞれ略平行に配列されており、一方のワーク保持治具1Aは、他方のワーク保持治具1Bに対して、Y軸を中心軸として時計回りに90°回転させてある。
First Embodiment As shown in FIG. 1A, the workpiece holding jigs 1A and 1B according to the first embodiment of the present invention are a workpiece holding mechanism 10 and an auxiliary member 20 configured to be detachable from the workpiece holding mechanism 10. And. In the electronic component processing apparatus, a plurality of workpiece holding jigs 1A and 1B are provided in an arrayed state as shown in FIG. 1A. In the example shown in FIG. 1A, two work holding jigs 1A and 1B are arranged substantially in parallel, respectively, and one work holding jig 1A has a Y-axis relative to the other work holding jig 1B. It is rotated 90 ° clockwise as a central axis.

ワーク保持治具1A,1Bは、電子部品の製造時において、端子電極を形成するために、複数の電子部品の素体(以下、ワーク50)を整列保持するための治具である。ワーク保持治具1A,1Bは、電子部品処理装置(図示略)の補助治具として用いられ、電子部品処理装置(図示略)に複数具備される。   The workpiece holding jigs 1A and 1B are jigs for aligning and holding element bodies (hereinafter, workpieces 50) of a plurality of electronic components in order to form terminal electrodes at the time of manufacturing the electronic components. The workpiece holding jigs 1A and 1B are used as auxiliary jigs for the electronic component processing apparatus (not shown), and a plurality of the workpiece holding jigs 1A and 1B are provided in the electronic component processing apparatus (not shown).

電子部品処理装置としては、たとえば印刷装置、捺印装置、あるいは塗布装置等が例示される。電子部品の製造時には、たとえば印刷装置に備わるスキージ等によって、ワーク保持治具1A,1Bに保持された複数のワーク50の処理予定面(本実施形態では、図1Bに示す鍔部52a,52bの表面)に電極膜(端子電極)形成処理が施される。   Examples of the electronic component processing apparatus include a printing apparatus, a sealing apparatus, or a coating apparatus. At the time of manufacture of the electronic component, for example, the processing scheduled surfaces of the plurality of works 50 held by the work holding jigs 1A and 1B by a squeegee or the like provided in the printing apparatus (in the present embodiment, the ridges 52a and 52b shown in FIG. An electrode film (terminal electrode) formation process is performed on the surface).

以下において、まず、ワーク50に電極膜形成処理を施してなる電子部品の詳細について説明する。以下の説明において、ワーク保持治具1A,1Bの長手方向と平行な方向をY軸方向、Y軸と垂直な方向をX軸方向、Y軸およびX軸に垂直な方向をZ軸方向とする。   In the following, first, details of the electronic component formed by subjecting the workpiece 50 to the electrode film formation process will be described. In the following description, the direction parallel to the longitudinal direction of the workpiece holding jigs 1A and 1B is taken as the Y-axis direction, the direction perpendicular to the Y-axis as the X-axis direction, and the direction perpendicular to the Y-axis and the X-axis as the Z-axis direction. .

図1Bに示すように、一方のワーク保持時具1Aに保持されるワーク50(電子部品の素体)は、ドラムコアからなり、X軸方向に巻軸を持つ巻芯部51と、巻芯部51のX軸方向の両端に備えられる一対の鍔部52aおよび52bとを有する。鍔部52a,52bは、X軸方向に関して所定の間隔を空けて、互いに略平行になるように配置されている。巻芯部51は、一対の鍔部52a,52bにおいて互いに向かい合うそれぞれの面の中央部に接続しており、一対の鍔部52a,52bを接続している。   As shown in FIG. 1B, the workpiece 50 (element body of the electronic component) held by one of the workpiece holding tools 1A comprises a drum core and a core 51 having a winding axis in the X-axis direction, and the core A pair of flanges 52a and 52b are provided at both ends of the 51 in the X-axis direction. The flanges 52a and 52b are arranged substantially parallel to each other at a predetermined interval in the X-axis direction. The winding core 51 is connected to the center of each of the faces facing each other in the pair of collars 52a and 52b, and connects the pair of collars 52a and 52b.

図1Cに示すように、鍔部52a,52bは、略直方形状(略六面体)からなり、上面52a1,52b1と、上面52a1,52b1とはZ軸方向に反対側にある下面52a2,52b2と、端面52a3,52b3と、第1側面52a4,52b4と、第1側面52a4,52b4とはY軸方向に反対側にある第2側面52a5,52b5と、端面52a3,52b3とはX軸方向に反対側にある内側面52a6,52b6とを有する。上面52a1,52b1または下面52a2,52b2は、たとえば回路基板等に接合される部分である。   As shown in FIG. 1C, the flanges 52a and 52b have a substantially rectangular shape (substantially hexahedron), and the upper surfaces 52a1 and 52b1 and the upper surfaces 52a1 and 52b1 are lower surfaces 52a2 and 52b2 opposite to each other in the Z-axis direction, The end faces 52a3 and 52b3, the first side faces 52a4 and 52b4, and the first side faces 52a4 and 52b4 are opposite to the second side faces 52a5 and 52b5 in the Y-axis direction, and the end faces 52a3 and 52b3 are on the opposite side in the X-axis direction And the inner side surfaces 52a6 and 52b6. Upper surface 52a1, 52b1 or lower surface 52a2, 52b2 is a part joined to a circuit board etc., for example.

図1Cに示すように、鍔部52a,52bには、所定パターンの電極膜53が形成される。電極部53は、たとえば金属ペースト焼付け膜や金属メッキ膜で構成される。電極膜53は、上面電極部531と、端面電極部532と、下面電極部533とを有し、これらは電気的および物理的に接続される。   As shown in FIG. 1C, an electrode film 53 having a predetermined pattern is formed on the ridges 52a and 52b. The electrode portion 53 is formed of, for example, a metal paste baking film or a metal plating film. The electrode film 53 has an upper surface electrode portion 531, an end surface electrode portion 532 and a lower surface electrode portion 533, which are electrically and physically connected.

上面電極部531は、XY平面に平行な面からなり、上面52a1,52b1に形成される。端面電極部532は、YZ平面に平行な面からなり、端面52a3,52b3に形成される。下面電極部533は、XY平面に平行な面からなり、下面52a2,52b2に形成される。   The upper surface electrode portion 531 is formed of a surface parallel to the XY plane, and is formed on the upper surfaces 52a1 and 52b1. The end face electrode portion 532 is formed in a plane parallel to the YZ plane, and is formed on the end faces 52a3 and 52b3. The lower surface electrode portion 533 is a surface parallel to the XY plane, and is formed on the lower surface 52a2, 52b2.

次に、ワーク保持治具1A,1Bの詳細について説明する。ワーク保持治具1Aおよび1Bは、それぞれ同様の構成を有するため、以下の説明では、ワーク保持治具1Aを参照しつつ、ワーク保持治具1A,1Bの詳細について説明する。   Next, details of the workpiece holding jigs 1A and 1B will be described. The workpiece holding jigs 1A and 1B have the same configuration, and therefore, in the following description, the workpiece holding jigs 1A and 1B will be described in detail with reference to the workpiece holding jig 1A.

ワーク保持治具1Aにおいて、X軸方向はワーク保持治具1Aの長さ方向に対応し、Y軸方向はワーク保持治具1Aの幅方向に対応し、Z軸方向はワーク保持治具1Aの高さ方向に対応する。また、以下では、Z軸の矢印方向側を上方とし、Z軸の矢印方向とは反対方向側を下方とする。   In the workpiece holding jig 1A, the X-axis direction corresponds to the lengthwise direction of the workpiece holding jig 1A, the Y-axis direction corresponds to the width direction of the workpiece holding jig 1A, and the Z-axis direction corresponds to the workpiece holding jig 1A. Corresponds to the height direction. Moreover, below, let the arrow direction side of Z-axis be upper direction, and let the opposite direction side to the arrow direction of Z-axis be downward.

図1Aに示すように、ワーク保持治具1Aは、Y軸方向に細長い形状を有する。ワーク保持機構10と補助部材20との結合時において、ワーク保持治具1Aの結合体の長手方向に垂直な断面形状は略正方形状である。より詳細には、ワーク保持治具1AのY軸方向長さは、たとえば200〜300mmであり、X軸方向幅は10〜30mmであり、Z軸方向幅は10〜30mmである。   As shown in FIG. 1A, the workpiece holding jig 1A has a shape elongated in the Y-axis direction. When the workpiece holding mechanism 10 and the auxiliary member 20 are coupled, the cross-sectional shape perpendicular to the longitudinal direction of the combined body of the workpiece holding jig 1A is substantially square. More specifically, the length in the Y-axis direction of the workpiece holding jig 1A is, for example, 200 to 300 mm, the width in the X-axis direction is 10 to 30 mm, and the width in the Z-axis direction is 10 to 30 mm.

ワーク保持機構10は、複数のワーク収容部13を有する。ワーク収容部13は、凹部からなり、上方および側方にワークを受け入れ可能な開放部が形成してある。この開放部を通じて、ワーク収容部13には、ワーク50が収容される。   The workpiece holding mechanism 10 has a plurality of workpiece accommodating parts 13. The work accommodating portion 13 is formed of a recess, and an open portion capable of receiving the work is formed on the upper side and the side. The workpiece 50 is accommodated in the workpiece accommodating portion 13 through the opening portion.

図1Bに示すように、ワーク収容部13は、第1当接面131と、第2当接面132と、第3当接面133と、対向面134とを有する。   As shown in FIG. 1B, the workpiece accommodating portion 13 has a first contact surface 131, a second contact surface 132, a third contact surface 133, and an opposing surface 134.

第1当接面131は、ワーク保持治具1の幅方向および長さ方向に平行な面(図示の例では、XY平面)からなる。第2当接面132は、ワーク保持治具1の長さ方向および高さ方向に平行な面(図示の例では、YZ平面)からなる。第3当接面133は、ワーク保持治具1の幅方向および高さ方向に平行な面(図示の例では、XZ平面)からなる。対向面134は、ワーク保持治具1の長さ方向および高さ方向に平行な面(図示の例では、XZ平面)からなり、第3当接面とはY軸方向反対側に配置してある。   The first contact surface 131 is formed of a surface (an XY plane in the illustrated example) parallel to the width direction and the length direction of the workpiece holding jig 1. The second contact surface 132 is formed of a surface (YZ plane in the illustrated example) parallel to the longitudinal direction and the height direction of the workpiece holding jig 1. The third contact surface 133 is formed of a surface (in the illustrated example, an XZ plane) parallel to the width direction and the height direction of the workpiece holding jig 1. The opposing surface 134 is composed of a surface (in the illustrated example, an XZ plane) parallel to the longitudinal direction and the height direction of the workpiece holding jig 1 and is disposed on the opposite side to the third contact surface in the Y axis direction. is there.

第2当接面132および第3当接面133は、互いに略直角に交差し、角部を形成している。同様に、第2当接面132および対向面134は、互いに略直角に交差し、角部を形成している。   The second contact surface 132 and the third contact surface 133 intersect each other substantially at right angles to form a corner. Similarly, the second abutment surface 132 and the opposing surface 134 intersect at substantially right angles with each other to form a corner.

ワーク収容部13にワーク50を収容すると、ワーク収容部13の第1当接面131には、図1Cに示すワーク50の鍔部52a,52bの下面52a2,52b2が当接する。また、図1Bに示すワーク収容部13の第2当接面132には、図1Cに示すワーク50の鍔部52bの端面52b3が当接する。また、図1Bに示すワーク収容部13の第3当接面133には、図1Cに示すワーク50の鍔部52a,52bの第2側面52a5,52b5が当接する。すなわち、図1Bに示す第1当接面131と、第2当接面132と、第3当接面133とには、ワーク50の3面が当接する。   When the workpiece 50 is accommodated in the workpiece accommodating portion 13, the lower surfaces 52a2 and 52b2 of the flange portions 52a and 52b of the workpiece 50 shown in FIG. 1C abut on the first contact surface 131 of the workpiece accommodating portion 13. Further, an end face 52b3 of the flange 52b of the work 50 shown in FIG. 1C abuts on the second contact surface 132 of the work storage 13 shown in FIG. 1B. In addition, the second side surfaces 52a and 52b5 of the flanges 52a and 52b of the workpiece 50 shown in FIG. 1C abut on the third abutment surface 133 of the workpiece storage portion 13 shown in FIG. 1B. That is, three surfaces of the workpiece 50 abut on the first abutment surface 131, the second abutment surface 132, and the third abutment surface 133 shown in FIG. 1B.

本実施形態では、第1当接面131および第3当接面133のX軸方向幅は、図1Cに示す鍔部52a,52bの端面52a3,52b3間のY軸方向幅よりも若干短くなるように形成してある。また、図1Bに示す第2当接面132、第3当接面133および対向面134とのZ軸方向幅は、鍔部52a,52bのZ軸方向高さよりも若干小さくなるように形成してある。   In the present embodiment, the width in the X-axis direction of the first contact surface 131 and the third contact surface 133 is slightly shorter than the width in the Y-axis direction between the end surfaces 52a3 and 52b3 of the flanges 52a and 52b shown in FIG. 1C. It is formed like. Further, the width in the Z-axis direction of the second contact surface 132, the third contact surface 133 and the opposing surface 134 shown in FIG. 1B is formed to be slightly smaller than the height in the Z-axis direction of the flanges 52a and 52b. It is

そのため、ワーク収容部13にワーク50を収容すると、第1当接面131の反対側と、第2当接面132の反対側とから、ワーク収容部13に収容してあるワーク50の処理予定面(所定パターンの電極膜53が形成される予定面)が、ワーク収容部13の外側に突出する。   Therefore, when the work 50 is stored in the work storage portion 13, the processing schedule of the work 50 stored in the work storage portion 13 from the opposite side of the first contact surface 131 and the opposite side of the second contact surface 132 The surface (the surface on which the electrode film 53 of a predetermined pattern is to be formed) protrudes to the outside of the workpiece storage portion 13.

より詳細には、図1Cに示す鍔部52a,52bの上面52a1,52b1が、図1Bに示す第1当接面131の反対側から突出するとともに、ワーク収容部13の外側に露出する。また、図1Cに示す鍔部52aの端面52a3が、図1Bに示す第2当接面132の反対側から突出するとともに、ワーク収容部13の外側に露出する。   More specifically, the upper surfaces 52a1 and 52b1 of the flanges 52a and 52b shown in FIG. 1C protrude from the opposite side of the first contact surface 131 shown in FIG. 1B and are exposed to the outside of the workpiece accommodating portion 13. Further, the end face 52a3 of the flange 52a shown in FIG. 1C protrudes from the opposite side of the second contact surface 132 shown in FIG. 1B, and is exposed to the outside of the workpiece accommodating portion 13.

なお、ワーク50を、上下(Z軸方向)および左右(Y軸方向)を反転させた状態でワーク収容部13の内部に収容した場合には、図1Cに示す鍔部52a,52bの下面52a2,52b2が、図1Bに示す第1当接面131の反対側から突出するとともに、ワーク収容部13の外側に露出する。また、図1Cに示す鍔部52bの端面52b3が、図1Bに示す第2当接面132の反対側から突出するとともに、ワーク収容部13の外側に露出する。   When the workpiece 50 is accommodated inside the workpiece accommodation portion 13 with the workpiece 50 vertically inverted (Z-axis direction) and horizontally (Y-axis direction) inverted, the lower surface 52a2 of the flanges 52a and 52b shown in FIG. 1C. , 52b2 project from the opposite side of the first contact surface 131 shown in FIG. 1B, and are exposed to the outside of the workpiece storage portion 13. Further, the end face 52b3 of the flange 52b shown in FIG. 1C protrudes from the opposite side of the second contact surface 132 shown in FIG.

本実施形態では、第1当接面131の反対側から突出した鍔部52a,52bの上面52a1,52b1の突出量と、第2当接面132の反対側から突出した鍔部52aの端面52a3の処理予定面の突出量とが、略等しくなっている。   In this embodiment, the amount of protrusion of the upper surfaces 52a1 and 52b1 of the flanges 52a and 52b protruding from the opposite side of the first abutment surface 131 and the end surface 52a3 of the flange 52a projecting from the opposite side of the second abutment surface 132 The amount of protrusion of the processing planned surface of is substantially equal.

本実施形態では、ワーク50をワーク収容部13に収容すると、ワーク収容部13の第2当接面132および第3当接面133に沿うように、ワーク50の鍔部52bの端面52b3(図1C参照)および鍔部52a,52bの第2側面52a5,52b5(図1C参照)が配置される。そのため、図1Bに示すように、ワーク収容部13に収容してあるワーク50は、第2当接面132と、第3当接面133とがなす角部の内側に配置されることになる。   In the present embodiment, when the workpiece 50 is accommodated in the workpiece accommodating portion 13, the end face 52b3 of the flange portion 52b of the workpiece 50 is arranged along the second abutment surface 132 and the third abutment surface 133 of the workpiece accommodation portion 13 (see FIG. 1C) and the second side surfaces 52a, 52b5 (see FIG. 1C) of the flanges 52a, 52b. Therefore, as shown in FIG. 1B, the work 50 stored in the work storage portion 13 is disposed inside the corner formed by the second contact surface 132 and the third contact surface 133. .

ワーク50は、第3当接面133側に偏って配置され、ワーク50の第1側面52a4と対向面134との間には隙間が形成されるようになっている。なお、この隙間の大きさは、ワーク50の大きさ(特に、Y軸方向幅)に応じて適宜設定してもよい。   The workpiece 50 is disposed to be biased toward the third contact surface 133, and a gap is formed between the first side surface 52a4 of the workpiece 50 and the facing surface 134. The size of the gap may be appropriately set in accordance with the size of the workpiece 50 (in particular, the width in the Y-axis direction).

第2当接面132には、ワーク収容部13に収容してあるワーク50とは反対側(当該ワーク50の鍔部52bの端面52b3(図1C参照)の法線方向)に向かって凹む凹部132aが形成してある。凹部132aは、第2当接面132のうち、第3当接面133側に偏って形成してある。   The second abutment surface 132 has a recess recessed toward the opposite side (normal direction of the end surface 52b3 (see FIG. 1C) of the flange 52b of the workpiece 50) to the workpiece 50 contained in the workpiece housing 13. 132a is formed. The concave portion 132 a is formed to be biased toward the third contact surface 133 side of the second contact surface 132.

凹部132aは、ワーク保持治具1Aの上方から見て、長孔形状を有するが、凹部132aの形状は特に限定されるものではなく、適宜変更してもよい。また、凹部132aのZ軸方向深さは、ワーク収容部13のZ軸方向深さと同じであってもよいが、異なっていていてもよい。   The recess 132a has a long hole shape when viewed from above the workpiece holding jig 1A, but the shape of the recess 132a is not particularly limited, and may be changed as appropriate. Further, the depth in the Z-axis direction of the recess 132 a may be the same as the depth in the Z-axis direction of the workpiece accommodating portion 13, but may be different.

凹部132aのY軸方向幅は、鍔部52a,52bのY軸方向幅よりも小さい。このような構成とすることにより、ワーク50をワーク収容部13に収容したときに、ワーク50が凹部132aの内部に埋没することが防止される。   The Y-axis direction width of the concave portion 132a is smaller than the Y-axis direction width of the flanges 52a and 52b. With such a configuration, when the workpiece 50 is accommodated in the workpiece accommodating portion 13, the workpiece 50 is prevented from being buried in the recess 132a.

本実施形態では、ワーク保持機構10は、第1ワーク保持部11と、第2ワーク保持部12と有し、各ワーク保持部11,12に分離可能に取り付けられる。図2Aに示すように、第1ワーク保持部11および第2ワーク保持部12は、それぞれ断面において段差部を有し、各段差部を着脱自在に係合させることにより、各ワーク保持部11,12を組み合わせることが可能となっている。   In the present embodiment, the work holding mechanism 10 includes the first work holding unit 11 and the second work holding unit 12 and is detachably attached to the work holding units 11 and 12. As shown in FIG. 2A, each of the first work holding portion 11 and the second work holding portion 12 has a stepped portion in the cross section, and each work holding portion 11 can be releasably engaged with each stepped portion. It is possible to combine twelve.

図1Aに示すように、第2ワーク保持部12には、ねじ穴60が形成してあり、ねじ穴60にねじ70を挿通することにより、第1ワーク保持部11と第2ワーク保持部12とを強固に固定することが可能となっている。   As shown in FIG. 1A, a screw hole 60 is formed in the second work holding portion 12, and the first work holding portion 11 and the second work holding portion 12 are inserted by inserting a screw 70 into the screw hole 60. It is possible to firmly fix the

本実施形態では、ワーク収容部13は、第1ワーク保持部11と第2ワーク保持部12とを組み合わせることにより形成される。すなわち、ワーク収容部13は、分離可能に構成してある。以下、ワーク収容部13の詳細な構造について説明する。   In the present embodiment, the workpiece storage unit 13 is formed by combining the first workpiece holding unit 11 and the second workpiece holding unit 12. That is, the workpiece storage unit 13 is configured to be separable. Hereinafter, the detailed structure of the workpiece storage unit 13 will be described.

第1ワーク保持部11は、第1仕切端部111と、第2仕切端部112と、複数の仕切部113と、複数の凹部114とを有する。複数の仕切部113は、Y軸方向に沿って所定の厚みを有し、第1ワーク保持部11の長手方向に沿って、所定の間隔を空けつつ配置してある。なお、仕切部113のY軸方向に沿った厚みは、特に限定されるものではなく、適宜変更してもよい。   The first work holding portion 11 has a first partition end 111, a second partition end 112, a plurality of partitions 113, and a plurality of recesses 114. The plurality of partition portions 113 have a predetermined thickness along the Y-axis direction, and are arranged along the longitudinal direction of the first work holding portion 11 at a predetermined interval. In addition, the thickness along the Y-axis direction of the partition part 113 is not specifically limited, You may change suitably.

第1仕切端部111は第1ワーク保持部11の長手方向一端に形成してあり、第2仕切端部112は第1ワーク保持部11の長手方向他端に形成してある。   The first partition end 111 is formed at one end in the longitudinal direction of the first workpiece holder 11, and the second partition end 112 is formed at the other end in the longitudinal direction of the first workpiece holder 11.

複数の凹部114の各々は、第1仕切端部111とこれに隣り合う仕切部113との間と、第2仕切端部112とこれに隣り合う仕切部113との間と、複数の仕切部113の各々の間とに形成してある。凹部114の上方は、開放してある。また、第1保持部11と第2保持部12とが分離している状態において、凹部114の側方(幅方向両端)は開放してある。   Each of the plurality of recesses 114 is between the first partition end 111 and the partition 113 adjacent to it, between the second partition end 112 and the partition 113 adjacent to it, and a plurality of partitions It is formed between each of 113. The upper side of the recess 114 is open. Further, in the state in which the first holding portion 11 and the second holding portion 12 are separated, the lateral sides (both ends in the width direction) of the concave portion 114 are open.

第2ワーク保持部12は、端面部121を有する。端面部121は、第1ワーク保持部12の幅方向一端を構成し、端面部121には上述したワーク収容部13の凹部132aが形成してある。なお、第2ワーク保持部12の上面と、仕切部113の上面とが面一になっていることが好ましいが、段差が形成されていてもよい。   The second work holding portion 12 has an end face portion 121. The end face portion 121 constitutes one end of the first work holding portion 12 in the width direction, and the end face portion 121 is provided with the recess 132 a of the work storage portion 13 described above. In addition, although it is preferable that the upper surface of the 2nd workpiece | work holding part 12 and the upper surface of the partition part 113 become flush | level, a level | step difference may be formed.

ワーク保持治具1Aにおいて、第1保持部11に第2保持部12が組み合わされると、凹部114の側方(X軸方向一端)に、第2保持部12の端面部121(図1Bに示すワーク収容部13の第2当接面132に対応する部分)が当接する。これにより、凹部114の幅方向一端が閉塞し、幅方向他端が開放してあるワーク収容部13が形成される。   In the workpiece holding jig 1A, when the second holding portion 12 is combined with the first holding portion 11, the end surface portion 121 (shown in FIG. 1B) of the second holding portion 12 is shown on the side (one end in the X-axis direction) of the recess 114. The portion corresponding to the second contact surface 132 of the workpiece accommodating portion 13 abuts. As a result, one end of the recess 114 in the width direction is closed, and the other end of the width direction is opened to form the workpiece storage portion 13.

すなわち、図1Bに示すように、ワーク収容部13に収容されるワーク50の鍔部52a,52bの上面52a1,52b1(図1C参照)と、鍔部52aの端面52a3(図1C参照)が露出するように、第1当接面131の反対側と、第2当接面132の反対側とが開放してあるワーク収容部13が形成される。   That is, as shown in FIG. 1B, the upper surfaces 52a1 and 52b1 (see FIG. 1C) of the flanges 52a and 52b of the workpiece 50 accommodated in the workpiece accommodation unit 13 and the end surface 52a3 (see FIG. 1C) of the flange 52a are exposed. As a result, the workpiece accommodating portion 13 in which the opposite side of the first abutment surface 131 and the opposite side of the second abutment surface 132 are opened is formed.

図1Bに示す例では、第1当接面131と第3当接面133とが、第1ワーク保持部11に形成してあり、第2当接面132が、第2ワーク保持部12に形成してある。しかしながら、ワーク収容部13の態様としては、必ずしも、図示の例のように、第1ワーク保持部11と第2ワーク保持部12とを組み合わせて構成する必要はなく、たとえば、ワーク収容部13を第1ワーク保持部11にのみ形成してもよい。   In the example shown in FIG. 1B, the first contact surface 131 and the third contact surface 133 are formed in the first workpiece holder 11, and the second contact surface 132 is in the second workpiece holder 12. It is formed. However, as an aspect of the work storage unit 13, it is not necessary to configure the first work holding unit 11 and the second work holding unit 12 in combination as in the example shown in the drawings. It may be formed only on the first work holding portion 11.

図3に示すように、ワーク保持機構10に組み合わされる補助部材20は、本体部21と、複数のマグネット22と、マグネット保持部23と、位置決め突起24とを有する。図示の例では、本体部21は、第1ワーク保持部11と略同一の長さ、幅および高さを有する。図示の例では、2つの位置決め突起24が、本体部21の長手方向両端に形成してある。位置決め突起24は、ワーク保持機構10と補助部材20との装着時に、第1ワーク保持部11が有する位置決め凹部(図示略)に係合する。   As shown in FIG. 3, the auxiliary member 20 combined with the workpiece holding mechanism 10 has a main body portion 21, a plurality of magnets 22, a magnet holding portion 23, and a positioning protrusion 24. In the illustrated example, the main body portion 21 has substantially the same length, width and height as the first work holding portion 11. In the illustrated example, two positioning protrusions 24 are formed on both ends of the main body 21 in the longitudinal direction. The positioning projection 24 engages with a positioning recess (not shown) of the first work holding portion 11 when the work holding mechanism 10 and the auxiliary member 20 are mounted.

マグネット保持部23は、本体部21の長手方向に沿って形成してあり、本体部21の幅方向一端に配置してある。マグネット保持部23は、複数(ワーク収容部13の個数と同様)のマグネット22を収容するための複数の収容凹部220を有する。複数の収容凹部220の各々は、マグネット保持部23の長手方向に沿って、所定の間隔を空けつつ配置してある。   The magnet holding portion 23 is formed along the longitudinal direction of the main body portion 21 and is disposed at one end in the width direction of the main body portion 21. The magnet holding portion 23 has a plurality of housing concave portions 220 for housing a plurality of (same as the number of the workpiece housing portions 13) magnets 22. Each of the plurality of housing recesses 220 is disposed along the longitudinal direction of the magnet holding portion 23 at a predetermined interval.

マグネット22は、略円柱状の形状を有し、収容凹部220の内部に収容してある。マグネット22は、ワーク収容部13に収容してあるワーク50を、第1当接面131、第2当接面132および第3当接面133に当接するように引き寄せる引き寄せ手段としての役割を果たす。マグネット22の一端は、収容凹部220の上端から露出し、第1保持部11のワーク収容部13の第1当接面131を向いている。   The magnet 22 has a substantially cylindrical shape and is housed inside the housing recess 220. The magnet 22 serves as a drawing means for drawing the workpiece 50 stored in the workpiece storage portion 13 into contact with the first contact surface 131, the second contact surface 132 and the third contact surface 133. . One end of the magnet 22 is exposed from the upper end of the accommodation recess 220 and faces the first contact surface 131 of the workpiece accommodation unit 13 of the first holding unit 11.

マグネット22は、図1Bに示す第1ワーク保持部11の凹部114の下方、すなわちワーク収容部13の下方に配置してある。より詳細には、図3に示すマグネット22は、図1Bに示すワーク収容部13のうち、第2当接面132と第3当接面113とがなす角部に、磁力によって、ワーク50を引き寄せる役割を果たす。   The magnet 22 is disposed below the recess 114 of the first workpiece holder 11 shown in FIG. 1B, that is, below the workpiece holder 13. More specifically, the magnet 22 shown in FIG. 3 has a workpiece 50 by magnetic force at an angle portion formed by the second contact surface 132 and the third contact surface 113 in the workpiece accommodating portion 13 shown in FIG. 1B. Play a role in attracting.

電子部品の製造では、まず、図2Aに示すように複数のワーク保持治具1A,1Bと、たとえばドラム型のワーク50とを準備する(ワーク準備工程)。ワーク50には、図1Bに示す巻芯部51と鍔部52a,52bとが一体に成形される。本実施形態では、ワーク50の鍔部52a,52bの上面52a1,52b1、下面52a2,52b2および端面52a3,52b3が処理予定面である。   In the manufacture of the electronic component, first, as shown in FIG. 2A, a plurality of workpiece holding jigs 1A and 1B and, for example, a drum-type workpiece 50 are prepared (work preparation step). In the work 50, a winding core 51 and collars 52a and 52b shown in FIG. 1B are integrally formed. In the present embodiment, the upper surfaces 52a1 and 52b1, the lower surfaces 52a2 and 52b2, and the end surfaces 52a3 and 52b3 of the flanges 52a and 52b of the workpiece 50 are to be processed.

次に、図2A示すように、複数のワーク50の各々をワーク保持治具1A,1Bの各ワーク収容部13の内部に収容する(ワーク収容工程)。ワーク収容工程では、鍔部52bの端面52b3が第2当接面132に当接し、鍔部52bの第2側面52b5が第3当接面133に当接するように、各ワーク50を各ワーク収容部13の内部に配置する。   Next, as shown in FIG. 2A, each of the plurality of works 50 is accommodated inside each of the work accommodating portions 13 of the work holding jigs 1A and 1B (work accommodation step). In the workpiece accommodation step, each workpiece 50 is accommodated so that the end surface 52b3 of the collar 52b abuts on the second abutment surface 132 and the second side surface 52b5 of the collar 52b abuts on the third abutment surface 133. It arranges inside the part 13.

このようにして各ワーク収容部13の内部に収容された各ワーク50は、図3に示す第2ワーク保持部12の各マグネット22の磁力によって、図1Bに示す第1当接面131と第2当接面132とがなす角部に引き寄せられ、当該角部の内側に位置決めされる。   In this manner, each work 50 stored in the interior of each work storage unit 13 has the first contact surface 131 shown in FIG. 1B and the first contact surface 131 shown in FIG. 1B by the magnetic force of each magnet 22 of the second work holding unit 12 shown in FIG. It is drawn to the corner formed by the two abutment surfaces 132 and positioned inside the corner.

次に、図1Bに示すように、ワーク保持治具1A,1Bの各々を、隣り合う一方のワーク保持治具1Aのワーク収容部13の第1当接面131と、隣り合う他方のワーク保持治具1Bのワーク収容部13の第2当接面132とが同一方向(Z軸上方)を向くように、所定角度(90度)だけ回転させて配列する(ワーク配列工程)。   Next, as shown in FIG. 1B, each of the workpiece holding jigs 1A and 1B is held by the first contact surface 131 of the workpiece accommodating portion 13 of one adjacent workpiece holding jig 1A and the other workpiece holding adjacent thereto. The second contact surface 132 of the workpiece accommodating portion 13 of the jig 1B is rotated by a predetermined angle (90 degrees) so as to face the same direction (Z-axis upper direction) (a workpiece arranging step).

この結果、図2Aに示すように、ワーク保持治具1Bのワーク収容部13に収容してあるワーク50では、鍔部52aの端面52a3が上方を向き、ワーク収容部13の第2当接面132の反対側から露出する。また、ワーク保持治具1Aのワーク収容部13に収容してあるワーク50では、鍔部52a,52bの上面52a1,52b1が上方を向き、ワーク収容部13の第1当接面131の反対側から露出する。   As a result, as shown in FIG. 2A, in the work 50 stored in the work storage portion 13 of the work holding jig 1B, the end face 52a3 of the collar portion 52a faces upward, and the second contact surface of the work storage portion 13 Exposed from the opposite side of 132. Further, in the workpiece 50 accommodated in the workpiece accommodation portion 13 of the workpiece holding jig 1A, the upper surfaces 52a1 and 52b1 of the flanges 52a and 52b face upward, and the opposite side of the first contact surface 131 of the workpiece accommodation portion 13 Exposed from

次に、ワーク収容部13から露出したワーク50の処理予定面(上面52a1,52b1および端面52a3)に、スクリーン印刷等で電極膜形成処理を行い、所定パターンで図1Cに示す電極部53を形成する(第1処理工程)。   Next, an electrode film formation process is performed by screen printing or the like on the processing planned surface (upper surfaces 52a1 and 52b1 and end surface 52a3) of the workpiece 50 exposed from the workpiece storage portion 13 to form the electrode portions 53 shown in FIG. (1st treatment process).

より詳細には、図2Aに示すように、ワーク保持治具1Bのワーク収容部13に収容してあるワーク50について、第2当接面132の反対側から露出している鍔部52aの端面52a3に電極膜形成処理を行い、電極部53の端面電極部532を形成する。   More specifically, as shown in FIG. 2A, the end surface of the flange portion 52a exposed from the opposite side of the second contact surface 132 for the workpiece 50 stored in the workpiece storage portion 13 of the workpiece holding jig 1B. An electrode film forming process is performed on 52 a 3 to form an end face electrode portion 532 of the electrode portion 53.

また、ワーク保持治具1Aのワーク収容部13に収容してあるワーク50について、第1当接面131の反対側から露出している鍔部52a,52bの上面52a1,52b1に電極膜形成処理を行い、電極部53の上面電極部531,531を形成する。   In addition, for the work 50 stored in the work storage unit 13 of the work holding jig 1A, the electrode film forming process is performed on the upper surfaces 52a1 and 52b1 of the flanges 52a and 52b exposed from the opposite side of the first contact surface 131 To form upper surface electrode portions 531 and 531 of the electrode portion 53.

なお、電極膜形成処理は、スキージ等を用いて、ワーク保持治具1に保持されている各ワーク50の処理予定面に、スクリーンを通じて金属ペースト(たとえば、Agペースト)を塗布することにより行われる。   The electrode film forming process is performed by applying a metal paste (for example, Ag paste) through a screen to the processing planned surface of each work 50 held by the work holding jig 1 using a squeegee or the like. .

次に、ワーク保持治具1A,1Bを所定角度だけ回転させる。より詳細には、図2Bに示すように、ワーク保持治具1Bについては、第1当接面131が上方を向くように、Y軸を中心軸として時計回りに90度回転させる。また、ワーク保持治具1Aについては、第2当接面132が上方を向くように、Y軸を中心軸として時計回りに90度回転させる。このように、ワーク保持治具1A,1Bを90度だけ回転させると、ワーク保持治具1A,1Bの左右の配置が入れ替わる。   Next, the workpiece holding jigs 1A and 1B are rotated by a predetermined angle. More specifically, as shown in FIG. 2B, the workpiece holding jig 1B is rotated 90 degrees clockwise about the Y axis such that the first contact surface 131 is directed upward. In addition, the workpiece holding jig 1A is rotated 90 degrees clockwise about the Y axis such that the second contact surface 132 faces upward. Thus, when the workpiece holding jigs 1A and 1B are rotated by 90 degrees, the left and right positions of the workpiece holding jigs 1A and 1B are switched.

そして、引き続き、ワーク保持治具1Aのワーク収容部13に収容してあるワーク50について、第2当接面132の反対側から露出している鍔部52aの端面52a3に電極膜形成処理を行い、端面電極部532を形成する。   Then, with respect to the workpiece 50 stored in the workpiece storage portion 13 of the workpiece holding jig 1A, an electrode film forming process is performed on the end surface 52a3 of the ridge portion 52a exposed from the opposite side of the second contact surface 132. The end face electrode portion 532 is formed.

また、ワーク保持治具1Bのワーク収容部13に収容してあるワーク50について、第1当接面131の反対側から露出している鍔部52a,52bの上面52a1,52b1に電極膜形成処理を行い、上面電極部531,531を形成する。   In addition, for the work 50 stored in the work storage portion 13 of the work holding jig 1B, the electrode film forming process is performed on the upper surfaces 52a1 and 52b1 of the flanges 52a and 52b exposed from the opposite side of the first contact surface 131 To form the upper surface electrode portions 531 and 531.

なお、ワーク保持治具1A,1Bの回転前後における一連の電極膜形成処理において、回転後の電極膜形成処理は、回転前の電極膜形成処理で形成された電極膜53が乾燥する前に行ってもよい。一連の電極膜形成処理の完了後、電極膜53を乾燥させてもよい(乾燥処理)。   In the series of electrode film formation processes before and after rotation of the workpiece holding jigs 1A and 1B, the electrode film formation process after rotation is performed before the electrode film 53 formed in the electrode film formation process before rotation is dried. May be After completion of the series of electrode film formation processes, the electrode film 53 may be dried (drying process).

次に、図2Cに示すように、ワーク50をワーク保持治具1A,1Bのワーク収容部13からそれぞれ取り出し、ワーク50の上下左右を反転させ、上述したワーク収容工程を行う。この結果、図2Cに示すように、図2Bに示す鍔部52aの端面52a3に形成してある端面電極部532は、ワーク収容部13の第2当接面132に当接する。また、図1Cに示す鍔部52a,52bの第2側面52a5,52b5は、図1Bに示す第3当接面133に当接する。また、図2Cに示すように、図2Bに示す鍔部52a,52bの上面52a1,52b1に形成してある上面電極部531,531は、第1当接面131に当接する。   Next, as shown in FIG. 2C, the workpiece 50 is taken out of the workpiece holding portion 13 of the workpiece holding jigs 1A and 1B, the upper and lower sides and the left and right of the workpiece 50 are reversed, and the above-mentioned workpiece housing process is performed. As a result, as shown in FIG. 2C, the end face electrode portion 532 formed on the end face 52a3 of the flange portion 52a shown in FIG. 2B abuts on the second contact surface 132 of the workpiece storage portion 13. Further, the second side surfaces 52a 5 52b 5 of the flanges 52a 52b shown in FIG. 1C abut on the third contact surface 133 shown in FIG. 1B. Further, as shown in FIG. 2C, upper surface electrode portions 531 and 531 formed on the upper surfaces 52a1 and 52b1 of the flange portions 52a and 52b shown in FIG. 2B abut on the first contact surface 131.

この結果、図2Cに示すように、ワーク保持治具1Aのワーク収容部13に収容してあるワーク50では、鍔部52bの端面52b3が上方を向き、ワーク収容部13の第2当接面132の反対側から露出する。また、ワーク保持治具1Bのワーク収容部13に収容してあるワーク50では、鍔部52a,52bの下面52a2,52b2が上方を向き、ワーク収容部13の第1当接面131の反対側から露出する。   As a result, as shown in FIG. 2C, in the work 50 stored in the work storage portion 13 of the work holding jig 1A, the end face 52b3 of the collar portion 52b faces upward, and the second contact surface of the work storage portion 13 Exposed from the opposite side of 132. Further, in the workpiece 50 stored in the workpiece storage portion 13 of the workpiece holding jig 1B, the lower surfaces 52a2 and 52b2 of the flange portions 52a and 52b face upward, and the opposite side of the first contact surface 131 of the workpiece storage portion 13 Exposed from

次に、再び、ワーク収容部13から露出したワーク50の処理予定面(下面52a2,52b2および端面52b3)に電極膜形成処理を行う(第2処理工程)。   Next, an electrode film forming process is performed again on the processing planned surfaces (the lower surfaces 52a2 and 52b2 and the end surface 52b3) of the workpiece 50 exposed from the workpiece storage portion 13 (second processing step).

第2処理工程では、ワーク保持治具1Bのワーク収容部13に収容してあるワーク50について、第1当接面131の反対側から露出している鍔部52a,52bの下面52a2,下面52b2に電極膜形成処理を行い、下面電極部533,533を形成する。   In the second processing step, the lower surface 52a2 and the lower surface 52b2 of the flanges 52a and 52b exposed from the opposite side of the first contact surface 131 for the workpiece 50 stored in the workpiece storage unit 13 of the workpiece holding jig 1B. An electrode film formation process is performed to form lower surface electrode portions 533 and 533.

また、ワーク保持治具1Aのワーク収容部13に収容してあるワーク50について、第2当接面132の反対側から露出している鍔部52bの端面52b3に電極膜形成処理を行い、端面電極部532を形成する。   In addition, with respect to the workpiece 50 stored in the workpiece storage portion 13 of the workpiece holding jig 1A, an electrode film forming process is performed on the end surface 52b3 of the flange 52b exposed from the opposite side of the second contact surface 132 An electrode portion 532 is formed.

次に、ワーク保持治具1A,1Bを所定角度だけ回転させる。より詳細には、ワーク保持治具1Bについては、第2当接面132が上方を向くように、Y軸を中心軸として時計回りに90度回転させる。また、ワーク保持治具1Aについては、第1当接面131が上方を向くように、Y軸を中心軸として時計回りに90度回転させる。このように、ワーク保持治具1A,1Bを90度だけ回転させると、図2Dに示すように、ワーク保持治具1A,1Bの左右の配置が入れ替わる。   Next, the workpiece holding jigs 1A and 1B are rotated by a predetermined angle. More specifically, the workpiece holding jig 1B is rotated 90 degrees clockwise about the Y axis such that the second contact surface 132 faces upward. In addition, the workpiece holding jig 1A is rotated 90 degrees clockwise about the Y axis such that the first contact surface 131 faces upward. Thus, when the workpiece holding jigs 1A and 1B are rotated by 90 degrees, as shown in FIG. 2D, the left and right positions of the workpiece holding jigs 1A and 1B are switched.

そして、引き続き、ワーク保持治具1Bのワーク収容部13に収容してあるワーク50について、第2当接面132の反対側から露出している鍔部52bの端面52b3に電極膜形成処理を行い、端面電極部532を形成する。   Then, with respect to the workpiece 50 accommodated in the workpiece accommodation portion 13 of the workpiece holding jig 1B, an electrode film forming process is performed on the end surface 52b3 of the flange 52b exposed from the opposite side of the second contact surface 132. The end face electrode portion 532 is formed.

また、ワーク保持治具1Aのワーク収容部13に収容してあるワーク50について、第1当接面131の反対側から露出している鍔部52a,52bの下面52a2,52b2に電極膜形成処理を行い、下面電極部533,533を形成する。   Further, for the workpiece 50 stored in the workpiece storage portion 13 of the workpiece holding jig 1A, the electrode film forming process is performed on the lower surfaces 52a2 and 52b2 of the flanges 52a and 52b exposed from the opposite side of the first contact surface 131 To form lower surface electrode portions 533 and 533.

一連の電極膜形成処理の完了後、乾燥処理を行ってもよい。なお、第2処理工程の後に、ワーク50を所定の温度で焼き付けた後、その処理予定面に、必要に応じて、たとえば電界メッキまたは無電界メッキを施し、メッキ膜を形成する。   A drying process may be performed after completion of a series of electrode film formation processes. After the second treatment process, the workpiece 50 is baked at a predetermined temperature, and then the surface to be treated is subjected to, for example, electrolytic plating or electroless plating, as needed, to form a plating film.

本実施形態では、ワーク収容部13にワーク50を収容すると、ワーク50の2つの処理予定面(上面52a1,52b1および端面52a3あるいは下面52a2,52b2および端面52b3)が、ワーク収容部13の第1当接面131の反対側と、第2当接面132の反対側とから露出する。   In the present embodiment, when the workpiece 50 is accommodated in the workpiece accommodating portion 13, the two processing planned surfaces (upper surface 52 a 1, 52 b 1 and end surface 52 a 3 or lower surface 52 a 2, 52 b 2 and end surface 52 b 3) of the workpiece 50 are the first of the workpiece accommodating portion 13. It is exposed from the opposite side of the contact surface 131 and the opposite side of the second contact surface 132.

本実施形態では、このワーク収容部13から露出したワーク50の処理予定面を印刷用スクリーン等に向けることで、当該処理予定面に所定パターンの電極膜53を形成することが可能である。そして、ワーク収容部13から露出したワーク50のいずれかの処理予定面(たとえば、上面51a1,51b1)に上面電極部531を形成した後は、ワーク保持治具1を90度だけ回転させ、ワーク収容部13から露出した他のいずれかの処理予定面(たとえば、端面51a3)を印刷用スクリーン等に向けることで、当該処理予定面に端面電極部532を上面電極部531に連続して位置ずれすることなく所定パターンで形成することができる。   In the present embodiment, the electrode film 53 of a predetermined pattern can be formed on the processing scheduled surface by directing the processing scheduled surface of the workpiece 50 exposed from the workpiece storage unit 13 to a printing screen or the like. Then, after the upper surface electrode portion 531 is formed on any of the processing planned surfaces (for example, the upper surfaces 51a1 and 51b1) of the workpiece 50 exposed from the workpiece accommodation portion 13, the workpiece holding jig 1 is rotated by 90 degrees to By directing any other processing planned surface (for example, the end surface 51a3) exposed from the storage section 13 to the printing screen etc., the end surface electrode section 532 is continuously displaced to the upper surface electrode section 531 on the processing planned surface. It can form in a predetermined pattern, without doing.

すなわち、本実施形態では、従来とは異なり、処理予定面に電極膜を形成する都度、ワークをワーク保持治具から取り外し、ワークの向きを変える必要がなく、ワーク収容部13から露出した2つの処理予定面(たとえば、上面52a1,52b1および端面52a3)に、連続的に電極膜53を形成することが可能である。したがって、ワーク50の取り外しに起因して生じ得る電極膜53の位置ずれや欠損等の不具合を防止し、ワーク50の所定位置に電極膜53を高精度で形成することができる。   That is, in the present embodiment, unlike in the prior art, it is not necessary to remove the work from the work holding jig and change the direction of the work each time the electrode film is formed on the processing planned surface. The electrode film 53 can be continuously formed on the processing target surface (for example, the upper surfaces 52a1 and 52b1 and the end surface 52a3). Therefore, it is possible to prevent a defect such as a positional deviation or a defect of the electrode film 53 which may occur due to the removal of the work 50, and to form the electrode film 53 at a predetermined position of the work 50 with high accuracy.

また、本実施形態に係るワーク保持治具1A,1Bを用いることにより、ワーク50の処理予定面に、電極膜53だけではなく、その他の機能被膜(たとえば、絶縁膜)を形成することも可能である。また、処理予定面には、被膜形成処理だけではなく、その他の処理(たとえば、エッチング等の表面処理)を行うことも可能である。いずれの処理についても、上述した要領でワーク保持治具1A,1Bを90度だけ回転させ、処理対象の処理予定面を順次シフトしていくことにより、ワーク50の複数の処理予定面に連続した処理を高精度で行うことができる。   Moreover, not only the electrode film 53 but also other functional films (for example, insulating films) can be formed on the processing planned surface of the work 50 by using the work holding jigs 1A and 1B according to the present embodiment. It is. Moreover, it is also possible to perform not only a film formation process but other processes (for example, surface treatment such as etching) on the surface to be treated. In any of the processes, the workpiece holding jigs 1A and 1B are rotated by 90 degrees as described above, and the processing scheduled surfaces of the processing targets are sequentially shifted, whereby the plurality of processing scheduled surfaces of the workpiece 50 are continuous. Processing can be performed with high accuracy.

また、ワーク50が第1当接面131と、第2当接面132と、第3当接面133とで位置決めされることにより、ワーク50の位置ずれを防止し、ワーク50の複数の処理予定面に連続した処理をより高精度で行うことができる。   Further, by positioning the work 50 with the first contact surface 131, the second contact surface 132, and the third contact surface 133, positional deviation of the work 50 can be prevented, and a plurality of processes of the work 50 can be performed. It is possible to perform continuous processing on the planned surface with higher accuracy.

また、本実施形態では、複数のワーク保持治具1A,1Bを、ワーク保持治具1Aに保持されたワーク50の第1当接面131とは反対側の処理予定面(鍔部52a,52bの上面52a1,52b1)と、ワーク保持治具1Bに保持されたワーク50の第2当接面132とは反対側の処理予定面(鍔部52aの端面53a3)とが略面一になるように配列する。そして、これらに保持されたワーク50の別々の処理予定面に同時に処理を行う。そのため、2つのワーク50の処理予定面に同時に電極膜形成処理などの処理を行うことができる。   Further, in the present embodiment, the plurality of workpiece holding jigs 1A and 1B are to be processed on the side opposite to the first contact surface 131 of the workpiece 50 held by the workpiece holding jig 1A (the ridge portions 52a and 52b So that the upper surface 52a1, 52b1) and the second processing surface (the end surface 53a3 of the flange portion 52a) opposite to the second contact surface 132 of the workpiece 50 held by the workpiece holding jig 1B are substantially flush with each other Arrange in Then, processing is simultaneously performed on different processing scheduled surfaces of the work 50 held by these. Therefore, processing such as electrode film formation can be performed simultaneously on the processing planned surfaces of the two workpieces 50.

また、本実施形態では、ワーク収容部13に収容してあるワーク50の2つの処理予定面(上面52a1,52b1と端面52a3)が、それぞれ第1当接面131の反対側と、前記第2当接面132の反対側とから露出するように、ワーク50がワーク収容部13に収容される。そのため、第1当接面131の反対側から露出した上面52a1,52b1と、第2当接面132の反対側から露出した端面52a3とに、上述した要領で、連続した処理をより高精度で行うことができる。   Further, in the present embodiment, the two processing planned surfaces (the upper surfaces 52a1 and 52b1 and the end surface 52a3) of the workpiece 50 stored in the workpiece storage portion 13 are respectively opposite to the first contact surface 131 and the second The workpiece 50 is accommodated in the workpiece accommodating portion 13 so as to be exposed from the opposite side of the abutment surface 132. Therefore, in the above-described manner, continuous processing is performed with higher accuracy on the upper surfaces 52a1 and 52b1 exposed from the opposite side of the first abutment surface 131 and the end surface 52a3 exposed from the opposite side of the second abutment surface 132. It can be carried out.

また、本実施形態では、第1当接面131の反対側と、第2当接面132の反対側とから、2つの処理予定面(たとえば、上面52a1,52b1と端面52a3)が、ワーク収容部13の外側に突出するように、ワーク50がワーク収容部13に収容される。そのため、ワーク収容部13の外側にワーク50の各処理予定面が突出し、スキージ等によって、各処理予定面に電極膜形成処理などの処理を容易に行うことができる。   Further, in the present embodiment, from the opposite side of the first contact surface 131 and the opposite side of the second contact surface 132, the two processing planned surfaces (for example, the upper surfaces 52a1 and 52b1 and the end surface 52a3) The workpiece 50 is accommodated in the workpiece accommodating portion 13 so as to protrude to the outside of the portion 13. Therefore, each processing scheduled surface of the workpiece 50 protrudes outside the workpiece accommodating portion 13, and the processing such as electrode film forming processing can be easily performed on each processing scheduled surface by a squeegee or the like.

また、本実施形態では、第1当接面131の反対側から突出したワーク50の端面52a3の突出量と、第2当接面の反対側から突出したワーク50の上面52a1,52b1突出量とが略等しい。そのため、ワーク保持治具1A,1Bを90度だけ回転させたときに、印刷用スクリーン等とワーク50の処理予定面の間の距離が、常に一定となるように調整しやすくなる。したがって、ワーク保持治具1を90度だけ回転させる都度、上記距離を調整する必要がなく、スキージ等によって、容易にワーク50の処理予定面に電極膜を形成することができる。   Further, in the present embodiment, the amount of projection of the end surface 52a3 of the work 50 that protrudes from the opposite side of the first contact surface 131 and the amount of upper surface 52a1, 52b1 of the work 50 that protrudes from the opposite side of the second contact surface. Are approximately equal. Therefore, when the workpiece holding jigs 1A and 1B are rotated by 90 degrees, the distance between the printing screen or the like and the processing planned surface of the workpiece 50 can be easily adjusted to be always constant. Therefore, it is not necessary to adjust the above-mentioned distance each time the work holding jig 1 is rotated by 90 degrees, and the electrode film can be easily formed on the processing planned surface of the work 50 by a squeegee or the like.

また、本実施形態では、ワーク保持機構10は、複数のワーク収容部13を具備する。そのため、複数のワーク50の各々を各ワーク収容部13に配置することが可能となり、一度に複数のワーク50に端子電極を高精度で形成することができる。   Further, in the present embodiment, the workpiece holding mechanism 10 includes a plurality of workpiece accommodating portions 13. Therefore, it becomes possible to arrange each of a plurality of works 50 in each work storage part 13, and a terminal electrode can be formed on a plurality of works 50 at once with high accuracy.

また、本実施形態では、第2当接面132には、ワーク収容部13に収容されるワーク50とは反対側に向かって凹む凹部132aが形成してある。そのため、処理予定面に所定の処理を行った後、凹部132aにピン等を挿入し、このピン等で掻き出すように、第2当接面132に固定してあるワーク50を押し出すことにより、ワーク収容部13からワーク50を取り出すことができる。   Further, in the present embodiment, the second contact surface 132 is formed with a recess 132 a that is recessed toward the opposite side to the workpiece 50 accommodated in the workpiece accommodation portion 13. Therefore, after performing predetermined processing on the processing scheduled surface, a pin or the like is inserted into the recess 132a, and the workpiece 50 fixed to the second contact surface 132 is pushed out so as to scrape with the pin or the like. The workpiece 50 can be taken out of the housing portion 13.

また、本実施形態では、ワーク保持機構10は、第1ワーク保持部11と、第1ワーク保持部11に分離可能に取り付けられる第2ワーク保持部12とを有し、第1当接面131と第3当接面132とが、第1ワーク保持部11に形成してあり、第2当接面132が、第2ワーク保持部12に形成してある。そのため、下記のような態様で処理を行うことが可能となる。   Further, in the present embodiment, the workpiece holding mechanism 10 includes the first workpiece holding portion 11 and the second workpiece holding portion 12 removably attached to the first workpiece holding portion 11, and the first contact surface 131 And the third contact surface 132 are formed on the first workpiece holder 11, and the second contact surface 132 is formed on the second workpiece holder 12. Therefore, processing can be performed in the following manner.

すなわち、予め、ワーク収容部13のサイズ(第1当接面131および第3当接面133の面積)が各々異なる複数の第1ワーク保持部11を準備しておき、処理を行うワーク50のサイズに応じて、所望のサイズのワーク収容部13を有する第1ワーク保持部11を選択する。この第1ワーク保持部11を第2ワーク保持部12に装着して処理を行えば、第2ワーク保持部12を変えずに済むため、他品種の電子部品50の生産性を向上させることができる。   That is, a plurality of first work holding portions 11 having different sizes (areas of the first contact surface 131 and the third contact surface 133) of the work storage portion 13 are prepared in advance, and the work 50 is processed In accordance with the size, the first workpiece holding unit 11 having the desired size of the workpiece storage unit 13 is selected. By mounting the first work holding unit 11 on the second work holding unit 12 and performing processing, the second work holding unit 12 does not need to be changed, and thus the productivity of the electronic components 50 of other types can be improved. it can.

また、本実施形態では、ワーク収容部13に収容してあるワーク50は、第2当接面132と、第3当接面133とがなす角部の内側に配置される。そのため、ワーク収容部13の角部の内側にワーク50を容易に位置決めすることが可能となる。したがって、ワーク50の位置ずれを防止し、ワーク50の複数の処理予定面に連続した処理をより高精度で行うことができる。   Further, in the present embodiment, the workpiece 50 accommodated in the workpiece accommodation portion 13 is disposed inside the corner formed by the second abutment surface 132 and the third abutment surface 133. Therefore, it becomes possible to easily position the work 50 inside the corner of the work accommodating portion 13. Therefore, positional deviation of the work 50 can be prevented, and processing continuous to a plurality of planned processing surfaces of the work 50 can be performed with higher accuracy.

また、本実施形態では、ワーク保持治具1A,1Bの長手方向に垂直な断面形状が略正方形状である。そのため、ワーク保持治具1A,1Bを90度回転させたときに、印刷用スクリーン等とワーク50の処理予定面の間の距離を、常に一定とすることが容易になる。   Further, in the present embodiment, the cross-sectional shape perpendicular to the longitudinal direction of the workpiece holding jigs 1A and 1B is substantially square. Therefore, when the workpiece holding jigs 1A and 1B are rotated by 90 degrees, it is easy to always keep the distance between the printing screen or the like and the processing planned surface of the workpiece 50 constant.

また、複数のワーク保持治具1A,1Bを隣り合うように配列した場合、各ワーク保持治具1A,1Bを所定角度だけ回転させたときに、隣り合うワーク保持治具1A,1B間で、保持されるワーク50の処理予定面を略面一にしやすくなり、スクリーン印刷などの処理が行いやすくなる。   Further, in the case where the plurality of work holding jigs 1A and 1B are arranged adjacent to each other, when the work holding jigs 1A and 1B are rotated by a predetermined angle, between the adjacent work holding jigs 1A and 1B. It becomes easy to make the processing scheduled surface of the workpiece 50 to be held substantially flush, and it becomes easy to carry out processing such as screen printing.

また、本実施形態では、ワーク収容部13に収容してあるワーク50を、第1当接面131、第2当接面132および第3当接面133に当接するように引き寄せるマグネット22を有する。そのため、ワーク収容部13に収容してあるワーク50を第2当接面132および第3当接面133に当接するように引き寄せることが可能となり、ワーク保持治具1A,1Bに対するワーク50の位置決め精度を向上させることができる。   Further, in the present embodiment, the magnet 22 is provided to draw the work 50 stored in the work storage portion 13 into contact with the first contact surface 131, the second contact surface 132, and the third contact surface 133. . Therefore, it becomes possible to draw the work 50 stored in the work storage portion 13 into contact with the second contact surface 132 and the third contact surface 133, and positioning of the work 50 with respect to the work holding jigs 1A and 1B. Accuracy can be improved.

また、本実施形態では、補助部材12がワーク保持機構11と着脱自在に構成してあるため、ワーク保持治具1A,1Bの内部等に塵等(フェライトの粉や欠け等)が蓄積した場合であっても、補助部材12をワーク保持機構11から取り外し、ワーク保持治具1A,1Bの内部等を掃除することができる。   Further, in the present embodiment, the auxiliary member 12 is configured to be attachable to and detachable from the work holding mechanism 11, so that dust etc. (ferrite powder, chipping etc.) is accumulated inside the work holding jigs 1A and 1B. Even if it is, the auxiliary member 12 can be removed from the workpiece holding mechanism 11, and the inside of the workpiece holding jigs 1A and 1B can be cleaned.

第2実施形態
本実施形態に係るワーク保持治具1A,1Bでは、電極膜形成処理の態様が異なる以外は、第1実施形態に係るワーク保持治具1A,1Bと同様である。以下、第1実施形態と異なる部分について詳細に説明し、共通する部分の説明は省略する。また、図面に示す部材において、共通する部材には共通する符号を付し、その説明は一部省略する。
Second Embodiment The workpiece holding jigs 1A and 1B according to the present embodiment are the same as the workpiece holding jigs 1A and 1B according to the first embodiment except that the form of the electrode film forming process is different. Hereinafter, portions different from the first embodiment will be described in detail, and description of the common portions will be omitted. Further, in the members shown in the drawings, the common members are denoted by the same reference numerals, and the description thereof is partially omitted.

図1Dに示すように、ワーク50Aに本実施形態における電極膜形成処理を施してなる電子部品は、電極膜53Aが下面電極部に相当する構成を具備していないという点と、端面電極部532AのZ軸方向幅が第1実施形態における端面電極部532のZ軸方向幅よりも短いという点において、第1実施形態における電子部品とは異なる。端面電極部532Aは、ワーク50Aの鍔部52a,52bの端面52a3,52b3の略上半分にのみ形成される。   As shown in FIG. 1D, the electronic component obtained by subjecting the work 50A to the electrode film forming process in the present embodiment does not have a configuration in which the electrode film 53A corresponds to the lower surface electrode portion, and an end surface electrode portion 532A. It differs from the electronic component in the first embodiment in that the width in the Z-axis direction is shorter than the width in the Z-axis direction of the end face electrode portion 532 in the first embodiment. The end surface electrode portion 532A is formed only on substantially the upper half of the end surfaces 52a3 and 52b3 of the flange portions 52a and 52b of the work 50A.

本実施形態では、第1処理工程(ワーク保持治具1A,1Bを回転する前の工程)において、ワーク保持治具1Bのワーク収容部13に収容してあるワーク50Aについて、第2当接面132の反対側から露出している鍔部52aの端面52a3の略上半分にのみ電極膜形成処理を行い、端面電極部532Aを形成する。   In the present embodiment, in the first processing step (the step before rotating the workpiece holding jigs 1A and 1B), the second contact surface of the workpiece 50A accommodated in the workpiece accommodating portion 13 of the workpiece holding jig 1B. An electrode film forming process is performed only on the substantially upper half of the end face 52a3 of the flange 52a exposed from the opposite side of 132 to form the end face electrode portion 532A.

また、ワーク保持治具1Aのワーク収容部13に収容してあるワーク50Aについて、第1当接面131の反対側から露出している鍔部52aの上面52a1にのみ電極膜形成処理を行い、上面電極部531を形成する。なお、鍔部52bの上面52b1には電極膜形成処理が行われないように、マスクされていることが好ましい。   The electrode film forming process is performed only on the upper surface 52a1 of the ridge portion 52a exposed from the opposite side of the first contact surface 131 for the workpiece 50A stored in the workpiece storage portion 13 of the workpiece holding jig 1A. An upper surface electrode portion 531 is formed. The upper surface 52b1 of the ridge portion 52b is preferably masked so that the electrode film formation process is not performed.

また、図2Fに示すように、ワーク保持治具1A,1Bを90度だけ回転させた後も、引き続き、ワーク保持治具1Bのワーク収容部13に収容してあるワーク50Aについて、第1当接面131の反対側から露出している鍔部52aの上面52a1にのみ電極膜形成処理を行い、上面電極部531を形成する。鍔部52bの上面52b1には電極膜形成処理が行われないように、マスクされていることが好ましい。   Further, as shown in FIG. 2F, even after rotating the workpiece holding jigs 1A and 1B by 90 degrees, the first contact of the workpiece 50A stored in the workpiece storage portion 13 of the workpiece holding jig 1B is continued. An electrode film forming process is performed only on the upper surface 52a1 of the ridge portion 52a exposed from the opposite side of the contact surface 131 to form the upper surface electrode portion 531. The upper surface 52b1 of the ridge portion 52b is preferably masked so that the electrode film formation process is not performed.

また、ワーク保持治具1Aのワーク収容部13に収容してあるワーク50Aについて、第2当接面132の反対側から露出している鍔部52aの端面52a3の略上半分にのみ電極膜形成処理を行い、端面電極部532Aを形成する。   In addition, with regard to the work 50A accommodated in the workpiece accommodation portion 13 of the workpiece holding jig 1A, the electrode film is formed only on the substantially upper half of the end face 52a3 of the flange 52a exposed from the opposite side of the second contact surface 132 A process is performed to form the end face electrode portion 532A.

本実施形態では、第1処理工程の完了後、ワーク50Aをワーク保持治具1A,1Bのワーク収容部13から取り出し、ワーク50Aの上下は反転させずに、左右のみを反転させ、ワーク収容部13の内部に収容する。   In the present embodiment, after completion of the first processing step, the workpiece 50A is taken out from the workpiece storage portion 13 of the workpiece holding jig 1A, 1B, and only the left and right are reversed without inverting the top and bottom of the workpiece 50A. Housed inside of 13.

第2処理工程(ワーク保持治具1A,1Bを回転した後の工程)においても、上述した要領で電極膜形成処理を行う。すなわち、図2Gに示すように、ワーク保持治具1Aのワーク収容部13に収容してあるワーク50Aについて、第2当接面132の反対側から露出している鍔部52bの端面52b3の略上半分にのみ電極膜形成処理を行い、端面電極部532Aを形成する。   Also in the second treatment process (the process after rotating the work holding jigs 1A and 1B), the electrode film formation process is performed in the manner described above. That is, as shown in FIG. 2G, in the workpiece 50A accommodated in the workpiece accommodation portion 13 of the workpiece holding jig 1A, substantially the end surface 52b3 of the flange 52b exposed from the opposite side of the second contact surface 132 An electrode film forming process is performed only on the upper half to form an end face electrode portion 532A.

また、ワーク保持治具1Bのワーク収容部13に収容してあるワーク50Aについて、第1当接面131の反対側から露出している鍔部52bの上面52b1にのみ電極膜形成処理を行い、上面電極部531を形成する。鍔部52aの上面52a1には電極膜形成処理が行われないように、マスクされていることが好ましい。   The electrode film forming process is performed only on the upper surface 52b1 of the ridge portion 52b exposed from the opposite side of the first contact surface 131 for the workpiece 50A stored in the workpiece storage portion 13 of the workpiece holding jig 1B. An upper surface electrode portion 531 is formed. The upper surface 52a1 of the ridge portion 52a is preferably masked so that the electrode film formation process is not performed.

また、図2Hに示すように、ワーク保持治具1A,1Bを90度だけ回転させた後も、引き続き、ワーク保持治具1Bのワーク収容部13に収容してあるワーク50Aについて、第2当接面132の反対側から露出している鍔部52bの端面52b3の略上半分にのみ電極膜形成処理を行い、端面電極部532Aを形成する。   Further, as shown in FIG. 2H, even after rotating the workpiece holding jigs 1A and 1B by 90 degrees, the second contact for the workpiece 50A stored in the workpiece storage portion 13 of the workpiece holding jig 1B is continued. An electrode film forming process is performed only on the substantially upper half of the end face 52b3 of the ridge 52b exposed from the opposite side of the contact surface 132, to form an end face electrode 532A.

また、ワーク保持治具1Aのワーク収容部13に収容してあるワーク50Aについて、第1当接面131の反対側から露出している鍔部52bの上面52b1にのみ電極膜形成処理を行い、上面電極部531を形成する。鍔部52aの上面52a1には電極膜形成処理が行われないように、マスクされていることが好ましい。   The electrode film forming process is performed only on the upper surface 52b1 of the ridge portion 52b exposed from the opposite side of the first contact surface 131 for the workpiece 50A stored in the workpiece storage portion 13 of the workpiece holding jig 1A. An upper surface electrode portion 531 is formed. The upper surface 52a1 of the ridge portion 52a is preferably masked so that the electrode film formation process is not performed.

本実施形態によれば、第1実施形態に係るワーク保持治具1A,1Bを用いることにより、たとえば下面電極部に相当する構成を具備しない電極部53Aを形成することが可能であり、電子部品の用途等に応じて、種々の電極部を形成することができる。   According to the present embodiment, by using the workpiece holding jigs 1A and 1B according to the first embodiment, it is possible to form an electrode portion 53A not having a configuration equivalent to the lower surface electrode portion, for example, and an electronic component Various electrode parts can be formed according to the application etc.

第3実施形態
図5Aおよび図5Bに示すように、本実施形態に係るワーク保持治具201では、ワーク保持機構210の構成が異なる以外は、第1実施形態に係るワーク保持治具1Aまたは1Bと同様である。以下、第1実施形態と異なる部分について詳細に説明し、共通する部分の説明は省略する。また、図面に示す部材において、共通する部材には共通する符号を付し、その説明は一部省略する。
Third Embodiment As shown in FIGS. 5A and 5B, in the workpiece holding jig 201 according to the present embodiment, the workpiece holding jig 1A or 1B according to the first embodiment except the configuration of the workpiece holding mechanism 210 is different. Is the same as Hereinafter, portions different from the first embodiment will be described in detail, and description of the common portions will be omitted. Further, in the members shown in the drawings, the common members are denoted by the same reference numerals, and the description thereof is partially omitted.

図5Aに示すように、本実施形態におけるワーク保持機構210のZ軸方向の上部には、Y軸方向に沿って複数のワーク収容部213を有する。   As shown in FIG. 5A, a plurality of work accommodating parts 213 are provided along the Y-axis direction at the upper part in the Z-axis direction of the work holding mechanism 210 in the present embodiment.

ワーク収容部213は、凹部114によって構成され、第1実施形態におけるワーク収容部13とは異なり、凹部114のX軸方向の両側が外部に開放している。   The work storage portion 213 is constituted by the recess 114, and unlike the work storage portion 13 in the first embodiment, both sides in the X axis direction of the recess 114 are open to the outside.

図5Bに示すように、ワーク収容部213は、図1Bに示す第2当接面132に替えて第2当接面232を有するという点において、第1実施形態におけるワーク収容部13とは異なる。   As shown in FIG. 5B, the workpiece storage portion 213 differs from the workpiece storage portion 13 in the first embodiment in that the workpiece storage portion 213 has a second contact surface 232 instead of the second contact surface 132 shown in FIG. 1B. .

第2当接面232は、ワーク保持治具201の長さ方向および高さ方向に平行な面(図示の例では、YZ平面)からなり、仕切部113の幅方向(X軸方向)の両側面に対応する。本実施形態では、1つのワーク収容部213について、2つの第2当接面232が備わっている。   The second contact surface 232 is a surface (YZ plane in the illustrated example) parallel to the longitudinal direction and the height direction of the workpiece holding jig 201, and both sides in the width direction (X-axis direction) of the partition portion 113 Correspond to the face. In the present embodiment, two second contact surfaces 232 are provided for one work accommodating portion 213.

ワーク収容部213において、第2当接面232および第3当接面133は、互いに略直角に交差し、角部を形成している。同様に、対向面134および第2当接面132は、互いに略直角に交差し、角部を形成している。   In the workpiece storage portion 213, the second contact surface 232 and the third contact surface 133 intersect each other at substantially right angles to form a corner. Similarly, the opposing surface 134 and the second abutment surface 132 intersect each other at substantially right angles to form a corner.

ワーク収容部213にワーク50を収容すると、ワーク収容部213の第1当接面131および第3当接面133には、ワーク50の巻芯部51の外周面が当接する。また、ワーク収容部213のいずれか一方の第2当接面232には、ワーク50の鍔部52a,52bのいずれか一方の内側面52a6,52b6が当接する。   When the workpiece 50 is housed in the workpiece housing portion 213, the outer circumferential surface of the core portion 51 of the workpiece 50 is in contact with the first contact surface 131 and the third contact surface 133 of the workpiece housing portion 213. In addition, one of the inner side surfaces 52a6 and 52b6 of the flanges 52a and 52b of the workpiece 50 abuts on one of the second contact surfaces 232 of the workpiece accommodating portion 213.

すなわち、本実施形態では、ワーク50をワーク収容部213に収容すると、ワーク収容部213の第2当接面232および第3当接面133に沿うように、ワーク50の巻芯部51の外周面および鍔部52a,52bの内側面52a6,52b6が配置される。そのため、ワーク収容部213に収容してあるワーク50は、第2当接面232と、第3当接面133とがなす角部の外側に配置されることになる。   That is, in the present embodiment, when the workpiece 50 is accommodated in the workpiece accommodating portion 213, the outer periphery of the winding core portion 51 of the workpiece 50 is arranged along the second abutment surface 232 and the third abutment surface 133 of the workpiece accommodating portion 213. The faces and the inner side surfaces 52a6, 52b6 of the ridges 52a, 52b are arranged. Therefore, the work 50 stored in the work storage portion 213 is disposed outside the corner formed by the second contact surface 232 and the third contact surface 133.

ワーク50は、第3当接面133側に偏って配置してあり、詳細な図示は省略するが、ワーク50の巻芯部51の外周面と対向面134との間にはわずかに隙間が形成してある。   The work 50 is disposed biased toward the third contact surface 133, and although a detailed illustration is omitted, there is a slight gap between the outer peripheral surface of the winding core 51 of the work 50 and the facing surface 134. It is formed.

この隙間は、図5Aに示す補助部材20が有するマグネット22(図3参照)にワーク50が引き寄せられることにより形成され、ワーク50の大きさ(特に、Y軸方向幅)に応じて適宜変動する。本実施形態では、マグネット22は、ワーク収容部213に収容してあるワーク50を、第1当接面131および第3当接面133に当接するように引き寄せる。   The gap is formed by drawing the work 50 to the magnet 22 (see FIG. 3) of the auxiliary member 20 shown in FIG. 5A, and varies appropriately according to the size of the work 50 (in particular, the width in the Y-axis direction). . In the present embodiment, the magnet 22 draws the workpiece 50 stored in the workpiece storage portion 213 so as to abut on the first contact surface 131 and the third contact surface 133.

ワーク保持治具201を用いた電子部品の製造では、まず、図6A〜図6Cに示すように、複数(図示の例では、3つ)のワーク保持治具201A,201B,201Cを準備する。なお、ワーク保持治具201A,201B,201Cの構成は、図5Aに示すワーク保持治具201の構成と同様である。   In the manufacture of an electronic component using the workpiece holding jig 201, first, as shown in FIGS. 6A to 6C, a plurality of (three in the illustrated example) workpiece holding jigs 201A, 201B, and 201C are prepared. The configurations of the workpiece holding jigs 201A, 201B and 201C are the same as the configuration of the workpiece holding jig 201 shown in FIG. 5A.

そして、図5Bに示すような態様で、複数のワーク50の各々をワーク保持治具201A〜201Cの各ワーク収容部13の内部に収容する(ワーク収容工程)。図5Bに示すように、ワーク収容工程では、巻芯部51の外周面の一部が第3当接面133に当接し、鍔部52a,52bの内側面52a6,52b6が第2当接面232,232に当接するように、各ワーク50を各ワーク収容部213の内部に配置する。   Then, in a mode as shown in FIG. 5B, each of the plurality of works 50 is accommodated inside each of the work accommodating portions 13 of the work holding jigs 201A to 201C (work accommodation step). As shown in FIG. 5B, in the workpiece accommodation step, a part of the outer peripheral surface of the winding core 51 abuts on the third contact surface 133, and the inner side surfaces 52a6 and 52b6 of the flanges 52a and 52b are the second contact surfaces. Each work 50 is disposed inside each work accommodating portion 213 so as to be in contact with 232 and 232.

次に、図6Aに示すように、ワーク保持治具201A〜201Cの各々を配列する(ワーク配列工程)。ワーク配列工程では、隣り合う一方のワーク保持治具201A〜201Cと、隣り合う他方のワーク保持治具201A〜201Cとを、Y軸を中心軸として所定角度(90度)だけ回転して配列する。図示の例では、ワーク保持治具201Bが中央に配置してあり、ワーク保持治具201A,201Cが、それぞれY軸を中心軸として90度だけ回転した状態で、ワーク保持治具201Bの左右に配置してある。   Next, as shown to FIG. 6A, each of workpiece holding jigs 201A-201C is arranged (work arrangement process). In the workpiece arranging step, one adjacent workpiece holding jig 201A to 201C and the other adjacent workpiece holding jig 201A to 201C are rotated and arranged by a predetermined angle (90 degrees) with the Y axis as a central axis. . In the illustrated example, the workpiece holding jig 201B is disposed at the center, and the workpiece holding jigs 201A and 201C are rotated by 90 degrees around the Y axis, respectively, to the left and right of the workpiece holding jig 201B. It is arranged.

この結果、ワーク保持治具201Aのワーク収容部213に収容してあるワーク50では、鍔部52aの端面52a3が上方を向き、ワーク収容部213の第2当接面232(図示略)の反対側から露出する。また、ワーク保持治具201Bのワーク収容部213に収容してあるワーク50では、鍔部52a,52bの上面52a1,52b1が上方を向き、ワーク収容部213の第1当接面131の反対側から露出する。また、ワーク保持治具201Cのワーク収容部213に収容してあるワーク50では、鍔部52bの端面52b3が上方を向き、ワーク収容部213の第2当接面232(図示略)の反対側から露出する。   As a result, in the workpiece 50 accommodated in the workpiece accommodating portion 213 of the workpiece holding jig 201A, the end surface 52a3 of the flange portion 52a faces upward, and the opposite of the second contact surface 232 (not shown) of the workpiece accommodating portion 213 Exposed from the side. Further, in the workpiece 50 stored in the workpiece storage portion 213 of the workpiece holding jig 201B, the upper surfaces 52a1 and 52b1 of the collar portions 52a and 52b face upward, and the opposite side of the first contact surface 131 of the workpiece storage portion 213 Exposed from Further, in the workpiece 50 accommodated in the workpiece accommodating portion 213 of the workpiece holding jig 201C, the end surface 52b3 of the flange portion 52b faces upward, and the opposite side of the second contact surface 232 (not shown) of the workpiece accommodating portion 213. Exposed from

次に、ワーク収容部213から露出したワーク50の処理予定面(上面52a1,52b1および端面52a3,52b3)に電極膜形成処理を行う。(第1処理工程)。   Next, an electrode film forming process is performed on the processing planned surfaces (the upper surfaces 52a1 and 52b1 and the end surfaces 52a3 and 52b3) of the workpiece 50 exposed from the workpiece accommodation portion 213. (First processing step).

より詳細には、図6Aに示すように、ワーク保持治具201Aのワーク収容部213に収容してあるワーク50について、第2当接面232(図示略)の反対側から露出している鍔部52aの端面52a3に電極膜形成処理を行い、端面電極部532を形成する。   More specifically, as shown in FIG. 6A, the workpiece 50 stored in the workpiece storage portion 213 of the workpiece holding jig 201A is exposed from the side opposite to the second contact surface 232 (not shown). An electrode film forming process is performed on the end surface 52a3 of the portion 52a to form an end surface electrode portion 532.

また、ワーク保持治具201Bのワーク収容部213に収容してあるワーク50について、第1当接面131の反対側から露出している鍔部52a,52bの上面52a1,52b1に電極膜形成処理を行い、上面電極部531,531を形成する。   Further, for the workpiece 50 stored in the workpiece storage portion 213 of the workpiece holding jig 201B, the electrode film forming process is performed on the upper surfaces 52a1 and 52b1 of the flanges 52a and 52b exposed from the opposite side of the first contact surface 131 To form the upper surface electrode portions 531 and 531.

また、ワーク保持治具201Cのワーク収容部213に収容してあるワーク50について、第2当接面232(図示略)の反対側から露出している鍔部52bの端面52b3に電極膜形成処理を行い、端面電極部532を形成する。   In addition, for the work 50 stored in the work storage portion 213 of the work holding jig 201C, an electrode film forming process is performed on the end face 52b3 of the flange portion 52b exposed from the opposite side of the second contact surface 232 (not shown). To form the end face electrode portion 532.

次に、図6Bに示すように、ワーク保持治具201A〜201Cを所定角度だけ回転させる。より詳細には、ワーク保持治具201Aについては、第1当接面131が上方を向くように、Y軸を中心軸として反時計回りに90度回転させる。また、ワーク保持治具201Bについては、第2当接面232(図示略)が上方を向くように、Y軸を中心軸として反時計回りに90度回転させる。また、ワーク保持治具201Cについては、第2当接面232(図示略)が上方を向くように、Y軸を中心軸として反時計回りに180度回転させる。   Next, as shown in FIG. 6B, the workpiece holding jigs 201A to 201C are rotated by a predetermined angle. More specifically, the workpiece holding jig 201A is rotated 90 degrees counterclockwise about the Y axis such that the first contact surface 131 faces upward. In addition, the workpiece holding jig 201B is rotated 90 degrees counterclockwise about the Y axis such that the second contact surface 232 (not shown) faces upward. The workpiece holding jig 201C is rotated 180 degrees counterclockwise about the Y axis so that the second contact surface 232 (not shown) faces upward.

このように、ワーク保持治具201A〜201Cを所定角度だけ回転させると、図6Aにおいてワーク保持治具201Aが配置されていた位置にワーク保持治具201Cが配置され、ワーク保持治具201Bが配置されていた位置にワーク保持治具201Aが配置され、ワーク保持治具201Cが配置されていた位置にワーク保持治具201Bが配置される。   Thus, when the workpiece holding jigs 201A to 201C are rotated by a predetermined angle, the workpiece holding jig 201C is disposed at the position where the workpiece holding jig 201A was disposed in FIG. 6A, and the workpiece holding jig 201B is disposed. The workpiece holding jig 201A is disposed at the position where the workpiece holding jig 201A is disposed, and the workpiece holding jig 201B is disposed at the position where the workpiece holding jig 201C is disposed.

そして、引き続き、ワーク保持治具201Aのワーク収容部213に収容してあるワーク50について、第1当接面131の反対側から露出している鍔部52a,52bの上面52a1,52b1に電極膜形成処理を行い、上面電極部531,531を形成する。   Then, with respect to the workpiece 50 stored in the workpiece storage portion 213 of the workpiece holding jig 201A, the electrode films are formed on the upper surfaces 52a1 and 52b1 of the ridges 52a and 52b exposed from the opposite side of the first contact surface 131. The formation processing is performed to form the upper surface electrode portions 531 and 531.

また、ワーク保持治具201Bのワーク収容部213に収容してあるワーク50について、第2当接面232(図示略)の反対側から露出している鍔部52bの端面52b3に電極膜形成処理を行い、端面電極部532を形成する。   In addition, for the work 50 stored in the work storage portion 213 of the work holding jig 201B, an electrode film forming process is performed on the end face 52b3 of the flange 52b exposed from the opposite side of the second contact surface 232 (not shown). To form the end face electrode portion 532.

また、ワーク保持治具201Cのワーク収容部213に収容してあるワーク50について、第2当接面232(図示略)の反対側から露出している鍔部52aの端面52a3に電極膜形成処理を行い、端面電極部532を形成する。   Further, with regard to the work 50 stored in the work storage portion 213 of the work holding jig 201C, an electrode film forming process is performed on the end face 52a3 of the ridge portion 52a exposed from the opposite side of the second contact surface 232 (not shown). To form the end face electrode portion 532.

次に、図6Cに示すように、ワーク保持治具201A〜201Cを所定角度だけ回転させる。より詳細には、ワーク保持治具201Cについては、第1当接面131が上方を向くように、Y軸を中心軸として反時計回りに90度回転させる。また、ワーク保持治具201Aについては、第2当接面232が上方を向くように、Y軸を中心軸として反時計回りに90度回転させる。また、ワーク保持治具201Bについては、第2当接面232が上方を向くように、Y軸を中心軸として反時計回りに180度回転させる。   Next, as shown in FIG. 6C, the workpiece holding jigs 201A to 201C are rotated by a predetermined angle. More specifically, the workpiece holding jig 201C is rotated 90 degrees counterclockwise about the Y axis such that the first contact surface 131 faces upward. The workpiece holding jig 201A is rotated 90 degrees counterclockwise about the Y axis so that the second contact surface 232 faces upward. In addition, the workpiece holding jig 201B is rotated 180 degrees counterclockwise about the Y axis such that the second contact surface 232 faces upward.

このように、ワーク保持治具201A〜201Cを所定角度だけ回転させると、図6Bにおいてワーク保持治具201Aが配置されていた位置にワーク保持治具201Cが配置され、ワーク保持治具201Bが配置されていた位置にワーク保持治具201Aが配置され、ワーク保持治具201Cが配置されていた位置にワーク保持治具201Bが配置される。   Thus, when the workpiece holding jigs 201A to 201C are rotated by a predetermined angle, the workpiece holding jig 201C is disposed at the position where the workpiece holding jig 201A was disposed in FIG. 6B, and the workpiece holding jig 201B is disposed. The workpiece holding jig 201A is disposed at the position where the workpiece holding jig 201A is disposed, and the workpiece holding jig 201B is disposed at the position where the workpiece holding jig 201C is disposed.

そして、引き続き、ワーク保持治具201Aのワーク収容部213に収容してあるワーク50について、第2当接面232の反対側から露出している鍔部52bの端面52b3に電極膜形成処理を行い、端面電極部532を形成する。   Subsequently, with respect to the workpiece 50 stored in the workpiece storage portion 213 of the workpiece holding jig 201A, an electrode film forming process is performed on the end surface 52b3 of the ridge portion 52b exposed from the opposite side of the second contact surface 232. The end face electrode portion 532 is formed.

また、ワーク保持治具201Bのワーク収容部213に収容してあるワーク50について、第2当接面232の反対側から露出している鍔部52aの端面52a3に電極膜形成処理を行い、端面電極部532を形成する。   In addition, with respect to the workpiece 50 stored in the workpiece storage portion 213 of the workpiece holding jig 201B, an electrode film forming process is performed on the end surface 52a3 of the ridge portion 52a exposed from the opposite side of the second contact surface 232. An electrode portion 532 is formed.

また、ワーク保持治具201Cのワーク収容部213に収容してあるワーク50について、第1当接面131の反対側から露出している鍔部52a,52bの上面52a1,52b1に電極膜形成処理を行い、上面電極部531,531を形成する。   Further, for the workpiece 50 stored in the workpiece storage portion 213 of the workpiece holding jig 201C, an electrode film forming process is performed on the upper surfaces 52a1 and 52b1 of the flanges 52a and 52b exposed from the opposite side of the first contact surface 131 To form the upper surface electrode portions 531 and 531.

本実施形態では、ワーク収容部213に収容してあるワーク50は、第2当接面232と、第3当接面133とがなす角部の外側に配置してある。そのため、ワーク収容部213の角部の外側にワーク50が固定され、ワーク50の位置決めを行うことが可能となる。したがって、ワーク50の位置ずれを防止し、ワーク50の複数の処理予定面に連続した処理をより高精度で行うことができる。   In the present embodiment, the workpiece 50 accommodated in the workpiece accommodation portion 213 is disposed outside the corner formed by the second abutment surface 232 and the third abutment surface 133. Therefore, the work 50 is fixed to the outside of the corner of the work storage portion 213, and the work 50 can be positioned. Therefore, positional deviation of the work 50 can be prevented, and processing continuous to a plurality of planned processing surfaces of the work 50 can be performed with higher accuracy.

また、ワーク収容部213にワーク50を配置すると、ワーク収容部213からワーク50の3つの処理予定面(鍔部52a,52bの上面52a1,52b1および端面52a3,52b3)が、第1当接面131の反対側と、2つの第2当接面232の反対側とから露出する。したがって、上述した要領でワーク保持治具201を90度だけ回転させ、処理対象の3つの処理予定面を順次シフトしていくことにより、ワーク50の複数の処理予定面に連続した処理を高精度で行うことができる。   In addition, when the workpiece 50 is disposed in the workpiece storage portion 213, the three processing planned surfaces (the upper surfaces 52a1 and 52b1 and the end surfaces 52a3 and 52b3 of the ridges 52a and 52b) of the workpiece 50 from the workpiece storage portion 213 are the first contact surfaces. It is exposed from the opposite side of 131 and the opposite side of the two second contact surfaces 232. Therefore, the workpiece holding jig 201 is rotated by 90 degrees as described above, and the three processing target surfaces to be processed are sequentially shifted, so that the processing continuous to a plurality of processing target surfaces of the workpiece 50 is highly accurate. Can be done with

また、本実施形態では、複数のワーク保持治具201A,201B,201Cを、ワーク保持治具201Aに保持されたワーク50の第1当接面131とは反対側の処理予定面と、ワーク保持治具201Bに保持されたワーク50の第2当接面132とは反対側の処理予定面と、ワーク保持治具201Cに保持されたワーク50の第2当接面132とは反対側の処理予定面とが略面一になるように配列する。そして、これらに保持されたワーク50の別々の処理予定面に同時に処理を行う。そのため、3つのワークの処理予定面に同時に電極膜形成処理などの処理を行うことができる。   Further, in the present embodiment, the plurality of workpiece holding jigs 201A, 201B, and 201C are to be treated holding surfaces opposite to the first contact surface 131 of the workpiece 50 held by the workpiece holding jig 201A, and the workpiece holding The processing scheduled surface opposite to the second contact surface 132 of the workpiece 50 held by the jig 201B, and the processing opposite to the second contact surface 132 of the workpiece 50 held by the workpiece holding jig 201C Arrange so as to be approximately flush with the planned surface. Then, processing is simultaneously performed on different processing scheduled surfaces of the work 50 held by these. Therefore, processing such as electrode film formation can be performed simultaneously on the processing planned surfaces of the three workpieces.

なお、本発明は、上述した実施形態に限定されるものではなく、本発明の範囲内で種々に改変することができる。たとえば、図1Aに示す例では、ワーク保持治具1A,1Bを、それぞれ90度反転させた状態で配列していたが、図4Aおよび図4Bに示すように反転させずに配列してもよい。   The present invention is not limited to the above-described embodiment, and can be variously modified within the scope of the present invention. For example, in the example shown in FIG. 1A, the work holding jigs 1A and 1B are arranged in an inverted state by 90 degrees, but may be arranged without being inverted as shown in FIGS. 4A and 4B. .

また、上記各実施形態では、巻芯部12の横断面形状は矩形であったが、その横断面形状は特に限定されるものはなく、円形や略八角形、あるいはその他の多角形でもよい。   In each of the above embodiments, the cross-sectional shape of the winding core 12 is rectangular, but the cross-sectional shape is not particularly limited, and may be circular, substantially octagonal, or other polygonal shapes.

また、上記実施形態では、鍔部52a,52bの横断面形状は、本実施形態では矩形であったが、その横断面形状は特に限定されるものではなく、円形や略八角形、あるいはその他の多角形でもよい。   Further, in the above embodiment, the cross sectional shapes of the flanges 52a and 52b are rectangular in this embodiment, but the cross sectional shape is not particularly limited, and may be circular, substantially octagonal, or other It may be a polygon.

1A,1B,201,201A,201B,201C・・・ ワーク保持治具
10,210・・・ワーク保持機構
11・・・第1保持部
111・・・第1仕切端部
112・・・第2仕切端部
113・・・仕切部
114・・・凹部
12・・・第2保持部
121・・・端面部
13,213・・・ワーク収容部
131・・・第1当接面
132,232・・・第2当接面
132a・・・凹部
133・・・第3当接面
134・・・対向面
20・・・補助部材
21・・・本体部
22・・・マグネット
220・・・収容凹部
23・・・マグネット保持部
24・・・位置決め突起
50,50A・・・ワーク(電子部品)
51・・・巻芯部
52a,52b・・・鍔部
52a1,52b1・・・上面
52a2,52b2・・・下面
52a3,52b3・・・端面
52a4,52b4・・・第1側面
52a5,52b5・・・第2側面
52a6,52b6・・・内側面
53,53A・・・電極部
531・・・上面電極部
532,532A・・・端面電極部
533…下面電極部
60・・・ねじ穴
70・・・ねじ
1A, 1B, 201, 201A, 201B, 201C ··· Work holding jig 10, 210 ··· Work holding mechanism 11 ··· First holding portion 111 ··· First partition end portion 112 ··· Second Partition end portion 113: Partition portion 114: Recess 12: Second holding portion 121: End surface portion 13, 213: Work storage portion 131: First contact surface 132, 232 ... second contact surface 132a ... recess 133 ... third abutment surface 134 ... facing surface 20 ... auxiliary member 21 ... main body 22 ... magnet 220 ... housing recess 23: Magnet holding portion 24: Positioning projection 50, 50A: Work (electronic parts)
51: Winding core portion 52a, 52b: Collar portion 52a1, 52b1: Upper surface 52a2, 52b2: Lower surface 52a3, 52b3: End surface 52a4, 52b4: First side surface 52a5, 52b5. · Second side face 52a6, 52b6 · · · inner side face 53, 53 A · · · electrode portion 531 · · · upper surface electrode portion 532, 532 A · · · end surface electrode portion 533 · · · lower surface electrode portion 60 · · · screw hole 70 · · · ·screw

Claims (14)

ワークを保持するワーク保持機構を有するワーク保持治具であって、
前記ワーク保持機構は、前記ワークの3面が当接する第1当接面と、第2当接面と、第3当接面とを持つワーク収容部を有し、
前記ワーク収容部は、前記ワーク収容部に収容されるワークの少なくとも2つの処理予定面が露出するように、少なくとも前記第1当接面の反対側と、前記第2当接面の反対側とが開放していることを特徴とするワーク保持治具。
A workpiece holding jig having a workpiece holding mechanism for holding a workpiece, wherein
The workpiece holding mechanism has a workpiece storage portion having a first contact surface on which the three surfaces of the workpiece contact, a second contact surface, and a third contact surface.
The work storage portion is at least opposite to the first contact surface and opposite to the second contact surface such that at least two planned processing surfaces of the workpiece stored in the work storage portion are exposed. A work holding jig characterized by being open.
前記ワーク収容部に収容してあるワークの2つの前記処理予定面が、それぞれ前記第1当接面の反対側と、前記第2当接面の反対側とから露出するように、前記ワークが前記ワーク収容部に収容されることを特徴とする請求項1に記載のワーク保持治具。   The workpiece is so exposed that the two processing planned surfaces of the workpiece stored in the workpiece storage portion are respectively exposed from the opposite side of the first contact surface and the opposite side of the second contact surface. The workpiece holding jig according to claim 1, wherein the workpiece holding portion is housed in the workpiece housing portion. 2つの前記処理予定面が、前記ワーク収容部の外側に突出するように、前記ワークが前記ワーク収容部に収容される請求項2に記載のワーク保持治具。   The workpiece holding jig according to claim 2, wherein the workpiece is accommodated in the workpiece accommodating portion such that the two processing planned surfaces project outside the workpiece accommodating portion. 前記第1当接面の反対側から突出したワークの処理予定面の突出量と、前記第2当接面の反対側から突出したワークの処理予定面の突出量とが略等しいことを特徴とする請求項3に記載のワーク保持治具。   The protrusion amount of the processing planned surface of the workpiece protruding from the opposite side of the first contact surface and the protrusion amount of the processing planned surface of the workpiece protruding from the opposite side of the second contact surface are substantially equal. The workpiece holding jig according to claim 3. 前記ワーク保持機構は、複数の前記ワーク収容部を具備することを特徴とする請求項1〜4のいずれかに記載のワーク保持治具。   The workpiece holding jig according to any one of claims 1 to 4, wherein the workpiece holding mechanism comprises a plurality of the workpiece accommodating portions. 前記第2当接面には、前記ワーク収容部に収容されるワークとは反対側に向かって凹む凹部が形成してあることを特徴とする請求項1〜5のいずれかに記載のワーク保持治具。   The workpiece holding device according to any one of claims 1 to 5, wherein the second contact surface is formed with a concave portion which is recessed toward the opposite side to the workpiece accommodated in the workpiece accommodation portion. jig. 前記ワーク保持機構は、第1ワーク保持部と、前記第1ワーク保持部に分離可能に取り付けられる第2ワーク保持部とを有し、
前記第1当接面と前記第3当接面とが、前記第1ワーク保持部に形成してあり、
前記第2当接面が、前記第2ワーク保持部に形成してあることを特徴とする請求項1〜6のいずれかに記載のワーク保持治具。
The work holding mechanism has a first work holding portion, and a second work holding portion detachably attached to the first work holding portion.
The first contact surface and the third contact surface are formed in the first work holding portion,
The workpiece holding jig according to any one of claims 1 to 6, wherein the second contact surface is formed on the second workpiece holding portion.
前記ワーク収容部に収容してあるワークは、前記第2当接面と、前記第3当接面とがなす角部の内側に配置されることを特徴とする請求項1〜7のいずれかに記載のワーク保持治具。   The workpiece accommodated in the said workpiece accommodation part is arrange | positioned inside the angle part which the said 2nd contact surface and the said 3rd contact surface make | forms, The any one of the Claims 1-7 characterized by the above-mentioned. The work holding jig described in. 長手方向に垂直な断面形状が略正方形状であることを特徴とする請求項8に記載のワーク保持治具。   9. The workpiece holding jig according to claim 8, wherein a cross-sectional shape perpendicular to the longitudinal direction is substantially square. 前記ワーク収容部に収容してあるワークは、前記第2当接面と、前記第3当接面とがなす角部の外側に配置してあることを特徴とする請求項1〜7のいずれかに記載のワーク保持治具。   The workpiece accommodated in the said workpiece accommodation part is arrange | positioned on the outer side of the corner | angular part which the said 2nd contact surface and the said 3rd contact surface make, either of the Claims 1-7 characterized by the above-mentioned. Work holding jig described in. 前記ワーク収容部に収容してあるワークを、前記第2当接面および前記第3当接面に当接するように引き寄せる引き寄せ手段をさらに有することを特徴とする請求項1〜10のいずれかに記載のワーク保持治具。   11. The apparatus according to any one of claims 1 to 10, further comprising a pulling means for pulling the work stored in the work storage portion into contact with the second contact surface and the third contact surface. Work holding jig as described. 請求項1〜請求項11のいずれかに記載のワーク保持治具を複数有する電子部品処理装置。   The electronic component processing apparatus which has multiple work holding jigs in any one of Claims 1-11. 請求項1〜請求項11のいずれかの請求項に記載のワーク保持治具を用いて、少なくとも2つの処理予定面がワーク収容部から露出したワークのいずれかの処理予定面に処理を行う工程と、
前記ワーク保持治具を所定角度だけ回転させ、当該ワークの他のいずれかの処理予定面に処理を行う工程とを有する電子部品の製造方法。
A step of processing any one processing planned surface of a work exposed by at least two processing planned surfaces from a workpiece storage unit using the workpiece holding jig according to any one of claims 1 to 11. When,
And D. rotating the workpiece holding jig by a predetermined angle to perform processing on any other planned surface of the workpiece.
請求項1〜請求項11のいずれかの請求項に記載の複数のワーク保持治具の各々を、隣り合う一方のワーク保持治具のワーク収容部の第1当接面と、隣り合う他方のワーク保持治具のワーク収容部の第2当接面とが同一方向を向くように、所定角度だけ回転させて配列する工程と、
前記一方のワーク保持治具の前記第1当接面の反対側から露出したワークの処理予定面と、前記他方のワーク保持治具の前記第2当接面の反対側から露出したワークの処理予定面とに処理を行う工程とを有することを特徴とする電子部品の製造方法。
A plurality of work holding jigs according to any one of claims 1 to 11, a first contact surface of a work accommodating portion of one adjacent work holding jig, and the other adjacent to each other. Arranging them by rotating them by a predetermined angle so that the second contact surface of the workpiece accommodating portion of the workpiece holding jig faces the same direction;
Processing of the work scheduled to be processed of the workpiece exposed from the opposite side of the first contact surface of the one work holding jig and the workpiece exposed from the opposite side of the second contact surface of the other work holding jig And a step of performing processing on the planned surface.
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