JP6269568B2 - Flux coating apparatus and flux coating method - Google Patents

Description

  The present invention relates to a flux coating apparatus and a flux coating method, and more particularly to a flux coating apparatus and a flux coating method for coating a flux liquid by bringing an absorber that has absorbed the flux liquid into contact with a workpiece.

  For example, as shown in FIGS. 10 to 12, the flux coating apparatus is used for manufacturing a chip coil.

  FIG. 10 is a perspective view of the chip coil 140. As shown in FIG. 10, in the chip coil 140, a wire 142 is wound around a bobbin-shaped core 141, and both ends 143 and 144 of the wire 142 are placed in a pair of grooves 146 and 147 formed on one end surface 145 of the core 141. Be contained. In this state, a flux solution is applied to the end surface 145 of the chip coil 140 using a flux application device, and then solder is applied to both ends 143 and 144 of the wire 142 to form electrodes (not shown).

  FIG.11 and FIG.12 is explanatory drawing of operation | movement of a flux application | coating apparatus. As shown in FIGS. 11 and 12, in the flux application device, the absorber 110 is held at the tip of the absorber holding member, and a cylinder 123 and a rotary cylinder 118 are provided as a drive mechanism at the base end of the absorber holding member. ing. First, as shown in FIG. 11A, the flux applying apparatus immerses the absorber 110 in the flux liquid 102 stored in the flux tank 105 by extending the cylinder 123. Thereby, the absorber 110 absorbs the flux liquid 102. Next, as shown in FIG. 11B, after the cylinder 123 contracts and the absorber 110 is pulled up from the flux liquid 102, the rotary cylinder 118 rotates to rotate the absorber holding member, and the absorber 110 is moved. Opposite to the compression surface 135. Next, as shown in FIG. 12C, the cylinder 123 extends for a predetermined time, presses the absorber 110 against the compression surface 135, and discharges excess flux from the absorber 110. Next, as shown in FIG. 14D, after the rotary cylinder 118 rotates and the absorber 110 is made to face the end surface 145 of the chip coil 140 held by the chuck 152 that is a work holding member, the cylinder 123 is The absorbent body 110 is pressed against the end surface 145 of the chip coil 140 by extending the time. Thereby, the flux liquid absorbed in the absorber 110 is applied to the end surface 145 of the chip coil 140 (see, for example, Patent Document 1).

  FIG. 13 is an explanatory view showing the operation of the flux applying apparatus for applying the flux to the printed circuit board. In this apparatus, as shown in FIG. 13A, the absorbent body 1 </ b> A held by the absorbent body holding member 1 is arranged in the flux liquid 229 of the flux tank 4. Next, as shown in FIG. 13B, the absorber holding member 1 is rotated by the rotation driving means 5, and the absorber 1A is left above the flux liquid 229 and left for a set time. During this time, the flux liquid 229 inside the absorber 1A descends as shown in FIGS. 13B and 13C from the state shown in FIG. Next, as shown in FIG. 13C, the upper surface of the absorber 1A is pressed against the tip of the lead of the component 223 protruding from the lower surface of the printed circuit board 222, and the flux liquid 229 in the absorber 1A is applied. To do. Next, as shown in FIG. 13D, the absorber holding member 1 is rotated by the rotation driving means 5, and the absorber 1A is disposed in the flux liquid 229 (see, for example, Patent Document 2).

Japanese Patent No. 5160207 Japanese Unexamined Patent Publication No. Sho 63-317259

  When manufacturing the chip coil, as shown by a broken line in the plan view of FIG. 9A, flux is applied to the entire end surface 2a of the workpiece 2 in which the grooves 2u and 2v for accommodating the ends of the wire are formed. When applied, the flux applied to the intermediate region 2w between the grooves 2u and 2v is exposed between electrodes (not shown) formed of solder. If solder residue or the like adheres to the flux in the intermediate region 2w, there is a possibility that the electrodes are short-circuited.

  Therefore, as shown by a broken line in the plan view of FIG. 9B, such a problem can be avoided if flux is applied to the region where the electrode is formed and the two spaced apart locations 2m and 2n. In order to apply the flux to the two separated locations 2m and 2n, it is conceivable to use an absorbent body holding member that holds the absorbent body in pairs with a gap therebetween.

  However, for example, in a chip coil having a small end face size, the distance between the absorbers to be paired becomes small. In this case, the flux liquid remains in a groove-like facing space formed by the absorber and the absorber holding member to be paired, and it becomes difficult to accurately apply an appropriate amount of flux to two spaced locations. A major problem was discovered.

  In view of such a situation, the present invention intends to provide a flux coating apparatus and a flux coating method capable of accurately coating an appropriate amount of flux at two spaced locations of a workpiece.

  In order to solve the above-mentioned problems, the present invention provides a flux coating apparatus configured as follows.

  The flux application apparatus includes: (a) a flux tank for storing a flux liquid; and (b) a pair of rectangular parallelepiped absorbers having a pair of main surfaces, side surfaces, and end surfaces, and each of the pair of absorbers. Side surfaces are opposed to each other with a space therebetween, and a groove-like facing space is formed between the one side surfaces facing each other, and one main surface of each of the pair of absorbers is adjacent to the facing space. (C) an absorber holding member that is exposed and holds such that a protruding portion including a portion adjacent to one of the end surfaces and the one side surface of each of the pair of absorbers protrudes; A workpiece holding member for holding a workpiece; and (d) immersing the pair of absorbers held by the absorber holding member in the flux liquid stored in the flux tank, Said The Lux liquid is absorbed, and then the pair of absorbers held by the absorber holding member is pulled up from the flux liquid, and the pair of absorbers in the air is moved to the one of the pair of absorbers. The end surface is in a downward posture in which the end surface is lower than the other end surface in the gravitational direction or the horizontal posture in which the one end surface and the other end surface are aligned in a direction perpendicular to the gravitational direction. And then the exposed portion of the one main surface of each of the pair of absorbers held by the absorber holding member and the workpiece are brought into contact with each other to form the pair of absorbers. The flux tank, the absorber holding member, and the work holding member are relative to each other so that the absorbed flux liquid is applied to two spaced locations of the work. And a drive mechanism for moving the.

  In the above configuration, one side surface of the pair of absorbers facing each other includes a portion protruding from the absorber holding member. At the end of the groove-like facing space formed by the one side surface of the pair of absorbent bodies facing each other and the absorbent body holding member, the force to dampen the flux liquid by the surface tension is one of the pair of absorbent bodies facing each other. The side surface is smaller than the case where the side surface does not protrude from the absorber holding member. Therefore, the flux liquid remaining in the facing space can be discharged when the pair of absorbers are in the downward posture or the horizontal posture.

  According to the said structure, a flux liquid can be discharged | emitted from opposing space and a suitable quantity of flux can be apply | coated to two places which the workpiece | work separated.

  Preferably, the absorber holding member includes (a) two pairs of inner surfaces facing each other, and the pair of main surfaces and the pair of side surfaces are opposed to the two pairs of inner surfaces. A pair of absorber housings that can accommodate the absorber, and (b) the pair of absorbers in a direction in which the pair of end surfaces face each other such that the protruding portions protrude from the absorber housing portions. A pair of first openings to be inserted; and (c) a part of the one main surface of the pair of absorbers arranged in the pair of absorber housings, communicating with the absorber housings, and A pair of second openings from which a part of the one side surface is exposed. The pair of absorbers can be attached to and detached from the pair of absorber housings from the pair of first openings.

  In this case, a facing space is formed between one side surface of the absorber exposed from the second opening of the absorber holding member. The pair of absorbers can be easily attached to and detached from the pair of absorber housing parts, and can be accurately positioned by the inner surfaces of the absorber housing parts. Therefore, the absorber can be replaced in a short time.

  Moreover, in order to solve the said subject, this invention provides the flux application | coating method comprised as follows.

In the flux coating method, (i) a pair of rectangular parallelepiped absorbers each having a pair of main surfaces, side surfaces, and end surfaces are provided on the absorber holding member, and one side surface of each of the pair of absorbers is provided with an interval. A groove-shaped facing space is formed between the one side surfaces facing each other, and one main surface of each of the pair of absorbers is exposed adjacent to the facing space, Each of the one side surfaces of the absorbent body is held by the absorbent body holding member in a state of being held so that a portion adjacent to the one end face and a protruding portion including the one end face protrude. An absorption step of immersing the pair of absorbers in a flux liquid and causing the pair of absorbers to absorb the flux liquid; and (ii) the pair of absorbers held by the absorber holding member as the flux liquid. Pulled from The pair of absorbers in the air, the one end surface of each of the pair of absorbers in a downward posture in which the one end surface is below the other end surface in the gravitational direction, or the one end surface and the other end surface are A discharging step of moving the excess flux liquid downward in the gravitational direction in a horizontal posture aligned in a direction perpendicular to the gravitational direction; and (iii) the pair of absorbers held by the absorber holding member each of the contacting the exposed portion and the word over click on one of the main surfaces, said flux liquid, which is absorbed by the pair of the absorber, a coating step of applying the two locations spaced in the work of .

  In the above method, one side surface of the pair of absorbent bodies facing each other includes a portion protruding from the absorbent body holding member. At the end of the groove-like facing space formed by the one side surface of the pair of absorbent bodies facing each other and the absorbent body holding member, the force to dampen the flux liquid by the surface tension is one of the pair of absorbent bodies facing each other. The side surface is smaller than the case where the side surface does not protrude from the absorber holding member. Therefore, the flux liquid remaining in the facing space can be discharged when the pair of absorbers are in the downward posture or the horizontal posture.

  According to the above method, the flux liquid can be discharged from the facing space, and an appropriate amount of flux can be applied to two spaced locations of the workpiece.

  Preferably, the absorber holding member includes (a) two pairs of inner surfaces facing each other, and the pair of main surfaces and the pair of side surfaces are opposed to the two pairs of inner surfaces. A pair of absorber housings that can be accommodated, and (b) the pair of absorbers in a direction in which the pair of end surfaces face each other such that the protruding portions protrude from the absorber housing portions. A pair of first openings to be inserted; and (c) a part of the one main surface of the pair of absorbers arranged in the pair of absorber housings, communicating with the absorber housings, and A pair of second openings from which a part of the one side surface is exposed. An attachment / detachment step of attaching / detaching the pair of absorbers to / from the pair of absorber housing portions from the pair of first openings is further provided.

  In this case, a facing space is formed between one side surface of the absorber exposed from the second opening of the absorber holding member. The pair of absorbers can be easily attached to and detached from the pair of absorber housing parts, and can be accurately positioned by the inner surfaces of the absorber housing parts. Therefore, an absorber can be replaced | exchanged for a short time by the attachment or detachment process.

  According to the present invention, it is possible to accurately apply an appropriate amount of flux to two spaced apart parts of the workpiece.

It is a principal part perspective view which shows the structure of a flux application apparatus. Example 1 It is a principal part assembly perspective view of an absorber holding member. Example 1 It is a principal part disassembled perspective view of an absorber holding member. Example 1 It is explanatory drawing which shows operation | movement of a flux application apparatus. Example 1 It is explanatory drawing which shows operation | movement of a flux application apparatus. Example 1 It is a principal part perspective view of an absorber holding member. (Comparative example, Example 1) It is explanatory drawing when a liquid adheres to solid. (Explanation example 1) It is explanatory drawing which shows operation | movement of a flux application apparatus. (Example 2) It is a top view of the end surface of a chip coil (description example 2). 3 is a perspective view of a chip coil 140. FIG. (Conventional example 1) It is explanatory drawing of operation | movement of a flux application apparatus. (Conventional example 1) It is explanatory drawing of operation | movement of a flux application apparatus. (Conventional example 1) It is explanatory drawing which shows operation | movement of a flux application apparatus. (Conventional example 2)

  Hereinafter, embodiments of the present invention will be described with reference to the drawings.

  <Example 1> The flux application apparatus 10 and the flux application method of Example 1 will be described with reference to FIGS. 1 to 7, 9, and 10. FIG. FIG. 1 is a perspective view of the main part assembly showing the configuration of the flux application device 10. FIG. 2 is a perspective view of a main part of the absorbent body holding member 20. FIG. 3 is an exploded perspective view of a main part of the absorbent body holding member. 4 and 5 are explanatory views showing the operation of the flux applying apparatus 10.

  As shown in FIGS. 1 to 5, the flux application apparatus 10 includes an absorber holding member 20 that holds the absorber 12, a flux tank 30 that stores the flux liquid 32, a work holding member 40 that holds the workpiece 2, And a drive mechanism 50.

  The work 2 is, for example, a chip inductor configured in the same manner as in FIG. As shown in FIG. 9, grooves 2 u and 2 v are formed on the end surface 2 a of the work 2 along the side surfaces 2 c and 2 d for accommodating end portions of a wire rod (not shown).

  As shown in FIG. 1, the absorbent body holding member 20 has a main body 21 fixed to one end of a pair of arms 27. The main body 21 holds at least a pair (in the first embodiment, a plurality of pairs) of absorbers 12. In each pair of the pair of absorbent bodies 12, one absorbent body 12 and the other absorbent body 12 are arranged with a space therebetween, and one end face 12 a of the absorbent body 12 protrudes on the same side of the main body 21. Retained.

  The drive mechanism 50 is provided at the other end of the arm 27 and changes the position and orientation of the arm 27 by rotating and expanding / contracting the arm 27, so that the absorber 12 held by the absorber holding member 20. Change the position and orientation.

  2 and 3, the absorber 12 has a rectangular parallelepiped shape, and has a pair of main surfaces 12e and 12f, side surfaces 12c and 12d, and end surfaces 12a and 12b facing each other. The absorber holding member 20 is configured so that the portion that holds the absorber 12 in pairs is mirror-symmetrical.

  The main body 21 of the absorbent body holding member 20 has an absorbent body accommodating portion 23 in which the absorbent body 12 is accommodated, and a first opening 22, a second opening 24, and a third opening 25 that communicate with the absorbent body accommodating portion 23. Is formed. The absorber housing portion 23 has a rectangular cross section and includes two pairs of inner surfaces 23i, 23j; 23m, 23n facing each other. The absorber housing portion 23 absorbs from the first opening 22 such that a portion adjacent to one end surface 12a of one side surface 12d of the absorber 12 and a projecting portion 12s including the one end surface 12a project. A body 12 is placed. From the second opening 24, a part of one main surface 12e and a part of one side surface 12d of the absorber 12 are exposed. From the third opening 25, the other end face 12b of the absorber 12 is exposed. That is, the absorber holding member 20 includes (a) two pairs of inner surfaces 23i, 23j; 23m, 23n facing each other, and two pairs of inner surfaces 23i, 23j; 12e and 12f and a pair of side surfaces 12c and 12d are opposed to each other, and a pair of absorber housings 23 capable of housing a pair of absorbers 12; The pair of absorbers 12 communicate with the pair of first openings 22 through which the pair of end faces 12a and 12b face each other, and (c) the absorber housing portion 23 so that the protruding portion 12s protrudes. And a pair of second openings 24 in which a part of one main surface 12e and a part of one side surface 12d of the pair of absorbers 12 arranged in the pair of absorber housing portions 23 are exposed, and (d ) Opposite the pair of first openings 22, An absorption body 12 of the pair, a pair of end faces 12a, 12b are a pair of third openings 25 can be inserted in opposite directions to each other, the.

  FIG. 2 illustrates a case where the other end surface 12 b of the absorber 12 overlaps with a virtual plane surrounded by the third opening 25 of the main body 21. The other end surface 12b of the absorber 12 may be retracted inward from the third opening 25 or may protrude outward. Further, the third opening 25 may not be provided, and the other end surface 12b of the absorber 12 may be covered with the main body 21 and not exposed to the outside.

  As shown by an arrow 12k in FIG. 3, the absorber 12 is attached to and detached from the absorber housing portion 23 from the third opening 25 by moving the absorber 12 in a direction in which the end faces 12a and 12b of the absorber 12 face each other. can do. It is also possible to attach and detach the absorber 12 from the first opening 22 to the absorber housing portion 23.

  For example, a dry absorbent body 12 having a size similar to that of the absorbent body accommodating portion 23 is inserted into the absorbent body accommodating portion 23, the flux liquid is absorbed to expand the absorbent body 12, and the main surface 12 e of the absorbent body 12. , 12f and side surfaces 12c, 12d can be held on the inner surface of the absorber housing portion 23 to hold the absorber 12. The held absorbent body 12 can be taken out from the absorbent body accommodating part 23 by pulling out or pushing out from one of the third opening 25 or the first opening 22 to the other.

  The absorber 12 can be easily attached to and detached from the absorber housing portion 23 and can be accurately positioned by the inner surface of the absorber housing portion 23. Therefore, the absorber can be replaced in a short time.

  As shown in FIG. 2, a groove-like opposing space 26 is formed between the paired absorbers 12, and the main surface 12 e of the paired absorber 12 is adjacent to both sides of the opposing space 26. The end surface 2a of the work 2 is separated by bringing the end surface 2a of the work 2 into contact with the portion exposed from the second opening 24 of the main surface 12e of the absorber 12 to be paired as shown by a broken line in FIG. The flux can be applied at two places, that is, with a gap between one side surface 2c side and the other side surface 2d side of the workpiece.

  The flux application device 10 moves the flux tank 30, the absorber holding member 20, and the work holding member 40 relative to each other by the drive mechanism 50, and applies the flux liquid to the end surface 2 a of the work 2 held by the work holding member 40. To do.

  Next, operation | movement of the flux application | coating apparatus 10 is demonstrated. As shown in FIGS. 4 and 5, the flux coating apparatus 10 sequentially performs a suction process, a discharge process, and a coating process as follows.

  First, in the absorption step, as shown in FIG. 4A, at least a part, preferably all, of the absorbent body 12 held in pairs with the absorbent body holding member 20 is stored in the flux tank 30. The flux liquid 32 is absorbed in the absorber 12 by being immersed in the liquid 32.

  Specifically, the drive mechanism 50 rotates the arm 27 of the absorber holding member 20 so that the main body 21 of the absorber holding member 20 enters the inside of the flux tank 30. At this time, the flux tank 30 may be configured to be stationary or the drive mechanism 50 may be configured to move the flux tank 30 in synchronization with the rotation of the arm 27.

Next, in the discharging step, as shown in FIG. 4 (b), the absorber 12 is pulled up from the flux liquid 32, and in the air, the absorber 12 is protruded from one end surface 12a of the absorber 12 to the other end surface 12b. Use a downward posture that is lower in the direction of gravity. During this time, excess flux liquid moves downward in the direction of gravity and is discharged. The discharged flux liquid is collected in the flux tank 30 through the liquid draining plate 28.
Discharged.

  Specifically, the drive mechanism operates to rotate the arm 27 of the absorber holding member 20, so that the main body 21 of the absorber holding member 20 moves to the outside of the flux tank 30 and is held by the absorber holding member 20. The state where the absorber 12 is pulled up from the flux liquid 32 and the one end surface 12a of the absorber 12 is in a downward posture in the gravity direction is held for a predetermined time. At this time, the flux tank 30 may be configured to be stationary or the flux tank 30 may be configured to move while being synchronized with the rotation of the arm 27 by a driving mechanism.

  Next, in the application step, as shown in FIGS. 5C and 5D, the main surface 12e of the absorbent body held by the absorbent body holding member is opposed to the work held by the work holding member, The end surface of the workpiece and the absorber are brought into contact with each other, and the flux liquid absorbed by the pair of absorbers 12 is applied to two locations separated from one workpiece 2.

  Specifically, the drive mechanism holds the absorber up to a position where the main surface of the absorber 12 held by the absorber holding member 20 faces the end surface 2a of the workpiece 2 held at a predetermined position by the workpiece holding member 40. The arm 27 of the member 20 is rotated. Next, the drive mechanism extends the arm 27 of the absorber holding member 20 and presses the main surface of the absorber 12 against the end surface 2 a of the workpiece 2. After a predetermined time elapses, the drive mechanism contracts the arm 27 of the absorbent body holding member 20 to the original position.

  In the application process, even if the workpiece holding member 40 is configured to move relative to the stationary absorber holding member 20, both the absorber holding member 20 and the workpiece holding member 40 are configured to move. May be.

  FIG. 6 is a perspective view of a main part of the absorbent body holding member in the discharging process. 6A is a comparative example, and FIG. 6B is the first embodiment.

  In the comparative example shown in FIG. 6A, the paired absorbers 12 are held so that the end surfaces 12a thereof are flush with the outer peripheral surface of the main body 21 of the absorber holding member. At the end of a groove-like facing space formed by one side surface of the pair of absorbent bodies 12 facing each other and the main body 21 of the absorber holding member, a U-shape is formed by the absorber 12 and the main body 21 of the holding member. Corner portions 12p, 12q, and 21p that are continuous in a shape are formed. In this case, as will be described in detail later, the force to stop the flux liquid is increased by the surface tension, the flux liquid 74 is left in the facing space 26, and the flux liquid is applied to two spaced locations on the end surface 2a of the workpiece 2. It becomes difficult.

  In Example 1 shown in FIG. 6B, the paired absorbers 12 are held such that one end face 12a protrudes from the main body 21 of the absorber holding member. One side surface of the pair of absorbent bodies 12 facing each other exceeds the end of a groove-shaped facing space formed by one side surface of the pair of absorbent bodies 12 facing each other and the main body 21 of the absorbent body holding member. Thus, it protrudes from the main body 21 of the absorbent body holding member. In this case, at the end of the facing space, as will be described in detail later, the force to stop the flux liquid by the surface tension is smaller than that of the comparative example. Therefore, the flux liquid remaining in the facing space wets and spreads along one side surface to the protruding portion 12 s protruding from the main body 21. Even if the flux liquid 76 remains on the protruding portion 12s of one side surface, the protruding portion 12s is separated from the end surface 2a of the workpiece 2 at the time of application. The liquid can be applied with high accuracy.

  Therefore, the flux liquid remaining in the facing space can be discharged when the pair of absorbers are in the downward posture. Note that the flux liquid remaining in the facing space is similarly discharged when the pair of absorbers are in a horizontal posture.

  Next, the effect of protruding the absorber will be described in more detail.

In general, the wettability in a state where the liquid is fixedly attached can be quantitatively evaluated by the contact angle θ. The relationship between the contact angle and wettability is as follows.
(A) When the contact angle θ is large, the wettability decreases (it is difficult to wet).
(B) When the contact angle θ is small, the wettability is improved (easy to get wet).
(C) When the contact angle θ = 0 °, the liquid expands and spreads wet.

FIG. 7A is an explanatory diagram when the liquid 70 adheres to the flat portion 82 of the solid 80 that extends horizontally. In this case, the following equation (1) is established from Young's equation.
γ _S = γ _{L / S} + γ _L cos θ ₁ (1)
However,
γ _S : Interfacial tension of solid γ _L : Surface tension of liquid γ _{L / S} : Interfacial tension θ ₁ : Contact angle

FIG. 7B is an explanatory diagram when the liquid 72 adheres to the corners 84 of the solid 80. X indicates the horizontal direction, and Y indicates the direction of gravity. In this case, the following equations (2) and (3) are established for the X component and the Y component from Young's equation.
X component: 0 = γ _{L / S} + γ _L cos θ ₂ (2)
Y component: γs = 0 + γ _L sin θ ₂ (3)
However,
γ _S : Interfacial tension of solid γ _L : Surface tension of liquid γ _{L / S} : Interfacial tension θ ₂ : θ ₂ satisfying equations (2) and (3) satisfies θ ₂ ≧ 90 °.

In order to compare the magnitudes of θ ₁ and θ ₂ , the following equation (4) is obtained by taking the difference between the equations (1) and (2).
γ _S = γ _L (cos θ ₁ −cos θ ₂ ) (4)
From the equation (4), the following equation (5) is obtained.
cosθ ₁ −cosθ ₂ = γ _S / γ _L (5)
Since γ _S / γ _L ≧ 0 and cos θ ₁ −cos θ ₂ ≧ 0, the following equation (6) is obtained.
θ ₂ ≧ θ ₁ (6)
However, θ ₂ ≧ 90 °

From the equation (6), it can be seen that the contact angle θ _{2 at the} corner is larger than the contact angle θ _{1 at the} flat portion. In other words, the flux liquid is less likely to spread and wet at the corners than at the flat part.

  As can be seen from this, in the case of FIG. 6A, the flux liquid 74 tends to stay in the facing space. On the other hand, in the case of FIG. 6B, the flux liquid in the facing space tends to spread wet along the side surface of the absorber 12 to the protruding portion 12 s. Therefore, the flux liquid is easily discharged from the facing space.

  As described above, in Example 1, in the discharge process, excess flux liquid that adversely affects the application is discharged from the facing space. Therefore, in the application process, an appropriate amount of flux is accurately applied to two spaced locations of the workpiece. Can be applied.

  <Specific example> Using the absorber holding member of Example 1, the absorber is held in pairs with an interval of about 2 mm to 3 mm. In the coating process, the end surface of the workpiece is set to 0 on the main surface of the absorber. By pressing about 1 mm to 1 mm, an appropriate amount of flux liquid could be applied with high precision to two spaced apart parts of the workpiece. The absorber was prepared by cutting a sheet of a special polyurethane sponge having a fine continuous pore structure and excellent water absorption and liquid absorption into a lattice shape. Moreover, the flux liquid which mixed and adjusted the flux stock solution and the solvent which has isopropyl alcohol as a main component was used.

  <Example 2> FIG. 8 is an explanatory view showing the operation of the flux applying apparatus 10a of Example 2. FIG. The flux coating apparatus 10a according to the second embodiment is configured in the same manner as the flux coating apparatus 10 according to the first embodiment. Below, the same code | symbol is used for the same component as Example 1, and a different point from Example 1 is mainly demonstrated.

  In the first embodiment, the absorbent body 12 is in a downward posture in the discharging process, whereas in the second embodiment, the absorbent body 12 is in a horizontal position in the discharging process. Moreover, in Example 1, the absorber holding member 20 rotates, whereas in Example 2, the absorber holding member 20 moves up and down.

  As shown in FIG. 8 (a), the main body 21 of the absorbent body holding member 20 is arranged so that at least one end face 12a of the absorbent body 12 protrudes from the main body 21, as in the first embodiment. And hold it. Note that both end faces 12 a and 12 b of the absorber 12 may protrude from the main body 21.

  In the absorption process, the absorbent body holding member 20 is completely submerged in the flux liquid 32 stored in the flux tank 30 with the main body 21 facing upward. At this time, the one main surface 12e of the absorber exposed from the main body 21 faces upward.

  In the discharging step, as shown by an arrow 10z in FIG. 8B, the absorbent body holding member 20 linearly moves upward, and the main body 21 comes out on the flux liquid 32. The absorbent body holding member 20 pulls up the absorbent body 12 from the flux liquid 32, and in the air, the absorbent body 12 is horizontally aligned with one end face 12a and the other end face 12b of the absorbent body 12 being perpendicular to the direction of gravity. Make a posture. Even when the absorbent body 12 is in a horizontal posture, as is clear from the equation (6) described in detail with reference to FIG. Similarly, the excess flux liquid moves downward in the gravity direction, is discharged, and is collected in the flux tank 30.

  Next, in the coating step, the absorbent body holding member 20 moves further upward, and the main surface 12e of the absorbent body 12e is placed on the downward end surface of the work held by the work holding member (not shown) above the absorbent body holding member 20. Is applied to the end surface of the workpiece.

  Also in Example 2, in the discharge process, excess flux liquid that adversely affects the application is discharged from the facing space. Therefore, in the application process, an appropriate amount of flux can be accurately applied to two spaced locations of the workpiece. it can.

  <Summary> As described above, an appropriate amount of the flux liquid can be accurately applied to two spaced locations of the workpiece 2 using the absorber holding members 10 and 10a.

  The present invention is not limited to the above embodiment, and can be implemented with various modifications.

  For example, the workpiece may be other than the chip inductor, and the groove may not be formed on the end surface of the workpiece to which the flux is applied. Even in such a case, it is possible to accurately apply an appropriate amount of flux to two spaced apart parts of the workpiece.

2 Workpiece 2a End surface 10, 10a Flux coating device 12 Absorber 12a, 12b End surface 12c, 12d Side surface 12e, 12f Main surface 20 Absorber holding member 21 Main body 22 First opening 23 Absorber accommodating portion 23i, 23j, 23m, 23n Inner surface 24 Second opening 25 Third opening 26 Opposite space 27 Arm 28 Liquid draining plate 30 Flux tank 32 Flux liquid 40 Work holding member 50 Drive mechanism

Claims (4)

A flux tank for storing flux liquid;
A pair of rectangular parallelepiped absorbers each having a pair of main surfaces, side surfaces, and end surfaces are arranged such that one of the side surfaces of the pair of absorbers faces each other with a space between the one side surfaces facing each other. A groove-like opposing space is formed, and one main surface of each of the pair of absorbers is exposed adjacent to the opposing space, and one of the one side surfaces of each of the pair of absorbers is exposed. An absorbent body holding member that holds the portion adjacent to the end surface and the protruding portion including one of the end surfaces;
A workpiece holding member for holding the workpiece;
The pair of absorbers held by the absorber holding member is immersed in the flux liquid stored in the flux tank so that the pair of absorbers absorb the flux liquid, and then the absorber Pulling up the pair of absorbers held by the holding member from the flux liquid, the pair of absorbers in the air, and in each of the pair of absorbers, the one end surface is lower than the other end surface in the gravitational direction. Or a horizontal posture in which the one end face and the other end face are aligned in a direction perpendicular to the gravitational direction, the excess flux liquid is moved downward in the gravitational direction, and then the absorption The exposed portion of the one main surface of each of the pair of absorbers held by the body holding member is brought into contact with the workpiece, and absorbed by the pair of absorbers. Said as flux liquid is applied in two places spaced in the workpiece, the flux bath, the driving mechanism for relatively moving the absorber holding member and the workpiece holding member that,
A flux coating apparatus comprising: The absorber holding member is
A pair of absorber housings that can house the pair of absorbers so that the pair of main surfaces and the pair of side surfaces face each other, the two pairs of inner surfaces facing each other;
A pair of first openings through which the pair of absorbers are inserted in a direction in which the pair of end faces face each other so as to communicate with the absorber housing portion and the protruding portion protrudes;
A pair of second communicating with the absorber housing portion and exposing a part of the one main surface and a portion of the one side surface of the pair of absorbers disposed in the pair of absorber housing portions. The opening of
Have
The flux coating apparatus according to claim 1, wherein the pair of absorbers can be attached to and detached from the pair of absorber housing portions from the pair of first openings. A pair of rectangular parallelepiped absorbers each having a pair of main surfaces, side surfaces, and end surfaces are disposed on the absorber holding member, and the one side surface of each of the pair of absorbers is opposed to each other with a gap therebetween, and is opposed to each other A groove-like facing space is formed between the one side surfaces, and one main surface of each of the pair of absorbers is exposed adjacent to the facing space, and each one of the pair of absorbers The pair of absorbers held by the absorber holding member in a state of being held so that a portion adjacent to one of the end surfaces and a protruding portion including one of the end surfaces protrude from the side surfaces of the side surfaces An absorption step in which the flux liquid is absorbed inside the pair of absorbers,
The pair of absorbers held by the absorber holding member are pulled up from the flux liquid, and the pair of absorbers are in the air, and the one end surface of each of the pair of absorbers is more gravitational than the other end surface. A discharging step of moving the excess flux liquid downward in the gravitational direction in a downward posture that becomes the lower side of the direction or in a horizontal posture in which the one end face and the other end face are aligned in a direction perpendicular to the gravitational direction When,
Said absorbent body holding member and the exposed portion and the word over click of each of the one main surface of the pair of the absorber which is held in contact, the said flux liquid, which is absorbed by the pair of the absorber An application step of applying to two spaced apart parts of the workpiece;
A flux coating method characterized by comprising: The absorber holding member is
A pair of absorber housings, which include two pairs of inner surfaces facing each other, and capable of accommodating the pair of absorbers such that the pair of main surfaces and the pair of side surfaces are opposed to the two pairs of inner surfaces;
A pair of first openings through which the pair of absorbers are inserted in a direction in which the pair of end faces face each other so as to communicate with the absorber housing portion and the protruding portion protrudes;
A pair of second communicating with the absorber housing portion and exposing a part of the one main surface and a portion of the one side surface of the pair of absorbers disposed in the pair of absorber housing portions. The opening of
Have
The flux application method according to claim 3, further comprising an attaching / detaching step of attaching / detaching the pair of absorbers to / from the pair of absorber accommodating portions from the pair of first openings.

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