JP2019068044A5 - - Google Patents

Download PDF

Info

Publication number
JP2019068044A5
JP2019068044A5 JP2018136555A JP2018136555A JP2019068044A5 JP 2019068044 A5 JP2019068044 A5 JP 2019068044A5 JP 2018136555 A JP2018136555 A JP 2018136555A JP 2018136555 A JP2018136555 A JP 2018136555A JP 2019068044 A5 JP2019068044 A5 JP 2019068044A5
Authority
JP
Japan
Prior art keywords
bonding layer
structure according
aperture
layer structure
penetrating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2018136555A
Other languages
English (en)
Japanese (ja)
Other versions
JP2019068044A (ja
JP7353024B2 (ja
Filing date
Publication date
Priority claimed from US15/724,045 external-priority patent/US10688750B2/en
Application filed filed Critical
Publication of JP2019068044A publication Critical patent/JP2019068044A/ja
Publication of JP2019068044A5 publication Critical patent/JP2019068044A5/ja
Priority to JP2023150739A priority Critical patent/JP7682966B2/ja
Application granted granted Critical
Publication of JP7353024B2 publication Critical patent/JP7353024B2/ja
Priority to JP2025080901A priority patent/JP2025122029A/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2018136555A 2017-10-03 2018-07-20 Umベース構成 Active JP7353024B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2023150739A JP7682966B2 (ja) 2017-10-03 2023-09-19 Umベース構成
JP2025080901A JP2025122029A (ja) 2017-10-03 2025-05-14 Umベース構成

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US15/724,045 2017-10-03
US15/724,045 US10688750B2 (en) 2017-10-03 2017-10-03 Bonding structure of E chuck to aluminum base configuration

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2023150739A Division JP7682966B2 (ja) 2017-10-03 2023-09-19 Umベース構成

Publications (3)

Publication Number Publication Date
JP2019068044A JP2019068044A (ja) 2019-04-25
JP2019068044A5 true JP2019068044A5 (enExample) 2021-08-12
JP7353024B2 JP7353024B2 (ja) 2023-09-29

Family

ID=65896401

Family Applications (3)

Application Number Title Priority Date Filing Date
JP2018136555A Active JP7353024B2 (ja) 2017-10-03 2018-07-20 Umベース構成
JP2023150739A Active JP7682966B2 (ja) 2017-10-03 2023-09-19 Umベース構成
JP2025080901A Pending JP2025122029A (ja) 2017-10-03 2025-05-14 Umベース構成

Family Applications After (2)

Application Number Title Priority Date Filing Date
JP2023150739A Active JP7682966B2 (ja) 2017-10-03 2023-09-19 Umベース構成
JP2025080901A Pending JP2025122029A (ja) 2017-10-03 2025-05-14 Umベース構成

Country Status (5)

Country Link
US (3) US10688750B2 (enExample)
JP (3) JP7353024B2 (enExample)
KR (2) KR102669140B1 (enExample)
CN (4) CN211700228U (enExample)
TW (2) TWI806799B (enExample)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10688750B2 (en) 2017-10-03 2020-06-23 Applied Materials, Inc. Bonding structure of E chuck to aluminum base configuration
US10847402B2 (en) 2018-04-02 2020-11-24 Applied Materials, Inc. Bond protection around porous plugs
US11456161B2 (en) 2018-06-04 2022-09-27 Applied Materials, Inc. Substrate support pedestal
KR20240115347A (ko) 2019-05-24 2024-07-25 어플라이드 머티어리얼스, 인코포레이티드 접합 층 보호가 개선된 기판 지지 캐리어
JP7291046B2 (ja) * 2019-09-18 2023-06-14 新光電気工業株式会社 基板固定装置
JP7319158B2 (ja) * 2019-09-30 2023-08-01 日本特殊陶業株式会社 保持装置
CN112908919B (zh) * 2019-12-04 2024-07-09 中微半导体设备(上海)股份有限公司 静电吸盘装置及包括该静电吸盘装置的等离子体处理装置
JP7458195B2 (ja) * 2020-02-10 2024-03-29 東京エレクトロン株式会社 載置台、プラズマ処理装置及びクリーニング処理方法
JP7634644B2 (ja) * 2021-02-17 2025-02-21 アプライド マテリアルズ インコーポレイテッド 多孔性プラグ結合
US11794296B2 (en) 2022-02-03 2023-10-24 Applied Materials, Inc. Electrostatic chuck with porous plug
JP7645838B2 (ja) 2022-03-31 2025-03-14 日本碍子株式会社 ウエハ載置台
US12340980B2 (en) 2022-04-01 2025-06-24 Applied Materials, Inc. Plasma showerhead with improved uniformity
WO2024129283A1 (en) * 2022-12-16 2024-06-20 Lam Research Corporation Electrostatic chuck with halogen modulated silicone dike
US20250037978A1 (en) * 2023-07-24 2025-01-30 Applied Materials, Inc. Gas distribution assemblies for semiconductor devices
WO2025038231A1 (en) * 2023-08-16 2025-02-20 Lam Research Corporation Electrostatic chuck with ceramic coating adhesion

Family Cites Families (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6490144B1 (en) 1999-11-29 2002-12-03 Applied Materials, Inc. Support for supporting a substrate in a process chamber
US7411331B2 (en) * 2002-05-10 2008-08-12 Massachusetts Institute Of Technology Dielectric elastomer actuated systems and methods
US7789736B2 (en) * 2006-10-13 2010-09-07 Applied Materials, Inc. Stepped retaining ring
KR101553423B1 (ko) 2007-12-19 2015-09-15 램 리써치 코포레이션 반도체 진공 프로세싱 장치용 필름 점착제
US9520314B2 (en) 2008-12-19 2016-12-13 Applied Materials, Inc. High temperature electrostatic chuck bonding adhesive
US20100326602A1 (en) * 2009-06-30 2010-12-30 Intevac, Inc. Electrostatic chuck
JP5604888B2 (ja) * 2009-12-21 2014-10-15 住友大阪セメント株式会社 静電チャックの製造方法
JP5558178B2 (ja) * 2010-04-07 2014-07-23 オリンパス株式会社 蛍光観察装置
JP5143184B2 (ja) 2010-05-07 2013-02-13 日本碍子株式会社 ウエハー載置装置の製造方法
KR20110138788A (ko) * 2010-06-22 2011-12-28 하나 마이크론(주) 적층형 반도체 패키지
WO2013047555A1 (ja) 2011-09-28 2013-04-04 住友大阪セメント株式会社 静電チャック装置
CN103843128B (zh) * 2011-09-30 2017-11-21 应用材料公司 静电夹具
KR101196441B1 (ko) * 2011-12-20 2012-11-01 이준호 정전 척의 리페어 방법
JP6047506B2 (ja) 2012-02-08 2016-12-21 東京エレクトロン株式会社 静電チャック装置
KR20130104738A (ko) * 2012-03-15 2013-09-25 코리아세미텍 주식회사 정전척 및 그 제조방법
JP6005579B2 (ja) 2012-04-27 2016-10-12 日本碍子株式会社 半導体製造装置用部材
US9685356B2 (en) 2012-12-11 2017-06-20 Applied Materials, Inc. Substrate support assembly having metal bonded protective layer
JP6140457B2 (ja) 2013-01-21 2017-05-31 東京エレクトロン株式会社 接着方法、載置台及び基板処理装置
JP6110159B2 (ja) 2013-02-22 2017-04-05 日本特殊陶業株式会社 複合部材及びその製造方法
JP5633766B2 (ja) 2013-03-29 2014-12-03 Toto株式会社 静電チャック
KR101385950B1 (ko) * 2013-09-16 2014-04-16 주식회사 펨빅스 정전척 및 정전척 제조 방법
JP6181572B2 (ja) 2014-02-13 2017-08-16 日本特殊陶業株式会社 静電チャック用の接着シート及びその製造方法
JP5811513B2 (ja) 2014-03-27 2015-11-11 Toto株式会社 静電チャック
CN204102876U (zh) * 2014-10-16 2015-01-14 中芯国际集成电路制造(北京)有限公司 一种晶片承载装置
US10475688B2 (en) 2015-02-18 2019-11-12 Sumitomo Osaka Cement Co., Ltd. Electrostatic chuck device, and semiconductor manufacturing device
CN107258012B (zh) 2015-03-20 2021-04-16 应用材料公司 以高温聚合物接合剂接合至金属基底的陶瓷静电夹盘
US10629466B2 (en) * 2015-03-24 2020-04-21 Sumitomo Osaka Cement Co., Ltd. Electrostatic chuck device including a heating member
US9608550B2 (en) 2015-05-29 2017-03-28 Lam Research Corporation Lightup prevention using multi-layer ceramic fabrication techniques
US11227749B2 (en) 2016-02-18 2022-01-18 Lam Research Corporation 3D printed plasma arrestor for an electrostatic chuck
US10249526B2 (en) 2016-03-04 2019-04-02 Applied Materials, Inc. Substrate support assembly for high temperature processes
JP6604239B2 (ja) * 2016-03-08 2019-11-13 住友大阪セメント株式会社 静電チャック装置
JP6688715B2 (ja) 2016-09-29 2020-04-28 東京エレクトロン株式会社 載置台及びプラズマ処理装置
US10688750B2 (en) 2017-10-03 2020-06-23 Applied Materials, Inc. Bonding structure of E chuck to aluminum base configuration
JP6994981B2 (ja) 2018-02-26 2022-01-14 東京エレクトロン株式会社 プラズマ処理装置及び載置台の製造方法

Similar Documents

Publication Publication Date Title
JP2019068044A5 (enExample)
JP2023171803A5 (enExample)
JP2019512308A5 (enExample)
CL2020001571A1 (es) Membranas de marco metal-orgánico.
WO2015183354A3 (en) Self sealing articles
JP2009500626A5 (enExample)
GB2561775A (en) Electrode integration into organs on chip devices
EP3893303A4 (en) CARBON SUBSTRATE WITH UNIDIRECTIONAL ORIENTED CARBON FIBERS AND GAS DIFFUSION LAYER THEREOF
MX2019005325A (es) Matriz para el crecimiento de celulas.
WO2017035599A3 (en) Unidirectional wicking substrate
USD949575S1 (en) Sheet material with camouflage pattern
WO2015019145A3 (en) Internal combustion engine and manufacturing method therefor
JP2015172480A5 (enExample)
EP3902039A4 (en) GRAPHITIZED CARBON SUBSTRATE AND GAS DIFFUSION LAYER USING THE SAME
JP2018518943A5 (enExample)
WO2020117499A3 (en) Weighted blanket
CL2016002881A1 (es) Revestimiento permeable al sonido para cartón yeso acústico
ES2496451T3 (es) Membrana para suspensión secundaria neumática de vehículo terrestre o ferroviario, su procedimiento de fabricación, suspensión y vehículo que la incorporan
JP2015189082A5 (enExample)
JP2016074938A5 (enExample)
WO2007120642A3 (en) Dual-containment pipe containing fluoropolymer
JP2018537305A5 (enExample)
JP2018517944A5 (enExample)
JP2015514011A5 (enExample)
DOP2018000221A (es) Bolsa de fluido con microestructura interna