JP2019057530A - 製造装置及び排出ガス処理装置 - Google Patents

製造装置及び排出ガス処理装置 Download PDF

Info

Publication number
JP2019057530A
JP2019057530A JP2017179330A JP2017179330A JP2019057530A JP 2019057530 A JP2019057530 A JP 2019057530A JP 2017179330 A JP2017179330 A JP 2017179330A JP 2017179330 A JP2017179330 A JP 2017179330A JP 2019057530 A JP2019057530 A JP 2019057530A
Authority
JP
Japan
Prior art keywords
exhaust gas
pipe
exhaust
drainage
opening area
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2017179330A
Other languages
English (en)
Japanese (ja)
Other versions
JP2019057530A5 (enExample
Inventor
錬平 中田
Renpei Nakada
錬平 中田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Toshiba Electronic Devices and Storage Corp
Original Assignee
Toshiba Corp
Toshiba Electronic Devices and Storage Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Toshiba Electronic Devices and Storage Corp filed Critical Toshiba Corp
Priority to JP2017179330A priority Critical patent/JP2019057530A/ja
Priority to US15/901,944 priority patent/US20190083918A1/en
Publication of JP2019057530A publication Critical patent/JP2019057530A/ja
Publication of JP2019057530A5 publication Critical patent/JP2019057530A5/ja
Pending legal-status Critical Current

Links

Images

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/002—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by condensation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D45/00—Separating dispersed particles from gases or vapours by gravity, inertia, or centrifugal forces
    • B01D45/04—Separating dispersed particles from gases or vapours by gravity, inertia, or centrifugal forces by utilising inertia
    • B01D45/08—Separating dispersed particles from gases or vapours by gravity, inertia, or centrifugal forces by utilising inertia by impingement against baffle separators
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D47/00—Separating dispersed particles from gases, air or vapours by liquid as separating agent
    • B01D47/02—Separating dispersed particles from gases, air or vapours by liquid as separating agent by passing the gas or air or vapour over or through a liquid bath
    • B01D47/024—Separating dispersed particles from gases, air or vapours by liquid as separating agent by passing the gas or air or vapour over or through a liquid bath by impinging the gas to be cleaned essentially in a perpendicular direction onto the liquid surface
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D47/00—Separating dispersed particles from gases, air or vapours by liquid as separating agent
    • B01D47/05—Separating dispersed particles from gases, air or vapours by liquid as separating agent by condensation of the separating agent
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D47/00—Separating dispersed particles from gases, air or vapours by liquid as separating agent
    • B01D47/06—Spray cleaning
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/14—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by absorption
    • B01D53/1456—Removing acid components
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/14—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by absorption
    • B01D53/18—Absorbing units; Liquid distributors therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
    • B01D53/77—Liquid phase processes
    • B01D53/78—Liquid phase processes with gas-liquid contact
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/24—Deposition of silicon only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02—Epitaxial-layer growth
    • C30B25/14—Feed and outlet means for the gases; Modifying the flow of the reactive gases
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/02—Elements
    • C30B29/06—Silicon
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/20—Halogens or halogen compounds
    • B01D2257/204—Inorganic halogen compounds
    • B01D2257/2045—Hydrochloric acid
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/20—Halogens or halogen compounds
    • B01D2257/204—Inorganic halogen compounds
    • B01D2257/2047—Hydrofluoric acid
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/55—Compounds of silicon, phosphorus, germanium or arsenic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/55—Compounds of silicon, phosphorus, germanium or arsenic
    • B01D2257/553—Compounds comprising hydrogen, e.g. silanes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2258/00—Sources of waste gases
    • B01D2258/02—Other waste gases
    • B01D2258/0216—Other waste gases from CVD treatment or semi-conductor manufacturing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Analytical Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Environmental & Geological Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Biomedical Technology (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
JP2017179330A 2017-09-19 2017-09-19 製造装置及び排出ガス処理装置 Pending JP2019057530A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2017179330A JP2019057530A (ja) 2017-09-19 2017-09-19 製造装置及び排出ガス処理装置
US15/901,944 US20190083918A1 (en) 2017-09-19 2018-02-22 Manufacturing apparatus and exhaust gas treatment apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2017179330A JP2019057530A (ja) 2017-09-19 2017-09-19 製造装置及び排出ガス処理装置

Publications (2)

Publication Number Publication Date
JP2019057530A true JP2019057530A (ja) 2019-04-11
JP2019057530A5 JP2019057530A5 (enExample) 2019-11-07

Family

ID=65719102

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2017179330A Pending JP2019057530A (ja) 2017-09-19 2017-09-19 製造装置及び排出ガス処理装置

Country Status (2)

Country Link
US (1) US20190083918A1 (enExample)
JP (1) JP2019057530A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2022050230A (ja) * 2020-09-17 2022-03-30 株式会社東芝 成膜装置
JP2024532466A (ja) * 2021-09-02 2024-09-05 エドワーズ バキューム リミテッド ライアビリティ カンパニー 半導体処理用インライン水スクラバーシステム

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR3114329B1 (fr) * 2020-09-24 2023-06-23 Safran Ceram Procédé de traitement d’une phase gazeuse résiduelle issue d’une technique CVI
CN114588762A (zh) * 2020-12-03 2022-06-07 中国科学院微电子研究所 半导体加工设备排气装置及方法
US11845029B2 (en) * 2021-03-09 2023-12-19 Jeffrey R. Mitchell Scent presentation system and method of use
TWI853471B (zh) * 2023-03-01 2024-08-21 南韓商等離子科學系統股份有限公司 半導體工程廢氣處理裝置

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005087958A (ja) * 2003-09-19 2005-04-07 Kanken Techno Co Ltd 排ガス導入構造および該構造を用いた排ガス処理装置
JP2005259932A (ja) * 2004-03-11 2005-09-22 Hitachi Kokusai Electric Inc 半導体製造装置
JP2010537811A (ja) * 2007-08-31 2010-12-09 アプライド マテリアルズ インコーポレイテッド 電子デバイス製造装置の排出物に対し除害処理を施すための方法及び装置
JP2011142257A (ja) * 2010-01-08 2011-07-21 Sumco Corp エピタキシャルウェーハの製造装置
JP2016225411A (ja) * 2015-05-28 2016-12-28 株式会社東芝 成膜装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005087958A (ja) * 2003-09-19 2005-04-07 Kanken Techno Co Ltd 排ガス導入構造および該構造を用いた排ガス処理装置
JP2005259932A (ja) * 2004-03-11 2005-09-22 Hitachi Kokusai Electric Inc 半導体製造装置
JP2010537811A (ja) * 2007-08-31 2010-12-09 アプライド マテリアルズ インコーポレイテッド 電子デバイス製造装置の排出物に対し除害処理を施すための方法及び装置
JP2011142257A (ja) * 2010-01-08 2011-07-21 Sumco Corp エピタキシャルウェーハの製造装置
JP2016225411A (ja) * 2015-05-28 2016-12-28 株式会社東芝 成膜装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2022050230A (ja) * 2020-09-17 2022-03-30 株式会社東芝 成膜装置
JP7293178B2 (ja) 2020-09-17 2023-06-19 株式会社東芝 成膜装置
JP2024532466A (ja) * 2021-09-02 2024-09-05 エドワーズ バキューム リミテッド ライアビリティ カンパニー 半導体処理用インライン水スクラバーシステム

Also Published As

Publication number Publication date
US20190083918A1 (en) 2019-03-21

Similar Documents

Publication Publication Date Title
JP2019057530A (ja) 製造装置及び排出ガス処理装置
KR100448291B1 (ko) 조합 화학물을 사용해서 반도체 제조 장비를 인시튜세정하기 위한 방법 및 장치
JP5654494B2 (ja) 排気ガスの処理方法
TWI539516B (zh) 基板處理方法及基板處理裝置
US9957611B2 (en) Removal device for semiconductor manufacturing apparatus and semiconductor manufacturing apparatus
JP3855081B2 (ja) フッ素ガスによるクリーニング機構を備えたｃｖｄ装置およびｃｖｄ装置のフッ素ガスによるクリーニング方法
KR101875421B1 (ko) 중원자들을 함유하는 화합물들의 플라즈마 저감
US10889891B2 (en) Apparatus for gaseous byproduct abatement and foreline cleaning
JP5877702B2 (ja) 成膜装置および成膜方法
TW200402092A (en) CVD apparatus and method for cleaning the same
KR100687942B1 (ko) 트랩 장치, 처리 시스템 및 불순물 제거 방법
JP6371738B2 (ja) 成膜装置
CN104303273A (zh) 蚀刻方法和等离子体处理装置
KR102490739B1 (ko) 식각액의 정제 방법
JP4772223B2 (ja) 排ガス除害装置及び方法
CN101214487B (zh) 一种半导体刻蚀设备腔室的清洗方法
CN110255506A (zh) 一种电子级硫酸生产的装置与方法
WO2025140753A2 (zh) 电子级多晶硅尾气中无定型硅粉处理系统
KR100658953B1 (ko) 폐가스 수처리장치
JPH08175810A (ja) 廃硫酸精製装置
KR101132568B1 (ko) 흄 발생없이 패턴을 형성하는 방법
JP2019165108A (ja) 成膜装置及び気液分離装置
JP2019145752A (ja) オイリーシランの処理装置および方法
JP2022119483A (ja) ガス分離回収装置、及びガス分離回収方法
KR102498830B1 (ko) 식각액의 정제 방법

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20180216

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20190919

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20190919

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20200731

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20200908

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20210309