JP2019057530A5 - - Google Patents

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Publication number
JP2019057530A5
JP2019057530A5 JP2017179330A JP2017179330A JP2019057530A5 JP 2019057530 A5 JP2019057530 A5 JP 2019057530A5 JP 2017179330 A JP2017179330 A JP 2017179330A JP 2017179330 A JP2017179330 A JP 2017179330A JP 2019057530 A5 JP2019057530 A5 JP 2019057530A5
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JP
Japan
Prior art keywords
exhaust gas
pipe
drainage
opening area
process chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2017179330A
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English (en)
Japanese (ja)
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JP2019057530A (ja
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Publication date
Application filed filed Critical
Priority to JP2017179330A priority Critical patent/JP2019057530A/ja
Priority claimed from JP2017179330A external-priority patent/JP2019057530A/ja
Priority to US15/901,944 priority patent/US20190083918A1/en
Publication of JP2019057530A publication Critical patent/JP2019057530A/ja
Publication of JP2019057530A5 publication Critical patent/JP2019057530A5/ja
Pending legal-status Critical Current

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JP2017179330A 2017-09-19 2017-09-19 製造装置及び排出ガス処理装置 Pending JP2019057530A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2017179330A JP2019057530A (ja) 2017-09-19 2017-09-19 製造装置及び排出ガス処理装置
US15/901,944 US20190083918A1 (en) 2017-09-19 2018-02-22 Manufacturing apparatus and exhaust gas treatment apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2017179330A JP2019057530A (ja) 2017-09-19 2017-09-19 製造装置及び排出ガス処理装置

Publications (2)

Publication Number Publication Date
JP2019057530A JP2019057530A (ja) 2019-04-11
JP2019057530A5 true JP2019057530A5 (enExample) 2019-11-07

Family

ID=65719102

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2017179330A Pending JP2019057530A (ja) 2017-09-19 2017-09-19 製造装置及び排出ガス処理装置

Country Status (2)

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US (1) US20190083918A1 (enExample)
JP (1) JP2019057530A (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7293178B2 (ja) * 2020-09-17 2023-06-19 株式会社東芝 成膜装置
FR3114329B1 (fr) * 2020-09-24 2023-06-23 Safran Ceram Procédé de traitement d’une phase gazeuse résiduelle issue d’une technique CVI
CN114588762A (zh) * 2020-12-03 2022-06-07 中国科学院微电子研究所 半导体加工设备排气装置及方法
US11845029B2 (en) * 2021-03-09 2023-12-19 Jeffrey R. Mitchell Scent presentation system and method of use
EP4395913A1 (en) * 2021-09-02 2024-07-10 Edwards Vacuum LLC In line water scrubber system for semiconductor processing
TWI853471B (zh) * 2023-03-01 2024-08-21 南韓商等離子科學系統股份有限公司 半導體工程廢氣處理裝置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4174396B2 (ja) * 2003-09-19 2008-10-29 カンケンテクノ株式会社 排ガス導入構造および該構造を用いた排ガス処理装置
JP2005259932A (ja) * 2004-03-11 2005-09-22 Hitachi Kokusai Electric Inc 半導体製造装置
WO2009029904A1 (en) * 2007-08-31 2009-03-05 Applied Materials, Inc. Methods and apparatus for abating electronic device manufacturing tool effluent
JP5454152B2 (ja) * 2010-01-08 2014-03-26 株式会社Ｓｕｍｃｏ エピタキシャルウェーハの製造装置
JP6371738B2 (ja) * 2015-05-28 2018-08-08 株式会社東芝 成膜装置

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