JP2019041005A5 - - Google Patents

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Publication number
JP2019041005A5
JP2019041005A5 JP2017162178A JP2017162178A JP2019041005A5 JP 2019041005 A5 JP2019041005 A5 JP 2019041005A5 JP 2017162178 A JP2017162178 A JP 2017162178A JP 2017162178 A JP2017162178 A JP 2017162178A JP 2019041005 A5 JP2019041005 A5 JP 2019041005A5
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JP
Japan
Prior art keywords
holding surface
contact
lithographic apparatus
polishing
holding
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2017162178A
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English (en)
Japanese (ja)
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JP6942562B2 (ja
JP2019041005A (ja
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Publication date
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Priority to JP2017162178A priority Critical patent/JP6942562B2/ja
Priority claimed from JP2017162178A external-priority patent/JP6942562B2/ja
Priority to US16/107,864 priority patent/US10444646B2/en
Priority to KR1020180097810A priority patent/KR102383372B1/ko
Publication of JP2019041005A publication Critical patent/JP2019041005A/ja
Publication of JP2019041005A5 publication Critical patent/JP2019041005A5/ja
Application granted granted Critical
Publication of JP6942562B2 publication Critical patent/JP6942562B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2017162178A 2017-08-25 2017-08-25 リソグラフィ装置、および物品の製造方法 Active JP6942562B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2017162178A JP6942562B2 (ja) 2017-08-25 2017-08-25 リソグラフィ装置、および物品の製造方法
US16/107,864 US10444646B2 (en) 2017-08-25 2018-08-21 Lithography apparatus and method of manufacturing article
KR1020180097810A KR102383372B1 (ko) 2017-08-25 2018-08-22 리소그래피 장치 및 물품의 제조 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2017162178A JP6942562B2 (ja) 2017-08-25 2017-08-25 リソグラフィ装置、および物品の製造方法

Publications (3)

Publication Number Publication Date
JP2019041005A JP2019041005A (ja) 2019-03-14
JP2019041005A5 true JP2019041005A5 (enExample) 2020-08-27
JP6942562B2 JP6942562B2 (ja) 2021-09-29

Family

ID=65435156

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2017162178A Active JP6942562B2 (ja) 2017-08-25 2017-08-25 リソグラフィ装置、および物品の製造方法

Country Status (3)

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US (1) US10444646B2 (enExample)
JP (1) JP6942562B2 (enExample)
KR (1) KR102383372B1 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7320360B2 (ja) 2019-03-06 2023-08-03 日東電工株式会社 粘着シート
EP3919978A1 (en) * 2020-06-05 2021-12-08 Taiwan Semiconductor Manufacturing Co., Ltd. Apparatus and a method of forming a particle shield
JP2022122141A (ja) * 2021-02-09 2022-08-22 株式会社ディスコ 保持面の洗浄方法
JP7650590B2 (ja) * 2021-03-29 2025-03-25 株式会社ディスコ 研磨装置

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5559582A (en) * 1992-08-28 1996-09-24 Nikon Corporation Exposure apparatus
JP3613288B2 (ja) 1994-10-18 2005-01-26 株式会社ニコン 露光装置用のクリーニング装置
US5825470A (en) * 1995-03-14 1998-10-20 Nikon Corporation Exposure apparatus
JP3450584B2 (ja) 1996-04-09 2003-09-29 キヤノン株式会社 半導体露光装置
JP3441956B2 (ja) * 1998-02-16 2003-09-02 キヤノン株式会社 露光装置、クリーニング用砥石およびデバイス製造方法
JP2000077368A (ja) * 1998-08-31 2000-03-14 Okamoto Machine Tool Works Ltd チャック機構よりウエハを取り外す方法
US6249932B1 (en) * 1999-01-29 2001-06-26 Taiwan Semiconductor Manufacturing Company, Ltd. Apparatus and method for removing fine particles
US6176770B1 (en) * 2000-01-31 2001-01-23 United Microelectronics Corp. Grindstone having a vacuum system in a pin chuck stepper
EP1329770A1 (en) * 2002-01-18 2003-07-23 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
DE60323927D1 (de) * 2002-12-13 2008-11-20 Asml Netherlands Bv Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
US7986395B2 (en) * 2005-10-24 2011-07-26 Taiwan Semiconductor Manufacturing Company, Ltd. Immersion lithography apparatus and methods
EP2102711A1 (en) * 2006-12-08 2009-09-23 Canon Kabushiki Kaisha Exposure appararus
KR101423611B1 (ko) * 2008-01-16 2014-07-30 삼성전자주식회사 기판 처리 장치, 노광 장치 및 클리닝 툴의 세정 방법
JP2010093245A (ja) * 2008-10-07 2010-04-22 Nikon Corp 露光装置、メンテナンス方法、露光方法、及びデバイス製造方法
JP2010153407A (ja) * 2008-12-23 2010-07-08 Nikon Corp 清掃方法及び装置、並びに露光方法及び装置
NL2004153A (en) * 2009-02-24 2010-08-25 Asml Netherlands Bv Lithographic apparatus, a method for removing material of one or more protrusions on a support surface, and an article support system.
JP5769451B2 (ja) * 2011-03-07 2015-08-26 キヤノン株式会社 インプリント装置および物品の製造方法
JP2012243805A (ja) * 2011-05-16 2012-12-10 Toshiba Corp パターン形成方法
JP2016031952A (ja) * 2014-07-25 2016-03-07 キヤノン株式会社 インプリント装置及び物品の製造方法

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