JP2019016666A - 加工装置 - Google Patents
加工装置 Download PDFInfo
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- JP2019016666A JP2019016666A JP2017131996A JP2017131996A JP2019016666A JP 2019016666 A JP2019016666 A JP 2019016666A JP 2017131996 A JP2017131996 A JP 2017131996A JP 2017131996 A JP2017131996 A JP 2017131996A JP 2019016666 A JP2019016666 A JP 2019016666A
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- 238000003754 machining Methods 0.000 claims description 11
- 230000000873 masking effect Effects 0.000 claims description 7
- 235000012431 wafers Nutrition 0.000 description 32
- 238000010586 diagram Methods 0.000 description 18
- 238000000034 method Methods 0.000 description 13
- 239000004973 liquid crystal related substance Substances 0.000 description 11
- 238000004519 manufacturing process Methods 0.000 description 7
- 238000005520 cutting process Methods 0.000 description 4
- 238000003384 imaging method Methods 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 3
- 238000005401 electroluminescence Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 230000032258 transport Effects 0.000 description 2
- 239000002390 adhesive tape Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67276—Production flow monitoring, e.g. for increasing throughput
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67253—Process monitoring, e.g. flow or thickness monitoring
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67288—Monitoring of warpage, curvature, damage, defects or the like
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P90/00—Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
- Y02P90/02—Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]
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- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Automation & Control Theory (AREA)
- Dicing (AREA)
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Laser Beam Processing (AREA)
- User Interface Of Digital Computer (AREA)
Abstract
Description
切削装置や研削装置にも適用できる旨記載ください。
10 チャックテーブル
20 レーザー光線照射部(加工ユニット)
60 制御ユニット
61 制御部
62 入力画面登録部
63 表示制御部
64 タッチパネル制御部
65 マスク登録部
66a〜66c 入力画面
67a〜67c マスク
70 操作パネル
71 表示パネル
73 液晶駆動回路基板
74 液晶パネル
75 タッチパネル
82a Enterキー(特定領域)
82b Exitキー(特定領域)
83a 設定/解除キー
83b 切替キー(切り替えボタン)
85 マスク領域(マスクで覆われる領域)
85a,85b 角部
86 マスクを除去する領域
86a,86b 角部
88 パスワード入力ボックス
90 マスキング画面
91 標準画面
100 ウエーハ(被加工物)
Claims (5)
- 被加工物を保持するチャックテーブルと、該チャックテーブルに保持された被加工物を加工する加工ユニットと、該被加工物の加工条件を入力する入力画面を表示する操作パネルと、各構成要素を制御する制御ユニットと、を備える加工装置であって、
該制御ユニットは、
該入力画面が複数登録される入力画面登録部と、
該入力画面の所定の領域を覆ってオペレータによる入力を不可能にするマスクを、該入力画面毎に登録するマスク登録部と、を備え、
該マスク登録部に該マスクを登録する際は、該入力画面の該マスクで覆う領域を指定して登録することを特徴とする加工装置。 - 該入力画面の該マスクで覆う領域又は、該マスクを除去する領域を指定する際は、該入力画面の該マスクで覆う領域又は、該マスクを除去する領域の角部を指定して登録する請求項1に記載の加工装置。
- 該入力画面における予め決められた特定領域を該マスクで覆う領域又は、該マスクを除去する領域として指定する際は、該特定領域内の一部を指定して登録する請求項1又は2に記載の加工装置。
- 該入力画面には、該入力画面に該マスクを重ねて表示するマスキング画面と、該入力画面に該マスクが重ねて表示されない標準画面とに表示を切り替える切り替えボタンが表示されることを特徴とする請求項1乃至3のいずれか一項に記載の加工装置。
- 該マスクは、色の濃淡が調整され該マスク越しに表示される該入力画面の視認性が設定される請求項1乃至4のいずれか一項に記載の加工装置。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017131996A JP6944291B2 (ja) | 2017-07-05 | 2017-07-05 | 加工装置 |
TW107119322A TWI773768B (zh) | 2017-07-05 | 2018-06-05 | 加工裝置 |
CN201810717324.5A CN109216235B (zh) | 2017-07-05 | 2018-07-02 | 加工装置 |
KR1020180077639A KR102559738B1 (ko) | 2017-07-05 | 2018-07-04 | 가공 장치 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017131996A JP6944291B2 (ja) | 2017-07-05 | 2017-07-05 | 加工装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2019016666A true JP2019016666A (ja) | 2019-01-31 |
JP6944291B2 JP6944291B2 (ja) | 2021-10-06 |
Family
ID=64990018
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2017131996A Active JP6944291B2 (ja) | 2017-07-05 | 2017-07-05 | 加工装置 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6944291B2 (ja) |
KR (1) | KR102559738B1 (ja) |
CN (1) | CN109216235B (ja) |
TW (1) | TWI773768B (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2020136308A (ja) * | 2019-02-13 | 2020-08-31 | 株式会社ディスコ | 加工装置 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06149525A (ja) * | 1992-10-30 | 1994-05-27 | Oki Electric Ind Co Ltd | 表示制御方法 |
JP2000181597A (ja) * | 1998-12-16 | 2000-06-30 | Internatl Business Mach Corp <Ibm> | コンピュ―タ・システムのグラフィック・ユ―ザ・インタフェ―ス内の制御を保護する方法及び装置 |
JP2012000701A (ja) * | 2010-06-15 | 2012-01-05 | Disco Corp | 加工装置 |
JP2013045358A (ja) * | 2011-08-25 | 2013-03-04 | Disco Abrasive Syst Ltd | 加工装置 |
JP2014231123A (ja) * | 2013-05-29 | 2014-12-11 | 株式会社ディスコ | 加工装置および情報交換方法 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6149525A (ja) * | 1984-08-17 | 1986-03-11 | Fujitsu Ltd | アナログ・デイジタル変換器 |
JP2008091476A (ja) * | 2006-09-29 | 2008-04-17 | Olympus Corp | 外観検査装置 |
JP5118445B2 (ja) | 2007-11-09 | 2013-01-16 | 株式会社ディスコ | 加工装置 |
JP6678375B2 (ja) * | 2013-11-18 | 2020-04-08 | 東京エレクトロン株式会社 | 情報処理装置、情報処理方法、および情報処理システム |
US10031528B2 (en) * | 2016-02-01 | 2018-07-24 | Komatsu Ltd. | Work machine control system, work machine, and work machine management system |
-
2017
- 2017-07-05 JP JP2017131996A patent/JP6944291B2/ja active Active
-
2018
- 2018-06-05 TW TW107119322A patent/TWI773768B/zh active
- 2018-07-02 CN CN201810717324.5A patent/CN109216235B/zh active Active
- 2018-07-04 KR KR1020180077639A patent/KR102559738B1/ko active IP Right Grant
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06149525A (ja) * | 1992-10-30 | 1994-05-27 | Oki Electric Ind Co Ltd | 表示制御方法 |
JP2000181597A (ja) * | 1998-12-16 | 2000-06-30 | Internatl Business Mach Corp <Ibm> | コンピュ―タ・システムのグラフィック・ユ―ザ・インタフェ―ス内の制御を保護する方法及び装置 |
JP2012000701A (ja) * | 2010-06-15 | 2012-01-05 | Disco Corp | 加工装置 |
JP2013045358A (ja) * | 2011-08-25 | 2013-03-04 | Disco Abrasive Syst Ltd | 加工装置 |
JP2014231123A (ja) * | 2013-05-29 | 2014-12-11 | 株式会社ディスコ | 加工装置および情報交換方法 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2020136308A (ja) * | 2019-02-13 | 2020-08-31 | 株式会社ディスコ | 加工装置 |
JP7290428B2 (ja) | 2019-02-13 | 2023-06-13 | 株式会社ディスコ | 加工装置 |
Also Published As
Publication number | Publication date |
---|---|
KR102559738B1 (ko) | 2023-07-25 |
TW201907255A (zh) | 2019-02-16 |
CN109216235B (zh) | 2024-02-09 |
TWI773768B (zh) | 2022-08-11 |
CN109216235A (zh) | 2019-01-15 |
KR20190005130A (ko) | 2019-01-15 |
JP6944291B2 (ja) | 2021-10-06 |
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