JP2018537144A5 - - Google Patents

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Publication number
JP2018537144A5
JP2018537144A5 JP2018516181A JP2018516181A JP2018537144A5 JP 2018537144 A5 JP2018537144 A5 JP 2018537144A5 JP 2018516181 A JP2018516181 A JP 2018516181A JP 2018516181 A JP2018516181 A JP 2018516181A JP 2018537144 A5 JP2018537144 A5 JP 2018537144A5
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JP
Japan
Prior art keywords
diffraction grating
grating structure
electrostrictive material
layer
ridge
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2018516181A
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English (en)
Japanese (ja)
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JP2018537144A (ja
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Publication date
Application filed filed Critical
Priority claimed from PCT/EP2016/072651 external-priority patent/WO2017055181A1/en
Publication of JP2018537144A publication Critical patent/JP2018537144A/ja
Publication of JP2018537144A5 publication Critical patent/JP2018537144A5/ja
Pending legal-status Critical Current

Links

JP2018516181A 2015-09-30 2016-09-23 電気機械トランスデューサフォイルによる微分位相コントラスト撮像のための回折格子の合焦 Pending JP2018537144A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP15187536 2015-09-30
EP15187536.6 2015-09-30
PCT/EP2016/072651 WO2017055181A1 (en) 2015-09-30 2016-09-23 Focussing of gratings for differential phase contrast imaging by means of electro-mechanic transducer foils

Publications (2)

Publication Number Publication Date
JP2018537144A JP2018537144A (ja) 2018-12-20
JP2018537144A5 true JP2018537144A5 (https=) 2019-10-31

Family

ID=54293044

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2018516181A Pending JP2018537144A (ja) 2015-09-30 2016-09-23 電気機械トランスデューサフォイルによる微分位相コントラスト撮像のための回折格子の合焦

Country Status (5)

Country Link
US (1) US20180294065A1 (https=)
EP (1) EP3192080B1 (https=)
JP (1) JP2018537144A (https=)
CN (1) CN108140439B (https=)
WO (1) WO2017055181A1 (https=)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6613988B2 (ja) * 2016-03-30 2019-12-04 コニカミノルタ株式会社 放射線撮影システム
EP3403581A1 (en) 2017-05-15 2018-11-21 Koninklijke Philips N.V. Grid-mounting device for slit-scan differential phase contrast imaging
US11013482B2 (en) * 2017-10-31 2021-05-25 Shimadzu Corporation Phase contrast X-ray imaging system
US11116463B2 (en) * 2019-01-11 2021-09-14 The Board Of Trustees Of The Leland Stanford Junior University Apparatus with flexible x-ray gratings
EP3826032A1 (en) * 2019-11-22 2021-05-26 Koninklijke Philips N.V. Modular fabrication technique for gratings for interferometric x-ray imaging
CN115373010A (zh) * 2022-08-31 2022-11-22 山东航天电子技术研究所 一种基于磁致变形材料的智能x射线光学系统

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3493287A (en) * 1966-04-26 1970-02-03 Ibm Optical detour phase system
JPS60256643A (ja) * 1984-05-31 1985-12-18 Moritomo Ando 減速装置
US5794023A (en) * 1996-05-31 1998-08-11 International Business Machines Corporation Apparatus utilizing a variably diffractive radiation element
US6985294B1 (en) * 2003-03-27 2006-01-10 Eric Rosenthal Full spectrum color projector
US6930817B2 (en) * 2003-04-25 2005-08-16 Palo Alto Research Center Incorporated Configurable grating based on surface relief pattern for use as a variable optical attenuator
DE102006037256B4 (de) * 2006-02-01 2017-03-30 Paul Scherer Institut Fokus-Detektor-Anordnung einer Röntgenapparatur zur Erzeugung projektiver oder tomographischer Phasenkontrastaufnahmen sowie Röntgensystem, Röntgen-C-Bogen-System und Röntgen-CT-System
JP2008048910A (ja) * 2006-08-24 2008-03-06 Shimadzu Corp Ｘ線グリッド
EP2068112A4 (en) * 2006-09-29 2017-11-15 Nikon Corporation Mobile unit system, pattern forming device, exposing device, exposing method, and device manufacturing method
JP5705826B2 (ja) * 2009-03-27 2015-04-22 コーニンクレッカ フィリップス エヌ ヴェ 円形格子を用いる差分位相コントラスト撮像
CN102395877B (zh) * 2009-04-17 2014-04-09 西门子公司 用于进行相衬测量的检测装置和x射线断层摄影仪以及进行相衬测量的方法
EP2443491B1 (en) * 2009-06-16 2020-03-04 Koninklijke Philips N.V. Tilted gratings and method for production of tilted gratings
CN101813796B (zh) * 2010-02-26 2012-07-18 深圳大学 一种硅基x射线相位光栅制作方法及其制作装置
JP2012090945A (ja) * 2010-03-30 2012-05-17 Fujifilm Corp 放射線検出装置、放射線撮影装置、放射線撮影システム
JP5634318B2 (ja) * 2011-04-19 2014-12-03 三菱電機株式会社 半導体装置
JP5930866B2 (ja) * 2012-06-22 2016-06-08 キヤノン株式会社 液体吐出ヘッド
JP2014006194A (ja) * 2012-06-26 2014-01-16 Canon Inc 構造体の製造方法
US10008659B2 (en) * 2014-12-09 2018-06-26 Lg Innotek Co., Ltd. Fingerprint sensor

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