JP2018515782A5 - - Google Patents
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- JP2018515782A5 JP2018515782A5 JP2017560538A JP2017560538A JP2018515782A5 JP 2018515782 A5 JP2018515782 A5 JP 2018515782A5 JP 2017560538 A JP2017560538 A JP 2017560538A JP 2017560538 A JP2017560538 A JP 2017560538A JP 2018515782 A5 JP2018515782 A5 JP 2018515782A5
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- JP
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- Prior art keywords
- optical system
- imaging
- target
- metrology
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- 230000003287 optical effect Effects 0.000 claims description 24
- 238000003384 imaging method Methods 0.000 claims description 9
- 238000005286 illumination Methods 0.000 claims description 5
- 230000003595 spectral effect Effects 0.000 claims description 3
- 238000005259 measurement Methods 0.000 claims 5
- 230000000737 periodic effect Effects 0.000 claims 5
- 238000005303 weighing Methods 0.000 claims 3
- PVNIIMVLHYAWGP-UHFFFAOYSA-N Niacin Chemical compound OC(=O)C1=CC=CN=C1 PVNIIMVLHYAWGP-UHFFFAOYSA-N 0.000 claims 2
- 238000001514 detection method Methods 0.000 claims 2
- 230000001747 exhibiting effect Effects 0.000 claims 1
- 238000012876 topography Methods 0.000 claims 1
- 238000000034 method Methods 0.000 description 1
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021077245A JP7250064B2 (ja) | 2015-05-19 | 2021-04-30 | イメージング計量ターゲットおよび計量方法 |
| JP2021077244A JP7250063B2 (ja) | 2015-05-19 | 2021-04-30 | 光学システム |
| JP2021077243A JP7253006B2 (ja) | 2015-05-19 | 2021-04-30 | 光学システム |
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201562163783P | 2015-05-19 | 2015-05-19 | |
| US62/163,783 | 2015-05-19 | ||
| US201562222724P | 2015-09-23 | 2015-09-23 | |
| US62/222,724 | 2015-09-23 | ||
| PCT/US2016/033353 WO2016187468A1 (en) | 2015-05-19 | 2016-05-19 | Topographic phase control for overlay measurement |
Related Child Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021077244A Division JP7250063B2 (ja) | 2015-05-19 | 2021-04-30 | 光学システム |
| JP2021077243A Division JP7253006B2 (ja) | 2015-05-19 | 2021-04-30 | 光学システム |
| JP2021077245A Division JP7250064B2 (ja) | 2015-05-19 | 2021-04-30 | イメージング計量ターゲットおよび計量方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2018515782A JP2018515782A (ja) | 2018-06-14 |
| JP2018515782A5 true JP2018515782A5 (enExample) | 2019-06-13 |
| JP6879939B2 JP6879939B2 (ja) | 2021-06-02 |
Family
ID=57320785
Family Applications (4)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017560538A Active JP6879939B2 (ja) | 2015-05-19 | 2016-05-19 | オーバレイ計測用トポグラフィック位相制御 |
| JP2021077245A Active JP7250064B2 (ja) | 2015-05-19 | 2021-04-30 | イメージング計量ターゲットおよび計量方法 |
| JP2021077244A Active JP7250063B2 (ja) | 2015-05-19 | 2021-04-30 | 光学システム |
| JP2021077243A Active JP7253006B2 (ja) | 2015-05-19 | 2021-04-30 | 光学システム |
Family Applications After (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021077245A Active JP7250064B2 (ja) | 2015-05-19 | 2021-04-30 | イメージング計量ターゲットおよび計量方法 |
| JP2021077244A Active JP7250063B2 (ja) | 2015-05-19 | 2021-04-30 | 光学システム |
| JP2021077243A Active JP7253006B2 (ja) | 2015-05-19 | 2021-04-30 | 光学システム |
Country Status (7)
| Country | Link |
|---|---|
| US (5) | US10520832B2 (enExample) |
| JP (4) | JP6879939B2 (enExample) |
| KR (4) | KR102334168B1 (enExample) |
| CN (4) | CN112859541A (enExample) |
| SG (3) | SG10201912822UA (enExample) |
| TW (4) | TWI755987B (enExample) |
| WO (1) | WO2016187468A1 (enExample) |
Families Citing this family (30)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI755987B (zh) | 2015-05-19 | 2022-02-21 | 美商克萊譚克公司 | 具有用於疊對測量之形貌相位控制之光學系統 |
| US9989806B2 (en) * | 2015-09-10 | 2018-06-05 | Samsung Display Co., Ltd. | Color conversion panel and display device including the same |
| KR102393740B1 (ko) | 2015-12-08 | 2022-05-02 | 케이엘에이 코포레이션 | 편광 타겟 및 편광 조명을 사용한 회절 차수의 진폭 및 위상의 제어 |
| US11112704B2 (en) * | 2017-02-10 | 2021-09-07 | Kla-Tencor Corporation | Mitigation of inaccuracies related to grating asymmetries in scatterometry measurements |
| WO2018226215A1 (en) * | 2017-06-06 | 2018-12-13 | Kla-Tencor Corporation | Reticle optimization algorithms and optimal target design |
| EP3454123A1 (en) * | 2017-09-06 | 2019-03-13 | ASML Netherlands B.V. | Metrology method and apparatus |
| WO2019091678A1 (en) * | 2017-11-07 | 2019-05-16 | Asml Netherlands B.V. | Metrology apparatus and a method of determining a characteristic of interest |
| EP3499312A1 (en) * | 2017-12-15 | 2019-06-19 | ASML Netherlands B.V. | Metrology apparatus and a method of determining a characteristic of interest |
| US11085754B2 (en) * | 2017-12-12 | 2021-08-10 | Kla Corporation | Enhancing metrology target information content |
| EP3521929A1 (en) * | 2018-02-02 | 2019-08-07 | ASML Netherlands B.V. | Method of determining an optimal focus height for a metrology apparatus |
| JP7227988B2 (ja) | 2018-02-27 | 2023-02-22 | エーエスエムエル ネザーランズ ビー.ブイ. | 基板上の1つ又は複数の構造の特性を算出するメトロロジ装置及び方法 |
| JP7177847B2 (ja) * | 2018-03-19 | 2022-11-24 | ケーエルエー コーポレイション | 複数波長を用いたオーバーレイ測定 |
| US10677588B2 (en) * | 2018-04-09 | 2020-06-09 | Kla-Tencor Corporation | Localized telecentricity and focus optimization for overlay metrology |
| WO2019236084A1 (en) * | 2018-06-07 | 2019-12-12 | Kla-Tencor Corporation | Overlay measurement using phase and amplitude modeling |
| KR102729956B1 (ko) * | 2018-08-28 | 2024-11-13 | 케이엘에이 코포레이션 | 2-회절된 차수들의 이미징을 사용한 축외 조명 오버레이 측정 |
| CN113260924B (zh) * | 2018-12-31 | 2025-02-18 | Asml荷兰有限公司 | 用于重叠量测的方法及其设备 |
| JP7595599B2 (ja) | 2019-02-14 | 2024-12-06 | ケーエルエー コーポレイション | トポグラフィ半導体デバイスウェハの製造における位置ずれの測定方法 |
| WO2020190318A1 (en) * | 2019-03-21 | 2020-09-24 | Kla Corporation | Parameter-stable misregistration measurement amelioration in semiconductor devices |
| US11703460B2 (en) * | 2019-07-09 | 2023-07-18 | Kla Corporation | Methods and systems for optical surface defect material characterization |
| US11914290B2 (en) * | 2019-07-24 | 2024-02-27 | Kla Corporation | Overlay measurement targets design |
| US11346657B2 (en) * | 2020-05-22 | 2022-05-31 | Kla Corporation | Measurement modes for overlay |
| KR102825815B1 (ko) * | 2020-06-18 | 2025-06-27 | 삼성전자주식회사 | 스루-포커스 이미지 기반 계측 장치, 그것의 동작 방법, 및 그 동작을 실행하는 컴퓨팅 장치 |
| CN112465694B (zh) * | 2020-11-27 | 2024-10-15 | 中国科学院西安光学精密机械研究所 | 基于相位变化的医学图像数据增广方法 |
| US11713959B2 (en) * | 2021-03-17 | 2023-08-01 | Kla Corporation | Overlay metrology using spectroscopic phase |
| JP2024521436A (ja) * | 2021-06-09 | 2024-05-31 | エーエスエムエル ネザーランズ ビー.ブイ. | アパーチャアポダイゼーションを備えた構造照明を使用したレチクル粒子検出用の検査システム |
| CN113467033A (zh) * | 2021-06-24 | 2021-10-01 | 南昌欧菲光电技术有限公司 | 一种摄像头模组及其透镜的定位方法 |
| CN113777731A (zh) * | 2021-08-11 | 2021-12-10 | 中国工程物理研究院应用电子学研究所 | 一种共轴反转环型连续变密度衰减器装置及其工作方法 |
| CN113985711B (zh) * | 2021-10-28 | 2024-02-02 | 无锡卓海科技股份有限公司 | 一种套刻测量装置 |
| KR102874693B1 (ko) * | 2023-08-17 | 2025-10-29 | (주) 오로스테크놀로지 | 이미지 기반 오버레이 시스템에서 위상 이미지 획득 장치 및 방법 |
| US12411420B2 (en) * | 2023-09-29 | 2025-09-09 | Kla Corporation | Small in-die target design for overlay measurement |
Family Cites Families (57)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4644172A (en) * | 1984-02-22 | 1987-02-17 | Kla Instruments Corporation | Electronic control of an automatic wafer inspection system |
| US5666197A (en) * | 1996-08-21 | 1997-09-09 | Polaroid Corporation | Apparatus and methods employing phase control and analysis of evanescent illumination for imaging and metrology of subwavelength lateral surface topography |
| JPH10284370A (ja) * | 1997-04-03 | 1998-10-23 | Nikon Corp | 焦点位置検出装置及び該装置を備えた投影露光装置 |
| JP2001307975A (ja) * | 2000-02-18 | 2001-11-02 | Nikon Corp | 荷電粒子線露光装置及び半導体デバイスの製造方法 |
| US7317531B2 (en) | 2002-12-05 | 2008-01-08 | Kla-Tencor Technologies Corporation | Apparatus and methods for detecting overlay errors using scatterometry |
| US6891627B1 (en) * | 2000-09-20 | 2005-05-10 | Kla-Tencor Technologies Corp. | Methods and systems for determining a critical dimension and overlay of a specimen |
| JP2002170760A (ja) * | 2000-12-01 | 2002-06-14 | Nikon Corp | 荷電粒子ビーム露光装置、荷電粒子ビーム露光方法及びデバイス製造方法 |
| US7072502B2 (en) * | 2001-06-07 | 2006-07-04 | Applied Materials, Inc. | Alternating phase-shift mask inspection method and apparatus |
| US6794671B2 (en) * | 2002-07-17 | 2004-09-21 | Particle Sizing Systems, Inc. | Sensors and methods for high-sensitivity optical particle counting and sizing |
| EP1570232B1 (en) * | 2002-12-05 | 2016-11-02 | KLA-Tencor Technologies Corporation | Apparatus and methods for detecting overlay errors using scatterometry |
| US7230704B2 (en) | 2003-06-06 | 2007-06-12 | Tokyo Electron Limited | Diffracting, aperiodic targets for overlay metrology and method to detect gross overlay |
| JP4734261B2 (ja) * | 2004-02-18 | 2011-07-27 | ケーエルエー−テンカー コーポレイション | 連続変化するオフセットマークと、オーバレイ決定方法 |
| DE102005006724A1 (de) * | 2004-10-20 | 2006-08-10 | Universität Stuttgart | Verfahren und Anordung zur konfokalen Spektral-Interferometrie, insbesondere auch zur optischen Kohärenz-Tomografie (OCT)und/oder optischen Kohärenz-Mikroskopie (OCM)von biologischen und technischen Objekten |
| US20060164649A1 (en) | 2005-01-24 | 2006-07-27 | Eliezer Rosengaus | Multi-spectral techniques for defocus detection |
| DE102006016131A1 (de) * | 2005-09-22 | 2007-03-29 | Robert Bosch Gmbh | Interferometrische Messvorrichtung |
| JP2007140212A (ja) * | 2005-11-18 | 2007-06-07 | Toshiba Corp | フォトマスク及び半導体装置の製造方法 |
| US20070238955A1 (en) * | 2006-01-18 | 2007-10-11 | The General Hospital Corporation | Systems and methods for generating data using one or more endoscopic microscopy techniques |
| US7408642B1 (en) * | 2006-02-17 | 2008-08-05 | Kla-Tencor Technologies Corporation | Registration target design for managing both reticle grid error and wafer overlay |
| DE102006021557B3 (de) * | 2006-05-08 | 2007-07-12 | Carl Mahr Holding Gmbh | Vorrichtung und Verfahren zur kombinierten interferometrischen und abbildungsbasierten Geometrieerfassung, insbesondere in der Mikrosystemtechnik |
| US7528941B2 (en) * | 2006-06-01 | 2009-05-05 | Kla-Tencor Technolgies Corporation | Order selected overlay metrology |
| TW200905157A (en) * | 2007-04-12 | 2009-02-01 | Nikon Corp | Measuring method, exposure method, and device fabricating method |
| JP4966724B2 (ja) * | 2007-04-20 | 2012-07-04 | キヤノン株式会社 | 露光装置及びデバイス製造方法 |
| WO2008134378A1 (en) * | 2007-04-26 | 2008-11-06 | Kla-Tencor Corporation | Optical gain approach for enhancement of overlay and alignment systems performance |
| US7869022B2 (en) * | 2007-07-18 | 2011-01-11 | Asml Netherlands B.V. | Inspection method and apparatus lithographic apparatus, lithographic processing cell, device manufacturing method and distance measuring system |
| US8148663B2 (en) * | 2007-07-31 | 2012-04-03 | Applied Materials, Inc. | Apparatus and method of improving beam shaping and beam homogenization |
| US20090034071A1 (en) * | 2007-07-31 | 2009-02-05 | Dean Jennings | Method for partitioning and incoherently summing a coherent beam |
| US9239455B2 (en) * | 2007-12-31 | 2016-01-19 | Stc.Unm | Structural illumination and evanescent coupling for the extension of imaging interferometric microscopy |
| NL1036857A1 (nl) | 2008-04-21 | 2009-10-22 | Asml Netherlands Bv | Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method. |
| JP5319978B2 (ja) * | 2008-07-28 | 2013-10-16 | 株式会社日立メディアエレクトロニクス | 光ピックアップ装置、光ディスク装置および回折格子 |
| EP2329322B1 (en) * | 2008-09-22 | 2016-09-07 | ASML Netherlands BV | Lithographic apparatus and lithographic method |
| JP5361322B2 (ja) * | 2008-10-14 | 2013-12-04 | キヤノン株式会社 | 露光装置及びデバイスの製造方法 |
| DE102009044151B4 (de) * | 2009-05-19 | 2012-03-29 | Kla-Tencor Mie Gmbh | Vorrichtung zur optischen Waferinspektion |
| NL2005162A (en) * | 2009-07-31 | 2011-02-02 | Asml Netherlands Bv | Methods and scatterometers, lithographic systems, and lithographic processing cells. |
| CN101699265A (zh) * | 2009-10-28 | 2010-04-28 | 上海理工大学 | 动态偏振光散射颗粒测量装置及测量方法 |
| US8896832B2 (en) | 2010-06-17 | 2014-11-25 | Kla-Tencor Corp. | Discrete polarization scatterometry |
| JP6008851B2 (ja) | 2010-07-19 | 2016-10-19 | エーエスエムエル ネザーランズ ビー.ブイ. | オーバレイ誤差を決定する方法及び装置 |
| US9927718B2 (en) | 2010-08-03 | 2018-03-27 | Kla-Tencor Corporation | Multi-layer overlay metrology target and complimentary overlay metrology measurement systems |
| US9007584B2 (en) * | 2010-12-27 | 2015-04-14 | Nanometrics Incorporated | Simultaneous measurement of multiple overlay errors using diffraction based overlay |
| KR101976152B1 (ko) * | 2011-02-10 | 2019-05-09 | 케이엘에이-텐코 코포레이션 | 오버레이 계측의 콘트라스트 증강을 위한 구조화 조명 |
| US20120224183A1 (en) * | 2011-03-02 | 2012-09-06 | Zygo Corporation | Interferometric metrology of surfaces, films and underresolved structures |
| US9645502B2 (en) * | 2011-04-08 | 2017-05-09 | Asml Netherlands B.V. | Lithographic apparatus, programmable patterning device and lithographic method |
| US8582114B2 (en) | 2011-08-15 | 2013-11-12 | Kla-Tencor Corporation | Overlay metrology by pupil phase analysis |
| US9310186B2 (en) * | 2012-04-23 | 2016-04-12 | Ben-Gurion University Of The Negev Research And Development Authority | True-spectroscopic dual mode high resolution full-field optical coherence tomography using liquid crystal devices |
| KR102231730B1 (ko) | 2012-06-26 | 2021-03-24 | 케이엘에이 코포레이션 | 각도 분해형 반사율 측정에서의 스캐닝 및 광학 계측으로부터 회절의 알고리즘적 제거 |
| US8913237B2 (en) * | 2012-06-26 | 2014-12-16 | Kla-Tencor Corporation | Device-like scatterometry overlay targets |
| US9329033B2 (en) | 2012-09-05 | 2016-05-03 | Kla-Tencor Corporation | Method for estimating and correcting misregistration target inaccuracy |
| WO2014062972A1 (en) * | 2012-10-18 | 2014-04-24 | Kla-Tencor Corporation | Symmetric target design in scatterometry overlay metrology |
| US9581430B2 (en) * | 2012-10-19 | 2017-02-28 | Kla-Tencor Corporation | Phase characterization of targets |
| US9875946B2 (en) * | 2013-04-19 | 2018-01-23 | Kla-Tencor Corporation | On-device metrology |
| US9189705B2 (en) * | 2013-08-08 | 2015-11-17 | JSMSW Technology LLC | Phase-controlled model-based overlay measurement systems and methods |
| CN103411557B (zh) * | 2013-08-15 | 2016-02-03 | 哈尔滨工业大学 | 阵列照明的角谱扫描准共焦环形微结构测量装置与方法 |
| CN106164775B (zh) * | 2014-02-03 | 2019-07-19 | Asml荷兰有限公司 | 量测方法和设备、衬底、光刻系统和器件制造方法 |
| KR101906293B1 (ko) * | 2014-02-21 | 2018-10-10 | 에이에스엠엘 네델란즈 비.브이. | 타겟 배열 및 연계된 타겟의 최적화 |
| KR102345196B1 (ko) * | 2014-04-07 | 2021-12-29 | 노바 메주어링 인스트루먼츠 엘티디. | 광학 위상 측정 방법 및 시스템 |
| US20150355098A1 (en) * | 2014-05-06 | 2015-12-10 | California Institute Of Technology | Rotating scattering plane based nonlinear optical spectrometer to study the crystallographic and electronic symmetries of crystals |
| CN112698551B (zh) | 2014-11-25 | 2024-04-23 | 科磊股份有限公司 | 分析及利用景观 |
| TWI755987B (zh) * | 2015-05-19 | 2022-02-21 | 美商克萊譚克公司 | 具有用於疊對測量之形貌相位控制之光學系統 |
-
2016
- 2016-05-19 TW TW109145524A patent/TWI755987B/zh active
- 2016-05-19 CN CN202110100981.7A patent/CN112859541A/zh active Pending
- 2016-05-19 CN CN202110100880.XA patent/CN112859540B/zh active Active
- 2016-05-19 JP JP2017560538A patent/JP6879939B2/ja active Active
- 2016-05-19 SG SG10201912822UA patent/SG10201912822UA/en unknown
- 2016-05-19 CN CN202110100983.6A patent/CN112859542A/zh active Pending
- 2016-05-19 KR KR1020177036236A patent/KR102334168B1/ko active Active
- 2016-05-19 KR KR1020217038906A patent/KR102678955B1/ko active Active
- 2016-05-19 KR KR1020217038903A patent/KR102665579B1/ko active Active
- 2016-05-19 TW TW105115575A patent/TWI715582B/zh active
- 2016-05-19 SG SG10201912816UA patent/SG10201912816UA/en unknown
- 2016-05-19 CN CN201680028226.XA patent/CN107636538B/zh active Active
- 2016-05-19 TW TW109145525A patent/TWI760984B/zh active
- 2016-05-19 SG SG10201912818WA patent/SG10201912818WA/en unknown
- 2016-05-19 US US15/114,175 patent/US10520832B2/en active Active
- 2016-05-19 KR KR1020217038910A patent/KR102607646B1/ko active Active
- 2016-05-19 TW TW109145523A patent/TWI752764B/zh active
- 2016-05-19 WO PCT/US2016/033353 patent/WO2016187468A1/en not_active Ceased
-
2019
- 2019-11-03 US US16/672,480 patent/US20200142322A1/en not_active Abandoned
- 2019-11-03 US US16/672,483 patent/US11314173B2/en active Active
- 2019-11-03 US US16/672,475 patent/US20200142321A1/en not_active Abandoned
-
2021
- 2021-04-26 US US17/241,006 patent/US20210255551A1/en not_active Abandoned
- 2021-04-30 JP JP2021077245A patent/JP7250064B2/ja active Active
- 2021-04-30 JP JP2021077244A patent/JP7250063B2/ja active Active
- 2021-04-30 JP JP2021077243A patent/JP7253006B2/ja active Active
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