JP2018169910A5 - - Google Patents

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Publication number
JP2018169910A5
JP2018169910A5 JP2017068162A JP2017068162A JP2018169910A5 JP 2018169910 A5 JP2018169910 A5 JP 2018169910A5 JP 2017068162 A JP2017068162 A JP 2017068162A JP 2017068162 A JP2017068162 A JP 2017068162A JP 2018169910 A5 JP2018169910 A5 JP 2018169910A5
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Japan
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gas
time
flow rate
pressure
chamber
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JP2017068162A
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English (en)
Japanese (ja)
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JP6670791B2 (ja
JP2018169910A (ja
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Priority to JP2017068162A priority Critical patent/JP6670791B2/ja
Priority claimed from JP2017068162A external-priority patent/JP6670791B2/ja
Priority to US15/938,916 priority patent/US10480978B2/en
Priority to TW107110651A priority patent/TWI758449B/zh
Priority to KR1020180036058A priority patent/KR102427994B1/ko
Publication of JP2018169910A publication Critical patent/JP2018169910A/ja
Publication of JP2018169910A5 publication Critical patent/JP2018169910A5/ja
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Publication of JP6670791B2 publication Critical patent/JP6670791B2/ja
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JP2017068162A 2017-03-30 2017-03-30 流量制御器を検査する方法及び被処理体を処理する方法 Active JP6670791B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2017068162A JP6670791B2 (ja) 2017-03-30 2017-03-30 流量制御器を検査する方法及び被処理体を処理する方法
US15/938,916 US10480978B2 (en) 2017-03-30 2018-03-28 Method for inspecting flow rate controller and method for processing workpiece
TW107110651A TWI758449B (zh) 2017-03-30 2018-03-28 檢查流量控制器之方法及處理被處理體之方法
KR1020180036058A KR102427994B1 (ko) 2017-03-30 2018-03-28 유량 제어기를 검사하는 방법 및 피처리체를 처리하는 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2017068162A JP6670791B2 (ja) 2017-03-30 2017-03-30 流量制御器を検査する方法及び被処理体を処理する方法

Publications (3)

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JP2018169910A JP2018169910A (ja) 2018-11-01
JP2018169910A5 true JP2018169910A5 (cg-RX-API-DMAC7.html) 2019-11-21
JP6670791B2 JP6670791B2 (ja) 2020-03-25

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JP2017068162A Active JP6670791B2 (ja) 2017-03-30 2017-03-30 流量制御器を検査する方法及び被処理体を処理する方法

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Country Link
US (1) US10480978B2 (cg-RX-API-DMAC7.html)
JP (1) JP6670791B2 (cg-RX-API-DMAC7.html)
KR (1) KR102427994B1 (cg-RX-API-DMAC7.html)
TW (1) TWI758449B (cg-RX-API-DMAC7.html)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117043705B (zh) * 2021-03-24 2026-07-31 桑名金属工业株式会社 决定参数的初始值的方法及系统、以及调整质量流量控制装置的方法及系统
KR102868615B1 (ko) * 2021-04-02 2025-10-10 주식회사 원익아이피에스 기판처리방법
JPWO2024024594A1 (cg-RX-API-DMAC7.html) * 2022-07-28 2024-02-01

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5383122A (en) * 1992-06-30 1995-01-17 Union Oil Company Of California Method for analyzing pressure buildup in low pumping rate wells
EP1096351A4 (en) * 1999-04-16 2004-12-15 Fujikin Kk FLUID SUPPLY DEVICE OF THE PARALLEL BYPASS TYPE, AND METHOD AND DEVICE FOR CONTROLLING THE FLOW OF A VARIABLE FLUID TYPE PRESSURE SYSTEM USED IN SAID DEVICE
TW538327B (en) * 2001-04-24 2003-06-21 Unit Instr Inc System and method for a mass flow controller
JP4195819B2 (ja) * 2003-01-17 2008-12-17 忠弘 大見 弗化水素ガスの流量制御方法及びこれに用いる弗化水素ガス用流量制御装置
JP5264039B2 (ja) * 2004-08-10 2013-08-14 東京エレクトロン株式会社 薄膜形成装置及び薄膜形成方法
US8316879B2 (en) * 2007-12-05 2012-11-27 Hitachi Zosen Corporation Method and device for controlling pressure of vacuum container
CN102077320B (zh) * 2008-07-04 2013-01-23 东京毅力科创株式会社 等离子体处理装置、等离子体处理方法和介电体窗的温度调节机构
JP5538119B2 (ja) * 2010-07-30 2014-07-02 株式会社フジキン ガス供給装置用流量制御器の校正方法及び流量計測方法
CN103250233B (zh) * 2010-12-24 2016-01-20 三菱电机株式会社 微晶半导体薄膜制造方法
JP5703032B2 (ja) * 2011-01-06 2015-04-15 株式会社フジキン ガス供給装置用流量制御器の流量測定方法
JP5286430B2 (ja) 2012-03-13 2013-09-11 株式会社フジキン 圧力制御式流量基準器を構成する基準圧力式流量制御器用の耐食性圧力式流量制御器。
JP6346849B2 (ja) * 2014-08-20 2018-06-20 東京エレクトロン株式会社 ガス供給系、プラズマ処理装置、及びプラズマ処理装置の運用方法
KR102371907B1 (ko) * 2015-07-10 2022-03-08 피포탈 시스템즈 코포레이션 가스 흐름 제어 방법 및 장치
JP6615544B2 (ja) * 2015-09-14 2019-12-04 株式会社東芝 流量調整装置及び処理装置

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