JP2018095959A5 - - Google Patents

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Publication number
JP2018095959A5
JP2018095959A5 JP2017227203A JP2017227203A JP2018095959A5 JP 2018095959 A5 JP2018095959 A5 JP 2018095959A5 JP 2017227203 A JP2017227203 A JP 2017227203A JP 2017227203 A JP2017227203 A JP 2017227203A JP 2018095959 A5 JP2018095959 A5 JP 2018095959A5
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JP
Japan
Prior art keywords
adhesive surface
region
close contact
sheet
partition
Prior art date
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Application number
JP2017227203A
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English (en)
Japanese (ja)
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JP7002302B2 (ja
JP2018095959A (ja
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Publication date
Application filed filed Critical
Priority to CN201711281075.1A priority Critical patent/CN108220882B/zh
Priority to TW106143484A priority patent/TWI656230B/zh
Priority to KR1020170170254A priority patent/KR102032307B1/ko
Priority to US15/838,982 priority patent/US10633736B2/en
Publication of JP2018095959A publication Critical patent/JP2018095959A/ja
Publication of JP2018095959A5 publication Critical patent/JP2018095959A5/ja
Application granted granted Critical
Publication of JP7002302B2 publication Critical patent/JP7002302B2/ja
Active legal-status Critical Current
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JP2017227203A 2016-12-13 2017-11-27 成膜装置 Active JP7002302B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
CN201711281075.1A CN108220882B (zh) 2016-12-13 2017-12-06 成膜装置
TW106143484A TWI656230B (zh) 2016-12-13 2017-12-12 成膜裝置
KR1020170170254A KR102032307B1 (ko) 2016-12-13 2017-12-12 성막 장치
US15/838,982 US10633736B2 (en) 2016-12-13 2017-12-12 Film formation apparatus

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016240856 2016-12-13
JP2016240856 2016-12-13

Publications (3)

Publication Number Publication Date
JP2018095959A JP2018095959A (ja) 2018-06-21
JP2018095959A5 true JP2018095959A5 (https=) 2021-01-14
JP7002302B2 JP7002302B2 (ja) 2022-02-10

Family

ID=62632166

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2017227203A Active JP7002302B2 (ja) 2016-12-13 2017-11-27 成膜装置

Country Status (4)

Country Link
JP (1) JP7002302B2 (https=)
KR (1) KR102032307B1 (https=)
CN (1) CN108220882B (https=)
TW (1) TWI656230B (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7134802B2 (ja) * 2018-09-14 2022-09-12 株式会社アルバック 真空処理装置
JP7141989B2 (ja) * 2018-09-28 2022-09-26 芝浦メカトロニクス株式会社 成膜装置
JP7190386B2 (ja) * 2019-03-28 2022-12-15 芝浦メカトロニクス株式会社 成膜装置
JP7159238B2 (ja) * 2020-03-13 2022-10-24 キヤノントッキ株式会社 基板キャリア、成膜装置、及び成膜方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001003026A (ja) 1999-06-22 2001-01-09 Bridgestone Corp 粘着剤組成物、粘着剤付きフィルム及び粘着剤付きフィルムの貼着方法
KR100995715B1 (ko) * 2002-04-09 2010-11-19 파나소닉 주식회사 플라즈마 처리 방법 및 장치와 플라즈마 처리용 트레이
JP4308564B2 (ja) * 2002-04-09 2009-08-05 パナソニック株式会社 プラズマ処理装置及びプラズマ処理用トレー
US7108899B2 (en) * 2002-09-11 2006-09-19 Entegris, Inc. Chip tray with tacky surface
JP2006505457A (ja) * 2002-09-11 2006-02-16 エンテグリス・インコーポレーテッド 粘着性表面を有するキャリア
JP2005116610A (ja) * 2003-10-03 2005-04-28 Nitto Denko Corp 半導体ウエハの加工方法および半導体ウエハ加工用粘着シート
JP4555032B2 (ja) 2004-09-03 2010-09-29 シーエステック株式会社 トレイ
CN101803460B (zh) * 2007-09-10 2012-01-25 株式会社爱发科 有机材料蒸气产生装置、成膜源、成膜装置
WO2010024146A1 (ja) * 2008-08-27 2010-03-04 株式会社アルバック 静電チャック及び真空処理装置
US20120225207A1 (en) * 2011-03-01 2012-09-06 Applied Materials, Inc. Apparatus and Process for Atomic Layer Deposition
JP2013035819A (ja) 2011-08-09 2013-02-21 Norimichi Kawashima 薬剤およびその使用方法
CN105463386B (zh) * 2014-09-30 2018-10-12 芝浦机械电子装置株式会社 成膜装置及成膜基板制造方法
JP6411975B2 (ja) * 2014-09-30 2018-10-24 芝浦メカトロニクス株式会社 成膜装置及び成膜基板製造方法

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