JP2018074160A5 - - Google Patents

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Publication number
JP2018074160A5
JP2018074160A5 JP2017209545A JP2017209545A JP2018074160A5 JP 2018074160 A5 JP2018074160 A5 JP 2018074160A5 JP 2017209545 A JP2017209545 A JP 2017209545A JP 2017209545 A JP2017209545 A JP 2017209545A JP 2018074160 A5 JP2018074160 A5 JP 2018074160A5
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JP
Japan
Prior art keywords
edge
substrate
template
layer
mold
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2017209545A
Other languages
English (en)
Japanese (ja)
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JP2018074160A (ja
JP7029272B2 (ja
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Publication date
Priority claimed from US15/339,281 external-priority patent/US10549313B2/en
Application filed filed Critical
Publication of JP2018074160A publication Critical patent/JP2018074160A/ja
Publication of JP2018074160A5 publication Critical patent/JP2018074160A5/ja
Application granted granted Critical
Publication of JP7029272B2 publication Critical patent/JP7029272B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2017209545A 2016-10-31 2017-10-30 エッジ領域のインプリントリソグラフィ Active JP7029272B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US15/339,281 2016-10-31
US15/339,281 US10549313B2 (en) 2016-10-31 2016-10-31 Edge field imprint lithography

Publications (3)

Publication Number Publication Date
JP2018074160A JP2018074160A (ja) 2018-05-10
JP2018074160A5 true JP2018074160A5 (enExample) 2020-11-19
JP7029272B2 JP7029272B2 (ja) 2022-03-03

Family

ID=62020369

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2017209545A Active JP7029272B2 (ja) 2016-10-31 2017-10-30 エッジ領域のインプリントリソグラフィ

Country Status (3)

Country Link
US (1) US10549313B2 (enExample)
JP (1) JP7029272B2 (enExample)
KR (1) KR102202849B1 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11614693B2 (en) 2021-06-30 2023-03-28 Canon Kabushiki Kaisha Method of determining the initial contact point for partial fields and method of shaping a surface
JP2023085012A (ja) * 2021-12-08 2023-06-20 キヤノン株式会社 インプリント方法、および物品製造方法

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6932934B2 (en) 2002-07-11 2005-08-23 Molecular Imprints, Inc. Formation of discontinuous films during an imprint lithography process
US7077992B2 (en) 2002-07-11 2006-07-18 Molecular Imprints, Inc. Step and repeat imprint lithography processes
US7179396B2 (en) 2003-03-25 2007-02-20 Molecular Imprints, Inc. Positive tone bi-layer imprint lithography method
US7396475B2 (en) 2003-04-25 2008-07-08 Molecular Imprints, Inc. Method of forming stepped structures employing imprint lithography
US7878791B2 (en) * 2005-11-04 2011-02-01 Asml Netherlands B.V. Imprint lithography
US20070138699A1 (en) * 2005-12-21 2007-06-21 Asml Netherlands B.V. Imprint lithography
US8361371B2 (en) 2008-02-08 2013-01-29 Molecular Imprints, Inc. Extrusion reduction in imprint lithography
US8470188B2 (en) 2008-10-02 2013-06-25 Molecular Imprints, Inc. Nano-imprint lithography templates
US8432548B2 (en) * 2008-11-04 2013-04-30 Molecular Imprints, Inc. Alignment for edge field nano-imprinting
US20110031650A1 (en) * 2009-08-04 2011-02-10 Molecular Imprints, Inc. Adjacent Field Alignment
JP6306501B2 (ja) 2011-04-25 2018-04-04 キヤノン ナノテクノロジーズ，インコーポレーテッド テンプレートおよびテンプレートを基板と位置合わせするための方法
JP2013225616A (ja) * 2012-04-23 2013-10-31 Canon Inc インプリント方法、それを用いた物品の製造方法
JP6106949B2 (ja) * 2012-05-16 2017-04-05 大日本印刷株式会社 パターン形成方法
KR102305247B1 (ko) * 2013-12-31 2021-09-27 캐논 나노테크놀로지즈 인코퍼레이티드 국부 필드 임프린팅을 위한 비대칭 템플릿 형상 변조
JP2015133464A (ja) * 2014-01-10 2015-07-23 株式会社東芝 インプリント装置
JP6423641B2 (ja) * 2014-08-05 2018-11-14 キヤノン株式会社 インプリント装置、物品の製造方法及びインプリント方法
US10035296B2 (en) 2016-10-13 2018-07-31 Canon Kabushiki Kaisha Methods for controlling spread of imprint material

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