JP2018074109A - 発光ダイオードチップの製造方法及び発光ダイオードチップ - Google Patents
発光ダイオードチップの製造方法及び発光ダイオードチップ Download PDFInfo
- Publication number
- JP2018074109A JP2018074109A JP2016216395A JP2016216395A JP2018074109A JP 2018074109 A JP2018074109 A JP 2018074109A JP 2016216395 A JP2016216395 A JP 2016216395A JP 2016216395 A JP2016216395 A JP 2016216395A JP 2018074109 A JP2018074109 A JP 2018074109A
- Authority
- JP
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- Prior art keywords
- emitting diode
- wafer
- transparent substrate
- light emitting
- diode chip
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 13
- 238000000034 method Methods 0.000 title claims abstract description 10
- 239000000758 substrate Substances 0.000 claims abstract description 78
- 238000005520 cutting process Methods 0.000 claims abstract description 27
- 239000004065 semiconductor Substances 0.000 claims abstract description 8
- 239000013078 crystal Substances 0.000 claims abstract description 6
- 229910052594 sapphire Inorganic materials 0.000 claims description 11
- 239000010980 sapphire Substances 0.000 claims description 11
- 230000010354 integration Effects 0.000 claims description 7
- 239000005304 optical glass Substances 0.000 claims description 4
- 239000011347 resin Substances 0.000 claims description 4
- 229920005989 resin Polymers 0.000 claims description 4
- 239000000853 adhesive Substances 0.000 claims description 3
- 230000001070 adhesive effect Effects 0.000 claims description 3
- 239000000919 ceramic Substances 0.000 claims description 3
- 238000002360 preparation method Methods 0.000 claims description 3
- 238000005488 sandblasting Methods 0.000 claims description 3
- 238000005530 etching Methods 0.000 claims description 2
- 230000003287 optical effect Effects 0.000 description 9
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 5
- 229910002601 GaN Inorganic materials 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 239000000969 carrier Substances 0.000 description 2
- 230000011218 segmentation Effects 0.000 description 2
- FGRBYDKOBBBPOI-UHFFFAOYSA-N 10,10-dioxo-2-[4-(N-phenylanilino)phenyl]thioxanthen-9-one Chemical compound O=C1c2ccccc2S(=O)(=O)c2ccc(cc12)-c1ccc(cc1)N(c1ccccc1)c1ccccc1 FGRBYDKOBBBPOI-UHFFFAOYSA-N 0.000 description 1
- 238000002679 ablation Methods 0.000 description 1
- 239000006061 abrasive grain Substances 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 239000002173 cutting fluid Substances 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000005323 electroforming Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 208000024891 symptom Diseases 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/005—Processes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/005—Processes
- H01L33/0095—Post-treatment of devices, e.g. annealing, recrystallisation or short-circuit elimination
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/20—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular shape, e.g. curved or truncated substrate
- H01L33/22—Roughened surfaces, e.g. at the interface between epitaxial layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/44—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the coatings, e.g. passivation layer or anti-reflective coating
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Led Devices (AREA)
- Dicing (AREA)
- Led Device Packages (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016216395A JP2018074109A (ja) | 2016-11-04 | 2016-11-04 | 発光ダイオードチップの製造方法及び発光ダイオードチップ |
TW106133663A TWI732047B (zh) | 2016-11-04 | 2017-09-29 | 發光二極體晶片的製造方法及發光二極體晶片 |
CN201711005663.2A CN108022999A (zh) | 2016-11-04 | 2017-10-25 | 发光二极管芯片的制造方法和发光二极管芯片 |
KR1020170144549A KR102327105B1 (ko) | 2016-11-04 | 2017-11-01 | 발광 다이오드 칩의 제조 방법 및 발광 다이오드 칩 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016216395A JP2018074109A (ja) | 2016-11-04 | 2016-11-04 | 発光ダイオードチップの製造方法及び発光ダイオードチップ |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2018074109A true JP2018074109A (ja) | 2018-05-10 |
Family
ID=62079569
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2016216395A Pending JP2018074109A (ja) | 2016-11-04 | 2016-11-04 | 発光ダイオードチップの製造方法及び発光ダイオードチップ |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP2018074109A (ko) |
KR (1) | KR102327105B1 (ko) |
CN (1) | CN108022999A (ko) |
TW (1) | TWI732047B (ko) |
Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005093728A (ja) * | 2003-09-17 | 2005-04-07 | Toyoda Gosei Co Ltd | 発光装置 |
JP2006278751A (ja) * | 2005-03-29 | 2006-10-12 | Mitsubishi Cable Ind Ltd | GaN系半導体発光素子 |
JP2007266472A (ja) * | 2006-03-29 | 2007-10-11 | Stanley Electric Co Ltd | 窒化物半導体ウエハないし窒化物半導体装置及びその製造方法 |
JP2011009305A (ja) * | 2009-06-23 | 2011-01-13 | Koito Mfg Co Ltd | 発光モジュール |
US20140159090A1 (en) * | 2012-12-07 | 2014-06-12 | Epistar Corporation | light emitting device |
JP2014517544A (ja) * | 2011-06-15 | 2014-07-17 | センサー エレクトロニック テクノロジー インコーポレイテッド | 大型の逆さ光取り出し構造付の装置 |
JP2014239123A (ja) * | 2013-06-06 | 2014-12-18 | 株式会社ディスコ | 加工方法 |
JP2015192100A (ja) * | 2014-03-28 | 2015-11-02 | 豊田合成株式会社 | 発光素子および発光素子の製造方法 |
JP2016076685A (ja) * | 2014-10-08 | 2016-05-12 | 株式会社東芝 | 半導体発光装置及びその製造方法 |
JP2016521463A (ja) * | 2013-05-15 | 2016-07-21 | コーニンクレッカ フィリップス エヌ ヴェKoninklijke Philips N.V. | 基板内に散乱機構を有するled |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100959079B1 (ko) * | 2005-06-27 | 2010-05-20 | 한빔 주식회사 | 열방출이 개선된 전면발광형 발광다이오드 소자 및 이의 제조방법 |
KR101726807B1 (ko) * | 2010-11-01 | 2017-04-14 | 삼성전자주식회사 | 반도체 발광소자 |
JP2014175362A (ja) * | 2013-03-06 | 2014-09-22 | Toshiba Corp | 半導体発光素子及びその製造方法 |
JP2014175354A (ja) | 2013-03-06 | 2014-09-22 | Disco Abrasive Syst Ltd | 発光ダイオード |
KR101426433B1 (ko) | 2013-04-30 | 2014-08-06 | 주식회사 세미콘라이트 | 반도체 발광소자를 제조하는 방법 |
JP6255235B2 (ja) * | 2013-12-20 | 2017-12-27 | 株式会社ディスコ | 発光チップ |
EP2944620A1 (en) * | 2013-12-26 | 2015-11-18 | Shin-Etsu Quartz Products Co., Ltd. | Silica glass member for wavelength conversion, and production method therefor |
JP6255255B2 (ja) * | 2014-01-27 | 2017-12-27 | 株式会社ディスコ | 光デバイスの加工方法 |
-
2016
- 2016-11-04 JP JP2016216395A patent/JP2018074109A/ja active Pending
-
2017
- 2017-09-29 TW TW106133663A patent/TWI732047B/zh active
- 2017-10-25 CN CN201711005663.2A patent/CN108022999A/zh active Pending
- 2017-11-01 KR KR1020170144549A patent/KR102327105B1/ko active IP Right Grant
Patent Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005093728A (ja) * | 2003-09-17 | 2005-04-07 | Toyoda Gosei Co Ltd | 発光装置 |
JP2006278751A (ja) * | 2005-03-29 | 2006-10-12 | Mitsubishi Cable Ind Ltd | GaN系半導体発光素子 |
JP2007266472A (ja) * | 2006-03-29 | 2007-10-11 | Stanley Electric Co Ltd | 窒化物半導体ウエハないし窒化物半導体装置及びその製造方法 |
JP2011009305A (ja) * | 2009-06-23 | 2011-01-13 | Koito Mfg Co Ltd | 発光モジュール |
JP2014517544A (ja) * | 2011-06-15 | 2014-07-17 | センサー エレクトロニック テクノロジー インコーポレイテッド | 大型の逆さ光取り出し構造付の装置 |
US20140159090A1 (en) * | 2012-12-07 | 2014-06-12 | Epistar Corporation | light emitting device |
JP2016521463A (ja) * | 2013-05-15 | 2016-07-21 | コーニンクレッカ フィリップス エヌ ヴェKoninklijke Philips N.V. | 基板内に散乱機構を有するled |
JP2014239123A (ja) * | 2013-06-06 | 2014-12-18 | 株式会社ディスコ | 加工方法 |
JP2015192100A (ja) * | 2014-03-28 | 2015-11-02 | 豊田合成株式会社 | 発光素子および発光素子の製造方法 |
JP2016076685A (ja) * | 2014-10-08 | 2016-05-12 | 株式会社東芝 | 半導体発光装置及びその製造方法 |
Non-Patent Citations (1)
Title |
---|
LIANG-JYI YAN ET AL.: ""Improved Light Extraction Efficiency in AlGaInP Light-Emitting Diodes by Applying a Periodic Textur", IEEE PHOTONICS TECHNOLOGY LETTERS, vol. 20, no. 20, JPN6020033600, 15 October 2008 (2008-10-15), pages 1724 - 1726, XP011235288, ISSN: 0004342013, DOI: 10.1109/LPT.2008.2004564 * |
Also Published As
Publication number | Publication date |
---|---|
KR102327105B1 (ko) | 2021-11-15 |
KR20180050230A (ko) | 2018-05-14 |
CN108022999A (zh) | 2018-05-11 |
TWI732047B (zh) | 2021-07-01 |
TW201830723A (zh) | 2018-08-16 |
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