JP2018041110A5 - - Google Patents

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Publication number
JP2018041110A5
JP2018041110A5 JP2017237953A JP2017237953A JP2018041110A5 JP 2018041110 A5 JP2018041110 A5 JP 2018041110A5 JP 2017237953 A JP2017237953 A JP 2017237953A JP 2017237953 A JP2017237953 A JP 2017237953A JP 2018041110 A5 JP2018041110 A5 JP 2018041110A5
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Japan
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droplet
frequency
pair
laser
waveform
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JP2017237953A
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Japanese (ja)
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JP2018041110A (ja
JP6557716B2 (ja
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Priority claimed from US12/721,317 external-priority patent/US8158960B2/en
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JP2017237953A 2010-03-10 2017-12-12 レーザ生成プラズマｅｕｖ光源 Active JP6557716B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US12/721,317 US8158960B2 (en) 2007-07-13 2010-03-10 Laser produced plasma EUV light source
US12/721,317 2010-03-10

Related Parent Applications (1)

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JP2012557036A Division JP6403362B2 (ja) 2010-03-10 2011-03-01 レーザ生成プラズマｅｕｖ光源

Publications (3)

Publication Number Publication Date
JP2018041110A JP2018041110A (ja) 2018-03-15
JP2018041110A5 true JP2018041110A5 (enExample) 2019-03-14
JP6557716B2 JP6557716B2 (ja) 2019-08-07

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JP2012557036A Active JP6403362B2 (ja) 2010-03-10 2011-03-01 レーザ生成プラズマｅｕｖ光源
JP2017237953A Active JP6557716B2 (ja) 2010-03-10 2017-12-12 レーザ生成プラズマｅｕｖ光源

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JP2012557036A Active JP6403362B2 (ja) 2010-03-10 2011-03-01 レーザ生成プラズマｅｕｖ光源

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US (1) US8158960B2 (enExample)
EP (1) EP2544766B1 (enExample)
JP (2) JP6403362B2 (enExample)
KR (2) KR20130006650A (enExample)
CN (1) CN102791331B (enExample)
TW (1) TWI479955B (enExample)
WO (1) WO2011112235A1 (enExample)

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KR102746923B1 (ko) * 2018-03-28 2024-12-24 에이에스엠엘 네델란즈 비.브이. 액적 생성기 성능을 모니터링 및 제어하는 장치 및 방법
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