JP2018040349A5 - - Google Patents

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Publication number
JP2018040349A5
JP2018040349A5 JP2017156616A JP2017156616A JP2018040349A5 JP 2018040349 A5 JP2018040349 A5 JP 2018040349A5 JP 2017156616 A JP2017156616 A JP 2017156616A JP 2017156616 A JP2017156616 A JP 2017156616A JP 2018040349 A5 JP2018040349 A5 JP 2018040349A5
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JP
Japan
Prior art keywords
process fluid
bladder
nozzle
elongated
chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2017156616A
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English (en)
Japanese (ja)
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JP2018040349A (ja
JP7038505B2 (ja
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Publication of JP2018040349A publication Critical patent/JP2018040349A/ja
Publication of JP2018040349A5 publication Critical patent/JP2018040349A5/ja
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Publication of JP7038505B2 publication Critical patent/JP7038505B2/ja
Active legal-status Critical Current
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JP2017156616A 2016-08-11 2017-08-14 高純度分配システム Active JP7038505B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201662373729P 2016-08-11 2016-08-11
US62/373,729 2016-08-11

Publications (3)

Publication Number Publication Date
JP2018040349A JP2018040349A (ja) 2018-03-15
JP2018040349A5 true JP2018040349A5 (enExample) 2020-04-30
JP7038505B2 JP7038505B2 (ja) 2022-03-18

Family

ID=61159327

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2017156616A Active JP7038505B2 (ja) 2016-08-11 2017-08-14 高純度分配システム

Country Status (5)

Country Link
US (1) US10403501B2 (enExample)
JP (1) JP7038505B2 (enExample)
KR (2) KR102462049B1 (enExample)
CN (1) CN107728432A (enExample)
TW (1) TWI723204B (enExample)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9987655B2 (en) * 2015-06-26 2018-06-05 Tokyo Electron Limited Inline dispense capacitor system
WO2018031896A1 (en) 2016-08-12 2018-02-15 Inpria Corporation Methods of reducing metal residue in edge bead region from metal-containing resists
US10682663B2 (en) * 2018-10-31 2020-06-16 The Boeing Company Methods for dispensing flowable materials
US11383211B2 (en) * 2019-04-29 2022-07-12 Tokyo Electron Limited Point-of-use dynamic concentration delivery system with high flow and high uniformity
KR102768474B1 (ko) * 2019-07-29 2025-02-17 엑스티피엘 에스.에이. 노즐로부터 기재 상으로 금속 나노입자 조성물을 분배하는 방법
AU2020405535A1 (en) * 2019-12-17 2022-08-11 Johnson & Johnson Surgical Vision, Inc. Rotary valve configuration for a surgical cassette
US11666932B2 (en) 2020-03-27 2023-06-06 Wagner Spray Tech Corporation Fluid applicator
JP7603311B2 (ja) * 2020-05-08 2024-12-20 兵神装備株式会社 流動物吐出システム
CN114054287A (zh) * 2020-07-30 2022-02-18 中国科学院微电子研究所 光刻胶回吸装置、光刻胶涂布设备及光刻胶涂布方法
US12216400B2 (en) 2021-01-22 2025-02-04 Tokyo Electron Limited Directed self-assembly
US12533771B2 (en) * 2021-10-21 2026-01-27 Applied Materials, Inc. Polishing slurry dispense nozzle
CN114311949B (zh) * 2022-01-17 2022-08-16 浙江华基环保科技有限公司 一种钢铁厂抗氧化防静电针刺毡的生产方法
TWI792883B (zh) * 2022-01-24 2023-02-11 高科晶捷自動化股份有限公司 塗佈裝置的流體控制結構
KR20240102710A (ko) 2022-12-26 2024-07-03 삼성전자주식회사 포토레지스트 코팅 장치

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JP4824792B2 (ja) * 2009-07-02 2011-11-30 東京エレクトロン株式会社 塗布装置
JP5416672B2 (ja) * 2010-09-28 2014-02-12 株式会社コガネイ 薬液供給装置
JP5672204B2 (ja) * 2011-09-13 2015-02-18 東京エレクトロン株式会社 液処理装置、液処理方法及び記憶媒体
EP2662137A1 (en) * 2012-05-08 2013-11-13 Roche Diagniostics GmbH Dispensing assembly
US9718082B2 (en) * 2014-01-26 2017-08-01 Tokyo Electron Limited Inline dispense capacitor
CN106463357B (zh) * 2014-05-15 2019-06-28 东京毅力科创株式会社 增加光致抗蚀剂分配系统中再循环和过滤的方法和设备
JP6420604B2 (ja) * 2014-09-22 2018-11-07 株式会社Ｓｃｒｅｅｎホールディングス 塗布装置
US9987655B2 (en) * 2015-06-26 2018-06-05 Tokyo Electron Limited Inline dispense capacitor system

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