JP2017526007A5 - - Google Patents
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- Publication number
- JP2017526007A5 JP2017526007A5 JP2017508479A JP2017508479A JP2017526007A5 JP 2017526007 A5 JP2017526007 A5 JP 2017526007A5 JP 2017508479 A JP2017508479 A JP 2017508479A JP 2017508479 A JP2017508479 A JP 2017508479A JP 2017526007 A5 JP2017526007 A5 JP 2017526007A5
- Authority
- JP
- Japan
- Prior art keywords
- optical element
- channel
- layer system
- defect
- reflective
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 230000007547 defect Effects 0.000 claims 22
- 230000003287 optical effect Effects 0.000 claims 20
- 239000010410 layer Substances 0.000 claims 17
- 238000000034 method Methods 0.000 claims 10
- 239000000758 substrate Substances 0.000 claims 5
- 239000002071 nanotube Substances 0.000 claims 4
- 230000008021 deposition Effects 0.000 claims 3
- 238000009792 diffusion process Methods 0.000 claims 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 2
- 239000002041 carbon nanotube Substances 0.000 claims 2
- 229910021393 carbon nanotube Inorganic materials 0.000 claims 2
- 239000011248 coating agent Substances 0.000 claims 2
- 238000000576 coating method Methods 0.000 claims 2
- 238000005286 illumination Methods 0.000 claims 2
- 239000006096 absorbing agent Substances 0.000 claims 1
- 238000005530 etching Methods 0.000 claims 1
- 238000010884 ion-beam technique Methods 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 239000011241 protective layer Substances 0.000 claims 1
- 230000003595 spectral effect Effects 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102014216240.8A DE102014216240A1 (de) | 2014-08-15 | 2014-08-15 | Reflektives optisches Element |
| DE102014216240.8 | 2014-08-15 | ||
| PCT/EP2015/068306 WO2016023840A1 (de) | 2014-08-15 | 2015-08-07 | Reflektives optisches element |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2017526007A JP2017526007A (ja) | 2017-09-07 |
| JP2017526007A5 true JP2017526007A5 (enExample) | 2018-09-20 |
| JP6722655B2 JP6722655B2 (ja) | 2020-07-15 |
Family
ID=54011694
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017508479A Active JP6722655B2 (ja) | 2014-08-15 | 2015-08-07 | 反射光学素子 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US10061205B2 (enExample) |
| JP (1) | JP6722655B2 (enExample) |
| DE (1) | DE102014216240A1 (enExample) |
| WO (1) | WO2016023840A1 (enExample) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2017084872A1 (en) * | 2015-11-19 | 2017-05-26 | Asml Netherlands B.V. | Euv source chamber and gas flow regime for lithographic apparatus, multi-layer mirror and lithographic apparatus |
| DE102015225509A1 (de) | 2015-12-16 | 2017-06-22 | Carl Zeiss Smt Gmbh | Reflektives optisches Element |
| DE102016213831A1 (de) | 2016-07-27 | 2018-02-01 | Carl Zeiss Smt Gmbh | Reflektives optisches Element für die EUV-Lithographie |
| DE102016213839A1 (de) | 2016-07-27 | 2016-12-15 | Carl Zeiss Smt Gmbh | Spiegel für ein mikrolithographisches Projektionsbelichtungssystem und Verfahren zur Bearbeitung eines Spiegels |
| DE102016224200A1 (de) | 2016-12-06 | 2018-06-07 | Carl Zeiss Smt Gmbh | Verfahren zum Reparieren von reflektiven optischen Elementen für die EUV-Lithographie |
| DE102016226202A1 (de) | 2016-12-23 | 2018-06-28 | Carl Zeiss Smt Gmbh | Optisches Element, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage |
| DE102017200667A1 (de) | 2017-01-17 | 2018-07-19 | Carl Zeiss Smt Gmbh | Spiegel, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage oder ein Inspektionssystem |
| DE102017206256A1 (de) | 2017-04-11 | 2018-10-11 | Carl Zeiss Smt Gmbh | Wellenfrontkorrekturelement zur Verwendung in einem optischen System |
| DE102017211824A1 (de) | 2017-07-11 | 2017-09-21 | Carl Zeiss Smt Gmbh | Spiegel, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage |
| DE102017213178A1 (de) | 2017-07-31 | 2018-06-21 | Carl Zeiss Smt Gmbh | Spiegel, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage |
| DE102018211498A1 (de) * | 2018-07-11 | 2019-08-01 | Carl Zeiss Smt Gmbh | Optische Anordnung |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1499683A (en) * | 1974-06-20 | 1978-02-01 | Westinghouse Electric Corp | High power laser mirror |
| EP1624467A3 (en) * | 2003-10-20 | 2007-05-30 | ASML Netherlands BV | Lithographic apparatus and device manufacturing method |
| JP4025316B2 (ja) * | 2004-06-09 | 2007-12-19 | 株式会社東芝 | 半導体装置の製造方法 |
| US7332416B2 (en) * | 2005-03-28 | 2008-02-19 | Intel Corporation | Methods to manufacture contaminant-gettering materials in the surface of EUV optics |
| DE102006008784A1 (de) * | 2006-02-24 | 2007-09-06 | Rodenstock Gmbh | Kratzfeste entspiegelte Oberfläche mit Antifog-Eigenschaften |
| WO2008148516A2 (en) | 2007-06-06 | 2008-12-11 | Carl Zeiss Smt Ag | Reflective optical element and method for operating an euv lithography device |
| KR20090105747A (ko) * | 2008-04-03 | 2009-10-07 | 삼성전자주식회사 | 광주사장치 및 이를 채용한 화상형성장치 |
| JP5061069B2 (ja) * | 2008-05-20 | 2012-10-31 | ギガフォトン株式会社 | 極端紫外光を用いる半導体露光装置 |
| IT1400159B1 (it) * | 2010-03-15 | 2013-05-17 | St Microelectronics Srl | Metodo di fotolitografia ad elevata risoluzione per la realizzazione di nanostrutture, in particolare nella fabbricazione di dispositivi elettronici integrati |
| JP5886279B2 (ja) * | 2010-06-25 | 2016-03-16 | エーエスエムエル ネザーランズ ビー．ブイ． | リソグラフィ装置およびリソグラフィ方法 |
| DE102011076011A1 (de) * | 2011-05-18 | 2012-11-22 | Carl Zeiss Smt Gmbh | Reflektives optisches Element und optisches System für die EUV-Lithographie |
| JP6253641B2 (ja) * | 2012-05-21 | 2017-12-27 | エーエスエムエル ネザーランズ ビー．ブイ． | リフレクタ、ペリクル、リソグラフィマスク、膜、スペクトル純度フィルタ、および、装置 |
| US9335206B2 (en) * | 2012-08-30 | 2016-05-10 | Kla-Tencor Corporation | Wave front aberration metrology of optics of EUV mask inspection system |
-
2014
- 2014-08-15 DE DE102014216240.8A patent/DE102014216240A1/de not_active Ceased
-
2015
- 2015-08-07 WO PCT/EP2015/068306 patent/WO2016023840A1/de not_active Ceased
- 2015-08-07 JP JP2017508479A patent/JP6722655B2/ja active Active
-
2017
- 2017-02-15 US US15/433,708 patent/US10061205B2/en active Active
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