JP2017524946A5 - - Google Patents
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- JP2017524946A5 JP2017524946A5 JP2017512438A JP2017512438A JP2017524946A5 JP 2017524946 A5 JP2017524946 A5 JP 2017524946A5 JP 2017512438 A JP2017512438 A JP 2017512438A JP 2017512438 A JP2017512438 A JP 2017512438A JP 2017524946 A5 JP2017524946 A5 JP 2017524946A5
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- JP
- Japan
- Prior art keywords
- function
- optical
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- matrix
- forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 230000003287 optical effect Effects 0.000 claims 31
- 238000000034 method Methods 0.000 claims 26
- 239000011159 matrix material Substances 0.000 claims 18
- 238000005259 measurement Methods 0.000 claims 11
- 230000004075 alteration Effects 0.000 claims 10
- 230000007704 transition Effects 0.000 claims 7
- 230000005855 radiation Effects 0.000 claims 5
- 230000000295 complement effect Effects 0.000 claims 3
- 238000003384 imaging method Methods 0.000 claims 3
- 238000011156 evaluation Methods 0.000 claims 2
- 230000015572 biosynthetic process Effects 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102014209348.1 | 2014-05-16 | ||
| DE102014209348.1A DE102014209348A1 (de) | 2014-05-16 | 2014-05-16 | Ermittlung einer korrigierten Größe |
| PCT/EP2015/060770 WO2015173397A1 (de) | 2014-05-16 | 2015-05-15 | Ermittlung einer korrigierten grösse |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2017524946A JP2017524946A (ja) | 2017-08-31 |
| JP2017524946A5 true JP2017524946A5 (enExample) | 2018-06-28 |
| JP6751079B2 JP6751079B2 (ja) | 2020-09-02 |
Family
ID=53276840
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017512438A Active JP6751079B2 (ja) | 2014-05-16 | 2015-05-15 | 補正光学変数を求める方法及び装置 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US9841685B2 (enExample) |
| JP (1) | JP6751079B2 (enExample) |
| DE (1) | DE102014209348A1 (enExample) |
| WO (1) | WO2015173397A1 (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP3570110A1 (en) | 2018-05-16 | 2019-11-20 | ASML Netherlands B.V. | Estimating a parameter of a substrate |
| EP3696605A1 (en) * | 2019-02-13 | 2020-08-19 | ASML Netherlands B.V. | Method and lithograph apparatus for measuring a radiation beam |
| CN116710847A (zh) * | 2021-01-19 | 2023-09-05 | 卡尔蔡司Smt有限责任公司 | 设置投射曝光系统的方法、投射曝光方法以及用于微光刻的投射曝光系统 |
| US11609506B2 (en) * | 2021-04-21 | 2023-03-21 | Kla Corporation | System and method for lateral shearing interferometry in an inspection tool |
| DE102023120807A1 (de) * | 2023-08-04 | 2025-02-06 | Asml Netherlands B.V. | Verfahren und System zur Bestimmung feldabhängiger Aberrationen |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW550377B (en) * | 2000-02-23 | 2003-09-01 | Zeiss Stiftung | Apparatus for wave-front detection |
| US7088458B1 (en) * | 2002-12-23 | 2006-08-08 | Carl Zeiss Smt Ag | Apparatus and method for measuring an optical imaging system, and detector unit |
| JP4753009B2 (ja) * | 2005-05-24 | 2011-08-17 | 株式会社ニコン | 計測方法、露光方法、及び露光装置 |
| US7580113B2 (en) * | 2006-06-23 | 2009-08-25 | Asml Netherlands B.V. | Method of reducing a wave front aberration, and computer program product |
| JP2008186912A (ja) * | 2007-01-29 | 2008-08-14 | Nikon Corp | 収差評価方法、調整方法、露光装置、露光方法、およびデバイス製造方法 |
| JP5503193B2 (ja) * | 2009-06-08 | 2014-05-28 | キヤノン株式会社 | 波面収差の測定装置、露光装置及びデバイス製造方法 |
| DE102009038558A1 (de) * | 2009-08-24 | 2011-03-10 | Carl Zeiss Sms Gmbh | Verfahren zur Emulation eines fotolithographischen Prozesses und Maskeninspektionsmikroskop zur Durchführung des Verfahrens |
| KR101336399B1 (ko) * | 2009-11-19 | 2013-12-04 | 캐논 가부시끼가이샤 | 계측 장치, 가공 방법 및 컴퓨터 판독가능한 저장 매체 |
| DE102010062763A1 (de) * | 2010-12-09 | 2012-06-14 | Carl Zeiss Smt Gmbh | Verfahren zum Vermessen eines optischen Systems |
| KR101529807B1 (ko) * | 2011-01-20 | 2015-06-17 | 칼 짜이스 에스엠티 게엠베하 | 투영 노광 도구를 조작하는 방법 |
| WO2013078638A1 (zh) * | 2011-11-30 | 2013-06-06 | 中国科学院长春光学精密机械与物理研究所 | 检测光刻机投影物镜系统的波像差的装置及方法 |
| DE102012202057B4 (de) * | 2012-02-10 | 2021-07-08 | Carl Zeiss Smt Gmbh | Projektionsobjektiv für EUV-Mikrolithographie, Folienelement und Verfahren zur Herstellung eines Projektionsobjektivs mit Folienelement |
| DE102012111008B4 (de) * | 2012-11-15 | 2014-05-22 | Precitec Optronik Gmbh | Optisches Messverfahren und optische Messvorrichtung zum Erfassen einer Oberflächentopographie |
| DE102013218991A1 (de) * | 2013-09-20 | 2015-03-26 | Carl Zeiss Smt Gmbh | Vorrichtung zum Bestimmen einer optischen Eigenschaft eines optischen Abbildungssystems |
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2014
- 2014-05-16 DE DE102014209348.1A patent/DE102014209348A1/de not_active Ceased
-
2015
- 2015-05-15 WO PCT/EP2015/060770 patent/WO2015173397A1/de not_active Ceased
- 2015-05-15 JP JP2017512438A patent/JP6751079B2/ja active Active
-
2016
- 2016-11-16 US US15/353,406 patent/US9841685B2/en active Active