JP2017523585A5 - - Google Patents
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- Publication number
- JP2017523585A5 JP2017523585A5 JP2017515674A JP2017515674A JP2017523585A5 JP 2017523585 A5 JP2017523585 A5 JP 2017523585A5 JP 2017515674 A JP2017515674 A JP 2017515674A JP 2017515674 A JP2017515674 A JP 2017515674A JP 2017523585 A5 JP2017523585 A5 JP 2017523585A5
- Authority
- JP
- Japan
- Prior art keywords
- dielectric tube
- coil
- coupled
- terminals
- conduit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000008878 coupling Effects 0.000 claims description 6
- 238000010168 coupling process Methods 0.000 claims description 6
- 238000005859 coupling reaction Methods 0.000 claims description 6
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 2
- 239000010453 quartz Substances 0.000 claims description 2
- 229910052594 sapphire Inorganic materials 0.000 claims description 2
- 239000010980 sapphire Substances 0.000 claims description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 2
- 238000000034 method Methods 0.000 claims 6
- 239000000758 substrate Substances 0.000 claims 6
- 239000002826 coolant Substances 0.000 claims 4
- 239000004519 grease Substances 0.000 claims 1
- 229920002379 silicone rubber Polymers 0.000 claims 1
- 239000004945 silicone rubber Substances 0.000 claims 1
- 239000003989 dielectric material Substances 0.000 description 2
- 238000009616 inductively coupled plasma Methods 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000000116 mitigating effect Effects 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201462004857P | 2014-05-29 | 2014-05-29 | |
| US62/004,857 | 2014-05-29 | ||
| US14/445,965 | 2014-07-29 | ||
| US14/445,965 US9378928B2 (en) | 2014-05-29 | 2014-07-29 | Apparatus for treating a gas in a conduit |
| PCT/US2015/029068 WO2015183479A1 (en) | 2014-05-29 | 2015-05-04 | Apparatus for treating a gas in a conduit |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2017523585A JP2017523585A (ja) | 2017-08-17 |
| JP2017523585A5 true JP2017523585A5 (enExample) | 2018-06-14 |
| JP6641359B2 JP6641359B2 (ja) | 2020-02-05 |
Family
ID=54699525
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017515674A Active JP6641359B2 (ja) | 2014-05-29 | 2015-05-04 | 導管内でガスを処置するための装置 |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US9378928B2 (enExample) |
| JP (1) | JP6641359B2 (enExample) |
| KR (1) | KR101805612B1 (enExample) |
| CN (1) | CN106414800B (enExample) |
| TW (1) | TWI607577B (enExample) |
| WO (1) | WO2015183479A1 (enExample) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10187966B2 (en) * | 2015-07-24 | 2019-01-22 | Applied Materials, Inc. | Method and apparatus for gas abatement |
| US10435787B2 (en) | 2016-11-14 | 2019-10-08 | Applied Materials, Inc. | Hydrogen partial pressure control in a vacuum process chamber |
| US10777394B2 (en) | 2016-12-09 | 2020-09-15 | Applied Materials, Inc. | Virtual sensor for chamber cleaning endpoint |
| JP7042142B2 (ja) * | 2018-03-30 | 2022-03-25 | 株式会社ダイヘン | プラズマ発生装置 |
| JP7042143B2 (ja) * | 2018-03-30 | 2022-03-25 | 株式会社ダイヘン | プラズマ発生装置 |
| KR102571335B1 (ko) * | 2020-02-19 | 2023-08-30 | 인투코어테크놀로지 주식회사 | 안테나 구조체 및 이를 이용한 플라즈마 발생 장치 |
| TWI816087B (zh) | 2020-02-19 | 2023-09-21 | 南韓商源多可股份有限公司 | 天線結構 |
| CN116034496A (zh) | 2020-06-25 | 2023-04-28 | 6K有限公司 | 微观复合合金结构 |
| JP2024504091A (ja) | 2021-01-11 | 2024-01-30 | シックスケー インコーポレイテッド | マイクロ波プラズマ処理を用いたＬｉイオンカソード物質の再生利用のための方法及びシステム |
| AU2022246797A1 (en) | 2021-03-31 | 2023-10-05 | 6K Inc. | Systems and methods for additive manufacturing of metal nitride ceramics |
| WO2023229928A1 (en) | 2022-05-23 | 2023-11-30 | 6K Inc. | Microwave plasma apparatus and methods for processing materials using an interior liner |
| US12040162B2 (en) | 2022-06-09 | 2024-07-16 | 6K Inc. | Plasma apparatus and methods for processing feed material utilizing an upstream swirl module and composite gas flows |
| WO2024044498A1 (en) * | 2022-08-25 | 2024-02-29 | 6K Inc. | Plasma apparatus and methods for processing feed material utilizing a powder ingress preventor (pip) |
| US12195338B2 (en) | 2022-12-15 | 2025-01-14 | 6K Inc. | Systems, methods, and device for pyrolysis of methane in a microwave plasma for hydrogen and structured carbon powder production |
Family Cites Families (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3875068A (en) | 1973-02-20 | 1975-04-01 | Tegal Corp | Gaseous plasma reaction apparatus |
| US4362632A (en) | 1974-08-02 | 1982-12-07 | Lfe Corporation | Gas discharge apparatus |
| US4278450A (en) | 1979-10-09 | 1981-07-14 | Georgia Tech Research Institute | Method for the recovery of clean pyrolysis off-gas and a rotary recycling means therefor |
| JPS6482521A (en) * | 1987-09-25 | 1989-03-28 | Toshiba Corp | High-frequency coil |
| TW347547B (en) * | 1994-05-17 | 1998-12-11 | Toshiba Light Technic Kk | Discharge lamp and illumination apparatus using the same |
| JP3349369B2 (ja) * | 1996-11-11 | 2002-11-25 | 三菱重工業株式会社 | ストリーマ放電排ガス処理装置及び方法 |
| US6657173B2 (en) * | 1998-04-21 | 2003-12-02 | State Board Of Higher Education On Behalf Of Oregon State University | Variable frequency automated capacitive radio frequency (RF) dielectric heating system |
| US7175054B2 (en) * | 1998-12-23 | 2007-02-13 | S.I.P. Technologies, Llc | Method and apparatus for disinfecting a refrigerated water cooler reservoir |
| JP3709432B2 (ja) * | 1999-04-30 | 2005-10-26 | アプライド マテリアルズ インコーポレイテッド | 排ガス処理装置及び基板処理装置 |
| US6287643B1 (en) * | 1999-09-30 | 2001-09-11 | Novellus Systems, Inc. | Apparatus and method for injecting and modifying gas concentration of a meta-stable or atomic species in a downstream plasma reactor |
| JP2002210330A (ja) | 2001-01-19 | 2002-07-30 | Pearl Kogyo Kk | 半導体プロセス用排ガス処理装置 |
| JP4567979B2 (ja) * | 2004-01-15 | 2010-10-27 | キヤノンアネルバ株式会社 | プラズマ処理システム及びプラズマ処理方法 |
| US20060081185A1 (en) * | 2004-10-15 | 2006-04-20 | Justin Mauck | Thermal management of dielectric components in a plasma discharge device |
| ITMI20050585A1 (it) * | 2005-04-07 | 2006-10-08 | Francesco Cino Matacotta | Apparato e processo per la generazione accelerazione e propagazione di fasci di elettroni e plasma |
| DE102006012100B3 (de) * | 2006-03-16 | 2007-09-20 | Maschinenfabrik Reinhausen Gmbh | Vorrichtung zur Erzeugung eines Plasma-Jets |
| US20080156264A1 (en) * | 2006-12-27 | 2008-07-03 | Novellus Systems, Inc. | Plasma Generator Apparatus |
| JP4950763B2 (ja) * | 2007-05-25 | 2012-06-13 | 大陽日酸株式会社 | プラズマ生成装置 |
| JP4952472B2 (ja) * | 2007-09-20 | 2012-06-13 | ウシオ電機株式会社 | エキシマランプおよびエキシマランプの製造方法 |
| US9591738B2 (en) * | 2008-04-03 | 2017-03-07 | Novellus Systems, Inc. | Plasma generator systems and methods of forming plasma |
| JP5099101B2 (ja) * | 2009-01-23 | 2012-12-12 | 東京エレクトロン株式会社 | プラズマ処理装置 |
| US8475673B2 (en) | 2009-04-24 | 2013-07-02 | Lam Research Company | Method and apparatus for high aspect ratio dielectric etch |
| US8604697B2 (en) * | 2009-12-09 | 2013-12-10 | Jehara Corporation | Apparatus for generating plasma |
| US9867238B2 (en) | 2012-04-26 | 2018-01-09 | Applied Materials, Inc. | Apparatus for treating an exhaust gas in a foreline |
-
2014
- 2014-07-29 US US14/445,965 patent/US9378928B2/en active Active
-
2015
- 2015-05-04 JP JP2017515674A patent/JP6641359B2/ja active Active
- 2015-05-04 KR KR1020167036786A patent/KR101805612B1/ko active Active
- 2015-05-04 CN CN201580026860.5A patent/CN106414800B/zh active Active
- 2015-05-04 WO PCT/US2015/029068 patent/WO2015183479A1/en not_active Ceased
- 2015-05-21 TW TW104116295A patent/TWI607577B/zh active
-
2016
- 2016-06-21 US US15/188,504 patent/US9767990B2/en active Active
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