CN106414800B - 用于处理管道中的气体的设备 - Google Patents

用于处理管道中的气体的设备 Download PDF

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Publication number
CN106414800B
CN106414800B CN201580026860.5A CN201580026860A CN106414800B CN 106414800 B CN106414800 B CN 106414800B CN 201580026860 A CN201580026860 A CN 201580026860A CN 106414800 B CN106414800 B CN 106414800B
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Prior art keywords
coil
dielectric tube
coupled
gas
endpoints
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CN201580026860.5A
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Chinese (zh)
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CN106414800A (zh
Inventor
曾继兵
布赖恩·T·韦斯特
王荣平
诺吉·A·贾金德拉
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Applied Materials Inc
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Applied Materials Inc
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H01J37/3211—Antennas, e.g. particular shapes of coils
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H01J37/32467—Material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H01J37/32522—Temperature
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32568—Relative arrangement or disposition of electrodes; moving means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32807—Construction (includes replacing parts of the apparatus)
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32816—Pressure
    • H01J37/32834—Exhausting
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32816—Pressure
    • H01J37/32834—Exhausting
    • H01J37/32844—Treating effluent gases
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H05H1/2443—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the plasma fluid flowing through a dielectric tube
    • H05H1/2465—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the plasma fluid flowing through a dielectric tube the plasma being activated by inductive coupling, e.g. using coiled electrodes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/30—Plasma torches using applied electromagnetic fields, e.g. high frequency or microwave energy
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02C—CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
    • Y02C20/00—Capture or disposal of greenhouse gases
    • Y02C20/30—Capture or disposal of greenhouse gases of perfluorocarbons [PFC], hydrofluorocarbons [HFC] or sulfur hexafluoride [SF6]

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Electromagnetism (AREA)
  • Fluid Mechanics (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
  • Drying Of Semiconductors (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
CN201580026860.5A 2014-05-29 2015-05-04 用于处理管道中的气体的设备 Active CN106414800B (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201462004857P 2014-05-29 2014-05-29
US62/004,857 2014-05-29
US14/445,965 2014-07-29
US14/445,965 US9378928B2 (en) 2014-05-29 2014-07-29 Apparatus for treating a gas in a conduit
PCT/US2015/029068 WO2015183479A1 (en) 2014-05-29 2015-05-04 Apparatus for treating a gas in a conduit

Publications (2)

Publication Number Publication Date
CN106414800A CN106414800A (zh) 2017-02-15
CN106414800B true CN106414800B (zh) 2020-06-26

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CN201580026860.5A Active CN106414800B (zh) 2014-05-29 2015-05-04 用于处理管道中的气体的设备

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US (2) US9378928B2 (enExample)
JP (1) JP6641359B2 (enExample)
KR (1) KR101805612B1 (enExample)
CN (1) CN106414800B (enExample)
TW (1) TWI607577B (enExample)
WO (1) WO2015183479A1 (enExample)

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US10187966B2 (en) * 2015-07-24 2019-01-22 Applied Materials, Inc. Method and apparatus for gas abatement
US10435787B2 (en) 2016-11-14 2019-10-08 Applied Materials, Inc. Hydrogen partial pressure control in a vacuum process chamber
US10777394B2 (en) 2016-12-09 2020-09-15 Applied Materials, Inc. Virtual sensor for chamber cleaning endpoint
JP7042142B2 (ja) * 2018-03-30 2022-03-25 株式会社ダイヘン プラズマ発生装置
JP7042143B2 (ja) * 2018-03-30 2022-03-25 株式会社ダイヘン プラズマ発生装置
KR102571335B1 (ko) * 2020-02-19 2023-08-30 인투코어테크놀로지 주식회사 안테나 구조체 및 이를 이용한 플라즈마 발생 장치
TWI876490B (zh) 2020-02-19 2025-03-11 南韓商源多可股份有限公司 天線結構以及使用其之電感耦合電漿產生裝置
AU2021297476A1 (en) 2020-06-25 2022-12-15 6K Inc. Microcomposite alloy structure
AU2022206483A1 (en) 2021-01-11 2023-08-31 6K Inc. Methods and systems for reclamation of li-ion cathode materials using microwave plasma processing
EP4313449A1 (en) 2021-03-31 2024-02-07 6K Inc. Systems and methods for additive manufacturing of metal nitride ceramics
WO2023229928A1 (en) 2022-05-23 2023-11-30 6K Inc. Microwave plasma apparatus and methods for processing materials using an interior liner
US12040162B2 (en) 2022-06-09 2024-07-16 6K Inc. Plasma apparatus and methods for processing feed material utilizing an upstream swirl module and composite gas flows
WO2024044498A1 (en) * 2022-08-25 2024-02-29 6K Inc. Plasma apparatus and methods for processing feed material utilizing a powder ingress preventor (pip)
US12195338B2 (en) 2022-12-15 2025-01-14 6K Inc. Systems, methods, and device for pyrolysis of methane in a microwave plasma for hydrogen and structured carbon powder production

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CN1121640A (zh) * 1994-05-17 1996-05-01 东芝照明技术株式会社 放电灯及使用该灯的照明装置
CN1516676A (zh) * 2001-06-15 2004-07-28 S��I��P�������������ι�˾ 用于对制冷式水冷却蓄水槽进行消毒的方法及装置
CN101057319A (zh) * 2004-10-15 2007-10-17 先进能源工业公司 等离子体排放装置中的介电部件的热控制
CN101156505A (zh) * 2005-04-07 2008-04-02 卡罗·塔里亚尼 用于生成、加速和传播电子束和等离子体束的设备和方法
CN101326863A (zh) * 2006-03-16 2008-12-17 赖茵豪森机械制造公司 用于产生等离子流的装置
CN101393839A (zh) * 2007-09-20 2009-03-25 优志旺电机株式会社 准分子灯及准分子灯的制造方法

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US4278450A (en) * 1979-10-09 1981-07-14 Georgia Tech Research Institute Method for the recovery of clean pyrolysis off-gas and a rotary recycling means therefor
CN1121640A (zh) * 1994-05-17 1996-05-01 东芝照明技术株式会社 放电灯及使用该灯的照明装置
CN1516676A (zh) * 2001-06-15 2004-07-28 S��I��P�������������ι�˾ 用于对制冷式水冷却蓄水槽进行消毒的方法及装置
CN101057319A (zh) * 2004-10-15 2007-10-17 先进能源工业公司 等离子体排放装置中的介电部件的热控制
CN101156505A (zh) * 2005-04-07 2008-04-02 卡罗·塔里亚尼 用于生成、加速和传播电子束和等离子体束的设备和方法
CN101326863A (zh) * 2006-03-16 2008-12-17 赖茵豪森机械制造公司 用于产生等离子流的装置
CN101393839A (zh) * 2007-09-20 2009-03-25 优志旺电机株式会社 准分子灯及准分子灯的制造方法

Also Published As

Publication number Publication date
TWI607577B (zh) 2017-12-01
US20150348754A1 (en) 2015-12-03
JP2017523585A (ja) 2017-08-17
CN106414800A (zh) 2017-02-15
JP6641359B2 (ja) 2020-02-05
TW201601339A (zh) 2016-01-01
US9378928B2 (en) 2016-06-28
US9767990B2 (en) 2017-09-19
KR101805612B1 (ko) 2017-12-07
KR20170012460A (ko) 2017-02-02
US20160300692A1 (en) 2016-10-13
WO2015183479A1 (en) 2015-12-03

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