JP6641359B2 - 導管内でガスを処置するための装置 - Google Patents

導管内でガスを処置するための装置 Download PDF

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Publication number
JP6641359B2
JP6641359B2 JP2017515674A JP2017515674A JP6641359B2 JP 6641359 B2 JP6641359 B2 JP 6641359B2 JP 2017515674 A JP2017515674 A JP 2017515674A JP 2017515674 A JP2017515674 A JP 2017515674A JP 6641359 B2 JP6641359 B2 JP 6641359B2
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Japan
Prior art keywords
coil
dielectric tube
coupled
terminals
gas
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JP2017515674A
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English (en)
Japanese (ja)
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JP2017523585A (ja
JP2017523585A5 (enExample
Inventor
ジビン ゼン
ジビン ゼン
ブライアン ティー ウェスト
ブライアン ティー ウェスト
ロンピン ワン
ロンピン ワン
マノジ エイ ガジェンドラ
マノジ エイ ガジェンドラ
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Applied Materials Inc
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Applied Materials Inc
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H01J37/3211—Antennas, e.g. particular shapes of coils
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H01J37/32467—Material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H01J37/32522—Temperature
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32568—Relative arrangement or disposition of electrodes; moving means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32807—Construction (includes replacing parts of the apparatus)
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32816—Pressure
    • H01J37/32834—Exhausting
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32816—Pressure
    • H01J37/32834—Exhausting
    • H01J37/32844—Treating effluent gases
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H05H1/2443—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the plasma fluid flowing through a dielectric tube
    • H05H1/2465—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the plasma fluid flowing through a dielectric tube the plasma being activated by inductive coupling, e.g. using coiled electrodes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/30—Plasma torches using applied electromagnetic fields, e.g. high frequency or microwave energy
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02C—CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
    • Y02C20/00—Capture or disposal of greenhouse gases
    • Y02C20/30—Capture or disposal of greenhouse gases of perfluorocarbons [PFC], hydrofluorocarbons [HFC] or sulfur hexafluoride [SF6]

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Electromagnetism (AREA)
  • Fluid Mechanics (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
  • Drying Of Semiconductors (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
JP2017515674A 2014-05-29 2015-05-04 導管内でガスを処置するための装置 Active JP6641359B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201462004857P 2014-05-29 2014-05-29
US62/004,857 2014-05-29
US14/445,965 US9378928B2 (en) 2014-05-29 2014-07-29 Apparatus for treating a gas in a conduit
US14/445,965 2014-07-29
PCT/US2015/029068 WO2015183479A1 (en) 2014-05-29 2015-05-04 Apparatus for treating a gas in a conduit

Publications (3)

Publication Number Publication Date
JP2017523585A JP2017523585A (ja) 2017-08-17
JP2017523585A5 JP2017523585A5 (enExample) 2018-06-14
JP6641359B2 true JP6641359B2 (ja) 2020-02-05

Family

ID=54699525

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2017515674A Active JP6641359B2 (ja) 2014-05-29 2015-05-04 導管内でガスを処置するための装置

Country Status (6)

Country Link
US (2) US9378928B2 (enExample)
JP (1) JP6641359B2 (enExample)
KR (1) KR101805612B1 (enExample)
CN (1) CN106414800B (enExample)
TW (1) TWI607577B (enExample)
WO (1) WO2015183479A1 (enExample)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10187966B2 (en) * 2015-07-24 2019-01-22 Applied Materials, Inc. Method and apparatus for gas abatement
US10435787B2 (en) 2016-11-14 2019-10-08 Applied Materials, Inc. Hydrogen partial pressure control in a vacuum process chamber
US10777394B2 (en) 2016-12-09 2020-09-15 Applied Materials, Inc. Virtual sensor for chamber cleaning endpoint
JP7042142B2 (ja) * 2018-03-30 2022-03-25 株式会社ダイヘン プラズマ発生装置
JP7042143B2 (ja) * 2018-03-30 2022-03-25 株式会社ダイヘン プラズマ発生装置
CN115039196A (zh) 2020-02-19 2022-09-09 源多可股份有限公司 天线结构以及使用其的电感耦合等离子体产生装置
KR102571335B1 (ko) * 2020-02-19 2023-08-30 인투코어테크놀로지 주식회사 안테나 구조체 및 이를 이용한 플라즈마 발생 장치
KR20230029836A (ko) 2020-06-25 2023-03-03 6케이 인크. 마이크로복합 합금 구조
WO2022150828A1 (en) 2021-01-11 2022-07-14 6K Inc. Methods and systems for reclamation of li-ion cathode materials using microwave plasma processing
KR20230164699A (ko) 2021-03-31 2023-12-04 6케이 인크. 질화금속 세라믹의 적층 제조를 위한 시스템 및 방법
US12261023B2 (en) 2022-05-23 2025-03-25 6K Inc. Microwave plasma apparatus and methods for processing materials using an interior liner
US12040162B2 (en) 2022-06-09 2024-07-16 6K Inc. Plasma apparatus and methods for processing feed material utilizing an upstream swirl module and composite gas flows
WO2024044498A1 (en) * 2022-08-25 2024-02-29 6K Inc. Plasma apparatus and methods for processing feed material utilizing a powder ingress preventor (pip)
US12195338B2 (en) 2022-12-15 2025-01-14 6K Inc. Systems, methods, and device for pyrolysis of methane in a microwave plasma for hydrogen and structured carbon powder production

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3875068A (en) 1973-02-20 1975-04-01 Tegal Corp Gaseous plasma reaction apparatus
US4362632A (en) 1974-08-02 1982-12-07 Lfe Corporation Gas discharge apparatus
US4278450A (en) 1979-10-09 1981-07-14 Georgia Tech Research Institute Method for the recovery of clean pyrolysis off-gas and a rotary recycling means therefor
JPS6482521A (en) * 1987-09-25 1989-03-28 Toshiba Corp High-frequency coil
TW347547B (en) * 1994-05-17 1998-12-11 Toshiba Light Technic Kk Discharge lamp and illumination apparatus using the same
JP3349369B2 (ja) * 1996-11-11 2002-11-25 三菱重工業株式会社 ストリーマ放電排ガス処理装置及び方法
US6657173B2 (en) * 1998-04-21 2003-12-02 State Board Of Higher Education On Behalf Of Oregon State University Variable frequency automated capacitive radio frequency (RF) dielectric heating system
US7175054B2 (en) * 1998-12-23 2007-02-13 S.I.P. Technologies, Llc Method and apparatus for disinfecting a refrigerated water cooler reservoir
JP3709432B2 (ja) * 1999-04-30 2005-10-26 アプライド マテリアルズ インコーポレイテッド 排ガス処理装置及び基板処理装置
US6287643B1 (en) * 1999-09-30 2001-09-11 Novellus Systems, Inc. Apparatus and method for injecting and modifying gas concentration of a meta-stable or atomic species in a downstream plasma reactor
JP2002210330A (ja) 2001-01-19 2002-07-30 Pearl Kogyo Kk 半導体プロセス用排ガス処理装置
JP4567979B2 (ja) * 2004-01-15 2010-10-27 キヤノンアネルバ株式会社 プラズマ処理システム及びプラズマ処理方法
US20060081185A1 (en) * 2004-10-15 2006-04-20 Justin Mauck Thermal management of dielectric components in a plasma discharge device
ITMI20050585A1 (it) * 2005-04-07 2006-10-08 Francesco Cino Matacotta Apparato e processo per la generazione accelerazione e propagazione di fasci di elettroni e plasma
DE102006012100B3 (de) * 2006-03-16 2007-09-20 Maschinenfabrik Reinhausen Gmbh Vorrichtung zur Erzeugung eines Plasma-Jets
US20080156264A1 (en) * 2006-12-27 2008-07-03 Novellus Systems, Inc. Plasma Generator Apparatus
JP4950763B2 (ja) * 2007-05-25 2012-06-13 大陽日酸株式会社 プラズマ生成装置
JP4952472B2 (ja) * 2007-09-20 2012-06-13 ウシオ電機株式会社 エキシマランプおよびエキシマランプの製造方法
US9591738B2 (en) * 2008-04-03 2017-03-07 Novellus Systems, Inc. Plasma generator systems and methods of forming plasma
JP5099101B2 (ja) * 2009-01-23 2012-12-12 東京エレクトロン株式会社 プラズマ処理装置
US8475673B2 (en) * 2009-04-24 2013-07-02 Lam Research Company Method and apparatus for high aspect ratio dielectric etch
US8604697B2 (en) * 2009-12-09 2013-12-10 Jehara Corporation Apparatus for generating plasma
US9867238B2 (en) 2012-04-26 2018-01-09 Applied Materials, Inc. Apparatus for treating an exhaust gas in a foreline

Also Published As

Publication number Publication date
CN106414800A (zh) 2017-02-15
WO2015183479A1 (en) 2015-12-03
KR101805612B1 (ko) 2017-12-07
US9378928B2 (en) 2016-06-28
TWI607577B (zh) 2017-12-01
US20150348754A1 (en) 2015-12-03
US20160300692A1 (en) 2016-10-13
KR20170012460A (ko) 2017-02-02
JP2017523585A (ja) 2017-08-17
US9767990B2 (en) 2017-09-19
CN106414800B (zh) 2020-06-26
TW201601339A (zh) 2016-01-01

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