JP2018530893A5 - - Google Patents
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- Publication number
- JP2018530893A5 JP2018530893A5 JP2018523737A JP2018523737A JP2018530893A5 JP 2018530893 A5 JP2018530893 A5 JP 2018530893A5 JP 2018523737 A JP2018523737 A JP 2018523737A JP 2018523737 A JP2018523737 A JP 2018523737A JP 2018530893 A5 JP2018530893 A5 JP 2018530893A5
- Authority
- JP
- Japan
- Prior art keywords
- windings
- plasma source
- winding group
- conductive connector
- pair
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004804 winding Methods 0.000 claims 27
- 230000000116 mitigating effect Effects 0.000 claims 4
- 229910001369 Brass Inorganic materials 0.000 claims 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims 1
- 229910052782 aluminium Inorganic materials 0.000 claims 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims 1
- 239000010951 brass Substances 0.000 claims 1
- 229910052802 copper Inorganic materials 0.000 claims 1
- 239000010949 copper Substances 0.000 claims 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 claims 1
- 229910052751 metal Inorganic materials 0.000 claims 1
- 239000002184 metal Substances 0.000 claims 1
- 239000010453 quartz Substances 0.000 claims 1
- 229910052594 sapphire Inorganic materials 0.000 claims 1
- 239000010980 sapphire Substances 0.000 claims 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 1
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201562196549P | 2015-07-24 | 2015-07-24 | |
| US62/196,549 | 2015-07-24 | ||
| US15/147,974 US10187966B2 (en) | 2015-07-24 | 2016-05-06 | Method and apparatus for gas abatement |
| US15/147,974 | 2016-05-06 | ||
| PCT/US2016/032091 WO2017019149A1 (en) | 2015-07-24 | 2016-05-12 | Method and apparatus for gas abatement |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2018530893A JP2018530893A (ja) | 2018-10-18 |
| JP2018530893A5 true JP2018530893A5 (enExample) | 2019-06-13 |
| JP6671472B2 JP6671472B2 (ja) | 2020-03-25 |
Family
ID=57837928
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018523737A Active JP6671472B2 (ja) | 2015-07-24 | 2016-05-12 | プラズマ源、軽減システム、真空処理システム |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | US10187966B2 (enExample) |
| EP (1) | EP3326193B1 (enExample) |
| JP (1) | JP6671472B2 (enExample) |
| KR (1) | KR102551216B1 (enExample) |
| CN (1) | CN107851547B (enExample) |
| TW (1) | TWI675415B (enExample) |
| WO (1) | WO2017019149A1 (enExample) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10187966B2 (en) * | 2015-07-24 | 2019-01-22 | Applied Materials, Inc. | Method and apparatus for gas abatement |
| US10535506B2 (en) | 2016-01-13 | 2020-01-14 | Mks Instruments, Inc. | Method and apparatus for deposition cleaning in a pumping line |
| WO2018148062A1 (en) | 2017-02-09 | 2018-08-16 | Applied Materials, Inc. | Plasma abatement technology utilizing water vapor and oxygen reagent |
| JP7042142B2 (ja) * | 2018-03-30 | 2022-03-25 | 株式会社ダイヘン | プラズマ発生装置 |
| JP7042143B2 (ja) * | 2018-03-30 | 2022-03-25 | 株式会社ダイヘン | プラズマ発生装置 |
| US11221182B2 (en) | 2018-07-31 | 2022-01-11 | Applied Materials, Inc. | Apparatus with multistaged cooling |
| US11306971B2 (en) | 2018-12-13 | 2022-04-19 | Applied Materials, Inc. | Heat exchanger with multistaged cooling |
| US11551917B2 (en) * | 2019-02-22 | 2023-01-10 | Applied Materials, Inc. | Reduction of Br2 and Cl2 in semiconductor processes |
| US20200286712A1 (en) * | 2019-03-05 | 2020-09-10 | Advanced Energy Industries, Inc. | Single-turn and laminated-wall inductively coupled plasma sources |
| JP7489171B2 (ja) * | 2019-03-26 | 2024-05-23 | 株式会社ダイヘン | プラズマ発生装置 |
| US11745229B2 (en) | 2020-08-11 | 2023-09-05 | Mks Instruments, Inc. | Endpoint detection of deposition cleaning in a pumping line and a processing chamber |
| US12065359B2 (en) | 2021-04-14 | 2024-08-20 | Applied Materials, Inc. | Portable fluorine generator for on-site calibration |
| US11664197B2 (en) | 2021-08-02 | 2023-05-30 | Mks Instruments, Inc. | Method and apparatus for plasma generation |
| JP7756033B2 (ja) * | 2022-03-23 | 2025-10-17 | 株式会社ダイヘン | プラズマ発生器 |
| US12159765B2 (en) | 2022-09-02 | 2024-12-03 | Mks Instruments, Inc. | Method and apparatus for plasma generation |
| CN116161802B (zh) * | 2023-03-24 | 2025-06-03 | 瑞纳智能设备股份有限公司 | 水处理装置和水处理系统 |
| US20250201530A1 (en) * | 2023-12-19 | 2025-06-19 | Applied Materials, Inc. | Protective liner for plasma source |
Family Cites Families (38)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0696967A (ja) * | 1992-09-14 | 1994-04-08 | Ulvac Japan Ltd | プロセス装置用高周波電源の整合装置 |
| US5540824A (en) * | 1994-07-18 | 1996-07-30 | Applied Materials | Plasma reactor with multi-section RF coil and isolated conducting lid |
| US6193802B1 (en) * | 1995-09-25 | 2001-02-27 | Applied Materials, Inc. | Parallel plate apparatus for in-situ vacuum line cleaning for substrate processing equipment |
| US6187072B1 (en) * | 1995-09-25 | 2001-02-13 | Applied Materials, Inc. | Method and apparatus for reducing perfluorocompound gases from substrate processing equipment emissions |
| US6315872B1 (en) * | 1997-11-26 | 2001-11-13 | Applied Materials, Inc. | Coil for sputter deposition |
| US6164241A (en) * | 1998-06-30 | 2000-12-26 | Lam Research Corporation | Multiple coil antenna for inductively-coupled plasma generation systems |
| US6291938B1 (en) | 1999-12-31 | 2001-09-18 | Litmas, Inc. | Methods and apparatus for igniting and sustaining inductively coupled plasma |
| US6367412B1 (en) | 2000-02-17 | 2002-04-09 | Applied Materials, Inc. | Porous ceramic liner for a plasma source |
| US7571697B2 (en) * | 2001-09-14 | 2009-08-11 | Lam Research Corporation | Plasma processor coil |
| KR100513163B1 (ko) * | 2003-06-18 | 2005-09-08 | 삼성전자주식회사 | Ｉｃｐ 안테나 및 이를 사용하는 플라즈마 발생장치 |
| FR2864795B1 (fr) * | 2004-01-06 | 2008-04-18 | Air Liquide | Procede de traitement des gaz par des decharges hautes frequence |
| US20050194099A1 (en) | 2004-03-03 | 2005-09-08 | Jewett Russell F.Jr. | Inductively coupled plasma source using induced eddy currents |
| US20060081185A1 (en) * | 2004-10-15 | 2006-04-20 | Justin Mauck | Thermal management of dielectric components in a plasma discharge device |
| US20060211253A1 (en) * | 2005-03-16 | 2006-09-21 | Ing-Shin Chen | Method and apparatus for monitoring plasma conditions in an etching plasma processing facility |
| JP2006286536A (ja) | 2005-04-04 | 2006-10-19 | Ebara Corp | プラズマ生成方法、誘導結合型プラズマ源、およびプラズマ処理装置 |
| KR100774521B1 (ko) * | 2005-07-19 | 2007-11-08 | 주식회사 디엠에스 | 다중 안테나 코일군이 구비된 유도결합 플라즈마 반응장치 |
| CN101390187A (zh) * | 2006-01-24 | 2009-03-18 | 瓦里安半导体设备公司 | 具有低有效天线电压的等离子体浸润离子源 |
| US20070170867A1 (en) * | 2006-01-24 | 2007-07-26 | Varian Semiconductor Equipment Associates, Inc. | Plasma Immersion Ion Source With Low Effective Antenna Voltage |
| US8932430B2 (en) * | 2011-05-06 | 2015-01-13 | Axcelis Technologies, Inc. | RF coupled plasma abatement system comprising an integrated power oscillator |
| US20080236491A1 (en) | 2007-03-30 | 2008-10-02 | Tokyo Electron Limited | Multiflow integrated icp source |
| JP4950763B2 (ja) * | 2007-05-25 | 2012-06-13 | 大陽日酸株式会社 | プラズマ生成装置 |
| KR100926706B1 (ko) * | 2008-02-21 | 2009-11-17 | (주)플러스텍 | 반구형 나선 안테나를 구비한 반도체용 플라즈마 가공장치 |
| US8736177B2 (en) | 2010-09-30 | 2014-05-27 | Fei Company | Compact RF antenna for an inductively coupled plasma ion source |
| KR101196309B1 (ko) * | 2011-05-19 | 2012-11-06 | 한국과학기술원 | 플라즈마 발생 장치 |
| JP5578155B2 (ja) * | 2011-10-27 | 2014-08-27 | パナソニック株式会社 | プラズマ処理装置及び方法 |
| US20130146225A1 (en) * | 2011-12-08 | 2013-06-13 | Mks Instruments, Inc. | Gas injector apparatus for plasma applicator |
| US9867238B2 (en) * | 2012-04-26 | 2018-01-09 | Applied Materials, Inc. | Apparatus for treating an exhaust gas in a foreline |
| KR20140087215A (ko) * | 2012-12-28 | 2014-07-09 | 주식회사 윈텔 | 플라즈마 장치 및 기판 처리 장치 |
| US9247629B2 (en) | 2013-03-15 | 2016-01-26 | Agilent Technologies, Inc. | Waveguide-based apparatus for exciting and sustaining a plasma |
| KR102171725B1 (ko) * | 2013-06-17 | 2020-10-29 | 어플라이드 머티어리얼스, 인코포레이티드 | 플라즈마 반응기를 위한 강화된 플라즈마 소스 |
| US11158526B2 (en) * | 2014-02-07 | 2021-10-26 | Applied Materials, Inc. | Temperature controlled substrate support assembly |
| US9230780B2 (en) * | 2014-03-06 | 2016-01-05 | Applied Materials, Inc. | Hall effect enhanced capacitively coupled plasma source |
| US9240308B2 (en) * | 2014-03-06 | 2016-01-19 | Applied Materials, Inc. | Hall effect enhanced capacitively coupled plasma source, an abatement system, and vacuum processing system |
| JP2017517380A (ja) * | 2014-03-06 | 2017-06-29 | アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ | 重原子を含有する化合物のプラズマ軽減 |
| US20150279626A1 (en) * | 2014-03-27 | 2015-10-01 | Mks Instruments, Inc. | Microwave plasma applicator with improved power uniformity |
| US9653266B2 (en) * | 2014-03-27 | 2017-05-16 | Mks Instruments, Inc. | Microwave plasma applicator with improved power uniformity |
| US9378928B2 (en) * | 2014-05-29 | 2016-06-28 | Applied Materials, Inc. | Apparatus for treating a gas in a conduit |
| US10187966B2 (en) * | 2015-07-24 | 2019-01-22 | Applied Materials, Inc. | Method and apparatus for gas abatement |
-
2016
- 2016-05-06 US US15/147,974 patent/US10187966B2/en active Active
- 2016-05-12 CN CN201680043524.6A patent/CN107851547B/zh active Active
- 2016-05-12 WO PCT/US2016/032091 patent/WO2017019149A1/en not_active Ceased
- 2016-05-12 KR KR1020187003693A patent/KR102551216B1/ko active Active
- 2016-05-12 JP JP2018523737A patent/JP6671472B2/ja active Active
- 2016-05-12 EP EP16830965.6A patent/EP3326193B1/en active Active
- 2016-05-24 TW TW105116031A patent/TWI675415B/zh active
-
2018
- 2018-11-30 US US16/206,276 patent/US10757797B2/en active Active
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