JP2017520396A - 水素化処理触媒を活性化する方法 - Google Patents
水素化処理触媒を活性化する方法 Download PDFInfo
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- JP2017520396A JP2017520396A JP2016572621A JP2016572621A JP2017520396A JP 2017520396 A JP2017520396 A JP 2017520396A JP 2016572621 A JP2016572621 A JP 2016572621A JP 2016572621 A JP2016572621 A JP 2016572621A JP 2017520396 A JP2017520396 A JP 2017520396A
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- nitrogen
- catalyst
- weight
- hydrocracking
- Prior art date
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- 238000004517 catalytic hydrocracking Methods 0.000 claims abstract description 86
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- DMQSHEKGGUOYJS-UHFFFAOYSA-N n,n,n',n'-tetramethylpropane-1,3-diamine Chemical compound CN(C)CCCN(C)C DMQSHEKGGUOYJS-UHFFFAOYSA-N 0.000 claims description 9
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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- B01J27/00—Catalysts comprising the elements or compounds of halogens, sulfur, selenium, tellurium, phosphorus or nitrogen; Catalysts comprising carbon compounds
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Abstract
Description
− 高水素圧下での触媒の不動態化は、一般に水素化処理の前、特に水素化分解前にインサイチュで実施されるので、水素化処理法、特に水素化分解法に追加工程を必要とする。
− 窒素化合物および硫化剤は、触媒が水素化処理反応器、特に水素化分解反応器に供給される前に、水素化処理触媒、特に水素化分解触媒から脱着されるおそれがある。
− 追加の乾燥工程が一般に必要であり、エクスサイチュ法の持続時間を増加させる。
− 不動態化が一般的にエクスサイチュで行われないので、水素化処理触媒、特に水素化分解触媒の活性を制御ことはより困難である。
a) 窒素化合物の総重量に対する15から35重量%の範囲、好ましくは20から35重量%の範囲、より好ましくは20から30重量%の範囲、より有利には20から25重量%の範囲の窒素の重量含有率;
b) 分子当たり2から20個の範囲、好ましくは2から15個の範囲、より好ましくは2から10個の範囲、さらにより好ましくは2から5個の範囲の窒素原子数、有利には分子当たり2個の窒素原子;
c) 140℃から300℃の範囲、好ましくは140℃から250℃の範囲、より好ましくは140℃から200℃の範囲、さらにより好ましくは140℃から175℃の範囲の沸点;および
d) 前記窒素化合物は、室温および大気圧で液体形態であること。
1) 前記水素化処理触媒、特に水素化分解触媒を硫化剤の存在下で硫化する工程;および
2) 本発明で定義した少なくとも1つの窒素化合物の存在下で、水素化処理触媒、特に水素化分解触媒を不動態化する工程、
を含む該方法に関する。
特に明記しない限り、記載された百分率は重量百分率である。
− 水素化処理触媒、特に水素化分解触媒の、水素化処理活性、特に水素化分解活性は、触媒の硫化操作の間中抑制される;
− 水素化処理操作、特に水素化分解操作の間の触媒の水素化処理活性、特に水素化分解活性は、触媒の硫化操作中、本発明の窒素化合物の作用に起因して低下しない;
− 本発明による窒素化合物の使用が容易である、即ち、本発明の窒素化合物は、より少ないアンモニアを生成する公知の窒素化合物と比較して、注入のために重い装置を必要としない;
− アニリンを使用する溶液のような公知の溶液に対して、本発明の窒素化合物を取り扱う操作者の曝露の危険性が低減される;
− 有利には、本発明による窒素化合物は、欧州CLP規則に従うCMR(発癌性、変異原性、生殖毒性)ではない。
− A1およびA2は2つの窒素化合物を表し、それらは同一でも異なってもよい;
− QA1は、窒素化合物の混合物の総重量に対する重量%で表される窒素化合物A1の量を表す;
− QA2は、窒素化合物の混合物の総重量に対する重量で表される窒素化合物A2の量を表す;
− %NA1は、窒素化合物A1の重量に対する重量%で表される窒素化合物A1における窒素の重量含有率を表す;
− %NA2は、窒素化合物A2の重量に対する重量%で表される窒素化合物A2における窒素の重量含有率を表す;
− %NA1+A2は、混合物の重量に対する重量%で表される本発明の2つの窒素化合物A1およびA2の混合物の窒素の重量含有率を表す。
1) 前記水素化処理触媒、特に水素化分解触媒を硫化剤の存在下で硫化する工程;および
2) 前記水素化処理触媒、特に前記水素化分解触媒の不動態化を、上で定義した少なくとも1つの窒素化合物の存在下で行う工程
からなる。
− 4mlの触媒を触媒反応器に入れ、0.5MPaの窒素(10NL/時)の下、150℃で1時間乾燥させた後、窒素を1NL/時の水素で置換し、反応器内の圧力6MPaにする。
− DMDSをドープしたドデカン(1.5重量%)4ml/時を水素の流入流に導入し、反応器の温度を25℃/時の温度勾配に従って230℃にし、次いでこの温度で6時間(この期間は、0.5mol%を超える、反応器出口での水素中の硫化水素の濃度を観察するのに十分な時間である)安定化させる。この硫化水素濃度をガスクロマトグラフィーによりオンラインで測定した。
− 次に、反応器の温度を25℃/時の勾配に従って350℃に上昇させ、次いでこの温度で少なくとも10時間維持する。
− アミンドープしたドデカン(窒素0.5重量%)の流量:4ml/時
− 水素圧力:6MPa
− 水素の流量:1NL/時。
− アニリン:256℃
− トリ−n−ブチルアミン:254℃
− ジエチルアミノプロピルアミン:245℃。
Claims (15)
- 水素化処理触媒のインサイチュ活性化のための方法における、以下の特徴
a) 窒素化合物の総重量に対する15から35重量%の範囲、好ましくは20から35重量%の範囲、より好ましくは20から30重量%の範囲、より有利には20から25重量%の範囲の窒素の重量含有率;
b) 分子当たり2から20個の範囲、好ましくは2から15個の範囲、より好ましくは2から10個の範囲、さらにより好ましくは2〜5個の範囲の窒素原子数、有利には分子当たり2個の窒素原子;
c) 140℃から300℃の範囲、好ましくは140℃から250℃の範囲、より好ましくは140℃から200℃の範囲、さらにより好ましくは140℃から175℃の範囲の沸点;および
d) 窒素化合物は、室温および大気圧で液体形態であること、
の少なくとも2つ、より好ましくは少なくとも3つ、さらにより好ましくは少なくとも4つを有する少なくとも1つの窒素化合物の使用。 - 窒素化合物はさらに80g.mol−1から300g.mol−1の範囲、好ましくは100g.mol−1から250g.mol−1の範囲、さらにより好ましくは100g.mol−1から200g.mol−1の範囲、有利には120g.mol−1から150g.mol−1の範囲の分子量を有し、これは以下、特徴e)として指定される請求項1に記載の使用。
- 窒素化合物は、芳香族基または環式基を含まないという特徴f)を有する請求項1または2に記載の使用。
- 少なくとも1つの窒素化合物は、必ず特徴b)を有する請求項1から3のいずれか一項に記載の使用。
- 窒素化合物は、N,N’−ジエチル−1,3−プロパンジアミン(DEAPA)、テトラメチル−1,3−プロパンジアミン(TMPDA)、N−メチル−1,3−プロパンジアミン、N,N’−ジブチル−1,3−プロパンジアミン、N−(3−ジメチルアミノプロピル)プロパン−1,3−ジアミン(DMAPAPA)、N−(3−アミノプロピル)−1,3−プロパンジアミン、N,N’−1,2−エタンジイル−ビス−1,3−プロパンジアミン、N−(アミノプロピル)ジエタノールアミン(APDEA)、およびそれらの混合物から選択される請求項1から4のいずれか一項に記載の使用。
- 少なくとも1つの水素化処理触媒の活性を制御するための、請求項1から5のいずれか一項に定義された1つ以上の窒素化合物の使用。
- 水素化処理触媒の酸性部位を不動態化するための、請求項1から4のいずれか一項に定義された1つ以上の窒素化合物の使用。
- インサイチュ活性化のための方法における、以下の特徴
a) 窒素化合物の総重量に対する15から35重量%の範囲、好ましくは20から35重量%の範囲、より好ましくは20から30重量%の範囲、より有利には20から25重量%の範囲の窒素の重量含有率;
b) 分子当たり2から20個の範囲、好ましくは2から15個の範囲、より好ましくは2から10個の範囲、さらにより好ましくは2〜5個の範囲の窒素原子数、有利には分子当たり2個の窒素原子;
c) 140℃から300℃の範囲、好ましくは140℃から250℃の範囲、より好ましくは140℃から200℃の範囲、さらにより好ましくは140℃から175℃の範囲の沸点;および
d) 窒素化合物は、室温および大気圧で液体形態であること、
の少なくとも2つ、より好ましくは少なくとも3つ、さらにより好ましくは少なくとも4つを有する少なくとも1つの窒素化合物の、請求項1から7のいずれか一項に記載の使用。 - 少なくとも1つの窒素化合物は、必ず特徴b)を有する請求項8に記載の使用。
- 少なくとも
1) 前記水素化処理触媒を硫化剤の存在下で硫化する工程;および
2) 請求項1から4のいずれか一項で定義した少なくとも1つの窒素化合物の存在下で、前記水素化処理触媒を不動態化する工程
を含む少なくとも1つの水素化処理触媒のインサイチュ活性化方法。 - 硫化工程と不動態化工程は同時に行われる請求項10に記載の方法。
- 窒素化合物は、液相または気相、好ましく液相で注入される請求項10または11に記載の方法。
- 窒素化合物は、水素化処理触媒の総重量に対して、0.01から20重量%、好ましくは0.01から10重量%、より好ましくは0.01から5重量%の範囲の含有率で注入される請求項10から12のいずれか一項に記載の方法。
- 硫化工程において、硫化剤は、硫化水素、二硫化炭素、ジメチルジスルフィド(DMDS)、ジメチルスルフィド、メルカプタン、チオフェンおよび誘導体、アルキルポリスルフィド、ジアルキルポリスルフィドならびに水素化処理触媒の金属酸化物を硫化することができる全てのスルフィド化合物から選択され、好ましくは、硫化剤はDMDSである請求項10から13のいずれか一項に記載の方法。
- 少なくとも
1) 水素化分解触媒を硫化剤の存在下で硫化する工程;および
2) 請求項1から5のいずれか一項で定義した少なくとも1つの窒素化合物の存在下で、前記水素化分解触媒を不動態化する工程、
を含む少なくとも1つの水素化分解触媒の請求項10から14のいずれか一項に記載のインサイチュ活性化方法。
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