JP2017500448A5 - - Google Patents
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- JP2017500448A5 JP2017500448A5 JP2016538729A JP2016538729A JP2017500448A5 JP 2017500448 A5 JP2017500448 A5 JP 2017500448A5 JP 2016538729 A JP2016538729 A JP 2016538729A JP 2016538729 A JP2016538729 A JP 2016538729A JP 2017500448 A5 JP2017500448 A5 JP 2017500448A5
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- JP
- Japan
- Prior art keywords
- film
- article
- chemical
- vertical
- interface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000010408 film Substances 0.000 claims description 90
- 239000012707 chemical precursor Substances 0.000 claims description 26
- 238000000151 deposition Methods 0.000 claims description 20
- 238000000034 method Methods 0.000 claims description 17
- 239000000758 substrate Substances 0.000 claims description 15
- 239000000126 substance Substances 0.000 claims description 14
- 230000008021 deposition Effects 0.000 claims description 10
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 3
- 239000000463 material Substances 0.000 claims description 3
- 229910052760 oxygen Inorganic materials 0.000 claims description 3
- 239000001301 oxygen Substances 0.000 claims description 3
- 239000002243 precursor Substances 0.000 claims description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 2
- 229910052799 carbon Inorganic materials 0.000 claims description 2
- 239000012159 carrier gas Substances 0.000 claims description 2
- 239000003085 diluting agent Substances 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 claims description 2
- 229910052751 metal Inorganic materials 0.000 claims description 2
- 239000002184 metal Substances 0.000 claims description 2
- 150000002739 metals Chemical class 0.000 claims description 2
- 229910052755 nonmetal Inorganic materials 0.000 claims description 2
- 150000002843 nonmetals Chemical class 0.000 claims description 2
- 239000010409 thin film Substances 0.000 claims description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 1
- 229910052710 silicon Inorganic materials 0.000 claims 1
- 239000010703 silicon Substances 0.000 claims 1
- 238000005137 deposition process Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000000565 sealant Substances 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US14/104,796 | 2013-12-12 | ||
| US14/104,796 US9139908B2 (en) | 2013-12-12 | 2013-12-12 | Gradient thin films |
| PCT/US2014/056467 WO2015088613A1 (en) | 2013-12-12 | 2014-09-19 | Gradient thin films |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2017500448A JP2017500448A (ja) | 2017-01-05 |
| JP2017500448A5 true JP2017500448A5 (https=) | 2017-11-02 |
| JP6381649B2 JP6381649B2 (ja) | 2018-08-29 |
Family
ID=51660657
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016538729A Active JP6381649B2 (ja) | 2013-12-12 | 2014-09-19 | 傾斜薄膜 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US9139908B2 (https=) |
| EP (1) | EP3080331B1 (https=) |
| JP (1) | JP6381649B2 (https=) |
| KR (1) | KR102374881B1 (https=) |
| CN (1) | CN105723013B (https=) |
| AU (1) | AU2014360781B2 (https=) |
| RU (1) | RU2666198C1 (https=) |
| WO (1) | WO2015088613A1 (https=) |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9869013B2 (en) | 2014-04-25 | 2018-01-16 | Applied Materials, Inc. | Ion assisted deposition top coat of rare-earth oxide |
| WO2018130289A1 (en) * | 2017-01-12 | 2018-07-19 | Applied Materials, Inc. | Hardcoat layer system and method for manufacturing a hardcoat layer system in a continuous roll-to-roll process |
| CN111278643A (zh) | 2017-10-27 | 2020-06-12 | 应用材料公司 | 柔性盖板透镜膜 |
| KR102691346B1 (ko) | 2018-05-10 | 2024-08-05 | 어플라이드 머티어리얼스, 인코포레이티드 | 플렉서블 디스플레이를 위한 교체가능한 커버 렌즈 |
| JP7574177B2 (ja) | 2018-08-14 | 2024-10-28 | アプライド マテリアルズ インコーポレイテッド | フレキシブルカバーレンズのための多層乾湿ハードコート |
| RU2702881C1 (ru) * | 2018-09-28 | 2019-10-11 | Общество с ограниченной ответственностью "Научно-производственное объединение "Защитные покрытия", ООО "НПО "Защитные покрытия" | Градиентное металлополимерное покрытие |
| US12211691B2 (en) | 2018-12-20 | 2025-01-28 | Lam Research Corporation | Dry development of resists |
| TWI837391B (zh) | 2019-06-26 | 2024-04-01 | 美商蘭姆研究公司 | 利用鹵化物化學品的光阻顯影 |
| JP7598888B2 (ja) | 2019-06-26 | 2024-12-12 | アプライド マテリアルズ インコーポレイテッド | 折り畳み式ディスプレイ用の可撓性多層カバーレンズ積層体 |
| KR20250160237A (ko) * | 2019-06-28 | 2025-11-11 | 램 리써치 코포레이션 | 복수의 패터닝 복사-흡수 엘리먼트들 및/또는 수직 조성 경사를 갖는 포토레지스트 |
| US20240117495A1 (en) * | 2019-10-14 | 2024-04-11 | Silcotek Corp. | Cold thermal chemical vapor deposition |
| SG11202108851RA (en) | 2020-01-15 | 2021-09-29 | Lam Res Corp | Underlayer for photoresist adhesion and dose reduction |
| EP4078292A4 (en) | 2020-07-07 | 2023-11-22 | Lam Research Corporation | Integrated dry processes for patterning radiation photoresist patterning |
| US20230107357A1 (en) | 2020-11-13 | 2023-04-06 | Lam Research Corporation | Process tool for dry removal of photoresist |
| DE102022105041A1 (de) * | 2022-03-03 | 2023-09-07 | IonKraft GmbH | Beschichtungstechnik für Kunststoffbehälter |
| BR102022012045A2 (pt) * | 2022-06-17 | 2024-01-02 | Autocoat Equipamentos E Processos De Deposição Ltda | Dispositivo para deposição de filmes finos por lâmina e processo derivado |
| AT526238B1 (de) * | 2022-08-09 | 2024-01-15 | Thermal Proc Solutions Gmbh | Vorrichtung zur Bereitstellung eines Plasmas |
| CN117004920A (zh) * | 2023-07-28 | 2023-11-07 | 上海大学 | 一种梯度h-BNC纳米自清洁薄膜设计方法 |
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-
2013
- 2013-12-12 US US14/104,796 patent/US9139908B2/en active Active
-
2014
- 2014-09-19 JP JP2016538729A patent/JP6381649B2/ja active Active
- 2014-09-19 EP EP14780989.1A patent/EP3080331B1/en active Active
- 2014-09-19 RU RU2016111166A patent/RU2666198C1/ru active
- 2014-09-19 AU AU2014360781A patent/AU2014360781B2/en active Active
- 2014-09-19 KR KR1020167009588A patent/KR102374881B1/ko active Active
- 2014-09-19 WO PCT/US2014/056467 patent/WO2015088613A1/en not_active Ceased
- 2014-09-19 CN CN201480062243.6A patent/CN105723013B/zh active Active
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