RU2666198C1 - Градиентные тонкие пленки - Google Patents

Градиентные тонкие пленки Download PDF

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Publication number
RU2666198C1
RU2666198C1 RU2016111166A RU2016111166A RU2666198C1 RU 2666198 C1 RU2666198 C1 RU 2666198C1 RU 2016111166 A RU2016111166 A RU 2016111166A RU 2016111166 A RU2016111166 A RU 2016111166A RU 2666198 C1 RU2666198 C1 RU 2666198C1
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film
chemical
product
composition
relative
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RU2016111166A
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Russian (ru)
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Альпана РАНАДЕ
Марви А. МАТОС
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Зе Боинг Компани
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40Oxides
    • C23C16/401Oxides containing silicon
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523Pulsed gas flow or change of composition over time
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04Coating on selected surface areas, e.g. using masks
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/453Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating passing the reaction gases through burners or torches, e.g. atmospheric pressure CVD
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/503Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using DC or AC discharges
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52Controlling or regulating the coating process

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
RU2016111166A 2013-12-12 2014-09-19 Градиентные тонкие пленки RU2666198C1 (ru)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US14/104,796 2013-12-12
US14/104,796 US9139908B2 (en) 2013-12-12 2013-12-12 Gradient thin films
PCT/US2014/056467 WO2015088613A1 (en) 2013-12-12 2014-09-19 Gradient thin films

Publications (1)

Publication Number Publication Date
RU2666198C1 true RU2666198C1 (ru) 2018-09-06

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RU2016111166A RU2666198C1 (ru) 2013-12-12 2014-09-19 Градиентные тонкие пленки

Country Status (8)

Country Link
US (1) US9139908B2 (https=)
EP (1) EP3080331B1 (https=)
JP (1) JP6381649B2 (https=)
KR (1) KR102374881B1 (https=)
CN (1) CN105723013B (https=)
AU (1) AU2014360781B2 (https=)
RU (1) RU2666198C1 (https=)
WO (1) WO2015088613A1 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2702881C1 (ru) * 2018-09-28 2019-10-11 Общество с ограниченной ответственностью "Научно-производственное объединение "Защитные покрытия", ООО "НПО "Защитные покрытия" Градиентное металлополимерное покрытие

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9869013B2 (en) 2014-04-25 2018-01-16 Applied Materials, Inc. Ion assisted deposition top coat of rare-earth oxide
WO2018130289A1 (en) * 2017-01-12 2018-07-19 Applied Materials, Inc. Hardcoat layer system and method for manufacturing a hardcoat layer system in a continuous roll-to-roll process
CN111278643A (zh) 2017-10-27 2020-06-12 应用材料公司 柔性盖板透镜膜
KR102691346B1 (ko) 2018-05-10 2024-08-05 어플라이드 머티어리얼스, 인코포레이티드 플렉서블 디스플레이를 위한 교체가능한 커버 렌즈
JP7574177B2 (ja) 2018-08-14 2024-10-28 アプライド マテリアルズ インコーポレイテッド フレキシブルカバーレンズのための多層乾湿ハードコート
US12211691B2 (en) 2018-12-20 2025-01-28 Lam Research Corporation Dry development of resists
TWI837391B (zh) 2019-06-26 2024-04-01 美商蘭姆研究公司 利用鹵化物化學品的光阻顯影
JP7598888B2 (ja) 2019-06-26 2024-12-12 アプライド マテリアルズ インコーポレイテッド 折り畳み式ディスプレイ用の可撓性多層カバーレンズ積層体
KR20250160237A (ko) * 2019-06-28 2025-11-11 램 리써치 코포레이션 복수의 패터닝 복사-흡수 엘리먼트들 및/또는 수직 조성 경사를 갖는 포토레지스트
US20240117495A1 (en) * 2019-10-14 2024-04-11 Silcotek Corp. Cold thermal chemical vapor deposition
SG11202108851RA (en) 2020-01-15 2021-09-29 Lam Res Corp Underlayer for photoresist adhesion and dose reduction
EP4078292A4 (en) 2020-07-07 2023-11-22 Lam Research Corporation Integrated dry processes for patterning radiation photoresist patterning
US20230107357A1 (en) 2020-11-13 2023-04-06 Lam Research Corporation Process tool for dry removal of photoresist
DE102022105041A1 (de) * 2022-03-03 2023-09-07 IonKraft GmbH Beschichtungstechnik für Kunststoffbehälter
BR102022012045A2 (pt) * 2022-06-17 2024-01-02 Autocoat Equipamentos E Processos De Deposição Ltda Dispositivo para deposição de filmes finos por lâmina e processo derivado
AT526238B1 (de) * 2022-08-09 2024-01-15 Thermal Proc Solutions Gmbh Vorrichtung zur Bereitstellung eines Plasmas
CN117004920A (zh) * 2023-07-28 2023-11-07 上海大学 一种梯度h-BNC纳米自清洁薄膜设计方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2189663C2 (ru) * 1997-06-30 2002-09-20 Мацушита Электрик Индастриал Ко., Лтд. Способ и устройство для изготовления тонкой полупроводниковой пленки
WO2007067242A1 (en) * 2005-12-08 2007-06-14 Siemens Power Generation, Inc. Stepped gradient fuel electrode and method for making the same
EP2194162A2 (de) * 2008-12-06 2010-06-09 Innovent e.V. Verwendung einer Schicht
US20100279027A1 (en) * 2009-05-04 2010-11-04 Pingree Liam S C System And Method For Applying Abrasion-Resistant Coatings
WO2011014974A1 (en) * 2009-08-07 2011-02-10 Oerlikon Trading Ag, Trübbach Tribology combined with corrosion resistance: a new family of pvd- and pacvd coatings

Family Cites Families (48)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1051393A (https=) 1964-08-28 1900-01-01
US4414085A (en) * 1981-10-08 1983-11-08 Wickersham Charles E Method of depositing a high-emissivity layer
DE3706340A1 (de) * 1987-02-27 1988-09-08 Winter & Sohn Ernst Verfahren zum auftragen einer verschleissschutzschicht und danach hergestelltes erzeugnis
US5482602A (en) * 1993-11-04 1996-01-09 United Technologies Corporation Broad-beam ion deposition coating methods for depositing diamond-like-carbon coatings on dynamic surfaces
DE4445427C2 (de) * 1994-12-20 1997-04-30 Schott Glaswerke Plasma-CVD-Verfahren zur Herstellung einer Gradientenschicht
US5926740A (en) * 1997-10-27 1999-07-20 Micron Technology, Inc. Graded anti-reflective coating for IC lithography
JPH11124693A (ja) 1997-10-20 1999-05-11 Nippon Steel Corp 精密機器用部材
JP3782608B2 (ja) 1998-05-22 2006-06-07 キヤノン株式会社 薄膜材料および薄膜作成法
JP2000256850A (ja) * 1999-03-04 2000-09-19 Riken Corp ダイヤモンドライクカーボン薄膜及びその製造方法
US6221737B1 (en) 1999-09-30 2001-04-24 Philips Electronics North America Corporation Method of making semiconductor devices with graded top oxide and graded drift region
AU4901201A (en) 1999-10-25 2001-07-03 Rolls-Royce Corporation Erosion-resistant coatings for organic matric composites
US20050257827A1 (en) 2000-04-27 2005-11-24 Russell Gaudiana Rotational photovoltaic cells, systems and methods
US20050268962A1 (en) 2000-04-27 2005-12-08 Russell Gaudiana Flexible Photovoltaic cells, systems and methods
US6881475B2 (en) * 2001-06-13 2005-04-19 Sumitomo Electric Industries, Ltd Amorphous carbon coated tool and fabrication method thereof
US6962751B2 (en) * 2001-06-13 2005-11-08 Sumitomo Electric Industries, Ltd. Amorphous carbon coated tools and method of producing the same
JP4151000B2 (ja) * 2002-06-13 2008-09-17 株式会社オンワード技研 ワークの表面処理方法と、その装置
US6852920B2 (en) 2002-06-22 2005-02-08 Nanosolar, Inc. Nano-architected/assembled solar electricity cell
US7713592B2 (en) * 2003-02-04 2010-05-11 Tegal Corporation Nanolayer deposition process
US20050118502A1 (en) 2003-11-27 2005-06-02 Matsushita Electric Industrial Co., Ltd. Energy device and method for producing the same
CN1906764B (zh) * 2004-01-14 2010-09-22 国际商业机器公司 低kCVD材料的梯度沉积
KR20070037492A (ko) * 2004-06-15 2007-04-04 에비자 테크놀로지, 인크. 다성분 유전체 필름을 형성하기 위한 시스템 및 방법
US20060210783A1 (en) * 2005-03-18 2006-09-21 Seder Thomas A Coated article with anti-reflective coating and method of making same
US7700167B2 (en) 2006-08-31 2010-04-20 Honeywell International Inc. Erosion-protective coatings on polymer-matrix composites and components incorporating such coated composites
JPWO2008114627A1 (ja) * 2007-03-16 2010-07-01 コニカミノルタホールディングス株式会社 防汚性積層体及びディスプレイ用前面板
US7615482B2 (en) * 2007-03-23 2009-11-10 International Business Machines Corporation Structure and method for porous SiCOH dielectric layers and adhesion promoting or etch stop layers having increased interfacial and mechanical strength
WO2009066630A1 (ja) * 2007-11-19 2009-05-28 Konica Minolta Holdings, Inc. 撥水または防汚性物品、それを用いて構成された建築用窓ガラス、車両用窓ガラス、ディスプレイ部材、光学部品
EP2232572A4 (en) 2007-12-07 2012-10-17 Alion Inc FOCUSED ACOUSTIC PRINTING OF ORIENTED PHOTOVOLTAIC MATERIALS
US8099792B1 (en) 2008-01-07 2012-01-17 Northwestern University Methods and apparatus for spatially resolved photocurrent mapping of operating photovoltaic devices using atomic force photovoltaic microscopy
WO2009094663A2 (en) 2008-01-25 2009-07-30 University Of Washington Photovoltaic devices having metal oxide electron-transport layers
US20090229667A1 (en) 2008-03-14 2009-09-17 Solarmer Energy, Inc. Translucent solar cell
FR2931844B1 (fr) 2008-06-02 2013-11-01 Alex Hr Roustaei Systemes pour la production de l'energie a la demande comme une source seule ou en assistance avec autres sources d'energie dans le domaine du transport ou de l'habitat.
DE102008028540A1 (de) * 2008-06-16 2009-12-17 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zum Abscheiden einer Gradientenschicht auf einem Kunststoffsubstrat sowie Kunststoffsubstrat mit einer Gradientenschicht
DE102008033938B4 (de) 2008-07-18 2012-04-19 Innovent E.V. Verfahren zur Abscheidung von Schichten auf einem Substrat
US8269100B2 (en) 2008-09-30 2012-09-18 Uchicago Argonne, Llc Hybrid solar cells via UV-polymerization of polymer precursor
US20110253217A1 (en) 2008-09-30 2011-10-20 The Regents Of The University Of California Controlled Alignment in Polymeric Solar Cells
US20110256422A1 (en) 2008-10-31 2011-10-20 Basf Se Merocyanines for producing photoactive layers for organic solar cells and organic photodetectors
FR2956869B1 (fr) 2010-03-01 2014-05-16 Alex Hr Roustaei Systeme de production de film flexible a haute capacite destine a des cellules photovoltaiques et oled par deposition cyclique des couches
JP2012519965A (ja) 2009-03-06 2012-08-30 ユニバーシティ オブ フロリダ リサーチ ファウンデーション,インク. 空気安定性有機−無機ナノ粒子ハイブリッド太陽電池
JP5222764B2 (ja) * 2009-03-24 2013-06-26 株式会社神戸製鋼所 積層皮膜および積層皮膜被覆部材
CN101560653A (zh) * 2009-05-14 2009-10-21 浙江大学 梯度折射率薄膜的制备方法
US20110030770A1 (en) 2009-08-04 2011-02-10 Molecular Imprints, Inc. Nanostructured organic solar cells
US9368729B2 (en) 2009-10-13 2016-06-14 Basf Se Mixtures for producing photoactive layers for organic solar cells and organic photodetectors
CN102782011A (zh) 2009-10-28 2012-11-14 华盛顿州大学 含噻唑并噻唑或苯并双噻唑、或苯并双噁唑电子受体亚单元、和电子供体亚单元的共聚物半导体以及它们在晶体管和太阳能电池中的用途
US9401442B2 (en) 2010-09-01 2016-07-26 Iowa State University Research Foundation, Inc. Textured micrometer scale templates as light managing fabrication platform for organic solar cells
US20120024380A1 (en) 2010-10-27 2012-02-02 Primestar Solar, Inc. Intermixing of cadmium sulfide layers and cadmium telluride layers for thin film photovoltaic devices and methods of their manufacture
CN103262242A (zh) 2010-12-03 2013-08-21 诺瓦莱德公开股份有限公司 在有机光伏器件中形成电互连的方法和用该方法制成的有机光伏器件
JP5595897B2 (ja) * 2010-12-24 2014-09-24 小島プレス工業株式会社 樹脂製品の製造方法
BR112014029751A2 (pt) * 2012-06-23 2017-06-27 Frito Lay North America Inc deposição de revestimentos de óxidos inorgânicos ultrafinos em empacotamento

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2189663C2 (ru) * 1997-06-30 2002-09-20 Мацушита Электрик Индастриал Ко., Лтд. Способ и устройство для изготовления тонкой полупроводниковой пленки
WO2007067242A1 (en) * 2005-12-08 2007-06-14 Siemens Power Generation, Inc. Stepped gradient fuel electrode and method for making the same
EP2194162A2 (de) * 2008-12-06 2010-06-09 Innovent e.V. Verwendung einer Schicht
US20100279027A1 (en) * 2009-05-04 2010-11-04 Pingree Liam S C System And Method For Applying Abrasion-Resistant Coatings
WO2011014974A1 (en) * 2009-08-07 2011-02-10 Oerlikon Trading Ag, Trübbach Tribology combined with corrosion resistance: a new family of pvd- and pacvd coatings

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2702881C1 (ru) * 2018-09-28 2019-10-11 Общество с ограниченной ответственностью "Научно-производственное объединение "Защитные покрытия", ООО "НПО "Защитные покрытия" Градиентное металлополимерное покрытие

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