JP2017166065A5 - - Google Patents
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- Publication number
- JP2017166065A5 JP2017166065A5 JP2017039058A JP2017039058A JP2017166065A5 JP 2017166065 A5 JP2017166065 A5 JP 2017166065A5 JP 2017039058 A JP2017039058 A JP 2017039058A JP 2017039058 A JP2017039058 A JP 2017039058A JP 2017166065 A5 JP2017166065 A5 JP 2017166065A5
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- diamond coating
- processing system
- edge ring
- purity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011248 coating agent Substances 0.000 claims description 25
- 238000000576 coating method Methods 0.000 claims description 25
- 229910003460 diamond Inorganic materials 0.000 claims description 25
- 239000010432 diamond Substances 0.000 claims description 25
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 claims description 14
- 239000000758 substrate Substances 0.000 claims description 11
- 238000005229 chemical vapour deposition Methods 0.000 claims 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 2
- 229910004298 SiO 2 Inorganic materials 0.000 claims 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 1
- 238000009616 inductively coupled plasma Methods 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 229910052710 silicon Inorganic materials 0.000 claims 1
- 239000010703 silicon Substances 0.000 claims 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims 1
- 235000012239 silicon dioxide Nutrition 0.000 claims 1
- 239000000377 silicon dioxide Substances 0.000 claims 1
- 238000005530 etching Methods 0.000 description 2
- 238000004380 ashing Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
Applications Claiming Priority (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201662303091P | 2016-03-03 | 2016-03-03 | |
| US62/303,091 | 2016-03-03 | ||
| US201662310993P | 2016-03-21 | 2016-03-21 | |
| US62/310,993 | 2016-03-21 | ||
| US15/428,744 US11008655B2 (en) | 2016-03-03 | 2017-02-09 | Components such as edge rings including chemical vapor deposition (CVD) diamond coating with high purity SP3 bonds for plasma processing systems |
| US15/428,744 | 2017-02-09 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2017166065A JP2017166065A (ja) | 2017-09-21 |
| JP2017166065A5 true JP2017166065A5 (enExample) | 2017-11-02 |
Family
ID=59724242
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017039058A Pending JP2017166065A (ja) | 2016-03-03 | 2017-03-02 | 高純度でｓｐ３結合を含む化学気相成長（ＣＶＤ）ダイヤモンドコーティングを有するエッジリングのようなプラズマ処理システム用構成部材 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US11008655B2 (enExample) |
| JP (1) | JP2017166065A (enExample) |
| KR (2) | KR20170103689A (enExample) |
| CN (2) | CN113506719B (enExample) |
| SG (2) | SG10201701713TA (enExample) |
| TW (2) | TWI737686B (enExample) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10784091B2 (en) * | 2017-09-29 | 2020-09-22 | Taiwan Semiconductor Manufacturing Co., Ltd. | Process and related device for removing by-product on semiconductor processing chamber sidewalls |
| US11538713B2 (en) * | 2017-12-05 | 2022-12-27 | Lam Research Corporation | System and method for edge ring wear compensation |
| CN109994351B (zh) * | 2018-01-02 | 2021-07-13 | 台湾积体电路制造股份有限公司 | 离子布植机及离子布植机腔室的制造方法 |
| CN111819679A (zh) | 2018-03-13 | 2020-10-23 | 应用材料公司 | 具有等离子体喷涂涂层的支撑环 |
| US11515128B2 (en) * | 2018-08-28 | 2022-11-29 | Lam Research Corporation | Confinement ring with extended life |
| KR102305539B1 (ko) * | 2019-04-16 | 2021-09-27 | 주식회사 티씨케이 | SiC 엣지 링 |
| JP7412923B2 (ja) * | 2019-08-23 | 2024-01-15 | 東京エレクトロン株式会社 | エッジリング、プラズマ処理装置及びエッジリングの製造方法 |
| CN112899662A (zh) * | 2019-12-04 | 2021-06-04 | 江苏菲沃泰纳米科技股份有限公司 | Dlc制备装置和制备方法 |
| CN112853482B (zh) * | 2020-12-31 | 2022-09-27 | 武汉大学深圳研究院 | 一种微波等离子体-磁控溅射复合气相沉积原位制备100面金刚石的方法及设备 |
| CN114318287B (zh) * | 2021-12-23 | 2023-11-03 | 深圳技术大学 | 金刚石自支撑膜的制备方法和金刚石自支撑膜 |
| US12354842B2 (en) | 2023-01-19 | 2025-07-08 | Tokyo Electron Limited | In-situ focus ring coating |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5190823A (en) * | 1989-07-31 | 1993-03-02 | General Electric Company | Method for improving adhesion of synthetic diamond coatings to substrates |
| US5167714A (en) * | 1989-09-29 | 1992-12-01 | Nordson Corporation | Powder coating system with configurable controller and dew point detection |
| US5952060A (en) * | 1996-06-14 | 1999-09-14 | Applied Materials, Inc. | Use of carbon-based films in extending the lifetime of substrate processing system components |
| US6508911B1 (en) * | 1999-08-16 | 2003-01-21 | Applied Materials Inc. | Diamond coated parts in a plasma reactor |
| US6605352B1 (en) * | 2000-01-06 | 2003-08-12 | Saint-Gobain Ceramics & Plastics, Inc. | Corrosion and erosion resistant thin film diamond coating and applications therefor |
| US6537429B2 (en) * | 2000-12-29 | 2003-03-25 | Lam Research Corporation | Diamond coatings on reactor wall and method of manufacturing thereof |
| JP4028274B2 (ja) * | 2002-03-26 | 2007-12-26 | 住友大阪セメント株式会社 | 耐食性材料 |
| US7247348B2 (en) * | 2004-02-25 | 2007-07-24 | Honeywell International, Inc. | Method for manufacturing a erosion preventative diamond-like coating for a turbine engine compressor blade |
| EP1719801A4 (en) * | 2004-02-26 | 2008-09-24 | Daikin Ind Ltd | ELASTOMERIC FLUORINE COMPOSITION |
| US7658802B2 (en) * | 2005-11-22 | 2010-02-09 | Applied Materials, Inc. | Apparatus and a method for cleaning a dielectric film |
| GB2449388B (en) * | 2006-03-06 | 2011-08-17 | Diamond Innovations Inc | Prosthesis for joint replacement |
| US20090029067A1 (en) * | 2007-06-28 | 2009-01-29 | Sciamanna Steven F | Method for producing amorphous carbon coatings on external surfaces using diamondoid precursors |
| US7629031B2 (en) * | 2007-07-13 | 2009-12-08 | Sub-One Technology, Inc. | Plasma enhanced bonding for improving adhesion and corrosion resistance of deposited films |
| JP2009123795A (ja) * | 2007-11-13 | 2009-06-04 | Hitachi Kokusai Electric Inc | 半導体装置の製造方法及び基板処理装置 |
| DE102010054875B4 (de) * | 2010-12-17 | 2012-10-31 | Eagleburgmann Germany Gmbh & Co. Kg | Reibungsarmer Gleitring mit kostengünstiger Diamantbeschichtung |
| US9059678B2 (en) | 2011-04-28 | 2015-06-16 | Lam Research Corporation | TCCT match circuit for plasma etch chambers |
| US10242848B2 (en) * | 2014-12-12 | 2019-03-26 | Lam Research Corporation | Carrier ring structure and chamber systems including the same |
-
2017
- 2017-02-09 US US15/428,744 patent/US11008655B2/en active Active
- 2017-03-02 TW TW106106790A patent/TWI737686B/zh active
- 2017-03-02 JP JP2017039058A patent/JP2017166065A/ja active Pending
- 2017-03-02 TW TW110128839A patent/TWI793701B/zh active
- 2017-03-03 CN CN202110539388.2A patent/CN113506719B/zh active Active
- 2017-03-03 CN CN201710122891.1A patent/CN107393797B/zh active Active
- 2017-03-03 SG SG10201701713TA patent/SG10201701713TA/en unknown
- 2017-03-03 KR KR1020170027531A patent/KR20170103689A/ko not_active Ceased
- 2017-03-03 SG SG10202008553TA patent/SG10202008553TA/en unknown
-
2022
- 2022-03-08 KR KR1020220029212A patent/KR102556603B1/ko active Active
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