JP2017077568A - レーザ加工装置 - Google Patents
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- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/14—Working by laser beam, e.g. welding, cutting or boring using a fluid stream, e.g. a jet of gas, in conjunction with the laser beam; Nozzles therefor
- B23K26/142—Working by laser beam, e.g. welding, cutting or boring using a fluid stream, e.g. a jet of gas, in conjunction with the laser beam; Nozzles therefor for the removal of by-products
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
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- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
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- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/009—Working by laser beam, e.g. welding, cutting or boring using a non-absorbing, e.g. transparent, reflective or refractive, layer on the workpiece
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
- B23K26/083—Devices involving movement of the workpiece in at least one axial direction
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/14—Working by laser beam, e.g. welding, cutting or boring using a fluid stream, e.g. a jet of gas, in conjunction with the laser beam; Nozzles therefor
- B23K26/1462—Nozzles; Features related to nozzles
- B23K26/1464—Supply to, or discharge from, nozzles of media, e.g. gas, powder, wire
- B23K26/147—Features outside the nozzle for feeding the fluid stream towards the workpiece
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/16—Removal of by-products, e.g. particles or vapours produced during treatment of a workpiece
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/18—Working by laser beam, e.g. welding, cutting or boring using absorbing layers on the workpiece, e.g. for marking or protecting purposes
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/361—Removing material for deburring or mechanical trimming
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/362—Laser etching
- B23K26/364—Laser etching for making a groove or trench, e.g. for scribing a break initiation groove
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/40—Removing material taking account of the properties of the material involved
- B23K26/402—Removing material taking account of the properties of the material involved involving non-metallic material, e.g. isolators
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/70—Auxiliary operations or equipment
- B23K26/702—Auxiliary equipment
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
- H01L21/02046—Dry cleaning only
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/268—Bombardment with radiation with high-energy radiation using electromagnetic radiation, e.g. laser radiation
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
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- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2101/00—Articles made by soldering, welding or cutting
- B23K2101/36—Electric or electronic devices
- B23K2101/40—Semiconductor devices
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- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/50—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
- B23K2103/56—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26 semiconducting
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Abstract
【解決手段】水溶性保護膜(78)を通過したレーザ光線によって板状ワーク(W)の上面をアブレーション加工するレーザ加工装置であって、板状ワークの上面にレーザ光線を照射する加工ノズル(43)が、レーザ光線の照射によって板状ワークの上面から飛散したデブリを捕獲するデブリ捕獲チャンバ(61)を備え、当該デブリ捕獲チャンバの捕獲空間(69)でエア噴射口(66)と吸引口(67)とを対向させてレーザ光線の光路に直交するエアの流れを作って、吸引口にデブリ(D)を吸引させる構成にした。
【選択図】図5
Description
以下、実験例について説明する。実験例では、エア噴射口66からのエアの流量[L/min]、流速[m/sec]を変えてアブレーション加工を実施して、板状ワークの上面に残るデブリを確認した。また、ノズルとしては、直径1.0[mm]のエア噴射口66を有するものと、直径2.0[mm]のエア噴射口66を有するものとを用いて、板状ワーク(水溶性保護膜)の上面から5mmの高さにエア噴射口を位置付けて実施した。この結果、下記表1に示すような結果が得られた。
11 チャックテーブル
42 集光器
43 加工ノズル
61 デブリ捕獲チャンバ
62 デブリ捕獲チャンバの上壁
63 デブリ捕獲チャンバの側壁
64 デブリ捕獲チャンバの下壁
65 レーザ光通過口
66 エア噴射口
67 吸引口
68 デブリ捕獲チャンバの開口
74 吸引源
78 水溶性保護膜
79 加工溝
D デブリ
W 板状ワーク
Claims (2)
- チャックテーブルに保持された板状ワークの上面を保護する水溶性保護膜を透して板状ワークの上面にレーザ光線を照射させてアブレーション加工するレーザ加工装置であって、
レーザ光線を集光させる集光器と、該集光器で集光されたレーザ光線を板状ワークの上面に対し垂直に照射させ板状ワークから飛散するデブリを板状ワークの上面から除去する加工ノズルとを備え、
該加工ノズルは、該集光器で集光したレーザ光線を通過させ板状ワークの上面に対し垂直に照射させるレーザ光通過口と、該レーザ光通過口を通過したレーザ光線の照射で板状ワークから飛散するデブリを除去するデブリ除去手段と、を備え、
該デブリ除去手段は、該レーザ光通過口を配設する上壁と該上壁から垂下する側壁と該上壁に対向しデブリを捕獲する開口を有する下壁とから構成されるデブリ捕獲チャンバと、該デブリ捕獲チャンバと吸引源とを連通する吸引口と、該レーザ光通過口を通過するレーザ光線の光路に対し直交する方向に該レーザ光通過口と該開口との範囲で横断し該吸引口に向かってエアを噴射するエア噴射口と、を備え、
該エア噴射口からエアを噴射させデブリを該吸引口から吸引し除去する事を特徴とするレーザ加工装置。 - 該エア噴射口から噴射されるエアは、500m/secから600m/secの流速で噴射される請求項1記載のレーザ加工装置。
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015206227A JP6647829B2 (ja) | 2015-10-20 | 2015-10-20 | レーザ加工装置 |
TW105127517A TW201718152A (zh) | 2015-10-20 | 2016-08-26 | 雷射加工裝置 |
KR1020160122130A KR20170046068A (ko) | 2015-10-20 | 2016-09-23 | 레이저 가공 장치 |
SG10201608478VA SG10201608478VA (en) | 2015-10-20 | 2016-10-10 | Laser processing apparatus |
US15/293,587 US20170106471A1 (en) | 2015-10-20 | 2016-10-14 | Laser processing apparatus |
CN201610907385.9A CN106583931A (zh) | 2015-10-20 | 2016-10-18 | 激光加工装置 |
Applications Claiming Priority (1)
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JP2015206227A JP6647829B2 (ja) | 2015-10-20 | 2015-10-20 | レーザ加工装置 |
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JP2017077568A true JP2017077568A (ja) | 2017-04-27 |
JP6647829B2 JP6647829B2 (ja) | 2020-02-14 |
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JP2015206227A Active JP6647829B2 (ja) | 2015-10-20 | 2015-10-20 | レーザ加工装置 |
Country Status (6)
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US (1) | US20170106471A1 (ja) |
JP (1) | JP6647829B2 (ja) |
KR (1) | KR20170046068A (ja) |
CN (1) | CN106583931A (ja) |
SG (1) | SG10201608478VA (ja) |
TW (1) | TW201718152A (ja) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2018192478A (ja) * | 2017-05-12 | 2018-12-06 | パナソニックIpマネジメント株式会社 | レーザ加工装置 |
JP2020142278A (ja) * | 2019-03-06 | 2020-09-10 | 株式会社ディスコ | 評価方法及び確認用流体噴射装置 |
CN112549156A (zh) * | 2020-11-16 | 2021-03-26 | 环旭电子股份有限公司 | 一种切割支撑平台及切割系统 |
KR20220012177A (ko) | 2020-07-22 | 2022-02-03 | 가부시기가이샤 디스코 | 레이저 가공 장치 |
WO2023218831A1 (ja) * | 2022-05-11 | 2023-11-16 | コマツ産機株式会社 | レーザ加工機、及び、レーザ加工機用のノズルユニット |
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KR102379215B1 (ko) * | 2017-10-31 | 2022-03-28 | 삼성디스플레이 주식회사 | 레이저 장치 |
CN108080638B (zh) * | 2018-01-30 | 2023-07-04 | 华中科技大学 | 一种非晶合金箔材的激光3d打印成形系统及成形方法 |
US10695875B2 (en) * | 2018-03-19 | 2020-06-30 | Asia Vital Components Co., Ltd. | Soldering method of soldering jig |
JP7201343B2 (ja) * | 2018-06-19 | 2023-01-10 | 株式会社ディスコ | レーザー加工装置 |
JP7114708B2 (ja) | 2018-06-27 | 2022-08-08 | ギガフォトン株式会社 | レーザ加工装置、レーザ加工システム、及びレーザ加工方法 |
IT201800007468A1 (it) * | 2018-07-24 | 2020-01-24 | Apparato per rimuovere residui di lavorazione e relativo metodo | |
CN109128499B (zh) * | 2018-08-07 | 2021-01-22 | 京东方科技集团股份有限公司 | 清洁装置 |
CN109807716A (zh) * | 2019-03-05 | 2019-05-28 | 盐城工学院 | 一种通讯计算机显示屏切割打磨装置 |
CN112809170A (zh) * | 2019-10-29 | 2021-05-18 | 大族激光科技产业集团股份有限公司 | 硅晶圆切割装置及方法 |
JP7431601B2 (ja) * | 2020-02-10 | 2024-02-15 | 株式会社ディスコ | レーザー加工装置 |
CN112967953B (zh) * | 2020-12-31 | 2023-09-08 | 深圳中科飞测科技股份有限公司 | 半导体处理设备的使用方法、半导体处理设备、及存储介质 |
US20230215721A1 (en) * | 2022-01-05 | 2023-07-06 | STATS ChipPAC Pte. Ltd. | Semiconductor Manufacturing Equipment and Method of Expelling Residue Through Suction Hood |
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KR20220012177A (ko) | 2020-07-22 | 2022-02-03 | 가부시기가이샤 디스코 | 레이저 가공 장치 |
CN112549156A (zh) * | 2020-11-16 | 2021-03-26 | 环旭电子股份有限公司 | 一种切割支撑平台及切割系统 |
WO2023218831A1 (ja) * | 2022-05-11 | 2023-11-16 | コマツ産機株式会社 | レーザ加工機、及び、レーザ加工機用のノズルユニット |
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SG10201608478VA (en) | 2017-05-30 |
TW201718152A (zh) | 2017-06-01 |
JP6647829B2 (ja) | 2020-02-14 |
CN106583931A (zh) | 2017-04-26 |
KR20170046068A (ko) | 2017-04-28 |
US20170106471A1 (en) | 2017-04-20 |
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