JP2017028091A5 - - Google Patents
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- JP2017028091A5 JP2017028091A5 JP2015144971A JP2015144971A JP2017028091A5 JP 2017028091 A5 JP2017028091 A5 JP 2017028091A5 JP 2015144971 A JP2015144971 A JP 2015144971A JP 2015144971 A JP2015144971 A JP 2015144971A JP 2017028091 A5 JP2017028091 A5 JP 2017028091A5
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- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims description 24
- 229910002092 carbon dioxide Inorganic materials 0.000 claims description 12
- 239000001569 carbon dioxide Substances 0.000 claims description 12
- 238000002835 absorbance Methods 0.000 claims description 10
- 229920002120 photoresistant polymer Polymers 0.000 claims description 10
- 239000003513 alkali Substances 0.000 claims description 8
- 238000000034 method Methods 0.000 claims description 8
- 238000000491 multivariate analysis Methods 0.000 claims description 7
- 238000013500 data storage Methods 0.000 claims description 5
- 230000002596 correlated effect Effects 0.000 claims description 4
- 238000004364 calculation method Methods 0.000 claims description 3
- 238000007726 management method Methods 0.000 claims description 3
- 230000001747 exhibiting effect Effects 0.000 claims description 2
- 239000007788 liquid Substances 0.000 claims 1
- 238000000611 regression analysis Methods 0.000 description 3
- 239000012086 standard solution Substances 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000001739 density measurement Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000012417 linear regression Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015144971A JP6505534B2 (ja) | 2015-07-22 | 2015-07-22 | 現像液の管理方法及び装置 |
| KR1020150181207A KR20170011962A (ko) | 2015-07-22 | 2015-12-17 | 현상액의 관리 방법 및 장치 |
| TW104143286A TWI676086B (zh) | 2015-07-22 | 2015-12-23 | 顯影液之管理方法及裝置 |
| TW108131471A TWI695236B (zh) | 2015-07-22 | 2015-12-23 | 顯影液之管理方法及裝置 |
| CN201510994042.6A CN106371295A (zh) | 2015-07-22 | 2015-12-25 | 显影液的管理方法及装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015144971A JP6505534B2 (ja) | 2015-07-22 | 2015-07-22 | 現像液の管理方法及び装置 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019014496A Division JP6624762B2 (ja) | 2019-01-30 | 2019-01-30 | 現像液の管理方法及び装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2017028091A JP2017028091A (ja) | 2017-02-02 |
| JP2017028091A5 true JP2017028091A5 (enExample) | 2018-03-29 |
| JP6505534B2 JP6505534B2 (ja) | 2019-04-24 |
Family
ID=57880865
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015144971A Expired - Fee Related JP6505534B2 (ja) | 2015-07-22 | 2015-07-22 | 現像液の管理方法及び装置 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP6505534B2 (enExample) |
| KR (1) | KR20170011962A (enExample) |
| CN (1) | CN106371295A (enExample) |
| TW (2) | TWI676086B (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6712415B2 (ja) * | 2017-01-23 | 2020-06-24 | 株式会社平間理化研究所 | 現像液管理装置 |
| JP2018200943A (ja) * | 2017-05-26 | 2018-12-20 | 株式会社平間理化研究所 | 現像液の濃度管理装置、及び、基板の現像処理システム |
| CN107300838A (zh) * | 2017-08-08 | 2017-10-27 | 武汉华星光电技术有限公司 | 显影液稀释系统 |
| WO2019036936A1 (zh) * | 2017-08-23 | 2019-02-28 | 深圳市柔宇科技有限公司 | 显影液回收系统 |
| CN108121174A (zh) * | 2017-12-20 | 2018-06-05 | 武汉华星光电半导体显示技术有限公司 | 显影设备及其显影液供应系统 |
| JP7137959B2 (ja) * | 2018-04-20 | 2022-09-15 | 株式会社Ｓｃｒｅｅｎホールディングス | 基板処理方法および基板処理装置 |
| US20250021007A1 (en) * | 2023-07-14 | 2025-01-16 | Yu Kang NIEH | Photoresist developer solutions containing low foam dispersing compositions and quantification methods |
Family Cites Families (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2561578B2 (ja) * | 1991-08-07 | 1996-12-11 | 株式会社平間理化研究所 | 現像液管理装置 |
| CN1327888A (zh) * | 2000-06-09 | 2001-12-26 | 株式会社平间理化研究所 | 基板表面处理装置 |
| TWI298423B (en) * | 2001-02-06 | 2008-07-01 | Nagase & Co Ltd | Developer producing equipment and method |
| US6752545B2 (en) * | 2001-08-16 | 2004-06-22 | Nagase & Co., Ltd. | Alkali-based treating liquid, treating liquid adjusting method and equipment, treating liquid supplying method and equipment |
| JP2003131398A (ja) * | 2001-08-16 | 2003-05-09 | Hirama Rika Kenkyusho:Kk | アルカリ系加工液、加工液調整方法及び装置、並びに、加工液供給方法及び装置 |
| JP3782374B2 (ja) * | 2002-07-19 | 2006-06-07 | 株式会社平間理化研究所 | レジスト剥離装置 |
| US20040055621A1 (en) * | 2002-09-24 | 2004-03-25 | Air Products And Chemicals, Inc. | Processing of semiconductor components with dense processing fluids and ultrasonic energy |
| JP2004271974A (ja) * | 2003-03-10 | 2004-09-30 | Fuji Photo Film Co Ltd | 感光性平版印刷版の現像液疲労度検出方法および現像液管理方法 |
| JP4366490B2 (ja) * | 2003-08-22 | 2009-11-18 | 長瀬産業株式会社 | 現像液供給方法及び装置 |
| JP4323946B2 (ja) * | 2003-12-19 | 2009-09-02 | キヤノン株式会社 | 露光装置 |
| EP1748469A4 (en) * | 2004-05-21 | 2012-04-04 | Jsr Corp | LIQUID FOR IMMERSION EXPOSURE AND METHOD OF IMMERSION EXPOSURE |
| JP4649158B2 (ja) * | 2004-09-30 | 2011-03-09 | 富士フイルム株式会社 | ホログラム記録方法 |
| JP2006285132A (ja) * | 2005-04-05 | 2006-10-19 | Konica Minolta Medical & Graphic Inc | 感光性平版印刷版の処理方法 |
| CN101563654A (zh) * | 2006-11-30 | 2009-10-21 | 三菱化学工程株式会社 | 显影液的浓度调节方法、调制装置和显影液 |
| US20080156356A1 (en) * | 2006-12-05 | 2008-07-03 | Nikon Corporation | Cleaning liquid, cleaning method, liquid generating apparatus, exposure apparatus, and device fabricating method |
| CN101641647A (zh) * | 2007-01-17 | 2010-02-03 | 索尼株式会社 | 显影液以及制备微细加工材料的方法 |
| WO2008088076A1 (ja) * | 2007-01-17 | 2008-07-24 | Sony Corporation | 現像液、および微細加工体の製造方法 |
| WO2010016110A1 (ja) * | 2008-08-05 | 2010-02-11 | 富士通株式会社 | 重回帰分析による予測モデルの作成方法、作成システムおよび作成プログラム |
| JP2011128455A (ja) * | 2009-12-18 | 2011-06-30 | Nagase & Co Ltd | 炭酸系塩類濃度測定装置、アルカリ現像液管理システム、及び、炭酸系塩類濃度測定方法 |
| JP6721157B2 (ja) * | 2015-07-22 | 2020-07-08 | 株式会社平間理化研究所 | 現像液の成分濃度測定方法及び装置、並びに、現像液管理方法及び装置 |
| JP6713658B2 (ja) * | 2015-07-22 | 2020-06-24 | 株式会社平間理化研究所 | 現像液の成分濃度測定装置、成分濃度測定方法、現像液管理装置、及び現像液管理方法 |
-
2015
- 2015-07-22 JP JP2015144971A patent/JP6505534B2/ja not_active Expired - Fee Related
- 2015-12-17 KR KR1020150181207A patent/KR20170011962A/ko not_active Ceased
- 2015-12-23 TW TW104143286A patent/TWI676086B/zh not_active IP Right Cessation
- 2015-12-23 TW TW108131471A patent/TWI695236B/zh not_active IP Right Cessation
- 2015-12-25 CN CN201510994042.6A patent/CN106371295A/zh active Pending
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