JP2017024965A - エピタキシャルシリコンウェーハ - Google Patents
エピタキシャルシリコンウェーハ Download PDFInfo
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- JP2017024965A JP2017024965A JP2015148558A JP2015148558A JP2017024965A JP 2017024965 A JP2017024965 A JP 2017024965A JP 2015148558 A JP2015148558 A JP 2015148558A JP 2015148558 A JP2015148558 A JP 2015148558A JP 2017024965 A JP2017024965 A JP 2017024965A
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- boron
- silicon substrate
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- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 163
- 239000010703 silicon Substances 0.000 title claims abstract description 163
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 161
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 123
- 239000001301 oxygen Substances 0.000 claims abstract description 123
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 122
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims abstract description 107
- 229910052796 boron Inorganic materials 0.000 claims abstract description 107
- 239000000758 substrate Substances 0.000 claims abstract description 96
- 238000010438 heat treatment Methods 0.000 claims abstract description 37
- 239000002244 precipitate Substances 0.000 claims description 69
- 238000011156 evaluation Methods 0.000 claims description 14
- 238000009792 diffusion process Methods 0.000 abstract description 27
- 238000000034 method Methods 0.000 abstract description 23
- 230000008569 process Effects 0.000 abstract description 13
- 235000012431 wafers Nutrition 0.000 description 49
- 239000010410 layer Substances 0.000 description 36
- 239000013078 crystal Substances 0.000 description 24
- 238000003384 imaging method Methods 0.000 description 8
- 238000009826 distribution Methods 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 7
- 239000004065 semiconductor Substances 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- 239000012298 atmosphere Substances 0.000 description 5
- 238000005247 gettering Methods 0.000 description 5
- 230000001590 oxidative effect Effects 0.000 description 5
- 238000001556 precipitation Methods 0.000 description 5
- 239000010453 quartz Substances 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- 239000012535 impurity Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 230000007704 transition Effects 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 239000012299 nitrogen atmosphere Substances 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 239000002019 doping agent Substances 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000000227 grinding Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 230000006911 nucleation Effects 0.000 description 2
- 238000010899 nucleation Methods 0.000 description 2
- 238000001004 secondary ion mass spectrometry Methods 0.000 description 2
- 150000003376 silicon Chemical class 0.000 description 2
- 238000004088 simulation Methods 0.000 description 2
- 239000002344 surface layer Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000010828 elution Methods 0.000 description 1
- 229910001385 heavy metal Inorganic materials 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000012886 linear function Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 150000002926 oxygen Chemical class 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000005204 segregation Methods 0.000 description 1
- 238000002798 spectrophotometry method Methods 0.000 description 1
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- H—ELECTRICITY
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- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0256—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
- H01L31/0264—Inorganic materials
- H01L31/028—Inorganic materials including, apart from doping material or other impurities, only elements of Group IV of the Periodic Table
- H01L31/0288—Inorganic materials including, apart from doping material or other impurities, only elements of Group IV of the Periodic Table characterised by the doping material
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- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
- H01L21/02293—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process formation of epitaxial layers by a deposition process
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- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/20—Controlling or regulating
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- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/30—Mechanisms for rotating or moving either the melt or the crystal
- C30B15/305—Stirring of the melt
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- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
- C30B25/18—Epitaxial-layer growth characterised by the substrate
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
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- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B30/00—Production of single crystals or homogeneous polycrystalline material with defined structure characterised by the action of electric or magnetic fields, wave energy or other specific physical conditions
- C30B30/04—Production of single crystals or homogeneous polycrystalline material with defined structure characterised by the action of electric or magnetic fields, wave energy or other specific physical conditions using magnetic fields
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- C30—CRYSTAL GROWTH
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- C30B33/00—After-treatment of single crystals or homogeneous polycrystalline material with defined structure
- C30B33/02—Heat treatment
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
- H01L21/02123—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon
- H01L21/02126—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon the material containing Si, O, and at least one of H, N, C, F, or other non-metal elements, e.g. SiOC, SiOC:H or SiONC
- H01L21/02129—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon the material containing Si, O, and at least one of H, N, C, F, or other non-metal elements, e.g. SiOC, SiOC:H or SiONC the material being boron or phosphorus doped silicon oxides, e.g. BPSG, BSG or PSG
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- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02524—Group 14 semiconducting materials
- H01L21/02532—Silicon, silicon germanium, germanium
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- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/322—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to modify their internal properties, e.g. to produce internal imperfections
- H01L21/3221—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to modify their internal properties, e.g. to produce internal imperfections of silicon bodies, e.g. for gettering
- H01L21/3225—Thermally inducing defects using oxygen present in the silicon body for intrinsic gettering
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- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
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- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
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- H01L21/02365—Forming inorganic semiconducting materials on a substrate
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Abstract
Description
11 シリコン基板
12 エピタキシャル層
Claims (2)
- ボロンがドープされたシリコン基板の表面にエピタキシャル層が形成されたエピタキシャルシリコンウェーハであって、
前記シリコン基板中のボロン濃度が2.7×1017atoms/cm3以上かつ1.3×1019atoms/cm3以下であり、
前記シリコン基板中の初期酸素濃度が11×1017atoms/cm3以下であり、
前記エピタキシャルシリコンウェーハに対して酸素析出物評価熱処理を施した場合に、前記シリコン基板中の酸素析出物密度が1×1010個/cm3以下であることを特徴とするエピタキシャルシリコンウェーハ。 - 前記ボロン濃度Y(atoms/cm3)および前記初期酸素濃度X(×1017atoms/cm3)が、X≦−4.3×10−19Y+16.3の関係式を満たす、請求項1に記載のエピタキシャルシリコンウェーハ。
Priority Applications (8)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015148558A JP6610056B2 (ja) | 2015-07-28 | 2015-07-28 | エピタキシャルシリコンウェーハの製造方法 |
TW105119403A TWI605494B (zh) | 2015-07-28 | 2016-06-21 | 磊晶矽晶圓 |
US15/745,174 US20180204960A1 (en) | 2015-07-28 | 2016-07-06 | Epitaxial silicon wafer |
PCT/JP2016/069980 WO2017018141A1 (ja) | 2015-07-28 | 2016-07-06 | エピタキシャルシリコンウェーハ |
CN201680043772.0A CN107849731A (zh) | 2015-07-28 | 2016-07-06 | 外延硅晶片 |
DE112016003412.1T DE112016003412T5 (de) | 2015-07-28 | 2016-07-06 | Siliziumepitaxialwafer |
KR1020187000940A KR102057086B1 (ko) | 2015-07-28 | 2016-07-06 | 에피택셜 실리콘 웨이퍼의 제조 방법 |
US16/583,732 US10861990B2 (en) | 2015-07-28 | 2019-09-26 | Epitaxial silicon wafer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015148558A JP6610056B2 (ja) | 2015-07-28 | 2015-07-28 | エピタキシャルシリコンウェーハの製造方法 |
Publications (2)
Publication Number | Publication Date |
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JP2017024965A true JP2017024965A (ja) | 2017-02-02 |
JP6610056B2 JP6610056B2 (ja) | 2019-11-27 |
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JP2015148558A Active JP6610056B2 (ja) | 2015-07-28 | 2015-07-28 | エピタキシャルシリコンウェーハの製造方法 |
Country Status (7)
Country | Link |
---|---|
US (2) | US20180204960A1 (ja) |
JP (1) | JP6610056B2 (ja) |
KR (1) | KR102057086B1 (ja) |
CN (1) | CN107849731A (ja) |
DE (1) | DE112016003412T5 (ja) |
TW (1) | TWI605494B (ja) |
WO (1) | WO2017018141A1 (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
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TWI792462B (zh) * | 2021-07-30 | 2023-02-11 | 合晶科技股份有限公司 | 供磊晶成長的複合基板及其製作方法 |
CN113782423B (zh) * | 2021-08-25 | 2022-08-23 | 中国科学院宁波材料技术与工程研究所 | 杂质扩散方法和太阳能电池制造方法 |
JP2023090559A (ja) * | 2021-12-17 | 2023-06-29 | 株式会社Sumco | シリコンウェーハ及びその製造方法 |
Citations (8)
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JP2010083712A (ja) * | 2008-09-30 | 2010-04-15 | Sumco Corp | 結晶欠陥状態予測方法、シリコンウェーハの製造方法 |
JP2010228924A (ja) * | 2009-03-25 | 2010-10-14 | Sumco Corp | シリコンエピタキシャルウェーハおよびその製造方法 |
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US6548886B1 (en) * | 1998-05-01 | 2003-04-15 | Wacker Nsce Corporation | Silicon semiconductor wafer and method for producing the same |
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US9634098B2 (en) * | 2013-06-11 | 2017-04-25 | SunEdison Semiconductor Ltd. (UEN201334164H) | Oxygen precipitation in heavily doped silicon wafers sliced from ingots grown by the Czochralski method |
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KR20180016580A (ko) | 2018-02-14 |
US20180204960A1 (en) | 2018-07-19 |
JP6610056B2 (ja) | 2019-11-27 |
TW201715579A (zh) | 2017-05-01 |
US10861990B2 (en) | 2020-12-08 |
DE112016003412T5 (de) | 2018-04-19 |
WO2017018141A1 (ja) | 2017-02-02 |
CN107849731A (zh) | 2018-03-27 |
TWI605494B (zh) | 2017-11-11 |
US20200020817A1 (en) | 2020-01-16 |
KR102057086B1 (ko) | 2019-12-18 |
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