JP2017018949A - 高分子膜、その製造方法、液体処理方法および液体処理装置 - Google Patents
高分子膜、その製造方法、液体処理方法および液体処理装置 Download PDFInfo
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- JP2017018949A JP2017018949A JP2016135416A JP2016135416A JP2017018949A JP 2017018949 A JP2017018949 A JP 2017018949A JP 2016135416 A JP2016135416 A JP 2016135416A JP 2016135416 A JP2016135416 A JP 2016135416A JP 2017018949 A JP2017018949 A JP 2017018949A
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Abstract
【解決手段】高分子膜3を利用した液体処理装置1を用いた電気的吸着またはエレクトロフィルトレーションによる液体処理方法である。高分子膜3は、高分子膜部と、高分子膜部の少なくとも一側面に金属および酸化アルミニウムの少なくともいずれか形成された多孔性の被覆部とを備える。そして、処理対象の液体が供給される容器2内に、高分子膜3と対電極4とを設置する。また、その容器2内に液体を供給する。さらに、被覆部と対電極4との間に電圧をかける。また、容器2から少なくとも液体の一部を除去するか、または、高分子膜3に少なくとも液体の一部を通過させて、この状態で電圧の極性を逆転させる。
【選択図】図1
Description
2 容器
3 高分子膜としての膜
4 対電極
Claims (23)
- 電気的吸着またはエレクトロフィルトレーションによる液体処理方法において、
液体が供給される容器内に、高分子膜部の少なくとも一側面に金属および酸化アルミニウムの少なくともいずれかで多孔性の被覆部が形成された高分子膜と、この高分子膜の被覆部に対する対電極とを設け、
容器に液体を供給し、
被覆部と対電極との間に電圧をかけ、
容器から少なくとも液体の一部を除去するか、または、高分子膜に少なくとも液体の一部を通過させ、
電圧の極性を逆転させる
ことを特徴とする液体処理方法。 - 対電極は、高分子膜における被覆部が形成された一側面に相対する他側面に設けられ前記被覆部に対して高分子膜により絶縁され金属で形成された多孔性の他の被覆部、および、絶縁性で浸透性のスペーサの中間層の下に配置された浸透性の電極のいずれかによって構成される
ことを特徴とする請求項1記載の液体処理方法。 - 浸透性の電極は、金属製の網によって形成されている
ことを特徴とする請求項2記載の液体処理方法。 - 被覆部を有する高分子膜の多孔性度は、被覆部で被覆されていない状態の高分子膜に対して被覆部を有する高分子膜の最初の泡立ち点細孔径および中位の細孔径の少なくともいずれかが、1%以上50%以下となるように調整されている
ことを特徴とする請求項1ないし3いずれか一記載の液体処理方法。 - 被覆部を有する高分子膜の多孔性度は、被覆部で被覆されていない状態の高分子膜に対して被覆部を有する高分子膜の最初の泡立ち点細孔径および中位の細孔径の少なくともいずれかが、1%以上20%以下となるように調整されている
ことを特徴とする請求項1ないし3いずれか一記載の液体処理方法。 - 被覆部の厚みは、5nm以上50nm以下である
ことを特徴とする請求項1ないし5いずれか一記載の液体処理方法。 - 高分子膜は、被覆部で被覆されていない状態における細孔径が、0.01μmより大きい
ことを特徴とする請求項1ないし6いずれか一記載の液体処理方法。 - 電気的吸着またはエレクトロフィルトレーションによる液体処理装置において、
液体が供給される容器と、
容器内に設けられた高分子膜と、
容器内に設けられた対電極とを備え、
高分子膜は、高分子膜部と、この高分子膜部の少なくとも一側面に金属および酸化アルミニウムの少なくともいずれかで形成された多孔性の被覆部とを有する
ことを特徴とする液体処理装置。 - 対電極は、高分子膜部の一側面に相対する他側面に金属で形成された多孔性の他の被覆部、および、絶縁性で浸透性のスペーサの中間層の下に配置された浸透性の電極のいずれかによって構成されている
ことを特徴とする請求項8記載の液体処理装置。 - 浸透性の電極は、金属製の網によって形成されている
ことを特徴とする請求項9記載の液体処理装置。 - 被覆部を有する高分子膜の多孔性度は、被覆部で被覆されていない状態の高分子膜に対して被覆部を有する高分子膜の最初の泡立ち点細孔径および中位の細孔径の少なくともいずれかが1%以上50%以下となるように調整されている
ことを特徴とする請求項8ないし10いずれか一記載の液体処理装置。 - 被覆部を有する高分子膜の多孔性度は、被覆部で被覆されていない状態の高分子膜に対して被覆部を有する高分子膜の最初の泡立ち点細孔径および中位の細孔径の少なくともいずれかが1%以上20%以下となるように調整されている
ことを特徴とする請求項8ないし10いずれか一記載の液体処理装置。 - 被覆部の厚みは、5nm以上50nm以下である
ことを特徴とする請求項8ないし11いずれか一記載の液体処理装置。 - 被覆されていない状態の高分子膜の細孔径は、0.01μm以上15μm以下である
ことを特徴とする請求項8ないし12いずれか一記載の液体処理装置。 - 被覆部および高分子膜は、不活性および殺菌性の少なくともいずれかを有する
ことを特徴とする請求項8ないし14いずれか一記載の液体処理装置。 - 多孔性の通路を有する高分子膜部と、
この高分子膜部の少なくとも一側面を被覆するように金属および酸化アルミニウムの少なくともいずれかで形成された多孔性の被覆部とを備え、
被覆部は、1nm以上50nm以下の厚みである
ことを特徴とする高分子膜。 - 被覆部で被覆されていない状態の高分子膜に対して被覆部を有する高分子膜の最初の泡立ち点細孔径および中位の細孔径の少なくともいずれかが1%以上50%以下となる多孔性度である
ことを特徴とする請求項16記載の高分子膜。 - 被覆部で被覆されていない状態の高分子膜に対して被覆部を有する高分子膜の最初の泡立ち点細孔径および中位の細孔径の少なくともいずれかが1%以上20%以下となる多孔性度である
ことを特徴とする請求項16記載の高分子膜。 - 金属および酸化アルミニウムの少なくともいずれかで形成された被覆部により少なくとも一側面が被覆された高分子膜の製造方法において、
高分子膜の温度が200℃を超えないように原子層堆積法によって高分子膜に被覆部を形成し、
被覆部を形成する際には、高分子膜の一側面からガスが到達する高分子膜の表面に被覆部を塗布し、かつ、被覆部の厚みが、最初の泡立ち点細孔径および中位の細孔径の少なくともいずれかに関して、被覆前の高分子膜に対し被覆後の高分子膜が1%以上45%以下となるように被覆部を塗布する
ことを特徴とする高分子膜の製造方法。 - 被覆部は、被覆前の高分子膜に対して被覆後の高分子膜の最初の泡立ち点細孔径および中位の細孔径の少なくともいずれかが1%以上45%以下となる厚みになるまで、金属および酸化アルミニウムの少なくともいずれかを蒸着する
ことを特徴とする請求項19記載の高分子膜の製造方法。 - 被覆部は、被覆前の高分子膜に対して被覆後の高分子膜の最初の泡立ち点細孔径および中位の細孔径の少なくともいずれかが1%以上50%以下となる多孔性度になるまで、金属および酸化アルミニウムの少なくともいずれかを蒸着する
ことを特徴とする請求項19または20記載の高分子膜の製造方法。 - 被覆部は、被覆前の高分子膜に対して被覆後の高分子膜の最初の泡立ち点細孔径および中位の細孔径の少なくともいずれかが1%以上20%以下となる多孔性度になるまで、金属および酸化アルミニウムの少なくともいずれかを蒸着する
ことを特徴とする請求項19または20記載の高分子膜の製造方法。 - 高分子膜は、一側面とこの一側面に相対する他側面とに、金属および酸化アルミニウムの少なくともいずれかが直接被覆される
ことを特徴とする請求項19ないし21いずれか一記載の高分子膜の製造方法。
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WO2018143390A1 (ja) | 2017-02-03 | 2018-08-09 | 株式会社Nttドコモ | ユーザ端末及び無線通信方法 |
JP2023505010A (ja) * | 2019-11-01 | 2023-02-08 | アイスリー メンブレイン ゲーエムベーハー | 吸着および電気脱着による分離方法、電気吸着および/または電気ろ過装置、および、システム |
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