JP2016527658A5 - - Google Patents

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Publication number
JP2016527658A5
JP2016527658A5 JP2016510818A JP2016510818A JP2016527658A5 JP 2016527658 A5 JP2016527658 A5 JP 2016527658A5 JP 2016510818 A JP2016510818 A JP 2016510818A JP 2016510818 A JP2016510818 A JP 2016510818A JP 2016527658 A5 JP2016527658 A5 JP 2016527658A5
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JP
Japan
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parameters
controller
portions
inspection
electron
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JP2016510818A
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English (en)
Japanese (ja)
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JP2016527658A (ja
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Priority claimed from US14/260,053 external-priority patent/US9257260B2/en
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Publication of JP2016527658A publication Critical patent/JP2016527658A/ja
Publication of JP2016527658A5 publication Critical patent/JP2016527658A5/ja
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JP2016510818A 2013-04-27 2014-04-25 電子ビーム検査中に試料を適応的に走査する方法及びシステム Pending JP2016527658A (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201361816720P 2013-04-27 2013-04-27
US61/816,720 2013-04-27
US14/260,053 2014-04-23
US14/260,053 US9257260B2 (en) 2013-04-27 2014-04-23 Method and system for adaptively scanning a sample during electron beam inspection
PCT/US2014/035572 WO2014176570A2 (en) 2013-04-27 2014-04-25 Method and system for adaptively scanning a sample during electron beam inspection

Related Child Applications (1)

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JP2018152676A Division JP6595058B2 (ja) 2013-04-27 2018-08-14 電子ビーム検査中に試料を適応的に走査する方法及びシステム

Publications (2)

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JP2016527658A JP2016527658A (ja) 2016-09-08
JP2016527658A5 true JP2016527658A5 (cg-RX-API-DMAC10.html) 2017-06-15

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JP2016510818A Pending JP2016527658A (ja) 2013-04-27 2014-04-25 電子ビーム検査中に試料を適応的に走査する方法及びシステム
JP2018152676A Active JP6595058B2 (ja) 2013-04-27 2018-08-14 電子ビーム検査中に試料を適応的に走査する方法及びシステム

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Country Status (6)

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US (2) US9257260B2 (cg-RX-API-DMAC10.html)
EP (1) EP3001865B1 (cg-RX-API-DMAC10.html)
JP (2) JP2016527658A (cg-RX-API-DMAC10.html)
KR (1) KR102094573B1 (cg-RX-API-DMAC10.html)
TW (1) TWI608553B (cg-RX-API-DMAC10.html)
WO (1) WO2014176570A2 (cg-RX-API-DMAC10.html)

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