JP2016524047A5 - - Google Patents
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- Publication number
- JP2016524047A5 JP2016524047A5 JP2016522493A JP2016522493A JP2016524047A5 JP 2016524047 A5 JP2016524047 A5 JP 2016524047A5 JP 2016522493 A JP2016522493 A JP 2016522493A JP 2016522493 A JP2016522493 A JP 2016522493A JP 2016524047 A5 JP2016524047 A5 JP 2016524047A5
- Authority
- JP
- Japan
- Prior art keywords
- gas supply
- evaporation
- crucibles
- supply pipe
- crucible
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000001704 evaporation Methods 0.000 claims description 44
- 230000008020 evaporation Effects 0.000 claims description 38
- 239000000758 substrate Substances 0.000 claims description 12
- 239000000463 material Substances 0.000 claims description 8
- 230000008021 deposition Effects 0.000 claims description 5
- 238000000151 deposition Methods 0.000 claims 6
- 238000000034 method Methods 0.000 description 7
- 230000003287 optical effect Effects 0.000 description 5
- 230000004888 barrier function Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP13174290.0 | 2013-06-28 | ||
| EP13174290.0A EP2818572B1 (en) | 2013-06-28 | 2013-06-28 | Evaporation apparatus with gas supply |
| PCT/EP2014/063488 WO2014207088A1 (en) | 2013-06-28 | 2014-06-26 | Evaporation apparatus with gas supply |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016524047A JP2016524047A (ja) | 2016-08-12 |
| JP2016524047A5 true JP2016524047A5 (enExample) | 2017-08-03 |
| JP6435325B2 JP6435325B2 (ja) | 2018-12-05 |
Family
ID=48692385
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016522493A Expired - Fee Related JP6435325B2 (ja) | 2013-06-28 | 2014-06-26 | ガス供給を備えた蒸発装置 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US10081866B2 (enExample) |
| EP (1) | EP2818572B1 (enExample) |
| JP (1) | JP6435325B2 (enExample) |
| KR (1) | KR20160025600A (enExample) |
| CN (1) | CN105378136B (enExample) |
| WO (1) | WO2014207088A1 (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6121639B1 (ja) * | 2015-06-09 | 2017-04-26 | 株式会社アルバック | 巻取式成膜装置及び巻取式成膜方法 |
| JP2018530664A (ja) * | 2016-01-15 | 2018-10-18 | アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ | 有機材料のための蒸発源、有機材料のための蒸発源を有する装置、及び有機材料を堆積させるための方法。 |
| CN121137527A (zh) | 2016-08-01 | 2025-12-16 | 应用材料公司 | 用于在柔性基板上沉积材料的蒸发设备及其方法 |
| CN110344002B (zh) * | 2019-06-11 | 2022-03-22 | 惠科股份有限公司 | 一种蒸镀装置和蒸镀方法 |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5242500A (en) * | 1990-08-27 | 1993-09-07 | Leybold Aktiengesellschaft | Apparatus for the continuous coating of band-type substrate |
| TW448236B (en) * | 1996-05-21 | 2001-08-01 | Matsushita Electric Industrial Co Ltd | Thin film, method and apparatus for forming the same, and electronic component incorporating the same |
| JPH1053868A (ja) * | 1996-08-07 | 1998-02-24 | Kao Corp | 薄膜形成装置 |
| JPH11335819A (ja) * | 1998-05-22 | 1999-12-07 | Dainippon Printing Co Ltd | 真空蒸着装置 |
| US20050147753A1 (en) * | 1999-10-22 | 2005-07-07 | Kurt J. Lesker Company | Material deposition system and a method for coating a substrate or thermally processing a material in a vacuum |
| JP2006274308A (ja) * | 2005-03-28 | 2006-10-12 | Fuji Photo Film Co Ltd | 蛍光体シート製造装置 |
| JP2007270251A (ja) * | 2006-03-31 | 2007-10-18 | Toray Ind Inc | 多層薄膜付き積層体の製造方法および製造装置 |
| JP5194939B2 (ja) * | 2008-03-28 | 2013-05-08 | 東レ株式会社 | 金属酸化物薄膜形成装置ならびに金属酸化物薄膜付きシートの製造方法 |
| JP5121638B2 (ja) * | 2008-09-05 | 2013-01-16 | パナソニック株式会社 | 蒸着装置および蒸着装置を用いた蒸着膜の製造方法 |
| KR101638765B1 (ko) * | 2011-04-29 | 2016-07-13 | 어플라이드 머티어리얼스, 인코포레이티드 | 반응성 증착 프로세스를 위한 가스 시스템 |
| JP2013234364A (ja) * | 2012-05-09 | 2013-11-21 | Mitsubishi Plastics Inc | ガスバリア性フィルムの製造方法 |
-
2013
- 2013-06-28 EP EP13174290.0A patent/EP2818572B1/en active Active
- 2013-07-12 US US13/940,587 patent/US10081866B2/en not_active Expired - Fee Related
-
2014
- 2014-06-26 WO PCT/EP2014/063488 patent/WO2014207088A1/en not_active Ceased
- 2014-06-26 JP JP2016522493A patent/JP6435325B2/ja not_active Expired - Fee Related
- 2014-06-26 CN CN201480038710.1A patent/CN105378136B/zh not_active Expired - Fee Related
- 2014-06-26 KR KR1020167002399A patent/KR20160025600A/ko not_active Abandoned
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