JP6435325B2 - ガス供給を備えた蒸発装置 - Google Patents

ガス供給を備えた蒸発装置 Download PDF

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Publication number
JP6435325B2
JP6435325B2 JP2016522493A JP2016522493A JP6435325B2 JP 6435325 B2 JP6435325 B2 JP 6435325B2 JP 2016522493 A JP2016522493 A JP 2016522493A JP 2016522493 A JP2016522493 A JP 2016522493A JP 6435325 B2 JP6435325 B2 JP 6435325B2
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JP
Japan
Prior art keywords
gas supply
evaporation
supply pipe
crucibles
crucible
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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JP2016522493A
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English (en)
Japanese (ja)
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JP2016524047A (ja
JP2016524047A5 (enExample
Inventor
ゲルト ホフマン，
ゲルト ホフマン，
スヴェン スクラム，
スヴェン スクラム，
ローラント トラッセル，
ローラント トラッセル，
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Applied Materials Inc
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Applied Materials Inc
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Publication date
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Publication of JP2016524047A5 publication Critical patent/JP2016524047A5/ja
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/081—Oxides of aluminium, magnesium or beryllium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physical Vapour Deposition (AREA)
JP2016522493A 2013-06-28 2014-06-26 ガス供給を備えた蒸発装置 Expired - Fee Related JP6435325B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP13174290.0 2013-06-28
EP13174290.0A EP2818572B1 (en) 2013-06-28 2013-06-28 Evaporation apparatus with gas supply
PCT/EP2014/063488 WO2014207088A1 (en) 2013-06-28 2014-06-26 Evaporation apparatus with gas supply

Publications (3)

Publication Number Publication Date
JP2016524047A JP2016524047A (ja) 2016-08-12
JP2016524047A5 JP2016524047A5 (enExample) 2017-08-03
JP6435325B2 true JP6435325B2 (ja) 2018-12-05

Family

ID=48692385

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016522493A Expired - Fee Related JP6435325B2 (ja) 2013-06-28 2014-06-26 ガス供給を備えた蒸発装置

Country Status (6)

Country Link
US (1) US10081866B2 (enExample)
EP (1) EP2818572B1 (enExample)
JP (1) JP6435325B2 (enExample)
KR (1) KR20160025600A (enExample)
CN (1) CN105378136B (enExample)
WO (1) WO2014207088A1 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107406969B (zh) * 2015-06-09 2020-06-19 株式会社爱发科 卷取式成膜装置、蒸发源单元和卷取式成膜方法
WO2017121491A1 (en) * 2016-01-15 2017-07-20 Applied Materials, Inc. Evaporation source, apparatus and method for depositing organic material
CN109563607A (zh) * 2016-08-01 2019-04-02 应用材料公司 沉积设备
CN110344002B (zh) * 2019-06-11 2022-03-22 惠科股份有限公司 一种蒸镀装置和蒸镀方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5242500A (en) * 1990-08-27 1993-09-07 Leybold Aktiengesellschaft Apparatus for the continuous coating of band-type substrate
MY143286A (en) * 1996-05-21 2011-04-15 Panasonic Corp Thin film, method and apparatus for forming the same, and electronic component incorporating the same
JPH1053868A (ja) * 1996-08-07 1998-02-24 Kao Corp 薄膜形成装置
JPH11335819A (ja) * 1998-05-22 1999-12-07 Dainippon Printing Co Ltd 真空蒸着装置
US20050147753A1 (en) * 1999-10-22 2005-07-07 Kurt J. Lesker Company Material deposition system and a method for coating a substrate or thermally processing a material in a vacuum
JP2006274308A (ja) * 2005-03-28 2006-10-12 Fuji Photo Film Co Ltd 蛍光体シート製造装置
JP2007270251A (ja) * 2006-03-31 2007-10-18 Toray Ind Inc 多層薄膜付き積層体の製造方法および製造装置
JP5194939B2 (ja) * 2008-03-28 2013-05-08 東レ株式会社 金属酸化物薄膜形成装置ならびに金属酸化物薄膜付きシートの製造方法
JP5121638B2 (ja) * 2008-09-05 2013-01-16 パナソニック株式会社 蒸着装置および蒸着装置を用いた蒸着膜の製造方法
KR101638765B1 (ko) * 2011-04-29 2016-07-13 어플라이드 머티어리얼스, 인코포레이티드 반응성 증착 프로세스를 위한 가스 시스템
JP2013234364A (ja) * 2012-05-09 2013-11-21 Mitsubishi Plastics Inc ガスバリア性フィルムの製造方法

Also Published As

Publication number Publication date
CN105378136A (zh) 2016-03-02
WO2014207088A1 (en) 2014-12-31
EP2818572B1 (en) 2019-11-13
KR20160025600A (ko) 2016-03-08
US10081866B2 (en) 2018-09-25
JP2016524047A (ja) 2016-08-12
US20150000598A1 (en) 2015-01-01
CN105378136B (zh) 2018-11-02
EP2818572A1 (en) 2014-12-31

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