JP2016519782A5 - - Google Patents

Download PDF

Info

Publication number
JP2016519782A5
JP2016519782A5 JP2016504330A JP2016504330A JP2016519782A5 JP 2016519782 A5 JP2016519782 A5 JP 2016519782A5 JP 2016504330 A JP2016504330 A JP 2016504330A JP 2016504330 A JP2016504330 A JP 2016504330A JP 2016519782 A5 JP2016519782 A5 JP 2016519782A5
Authority
JP
Japan
Prior art keywords
harmonic
laser
frequency
crystal
fundamental frequency
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2016504330A
Other languages
English (en)
Other versions
JP6275240B2 (ja
JP2016519782A (ja
Filing date
Publication date
Priority claimed from US14/210,355 external-priority patent/US9608399B2/en
Application filed filed Critical
Publication of JP2016519782A publication Critical patent/JP2016519782A/ja
Publication of JP2016519782A5 publication Critical patent/JP2016519782A5/ja
Application granted granted Critical
Publication of JP6275240B2 publication Critical patent/JP6275240B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Claims (18)

  1. 光を発生させるためのレーザであって、前記レーザは、
    約1105nm〜約1130nmの対応波長を有するポンプ周波数を発生させるように構成されたポンプレーザと、
    前記ポンプ周波数の一部から基本周波数を発生させるように構成された基本波レーザであって、前記基本周波数は約1150nm〜約1175nmの対応波長を有する、基本波レーザと、
    前記基本周波数の第5高調波を発生させるように構成された第5高調波発生器モジュールと、
    前記ポンプ周波数と前記第5高調波周波数とを結合させて、約189nm〜約200nmの出力波長を発生させるように構成された周波数混合モジュールと
    を含み、
    前記周波数混合モジュールが、前記ポンプ周波数の未消費部分を再循環させるように構成された光空洞をさらに備える、レーザ。
  2. 前記第5高調波発生器が、前記基本周波数の一部から第2高調波を発生させるように構成された第1の段階を含む、請求項1に記載のレーザ。
  3. 前記第1の段階が三硼酸リチウム(LBO)結晶を含む、請求項2に記載のレーザ。
  4. 前記第5高調波発生器が、
    前記第2高調波から第4高調波を発生させるように構成された第2の段階と、
    前記第4高調波と前記基本周波数の一部とを結合させることにより前記第5高調波を発生させるように構成された第3の段階と
    をさらに含む、請求項2に記載のレーザ。
  5. 前記第2及び第3の段階のうちの少なくとも1つが、焼鈍された硼酸セシウム・リチウム(CLBO)結晶、焼鈍されたLBO結晶、水素焼鈍されたCLBO結晶、及び水素焼鈍されたLBO結晶のうちの少なくとも1つを含む、請求項4に記載のレーザ。
  6. 前記第5高調波発生器が、
    前記第2高調波の一部と前記基本周波数の一部とを結合させることにより第3高調波を発生させるように構成された第2の段階と、
    前記第3高調波と前記第2高調波の一部とを結合させることにより前記第5高調波を発生させるように構成された第3の段階と
    をさらに含む、請求項2に記載のレーザ。
  7. 前記第2の段階が、LBO結晶または焼鈍されたLBO結晶を含む、請求項6に記載のレーザ。
  8. 前記第3の段階が、硼酸セシウム・リチウム(CLBO)結晶、焼鈍されたCLBO結晶、及び水素焼鈍されたCLBO結晶のうちの少なくとも1つを含む、請求項6に記載のレーザ。
  9. 前記基本波レーザが、ラマンシフタ、ラマン発振器、及びラマン増幅器のうちの1つを備えている、請求項1に記載のレーザ。
  10. 前記ラマンシフタ、ラマン発振器、またはラマン増幅器が、添加溶融石英光ファイバ、ゲルマニウム添加溶融石英光ファイバ、及び無添加溶融石英光ファイバのうちの1つを含む、請求項9に記載のレーザ。
  11. 前記ポンプレーザが、イッテルビウム(Yb)添加ファイバ及び赤外線ダイオードレーザのうちの1つを含む、請求項1に記載のレーザ。
  12. 前記レーザダイオードが量子ドット技術を用いる、請求項11に記載のレーザ。
  13. 前記周波数混合モジュールが、焼鈍された硼酸セシウム・リチウム(CLBO)結晶または水素焼鈍されたCLBO結晶を含む、請求項1に記載のレーザ。
  14. 光を発生させる方法であって、前記方法は、
    約1105nm〜約1130nmの対応波長を有するポンプ周波数を発生させることと、
    前記ポンプ周波数の一部から基本周波数を発生させることであって、前記基本周波数は約1150nm〜約1175nmの波長に対応する、発生させることと、
    前記基本周波数から第5高調波を発生させることと、
    前記ポンプ周波数と前記第5高調波とを結合させて約189nm〜約200nmの出力波長を発生させることと
    を含
    前記ポンプ周波数と前記第5高調波とを結合させることが、前記ポンプ周波数の未消費部分を再循環させることを含む、方法。
  15. 前記基本周波数の前記発生が、前記ポンプ周波数をラマンシフトさせることを含む、請求項14に記載の方法。
  16. 前記ポンプ周波数と前記第5高調波周波数との前記結合が、焼鈍されたCLBO結晶または水素焼鈍されたCLBO結晶を用いる、請求項14に記載の方法。
  17. 前記基本周波数からの前記第5高調波周波数の前記発生が、
    前記基本周波数の一部から第2高調波を発生させることと、
    前記第2高調波から第4高調波を発生させることと、
    前記第4高調波と前記基本周波数の一部とを結合させることにより前記第5高調波を発生させることと
    を含む、請求項14に記載の方法。
  18. 前記基本周波数からの前記第5高調波周波数の前記発生が、
    前記基本周波数の一部から第2高調波を発生させることと、
    前記第2高調波の一部と前記基本周波数の一部とを結合させることにより第3高調波を発生させることと、
    前記第高調波と前記第2高調波の一部とを結合させることにより第5高調波を発生させることと
    を含む、請求項14に記載の方法。
JP2016504330A 2013-03-18 2014-03-18 193nmレーザ及び193nmレーザを用いた検査システム Active JP6275240B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201361803108P 2013-03-18 2013-03-18
US61/803,108 2013-03-18
US14/210,355 US9608399B2 (en) 2013-03-18 2014-03-13 193 nm laser and an inspection system using a 193 nm laser
US14/210,355 2014-03-13
PCT/US2014/030989 WO2014153328A1 (en) 2013-03-18 2014-03-18 A 193nm laser and an inspection system using a 193nm laser

Publications (3)

Publication Number Publication Date
JP2016519782A JP2016519782A (ja) 2016-07-07
JP2016519782A5 true JP2016519782A5 (ja) 2017-05-25
JP6275240B2 JP6275240B2 (ja) 2018-02-07

Family

ID=51581484

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016504330A Active JP6275240B2 (ja) 2013-03-18 2014-03-18 193nmレーザ及び193nmレーザを用いた検査システム

Country Status (5)

Country Link
US (1) US9608399B2 (ja)
JP (1) JP6275240B2 (ja)
KR (1) KR102127030B1 (ja)
TW (1) TWI597908B (ja)
WO (1) WO2014153328A1 (ja)

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9793673B2 (en) 2011-06-13 2017-10-17 Kla-Tencor Corporation Semiconductor inspection and metrology system using laser pulse multiplier
US9496425B2 (en) 2012-04-10 2016-11-15 Kla-Tencor Corporation Back-illuminated sensor with boron layer
US9529182B2 (en) 2013-02-13 2016-12-27 KLA—Tencor Corporation 193nm laser and inspection system
US9478402B2 (en) 2013-04-01 2016-10-25 Kla-Tencor Corporation Photomultiplier tube, image sensor, and an inspection system using a PMT or image sensor
US9410901B2 (en) 2014-03-17 2016-08-09 Kla-Tencor Corporation Image sensor, an inspection system and a method of inspecting an article
US9804101B2 (en) 2014-03-20 2017-10-31 Kla-Tencor Corporation System and method for reducing the bandwidth of a laser and an inspection system and method using a laser
US9568803B2 (en) * 2014-05-22 2017-02-14 Lumentum Operations Llc Cascaded optical harmonic generation
US10228607B2 (en) 2014-05-22 2019-03-12 Lumentum Operations Llc Second harmonic generation
US9419407B2 (en) 2014-09-25 2016-08-16 Kla-Tencor Corporation Laser assembly and inspection system using monolithic bandwidth narrowing apparatus
US9748729B2 (en) 2014-10-03 2017-08-29 Kla-Tencor Corporation 183NM laser and inspection system
CN104759753B (zh) * 2015-03-30 2016-08-31 江苏大学 多系统自动化协调工作提高激光诱导空化强化的方法
US9860466B2 (en) 2015-05-14 2018-01-02 Kla-Tencor Corporation Sensor with electrically controllable aperture for inspection and metrology systems
US10748730B2 (en) 2015-05-21 2020-08-18 Kla-Tencor Corporation Photocathode including field emitter array on a silicon substrate with boron layer
KR20170017019A (ko) * 2015-07-09 2017-02-15 주식회사 이오테크닉스 집광점 검출장치
US10462391B2 (en) 2015-08-14 2019-10-29 Kla-Tencor Corporation Dark-field inspection using a low-noise sensor
US10778925B2 (en) 2016-04-06 2020-09-15 Kla-Tencor Corporation Multiple column per channel CCD sensor architecture for inspection and metrology
US10313622B2 (en) 2016-04-06 2019-06-04 Kla-Tencor Corporation Dual-column-parallel CCD sensor and inspection systems using a sensor
JP6306659B1 (ja) * 2016-10-19 2018-04-04 ファナック株式会社 ビーム分配器
TWI747990B (zh) * 2016-11-07 2021-12-01 美商應用材料股份有限公司 偵測和分析來自半導體腔室部件之奈米顆粒的方法和設備
US10175555B2 (en) 2017-01-03 2019-01-08 KLA—Tencor Corporation 183 nm CW laser and inspection system
KR102492053B1 (ko) * 2017-08-23 2023-01-25 삼성전자주식회사 반도체 제조 장치 및 이를 이용한 반도체 장치 제조 방법
JP7436141B2 (ja) * 2017-11-03 2024-02-21 セラ セミコンダクター エンジニアリング ラボラトリーズ リミテッド 埋没欠陥の割断システム及び割断方法
CN110398486B (zh) * 2018-04-24 2024-01-30 南京简智仪器设备有限公司 一种光斑可移动的差分拉曼光谱检测装置及检测方法
US11114489B2 (en) 2018-06-18 2021-09-07 Kla-Tencor Corporation Back-illuminated sensor and a method of manufacturing a sensor
US11156817B2 (en) * 2018-08-08 2021-10-26 Kessler Optics and Photonics Solutions Ltd. Scanning microscope with enhanced FOV and NA
US10943760B2 (en) 2018-10-12 2021-03-09 Kla Corporation Electron gun and electron microscope
US11114491B2 (en) 2018-12-12 2021-09-07 Kla Corporation Back-illuminated sensor and a method of manufacturing a sensor
CN109668650B (zh) * 2019-01-07 2024-03-29 富通集团有限公司 用于热刺激电流法的检测装置
US11848350B2 (en) 2020-04-08 2023-12-19 Kla Corporation Back-illuminated sensor and a method of manufacturing a sensor using a silicon on insulator wafer
US11444691B2 (en) * 2020-11-19 2022-09-13 Northrop Grumman Systems Corporation Optical free space communication apparatus using polarization
US20220399694A1 (en) * 2021-06-11 2022-12-15 Kla Corporation Tunable duv laser assembly

Family Cites Families (173)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3755704A (en) 1970-02-06 1973-08-28 Stanford Research Inst Field emission cathode structures and devices utilizing such structures
US4178561A (en) 1978-10-02 1979-12-11 Hughes Aircraft Company Scanning arrangements for optical frequency converters
JPS58146B2 (ja) 1980-10-14 1983-01-05 浜松テレビ株式会社 フレ−ミング管
US4644221A (en) 1981-05-06 1987-02-17 The United States Of America As Represented By The Secretary Of The Army Variable sensitivity transmission mode negative electron affinity photocathode
US4853595A (en) 1987-08-31 1989-08-01 Alfano Robert R Photomultiplier tube having a transmission strip line photocathode and system for use therewith
US5120949A (en) 1991-01-17 1992-06-09 Burle Technologies, Inc. Semiconductor anode photomultiplier tube
JP2828221B2 (ja) 1991-06-04 1998-11-25 インターナショナル・ビジネス・マシーンズ・コーポレイション レーザー光波長変換装置
US5144630A (en) 1991-07-29 1992-09-01 Jtt International, Inc. Multiwavelength solid state laser using frequency conversion techniques
DE69208413T2 (de) 1991-08-22 1996-11-14 Kla Instr Corp Gerät zur automatischen Prüfung von Photomaske
EP0532927B1 (en) 1991-08-22 1996-02-21 Kla Instruments Corporation Automated photomask inspection apparatus
US5563702A (en) 1991-08-22 1996-10-08 Kla Instruments Corporation Automated photomask inspection apparatus and method
US5475227A (en) 1992-12-17 1995-12-12 Intevac, Inc. Hybrid photomultiplier tube with ion deflector
US5326978A (en) 1992-12-17 1994-07-05 Intevac, Inc. Focused electron-bombarded detector
US5760809A (en) 1993-03-19 1998-06-02 Xerox Corporation Recording sheets containing phosphonium compounds
FI940740A0 (fi) 1994-02-17 1994-02-17 Arto Salokatve Detektor foer paovisning av fotoner eller partiklar, foerfarande foer framstaellning av detektorn och maetningsfoerfarande
US6271916B1 (en) 1994-03-24 2001-08-07 Kla-Tencor Corporation Process and assembly for non-destructive surface inspections
US5493176A (en) 1994-05-23 1996-02-20 Siemens Medical Systems, Inc. Photomultiplier tube with an avalanche photodiode, a flat input end and conductors which simulate the potential distribution in a photomultiplier tube having a spherical-type input end
US6512631B2 (en) 1996-07-22 2003-01-28 Kla-Tencor Corporation Broad-band deep ultraviolet/vacuum ultraviolet catadioptric imaging system
EP0979398B1 (en) 1996-06-04 2012-01-04 KLA-Tencor Corporation Optical scanning system for surface inspection
US5999310A (en) 1996-07-22 1999-12-07 Shafer; David Ross Ultra-broadband UV microscope imaging system with wide range zoom capability
US5742626A (en) 1996-08-14 1998-04-21 Aculight Corporation Ultraviolet solid state laser, method of using same and laser surgery apparatus
US5760899A (en) 1996-09-04 1998-06-02 Erim International, Inc. High-sensitivity multispectral sensor
US6201257B1 (en) 1996-10-10 2001-03-13 Advanced Scientific Concepts, Inc. Semiconductor X-ray photocathodes devices
US6212310B1 (en) 1996-10-22 2001-04-03 Sdl, Inc. High power fiber gain media system achieved through power scaling via multiplexing
US6064759A (en) 1996-11-08 2000-05-16 Buckley; B. Shawn Computer aided inspection machine
EP2648039A3 (en) 1997-03-21 2014-07-09 Imra America, Inc. High energy optical fiber amplifier for picosecond-nanosecond pulses for advanced material processing applications
US6608676B1 (en) 1997-08-01 2003-08-19 Kla-Tencor Corporation System for detecting anomalies and/or features of a surface
US5825562A (en) 1997-08-18 1998-10-20 Novatec Corporation Method of continuous motion for prolong usage of optical elements under the irradiation of intensive laser beams
US6201601B1 (en) 1997-09-19 2001-03-13 Kla-Tencor Corporation Sample inspection system
JP3956447B2 (ja) * 1997-10-16 2007-08-08 ウシオ電機株式会社 インジェクション・シーディングを用いた露光用レーザ装置
CN100578876C (zh) 1998-03-11 2010-01-06 株式会社尼康 紫外激光装置以及使用该紫外激光装置的曝光装置和曝光方法
JP3997450B2 (ja) 1998-03-13 2007-10-24 ソニー株式会社 波長変換装置
US6376985B2 (en) 1998-03-31 2002-04-23 Applied Materials, Inc. Gated photocathode for controlled single and multiple electron beam emission
US6373869B1 (en) 1998-07-30 2002-04-16 Actinix System and method for generating coherent radiation at ultraviolet wavelengths
JP2000223408A (ja) * 1999-02-03 2000-08-11 Hitachi Ltd 半導体製造装置および半導体装置の製造方法
US6888855B1 (en) 1999-06-11 2005-05-03 Daniel Kopf Optical system for lasers
WO2000077890A2 (en) 1999-06-11 2000-12-21 Daniel Kopf Optical system for lasers
US6285018B1 (en) 1999-07-20 2001-09-04 Intevac, Inc. Electron bombarded active pixel sensor
US6498801B1 (en) 1999-08-05 2002-12-24 Alexander E. Dudelzak Solid state laser for microlithography
AU6875100A (en) 1999-09-10 2001-04-17 Nikon Corporation Laser device and exposure method
AU6865300A (en) 1999-09-10 2001-04-17 Nikon Corporation Light source and wavelength stabilization control method, exposure apparatus andexposure method, method for producing exposure apparatus, and device manufactur ing method and device
US6369888B1 (en) 1999-11-17 2002-04-09 Applied Materials, Inc. Method and apparatus for article inspection including speckle reduction
US6549647B1 (en) 2000-01-07 2003-04-15 Cyberoptics Corporation Inspection system with vibration resistant video capture
JP2001194693A (ja) * 2000-01-07 2001-07-19 Ushio Sogo Gijutsu Kenkyusho:Kk Clbo結晶による波長変換方法
US6879390B1 (en) 2000-08-10 2005-04-12 Kla-Tencor Technologies Corporation Multiple beam inspection apparatus and method
US6704339B2 (en) 2001-01-29 2004-03-09 Cymer, Inc. Lithography laser with beam delivery and beam pointing control
US8208505B2 (en) 2001-01-30 2012-06-26 Board Of Trustees Of Michigan State University Laser system employing harmonic generation
US6791099B2 (en) 2001-02-14 2004-09-14 Applied Materials, Inc. Laser scanning wafer inspection using nonlinear optical phenomena
JP3939928B2 (ja) 2001-02-28 2007-07-04 サイバーレーザー株式会社 波長変換装置
JP2003043533A (ja) 2001-08-03 2003-02-13 Kitakyushu Foundation For The Advancement Of Industry Science & Technology レーザーの第二高調波の方向を一定に保つための自動追尾装置
US20030161374A1 (en) 2001-11-21 2003-08-28 Lambda Physik Ag High-resolution confocal Fabry-Perot interferometer for absolute spectral parameter detection of excimer laser used in lithography applications
US6816520B1 (en) 2001-11-30 2004-11-09 Positive Light Solid state system and method for generating ultraviolet light
US7088443B2 (en) 2002-02-11 2006-08-08 Kla-Tencor Technologies Corporation System for detecting anomalies and/or features of a surface
US6859335B1 (en) 2002-11-20 2005-02-22 Ming Lai Method of programmed displacement for prolong usage of optical elements under the irradiation of intensive laser beams
US7957066B2 (en) 2003-02-21 2011-06-07 Kla-Tencor Corporation Split field inspection system using small catadioptric objectives
KR20060014359A (ko) * 2003-03-24 2006-02-15 가부시키가이샤 니콘 광학 소자, 광학계, 레이저 장치, 노광 장치, 마스크 검사장치 및 고분자 결정 가공 장치
EP1666520B1 (en) 2003-09-11 2013-11-13 Nikon Corporation A macromolecular crystral working apparatus ; A macromolecular crystal evaluating device with such apparatus
US7463657B2 (en) * 2003-10-09 2008-12-09 Coherent, Inc. Intracavity frequency-tripled CW laser
US7813406B1 (en) 2003-10-15 2010-10-12 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Temporal laser pulse manipulation using multiple optical ring-cavities
JP2005156516A (ja) 2003-11-05 2005-06-16 Hitachi Ltd パターン欠陥検査方法及びその装置
US7023126B2 (en) 2003-12-03 2006-04-04 Itt Manufacturing Enterprises Inc. Surface structures for halo reduction in electron bombarded devices
CN1926728A (zh) 2004-01-07 2007-03-07 光谱物理学公司 工业用直接二极管泵浦超快速放大器系统
US7313155B1 (en) 2004-02-12 2007-12-25 Liyue Mu High power Q-switched laser for soft tissue ablation
US7035012B2 (en) 2004-03-01 2006-04-25 Coherent, Inc. Optical pulse duration extender
EP1724633B1 (en) 2004-03-08 2017-01-04 Nikon Corporation Laser light source device, exposure apparatus using this laser light source device, and mask examining device
JP4365255B2 (ja) 2004-04-08 2009-11-18 浜松ホトニクス株式会社 発光体と、これを用いた電子線検出器、走査型電子顕微鏡及び質量分析装置
US20050254065A1 (en) 2004-05-12 2005-11-17 Stokowski Stanley E Method and apparatus for detecting surface characteristics on a mask blank
US7349079B2 (en) 2004-05-14 2008-03-25 Kla-Tencor Technologies Corp. Methods for measurement or analysis of a nitrogen concentration of a specimen
EP1750172B1 (en) 2004-05-26 2013-04-24 Nikon Corporation Wavelength converting optical system
US20060028984A1 (en) 2004-08-09 2006-02-09 Chang Gung University Energy efficient medium access control protocol for IEEE 802.11 WLANs
JP2006060162A (ja) 2004-08-24 2006-03-02 Nikon Corp レーザ光源装置の励起光の制御方法及びレーザ光源装置
US7627007B1 (en) 2004-08-25 2009-12-01 Kla-Tencor Technologies Corporation Non-critical phase matching in CLBO to generate sub-213nm wavelengths
JP4500641B2 (ja) 2004-09-29 2010-07-14 株式会社日立ハイテクノロジーズ 欠陥検査方法およびその装置
US7952633B2 (en) 2004-11-18 2011-05-31 Kla-Tencor Technologies Corporation Apparatus for continuous clocking of TDI sensors
US7609309B2 (en) 2004-11-18 2009-10-27 Kla-Tencor Technologies Corporation Continuous clocking of TDI sensors
JP2006250845A (ja) 2005-03-14 2006-09-21 Topcon Corp パターン欠陥検査方法とその装置
US7593440B2 (en) 2005-03-29 2009-09-22 Coherent, Inc. MOPA laser apparatus with two master oscillators for generating ultraviolet radiation
EP1716964B1 (en) 2005-04-28 2009-01-21 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing semiconductor device and laser irradiation apparatus
US7345825B2 (en) 2005-06-30 2008-03-18 Kla-Tencor Technologies Corporation Beam delivery system for laser dark-field illumination in a catadioptric optical system
JP4640029B2 (ja) 2005-08-08 2011-03-02 株式会社ニコン 波長変換光学系、レーザ光源、露光装置、被検物検査装置、及び高分子結晶の加工装置
US7864425B2 (en) 2005-09-16 2011-01-04 Panasonic Corporation Composite material and optical component using the same
JP4925085B2 (ja) 2005-09-20 2012-04-25 株式会社メガオプト 深紫外レーザー光の発生方法および深紫外レーザー装置
JP4939033B2 (ja) 2005-10-31 2012-05-23 浜松ホトニクス株式会社 光電陰極
US7715459B2 (en) 2005-11-01 2010-05-11 Cymer, Inc. Laser system
US7643529B2 (en) 2005-11-01 2010-01-05 Cymer, Inc. Laser system
US7920616B2 (en) 2005-11-01 2011-04-05 Cymer, Inc. Laser system
KR101238739B1 (ko) 2005-11-01 2013-03-04 사이머 인코포레이티드 레이저 시스템
US20090296755A1 (en) 2005-11-01 2009-12-03 Cymer, Inc. Laser system
US7471705B2 (en) 2005-11-09 2008-12-30 Lockheed Martin Corporation Ultraviolet laser system and method having wavelength in the 200-nm range
JP2007133102A (ja) 2005-11-09 2007-05-31 Canon Inc 反射防止膜を有する光学素子及びそれを有する露光装置
US7519253B2 (en) 2005-11-18 2009-04-14 Omni Sciences, Inc. Broadband or mid-infrared fiber light sources
US7528943B2 (en) 2005-12-27 2009-05-05 Kla-Tencor Technologies Corporation Method and apparatus for simultaneous high-speed acquisition of multiple images
JP2007206452A (ja) 2006-02-02 2007-08-16 Lasertec Corp 深紫外光源及び、その深紫外光源を用いたマスク検査装置及び露光装置
JP4911494B2 (ja) 2006-03-18 2012-04-04 国立大学法人大阪大学 波長変換光学素子、波長変換光学素子の製造方法、波長変換装置、紫外線レーザ照射装置およびレーザ加工装置
EP2013951A4 (en) 2006-04-28 2011-08-03 Corning Inc PULSED RAMAN LASER SYSTEMS IN ULTRAVIOLET AND VISIBLE LIGHT
US7113325B1 (en) 2006-05-03 2006-09-26 Mitsubishi Materials Corporation Wavelength conversion method with improved conversion efficiency
US7593437B2 (en) 2006-05-15 2009-09-22 Coherent, Inc. MOPA laser apparatus with two master oscillators for generating ultraviolet radiation
US20070263680A1 (en) 2006-05-15 2007-11-15 Andrei Starodoumov MOPA laser apparatus with two master oscillators for generating ultraviolet radiation
US20090185583A1 (en) 2006-06-02 2009-07-23 Corning Incorporated UV and Visible Laser Systems
US7457330B2 (en) 2006-06-15 2008-11-25 Pavilion Integration Corporation Low speckle noise monolithic microchip RGB lasers
US7970201B2 (en) 2006-07-31 2011-06-28 Applied Materials Israel, Ltd. Method and system for defect detection
DE102007004235B3 (de) 2006-12-21 2008-01-03 Coherent Gmbh Verfahren zur Frequenzkonversion eines Lichtstrahls mittels eines CLBO-Kristalls
JP5342769B2 (ja) 2006-12-28 2013-11-13 浜松ホトニクス株式会社 光電陰極、電子管及び光電子増倍管
US9771666B2 (en) 2007-01-17 2017-09-26 Crystal Is, Inc. Defect reduction in seeded aluminum nitride crystal growth
CN107059116B (zh) 2007-01-17 2019-12-31 晶体公司 引晶的氮化铝晶体生长中的缺陷减少
JP4224863B2 (ja) 2007-02-02 2009-02-18 レーザーテック株式会社 検査装置及び検査方法、並びにパターン基板の製造方法
JP2008209664A (ja) 2007-02-27 2008-09-11 Advanced Mask Inspection Technology Kk パターン検査装置
US8755417B1 (en) * 2007-04-16 2014-06-17 Kla-Tencor Corporation Coherent light generation below about two-hundred nanometers
US20110073982A1 (en) 2007-05-25 2011-03-31 Armstrong J Joseph Inspection system using back side illuminated linear sensor
US7586108B2 (en) 2007-06-25 2009-09-08 Asml Netherlands B.V. Radiation detector, method of manufacturing a radiation detector and lithographic apparatus comprising a radiation detector
US7999342B2 (en) 2007-09-24 2011-08-16 Taiwan Semiconductor Manufacturing Company, Ltd Image sensor element for backside-illuminated sensor
JP4634427B2 (ja) 2007-09-27 2011-02-16 株式会社東芝 照明装置及びパターン検査装置
US7525649B1 (en) 2007-10-19 2009-04-28 Kla-Tencor Technologies Corporation Surface inspection system using laser line illumination with two dimensional imaging
US7605376B2 (en) 2007-10-29 2009-10-20 Fairchild Imaging, Inc. CMOS sensor adapted for dental x-ray imaging
US8298335B2 (en) 2007-12-18 2012-10-30 Kla-Tencor Technologies Corporation Enclosure for controlling the environment of optical crystals
JP2009145791A (ja) 2007-12-18 2009-07-02 Lasertec Corp 波長変換装置、検査装置及び波長変換方法
US7885298B2 (en) 2008-01-16 2011-02-08 Deep Photonics Corporation Method and apparatus for producing arbitrary pulsetrains from a harmonic fiber laser
US7633979B2 (en) 2008-02-12 2009-12-15 Pavilion Integration Corporation Method and apparatus for producing UV laser from all-solid-state system
JP2010003755A (ja) 2008-06-18 2010-01-07 Mitsubishi Electric Corp 波長変換レーザ装置
JP2010054547A (ja) 2008-08-26 2010-03-11 Lasertec Corp 紫外レーザ装置
US9080991B2 (en) 2008-09-29 2015-07-14 Kla-Tencor Corp. Illuminating a specimen for metrology or inspection
WO2010037106A2 (en) 2008-09-29 2010-04-01 Kla-Tencor Corporation Illumination subsystems of a metrology system, metrology systems, and methods for illuminating a specimen for metrology measurements
US7875948B2 (en) 2008-10-21 2011-01-25 Jaroslav Hynecek Backside illuminated image sensor
FR2938935B1 (fr) 2008-11-21 2011-05-06 Eolite Systems Dispositif d'allongement de la duree de vie d'un systeme optique non lineaire soumis au rayonnement d'un faisceau laser intense et source optique non lineaire comprenant ce dispositif
US8146498B2 (en) 2008-12-03 2012-04-03 Eastman Kodak Company Printing plate registration
US8624971B2 (en) 2009-01-23 2014-01-07 Kla-Tencor Corporation TDI sensor modules with localized driving and signal processing circuitry for high speed inspection
JP5237874B2 (ja) 2009-04-24 2013-07-17 株式会社日立ハイテクノロジーズ 欠陥検査方法および欠陥検査装置
JP4565207B1 (ja) 2009-04-28 2010-10-20 レーザーテック株式会社 波長変換装置及び波長変換方法並びに半導体装置の製造方法
US20100301437A1 (en) 2009-06-01 2010-12-02 Kla-Tencor Corporation Anti-Reflective Coating For Sensors Suitable For High Throughput Inspection Systems
JP2011023532A (ja) 2009-07-15 2011-02-03 Nikon Corp 光増幅器、レーザ装置及び光源装置
US9023152B2 (en) 2009-09-17 2015-05-05 Kla-Tencor Corporation CLBO crystal growth
CN102035085B (zh) 2009-10-08 2014-03-05 群康科技(深圳)有限公司 导电结构及其制造方法
WO2011046780A1 (en) 2009-10-13 2011-04-21 Nanda Nathan Pulsed high-power laser apparatus and methods
US8629384B1 (en) 2009-10-26 2014-01-14 Kla-Tencor Corporation Photomultiplier tube optimized for surface inspection in the ultraviolet
CN101702490B (zh) 2009-10-29 2011-02-09 长春理工大学 一种采用阱中量子点(dwell)的中红外锑化物激光器结构
US20110134944A1 (en) 2009-12-08 2011-06-09 The Arizona Board Of Regents On Behalf Of The University Of Arizona Efficient pulse laser light generation and devices using the same
JP2011128330A (ja) 2009-12-17 2011-06-30 Nikon Corp レーザ装置
JP4590578B1 (ja) 2010-04-01 2010-12-01 レーザーテック株式会社 光源装置、マスク検査装置、及びコヒーレント光発生方法
WO2011148895A1 (ja) 2010-05-24 2011-12-01 ギガフォトン株式会社 固体レーザ装置およびレーザシステム
EP2601714A4 (en) 2010-08-08 2014-12-17 Kla Tencor Corp DYNAMIC WAVE FRONT CONTROL OF A LASER SYSTEM WITH FREQUENCY CONVERSION
US8482846B2 (en) 2010-08-09 2013-07-09 Coherent Gmbh Advanced shifting algorithm for prolonging the life of an optically nonlinear crystal
US8824514B2 (en) 2010-11-09 2014-09-02 Kla-Tencor Corporation Measuring crystal site lifetime in a non-linear optical crystal
US8711470B2 (en) 2010-11-14 2014-04-29 Kla-Tencor Corporation High damage threshold frequency conversion system
JP6010042B2 (ja) 2010-12-16 2016-10-19 ケーエルエー−テンカー コーポレイション ウェーハ検査
US8669512B2 (en) 2010-12-28 2014-03-11 Technion Research & Development Foundation Limited System and method for analyzing light by three-photon counting
WO2012154468A2 (en) 2011-05-06 2012-11-15 Kla-Tencor Corporation Deep ultra-violet light sources for wafer and reticle inspection systems
US9793673B2 (en) 2011-06-13 2017-10-17 Kla-Tencor Corporation Semiconductor inspection and metrology system using laser pulse multiplier
JP5731444B2 (ja) 2011-07-07 2015-06-10 富士フイルム株式会社 放射線検出器、放射線画像撮影装置、及び放射線画像撮影システム
WO2013006867A1 (en) 2011-07-07 2013-01-10 Massachussetts Institute Of Technology Methods and apparatus for ultrathin catalyst layer for photoelectrode
US9279774B2 (en) 2011-07-12 2016-03-08 Kla-Tencor Corp. Wafer inspection
ITTO20110649A1 (it) 2011-07-19 2013-01-20 St Microelectronics Srl Dispositivo di fotorivelazione con copertura protettiva e antiriflesso, e relativo metodo di fabbricazione
US8873596B2 (en) 2011-07-22 2014-10-28 Kla-Tencor Corporation Laser with high quality, stable output beam, and long life high conversion efficiency non-linear crystal
US9076639B2 (en) 2011-09-07 2015-07-07 Kla-Tencor Corporation Transmissive-reflective photocathode
US8748828B2 (en) 2011-09-21 2014-06-10 Kla-Tencor Corporation Interposer based imaging sensor for high-speed image acquisition and inspection systems
US20130077086A1 (en) 2011-09-23 2013-03-28 Kla-Tencor Corporation Solid-State Laser And Inspection System Using 193nm Laser
US8872159B2 (en) 2011-09-29 2014-10-28 The United States Of America, As Represented By The Secretary Of The Navy Graphene on semiconductor detector
US9250178B2 (en) 2011-10-07 2016-02-02 Kla-Tencor Corporation Passivation of nonlinear optical crystals
US9389166B2 (en) 2011-12-16 2016-07-12 Kla-Tencor Corporation Enhanced high-speed logarithmic photo-detector for spot scanning system
US8754972B2 (en) 2012-02-01 2014-06-17 Kla-Tencor Corporation Integrated multi-channel analog front end and digitizer for high speed imaging applications
US9496425B2 (en) 2012-04-10 2016-11-15 Kla-Tencor Corporation Back-illuminated sensor with boron layer
US20130313440A1 (en) * 2012-05-22 2013-11-28 Kla-Tencor Corporation Solid-State Laser And Inspection System Using 193nm Laser
US8953869B2 (en) 2012-06-14 2015-02-10 Kla-Tencor Corporation Apparatus and methods for inspecting extreme ultra violet reticles
US9601299B2 (en) 2012-08-03 2017-03-21 Kla-Tencor Corporation Photocathode including silicon substrate with boron layer
US9042006B2 (en) 2012-09-11 2015-05-26 Kla-Tencor Corporation Solid state illumination source and inspection system
NL2011568A (en) 2012-10-31 2014-05-06 Asml Netherlands Bv Sensor and lithographic apparatus.
US9151940B2 (en) 2012-12-05 2015-10-06 Kla-Tencor Corporation Semiconductor inspection and metrology system using laser pulse multiplier
US9426400B2 (en) 2012-12-10 2016-08-23 Kla-Tencor Corporation Method and apparatus for high speed acquisition of moving images using pulsed illumination
US8929406B2 (en) 2013-01-24 2015-01-06 Kla-Tencor Corporation 193NM laser and inspection system
US9529182B2 (en) 2013-02-13 2016-12-27 KLA—Tencor Corporation 193nm laser and inspection system
US9478402B2 (en) 2013-04-01 2016-10-25 Kla-Tencor Corporation Photomultiplier tube, image sensor, and an inspection system using a PMT or image sensor
US11180866B2 (en) 2013-04-10 2021-11-23 Kla Corporation Passivation of nonlinear optical crystals
US9347890B2 (en) 2013-12-19 2016-05-24 Kla-Tencor Corporation Low-noise sensor and an inspection system using a low-noise sensor
US9748294B2 (en) 2014-01-10 2017-08-29 Hamamatsu Photonics K.K. Anti-reflection layer for back-illuminated sensor

Similar Documents

Publication Publication Date Title
JP2016519782A5 (ja)
Bednyakova et al. Evolution of dissipative solitons in a fiber laser oscillator in the presence of strong Raman scattering
Koyama et al. Power scaling of a picosecond vortex laser based on a stressed Yb-doped fiber amplifier
JPWO2011158927A1 (ja) 紫外レーザ装置
Délen et al. Hybrid master oscillator power amplifier high-power narrow-linewidth nanosecond laser source at 257 nm
Xuan et al. 300-mW narrow-linewidth deep-ultraviolet light generation at 193 nm by frequency mixing between Yb-hybrid and Er-fiber lasers
Yoshitomi et al. Long-term stable passive synchronization of 50 µJ femtosecond Yb-doped fiber chirped-pulse amplifier with a mode-locked Ti: sapphire laser
US8929410B2 (en) Ultraviolet laser device
JP2013104889A (ja) 光源装置及び波長変換方法
Liu et al. Compact high-power multiwavelength photonic-crystal-fiber-based laser source of femtosecond pulses in the infrared–visible–ultraviolet range
AU2015268077A1 (en) An optical parametric generator
Lin et al. Mid-infrared, wide-tunable, continuous-wave Nd: YVO4/PPMgLN intracavity optical parametric oscillator
Li et al. Novel optical parametric amplifier at 1572 nm wavelength using KTP crystal
Deng et al. Widely tunable soliton self-frequency shift and dispersive wave generation in a highly nonlinear fiber
He et al. Pulse operation of linearly polarized diode-pumped cesium-vapor laser based on acousto-optical modulation
Rohrbacher et al. Sub-100 fs high average power directly blue-diode-laser-pumped Ti: sapphire oscillator
JP2012027215A (ja) 紫外レーザ装置
Geskus et al. Ten deep-blue to cyan laser emission lines from 451 nm to 495 nm using Nd: YLF-KGW-LBO intracavity Raman laser
Xuguang et al. 440 nm solid-state blue laser produced by a monolithic periodically poled lithium niobate crystal based on cascaded third-harmonic generation
Miyazaki et al. Tunable 820.65 nm light source by injection-seeded optical parametric oscillator and amplifier for Muonium Lyman-alpha Generation
Prandolini et al. First experimental results towards a 100 W wavelength tunable femtosecond OPCPA
Rowen et al. Multi-mJ bursts of green light obtained by frequency doubling the output of a fiber based MOPA
Honea et al. Green and UV frequency conversion of a variable pulse repetition frequency photonic crystal fiber system
Jung et al. Development of a 20-W hybrid UV DPSSL system
Xu The Nonlinear Optics of Self-assembled Supramolecular Systems