JP2016519423A5 - - Google Patents

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Publication number
JP2016519423A5
JP2016519423A5 JP2016501882A JP2016501882A JP2016519423A5 JP 2016519423 A5 JP2016519423 A5 JP 2016519423A5 JP 2016501882 A JP2016501882 A JP 2016501882A JP 2016501882 A JP2016501882 A JP 2016501882A JP 2016519423 A5 JP2016519423 A5 JP 2016519423A5
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Japan
Prior art keywords
acid
cleaning composition
aqueous cleaning
concentration
amino
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JP2016501882A
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English (en)
Japanese (ja)
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JP2016519423A (ja
JP6751015B2 (ja
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Priority claimed from PCT/US2014/025563 external-priority patent/WO2014151361A1/en
Publication of JP2016519423A publication Critical patent/JP2016519423A/ja
Publication of JP2016519423A5 publication Critical patent/JP2016519423A5/ja
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JP2016501882A 2013-03-15 2014-03-13 銅の化学的機械的平坦化後のための水性清浄化組成物 Active JP6751015B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201361793073P 2013-03-15 2013-03-15
US61/793,073 2013-03-15
PCT/US2014/025563 WO2014151361A1 (en) 2013-03-15 2014-03-13 Aqueous cleaning composition for post copper chemical mechanical planarization

Publications (3)

Publication Number Publication Date
JP2016519423A JP2016519423A (ja) 2016-06-30
JP2016519423A5 true JP2016519423A5 (https=) 2019-01-31
JP6751015B2 JP6751015B2 (ja) 2020-09-02

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JP2016501882A Active JP6751015B2 (ja) 2013-03-15 2014-03-13 銅の化学的機械的平坦化後のための水性清浄化組成物

Country Status (7)

Country Link
US (1) US20140264151A1 (https=)
EP (1) EP2971248B1 (https=)
JP (1) JP6751015B2 (https=)
KR (1) KR102237745B1 (https=)
CN (1) CN105264117B (https=)
TW (1) TWI515339B (https=)
WO (1) WO2014151361A1 (https=)

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