JP2016502733A5 - - Google Patents

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Publication number
JP2016502733A5
JP2016502733A5 JP2015539715A JP2015539715A JP2016502733A5 JP 2016502733 A5 JP2016502733 A5 JP 2016502733A5 JP 2015539715 A JP2015539715 A JP 2015539715A JP 2015539715 A JP2015539715 A JP 2015539715A JP 2016502733 A5 JP2016502733 A5 JP 2016502733A5
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JP
Japan
Prior art keywords
ion beam
ion
scanning assembly
beam scanning
electrodes
Prior art date
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Application number
JP2015539715A
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English (en)
Japanese (ja)
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JP6453756B2 (ja
JP2016502733A (ja
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Publication date
Priority claimed from US13/658,990 external-priority patent/US9165744B2/en
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Publication of JP2016502733A publication Critical patent/JP2016502733A/ja
Publication of JP2016502733A5 publication Critical patent/JP2016502733A5/ja
Application granted granted Critical
Publication of JP6453756B2 publication Critical patent/JP6453756B2/ja
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JP2015539715A 2012-10-24 2013-10-22 イオンビーム処理装置 Active JP6453756B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US13/658,990 2012-10-24
US13/658,990 US9165744B2 (en) 2012-10-24 2012-10-24 Apparatus for treating ion beam
PCT/US2013/066160 WO2014066375A1 (en) 2012-10-24 2013-10-22 Apparatus for treating ion beam

Publications (3)

Publication Number Publication Date
JP2016502733A JP2016502733A (ja) 2016-01-28
JP2016502733A5 true JP2016502733A5 (enExample) 2016-10-06
JP6453756B2 JP6453756B2 (ja) 2019-01-16

Family

ID=49519127

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015539715A Active JP6453756B2 (ja) 2012-10-24 2013-10-22 イオンビーム処理装置

Country Status (6)

Country Link
US (1) US9165744B2 (enExample)
JP (1) JP6453756B2 (enExample)
KR (1) KR102039920B1 (enExample)
CN (1) CN104823263B (enExample)
TW (1) TWI597760B (enExample)
WO (1) WO2014066375A1 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9881711B2 (en) 2014-09-12 2018-01-30 Mitsubishi Electric Corporation Beam transport system and particle beam therapy system
JP6462718B2 (ja) * 2014-12-04 2019-01-30 株式会社東芝 粒子線ビーム調整装置及び方法、粒子線治療装置
US9679745B2 (en) * 2015-10-14 2017-06-13 Varian Semiconductor Equipment Associates, Inc. Controlling an ion beam in a wide beam current operation range
CN113380598A (zh) * 2020-03-09 2021-09-10 北京烁科中科信电子装备有限公司 一种离子注入机电扫描图形识别注入方法
US11217427B1 (en) * 2020-11-27 2022-01-04 Applied Materials, Inc. System, apparatus and method for bunched ribbon ion beam
CN113140436A (zh) * 2021-04-22 2021-07-20 大连交通大学 扫描式氩离子源
CN115376874B (zh) * 2022-08-23 2024-10-18 浙江陶特容器科技股份有限公司 一种基于离子注入机的离子束注入控制方法及装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5769653A (en) * 1980-10-20 1982-04-28 Fujitsu Ltd Charged particle beam device
JP2881649B2 (ja) * 1989-03-22 1999-04-12 日本真空技術株式会社 イオン注入装置
JP3859437B2 (ja) * 2000-08-04 2006-12-20 株式会社東芝 荷電ビーム露光装置
JP4032111B2 (ja) 2001-07-19 2008-01-16 独立行政法人産業技術総合研究所 荷電粒子ビーム装置
GB0408751D0 (en) * 2004-04-20 2004-05-26 Micromass Ltd Mass spectrometer
JP5085887B2 (ja) * 2006-05-30 2012-11-28 株式会社Sen ビーム処理装置及びビーム処理方法
JP5329050B2 (ja) 2007-04-20 2013-10-30 株式会社Sen ビーム処理装置

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