JP2016500449A5 - - Google Patents
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- Publication number
- JP2016500449A5 JP2016500449A5 JP2015546004A JP2015546004A JP2016500449A5 JP 2016500449 A5 JP2016500449 A5 JP 2016500449A5 JP 2015546004 A JP2015546004 A JP 2015546004A JP 2015546004 A JP2015546004 A JP 2015546004A JP 2016500449 A5 JP2016500449 A5 JP 2016500449A5
- Authority
- JP
- Japan
- Prior art keywords
- capping layer
- thickness
- optical element
- manufacturing
- reflective optical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201261734183P | 2012-12-06 | 2012-12-06 | |
| US61/734,183 | 2012-12-06 | ||
| DE102012222466.1A DE102012222466A1 (de) | 2012-12-06 | 2012-12-06 | Reflektives optisches Element für die EUV-Lithographie |
| DE102012222466.1 | 2012-12-06 | ||
| PCT/EP2013/075620 WO2014086905A1 (en) | 2012-12-06 | 2013-12-05 | Reflective optical element for euv lithography and method of manufacturing a reflective optical element |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016500449A JP2016500449A (ja) | 2016-01-12 |
| JP2016500449A5 true JP2016500449A5 (https=) | 2017-01-19 |
| JP6309535B2 JP6309535B2 (ja) | 2018-04-18 |
Family
ID=50778061
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015546004A Active JP6309535B2 (ja) | 2012-12-06 | 2013-12-05 | Ｅｕｖリソグラフィー用反射性光学素子及びその製造方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US9606446B2 (https=) |
| EP (1) | EP2929398B9 (https=) |
| JP (1) | JP6309535B2 (https=) |
| KR (1) | KR102127230B1 (https=) |
| DE (1) | DE102012222466A1 (https=) |
| WO (1) | WO2014086905A1 (https=) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102016212373A1 (de) * | 2016-07-07 | 2018-01-11 | Carl Zeiss Smt Gmbh | Optisches System, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage |
| US10468149B2 (en) * | 2017-02-03 | 2019-11-05 | Globalfoundries Inc. | Extreme ultraviolet mirrors and masks with improved reflectivity |
| JP2021071543A (ja) | 2019-10-29 | 2021-05-06 | ギガフォトン株式会社 | 極端紫外光集光ミラー、極端紫外光生成装置、及び電子デバイスの製造方法 |
| DE102020203286A1 (de) * | 2020-03-13 | 2021-09-16 | 3D Global Holding Gmbh | Lentikularlinsen-Baugruppe zum Anbringen an einer Anzeigefläche |
| KR102882943B1 (ko) * | 2022-04-01 | 2025-11-07 | 에이지씨 가부시키가이샤 | 반사형 마스크 블랭크, 반사형 마스크, 반사형 마스크 블랭크의 제조 방법 및 반사형 마스크의 제조 방법 |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI267704B (en) * | 1999-07-02 | 2006-12-01 | Asml Netherlands Bv | Capping layer for EUV optical elements |
| US20030081722A1 (en) * | 2001-08-27 | 2003-05-01 | Nikon Corporation | Multilayer-film mirrors for use in extreme UV optical systems, and methods for manufacturing such mirrors exhibiting improved wave aberrations |
| DE10209493B4 (de) | 2002-03-07 | 2007-03-22 | Carl Zeiss Smt Ag | Verfahren zur Vermeidung von Kontamination auf optischen Elementen, Vorrichtung zur Regelung von Kontamination auf optischen Elementen und EUV-Lithographievorrichtung |
| DE10309084A1 (de) * | 2003-03-03 | 2004-09-16 | Carl Zeiss Smt Ag | Reflektives optisches Element und EUV-Lithographiegerät |
| JP4521753B2 (ja) * | 2003-03-19 | 2010-08-11 | Ｈｏｙａ株式会社 | 反射型マスクの製造方法及び半導体装置の製造方法 |
| EP1930771A1 (en) | 2006-12-04 | 2008-06-11 | Carl Zeiss SMT AG | Projection objectives having mirror elements with reflective coatings |
| JP5194547B2 (ja) * | 2007-04-26 | 2013-05-08 | 凸版印刷株式会社 | 極端紫外線露光用マスク及びマスクブランク |
| CN101836163B (zh) | 2007-08-20 | 2012-06-27 | 卡尔蔡司Smt有限责任公司 | 包括具有反射涂层的镜元件的投射物镜 |
| ATE512389T1 (de) * | 2007-10-23 | 2011-06-15 | Imec | Erkennung von kontaminationen in euv-systemen |
| WO2011071086A1 (ja) * | 2009-12-09 | 2011-06-16 | 旭硝子株式会社 | Ｅｕｖリソグラフィ用光学部材 |
| TWI464529B (zh) * | 2009-12-09 | 2014-12-11 | 旭硝子股份有限公司 | EUV microfilm with anti-reflective substrate, EUV microsurgical reflective mask substrate, EUV microsurgical reflective mask and manufacturing method of the reflective substrate |
| DE102009054986B4 (de) * | 2009-12-18 | 2015-11-12 | Carl Zeiss Smt Gmbh | Reflektive Maske für die EUV-Lithographie |
| JP5926264B2 (ja) | 2010-09-27 | 2016-05-25 | カール・ツァイス・エスエムティー・ゲーエムベーハー | ミラー、当該ミラーを備える投影対物レンズ、及び当該投影対物レンズを備えるマイクロリソグラフィ用投影露光装置 |
| DE102010041502A1 (de) * | 2010-09-28 | 2012-03-29 | Carl Zeiss Smt Gmbh | Spiegel, Projektionsobjektiv mit einem solchen Spiegel und Projektionsbelichtungs-anlage für die Mikrolithographie mit einem solchen Projektionsobjektiv |
| DE102011076011A1 (de) * | 2011-05-18 | 2012-11-22 | Carl Zeiss Smt Gmbh | Reflektives optisches Element und optisches System für die EUV-Lithographie |
| DE102012222451A1 (de) | 2012-12-06 | 2014-06-26 | Carl Zeiss Smt Gmbh | Reflektives optisches Element für die EUV-Lithographie |
-
2012
- 2012-12-06 DE DE102012222466.1A patent/DE102012222466A1/de not_active Ceased
-
2013
- 2013-12-05 KR KR1020157017603A patent/KR102127230B1/ko active Active
- 2013-12-05 JP JP2015546004A patent/JP6309535B2/ja active Active
- 2013-12-05 EP EP13811826.0A patent/EP2929398B9/en not_active Not-in-force
- 2013-12-05 WO PCT/EP2013/075620 patent/WO2014086905A1/en not_active Ceased
-
2015
- 2015-06-05 US US14/732,248 patent/US9606446B2/en not_active Expired - Fee Related
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