JP2016169948A - 光計測装置及び光計測方法 - Google Patents
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Abstract
Description
101:基板
102:金属層
103:誘電体層
110:アレイ状に反射型位相付与素子
150:仮想開口
500:光学系
501:光源
502:コリメートレンズ
503、513:λ/2板
504:偏光ビームスプリッタ
505、509、514:λ/4板
506:対物レンズ
507:対物レンズアクチュエータ
508:観測対象
511:干渉光学系
512:ハーフビームスプリッタ
515、516:集光レンズ
517、518:ウォラストンプリズム
519、520:電流差動型の光検出器
523:信号処理部
525:画像表示部
Claims (15)
- レーザ光を出射する光源と、
前記光源から出射されたレーザ光を信号光と参照光に分岐する光分岐部と、
前記信号光を観測対象に集光する集光手段と、
前記観測対象によって反射された信号光を前記参照光と合波して干渉光を生成する手段と、
前記参照光の光束内に、所定の位相分布又は強度分布の少なくとも一方を付与する手段と、
前記干渉光を検出する検出器と、
前記検出器からの信号に基づいて、前記観測対象の断層画像を生成する画像処理部と
を有することを特徴とする光計測装置。 - 前記位相分布又は強度分布の少なくとも一方を付与する手段は、円錐型の位相分布を付与する手段であることを特徴とする請求項1記載の光計測装置。
- 前記位相分布又は強度分布の少なくとも一方を付与する手段は、ステップ状の位相分布を付与する手段であることを特徴とする請求項1記載の光計測装置。
- 前記ステップ状の位相分布を付与する手段は、前記参照光の光束を、内周側と外周側に分割し、前記内周側に位相差を付与したものであることを特徴とする請求項5記載の光計測装置。
- 前記ステップ状の位相分布は、検出レンズ開口内において付与する位相がゼロの領域ととλ/2の領域の面積が、ほぼ等しいことを特徴とする請求項5記載の光計測装置。
- 前記位相分布又は強度分布の少なくとも一方を付与する手段は、ステップ状の強度分布を付与する手段であることを特徴とする請求項1記載の光計測装置。
- 前記位相分布又は強度分布の少なくとも一方を付与する手段は、複数の位相分布及び/又は強度分布を付与する空間光変調器であることを特徴とする請求項1記載の光計測装置。
- 前記位相分布又は強度分布の少なくとも一方を付与する手段は、前記参照光のデフォーカス状態を変化させる手段であることを特徴とする請求項1記載の光計測装置。
- 前記干渉光は、互いに位相関係が異なる4つの干渉光であり、それぞれの干渉光が前記検出器によって検出されることを特徴とする請求項1記載の光計測装置。
- 前記光源、前記光分岐部、前記集光手段、前記干渉光を生成する手段、前記検出器を、一体として駆動する駆動部を有することを特徴とする請求項1記載の光計測装置。
- レーザ光を信号光と参照光に分岐し、
前記信号光を、平面と見なせる境界面を介して三次元形状の観察対象に集光して照射し、
前記観察対象から反射した信号光と、光束内に所定の位相分布又は強度分布の少なくとも一方が付与された前記参照光とを干渉させ、
前記干渉させた干渉光を検出し、
前記検出した検出信号をもとに前記観察対象の断層像を生成する
ことを特徴とする光計測方法。 - 前記参照光に位相分布を付与するステップと、
前記位相分布が付与された参照光を用いて生成された前記干渉光の検出信号から、画像を取得するステップと
を、複数回繰り返して前記断層像を合成することを特徴とする請求項12記載の光計測方法。 - 前記参照光に位相分布又は強度分布の少なくとも一方を付与するステップと、
前記位相分布又は強度分布の少なくとも一方が付与された参照光を用いて生成された前記干渉光の検出信号から、画像を取得するステップと
を、前記位相分布又は強度分布を変化させながら複数回繰り返して前記断層像を合成することを特徴とする請求項12記載の光計測方法。
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JP2015047871A JP6462432B2 (ja) | 2015-03-11 | 2015-03-11 | 光計測装置及び光計測方法 |
US14/991,022 US10006755B2 (en) | 2015-03-11 | 2016-01-08 | Optical measurement apparatus and optical measurement method |
EP16154590.0A EP3067657A1 (en) | 2015-03-11 | 2016-02-08 | Optical measurement apparatus and optical measurement method |
CN201610091433.1A CN105973845B (zh) | 2015-03-11 | 2016-02-18 | 光学测量装置和光学测量方法 |
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Cited By (4)
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KR20180121077A (ko) * | 2017-04-28 | 2018-11-07 | 연세대학교 산학협력단 | 고주파 및 미분간섭을 활용한 병변 진단 장치 |
JP2018189395A (ja) * | 2017-04-28 | 2018-11-29 | 株式会社Screenホールディングス | 試料容器およびこれを用いる撮像方法 |
WO2019150695A1 (ja) * | 2018-01-30 | 2019-08-08 | 株式会社日立ハイテクノロジーズ | 光画像計測装置 |
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US10584954B2 (en) | 2015-09-16 | 2020-03-10 | The General Hospital Corporation | Apparatus and methods for mirror tunnel imaging device and for providing pseudobessel beams in a miniaturized optical system for imaging |
JP6628589B2 (ja) * | 2015-12-11 | 2020-01-08 | 株式会社Screenホールディングス | 撮像装置 |
KR101856753B1 (ko) | 2016-09-22 | 2018-05-11 | 한국과학기술연구원 | 망막 질환 검지 장치 |
JP6731868B2 (ja) * | 2017-02-17 | 2020-07-29 | 株式会社Screenホールディングス | 撮像方法および撮像装置 |
EP3653987A1 (en) * | 2018-11-16 | 2020-05-20 | Nokia Technologies Oy | Apparatus and method for detecting light |
CN112268505B (zh) * | 2020-10-22 | 2022-11-08 | 江苏集萃微纳自动化系统与装备技术研究所有限公司 | 一种基于全场光学相干层析技术的显微操作系统 |
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JP6462432B2 (ja) | 2019-01-30 |
CN105973845B (zh) | 2019-11-05 |
US20160265899A1 (en) | 2016-09-15 |
US10006755B2 (en) | 2018-06-26 |
CN105973845A (zh) | 2016-09-28 |
EP3067657A1 (en) | 2016-09-14 |
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