JP2016128208A - 向上した品質の多スペクトル硫化亜鉛 - Google Patents
向上した品質の多スペクトル硫化亜鉛 Download PDFInfo
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- C04B35/515—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0623—Sulfides, selenides or tellurides
- C23C14/0629—Sulfides, selenides or tellurides of zinc, cadmium or mercury
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
- C23C14/354—Introduction of auxiliary energy into the plasma
- C23C14/357—Microwaves, e.g. electron cyclotron resonance enhanced sputtering
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- C—CHEMISTRY; METALLURGY
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/305—Sulfides, selenides, or tellurides
- C23C16/306—AII BVI compounds, where A is Zn, Cd or Hg and B is S, Se or Te
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
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- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/65—Aspects relating to heat treatments of ceramic bodies such as green ceramics or pre-sintered ceramics, e.g. burning, sintering or melting processes
- C04B2235/656—Aspects relating to heat treatments of ceramic bodies such as green ceramics or pre-sintered ceramics, e.g. burning, sintering or melting processes characterised by specific heating conditions during heat treatment
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- C04B2235/65—Aspects relating to heat treatments of ceramic bodies such as green ceramics or pre-sintered ceramics, e.g. burning, sintering or melting processes
- C04B2235/656—Aspects relating to heat treatments of ceramic bodies such as green ceramics or pre-sintered ceramics, e.g. burning, sintering or melting processes characterised by specific heating conditions during heat treatment
- C04B2235/6567—Treatment time
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- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
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Abstract
【解決手段】硫化亜鉛を保持するチャックをコーティングし、かつ硫化亜鉛をコーティングされていない研磨剤粒子で機械加工することにより、金属汚染物質が低減された低散乱無色透明硫化亜鉛が製造される。不活性ホイルは酸クリーニング方法でクリーニングされ、また硫化亜鉛もクリーニングする。硫化亜鉛は不活性化ホイルに包まれ、次いでHIPプロセスによって処理されて、低散乱無色透明硫化亜鉛を提供する。この低散乱無色透明硫化亜鉛は窓およびドームのような物品に使用されうる。
【選択図】なし
Description
カリフォルニア州ロサンゼルスのナショナルダイヤモンドラボラトリーからの0.16cmのコーティングされていないダイヤモンド深さ、平均のコーティングされていないダイヤモンドグリッドサイズ240および濃度100(72カラット/in3)の樹脂結合ホイールを有するブランチャードグラインダーにおいて硫化亜鉛プレートを創成する(機械加工する)ことにより、25cm×25cm×1cmの寸法を有する化学蒸着硫化亜鉛の5枚のプレートが準備される。研磨パッドは硫化亜鉛プレートとブランチャードグラインダーのチャックとの間に配置される。この研磨パッドは、20%〜30%の多孔度および1.2g/cm3の密度を有するポリウレタン含浸ポリエステルパッドである。機械加工は20kHzの速度で5分間行われる。次いで、この硫化亜鉛プレートはソニコア(商標)SC超音波クリーナーにおいて、水で15:1(体積)に希釈されたソニコア(商標)205過酷な苛性アルカリ溶液を用いてクリーニングされる。このクリーニング液は室温に維持される。この硫化亜鉛プレートは超音波クリーナーから取り出され、シュアワイプス(商標)で拭い乾かされる。
従来のCVDチャンバーのレトルト内に、固体としての塩化マグネシウムが入れられる。気体のマグネシウム金属元素を生じさせるために、このレトルトは950℃に加熱される。蒸気圧は8〜10Torrの範囲である。
固体としてのAlCl3がCVDチャンバーのレトルトに入れられる。このレトルトは700℃の温度に加熱される。AlCl3の蒸気圧は5Torr〜6Torrの範囲である。
CVDチャンバーの外側のソースから元素酸素が提供され、従来の装置を用いて炉内にポンプ移送される。
チャックは97%アセトンでまずクリーニングされ、次いで70%メチルアルコールでクリーニングされ、次いでマイクロダイン(MicroDyn(商標))反応性スパッタリングドラムコーターに搭載される。このチャック上に、堆積速度200Å/分でアルミナを堆積させるために、2つのスパッタリングソースおよび2つのマイクロ波プラズマ源が同時に使用される。ターゲット材料は99.99%純度のアルミニウムであり、それはこのチャックから12cmの距離にある。このチャックが搭載されるドラムは1回転/秒の速度で回転させられる。このコーティングチャンバーは堆積前に、10−6Torrの圧力までポンプ減圧される。二原子酸素とアルゴンとの混合物がこの堆積チャンバー内に導入される。二原子酸素およびアルゴンの流量は、それぞれ、50sccmおよび100sccmである。チャンバー内の全圧力は0.004Torrである。マイクロ波出力は3kWで周波数2.54GHzである。マイクロ波はこのマイクロ波源の近くでプラズマを発生させる。
研磨パッドが、40%〜50%の多孔度および0.3g/cm3の密度を有するポリウレタン含浸ポリエステルパッドであること以外は、実施例1に記載される方法が繰り返される。硫化亜鉛プレートは酢酸の水溶液でクリーニングされる。10%酢酸水溶液は、氷酢酸(テキサス州ラポルテのリオンデルバーゼルアセチルズ(LyondellBasell Acetyls)から市販)のストック溶液から調製される。各プレートは、pH2〜3を有する酢酸の10%水溶液中に15分間浸漬される。クリーニングの際に、この酢酸溶液は室温に維持される。クリーニング後、プレートは取り出され、脱イオン水で2分間すすがれる。次いで、プレートはシュアワイプス(商標)で拭って乾燥させられる。次いで、これらは高グレードのアセトンで1分間すすがれ、室温で空気乾燥される。
Claims (1)
- a)創成チャックをコーティングし、被覆しまたはそれらの組み合わせを行い;
b)コーティングされた、被覆された、またはこれらの組み合わせが行われた創成チャックに硫化亜鉛基体を配置し;
c)コーティングされた、被覆された、またはこれらの組み合わせが行われた創成チャックにおいて、コーティングされていない研磨剤粒子を用いて、硫化亜鉛基体を創成し;
d)前記硫化亜鉛基体から金属汚染物質を除去し;
e)硫酸、硝酸またはこの組み合わせでのマイクロエッチングおよびクリーニングによって、白金ホイルから金属汚染物質を除去し;
f)クリーニングされた硫化亜鉛基体をクリーニングされた白金ホイルに包み;並びに、
g)クリーニングされた白金ホイルに包まれたクリーニングされた硫化亜鉛基体をHIPプロセスによって処理する;
ことを含む方法。
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US201161489380P | 2011-05-24 | 2011-05-24 | |
US61/489,380 | 2011-05-24 |
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JP2012091473A Division JP2012240192A (ja) | 2011-05-24 | 2012-04-13 | 向上した品質の多スペクトル硫化亜鉛 |
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JP2016128208A true JP2016128208A (ja) | 2016-07-14 |
JP6200011B2 JP6200011B2 (ja) | 2017-09-20 |
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JP2016030975A Active JP6200011B2 (ja) | 2011-05-24 | 2016-02-22 | 向上した品質の多スペクトル硫化亜鉛 |
JP2016134952A Active JP6275206B2 (ja) | 2011-05-24 | 2016-07-07 | 向上した品質の多スペクトル硫化亜鉛 |
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EP (3) | EP2527309B1 (ja) |
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KR20150034666A (ko) | 2013-09-26 | 2015-04-03 | 롬 앤드 하스 일렉트로닉 머트어리얼즈 엘엘씨 | 아연 설파이드 경도의 증가 |
DE102020201829A1 (de) * | 2020-02-13 | 2021-08-19 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung eingetragener Verein | Vorrichtung und Verfahren zur Herstellung von Schichten mit verbesserter Uniformität bei Beschichtungsanlagen mit horizontal rotierender Substratführung mit zusätzlichen Plasmaquellen |
CN112207653B (zh) * | 2020-08-24 | 2022-05-17 | 宁波奥达磁业有限公司 | 用于磨削磁材的磨床 |
CN115403384B (zh) * | 2022-08-29 | 2023-05-02 | 江苏布拉维光学科技有限公司 | 一种多光谱硫化锌的制备方法 |
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US9340871B1 (en) | 2016-05-17 |
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