JP2016085212A - Defect detection system and method - Google Patents
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Abstract
Description
本発明は、検査対象体の欠陥を検出するためのシステム及び方法に関する。 The present invention relates to a system and method for detecting defects in an inspection object.
最近、映像分析技術の発展にしたがって、製品の製造工程の間に、または製造が完了した後、製品の外観の映像をカメラのような撮像機器で捕捉してその映像を分析して製品に欠陥があるか否かを検出する光学検査方式が広く使用されている。一般に、このような検査方式においては撮像のために製品を照明する光源が配置される。 Recently, in accordance with the development of video analysis technology, during the manufacturing process of the product or after the manufacturing is completed, the video of the appearance of the product is captured with an imaging device such as a camera and the video is analyzed to detect defects in the product An optical inspection method for detecting whether or not there is widely used. Generally, in such an inspection method, a light source that illuminates a product for imaging is arranged.
光学検査は、検査対象体（例えば、偏光フィルム、光学フィルム、ディスプレイパネル、タッチパネル、印刷回路基板など）を基準に、光源と撮像機器とがどのように配置されるかにより、透過光学系検査と反射光学系検査とに区分することができる。大韓民国公開特許公報第２００９-０１１３８８５号は、カメラによる検査に利用可能な照明システムを開示しているが、このような照明システムは透過光学系検査に適合する。しかし、検査対象体が光反射率より低い光透過率を有する場合、または検査対象体がスリットのない不透明なコンベヤーベルト上で移送される間には透過光学系検査が適用されにくい。一方、光が透過されない検査対象体上の欠陥を検出するために正反射、境界反射、同軸反射などの光学系を用いることもあるが、このような検査方式は、いくつかの種類の欠陥（例えば、スクラッチ欠陥）をきちんと検出することができないという問題点がある。したがって、反射光学系検査において、与えられた撮像機器でそのような欠陥をさらに正確に検出するための手法が要求される。 The optical inspection is based on an inspection object (for example, a polarizing film, an optical film, a display panel, a touch panel, a printed circuit board, and the like), depending on how the light source and the imaging device are arranged. It can be divided into a reflection optical system inspection. Korean Laid-Open Patent Publication No. 2009-0113885 discloses an illumination system that can be used for inspection by a camera. Such an illumination system is suitable for inspection of a transmission optical system. However, when the inspection object has a light transmittance lower than the light reflectance, or while the inspection object is transported on an opaque conveyor belt without slits, the transmission optical system inspection is difficult to apply. On the other hand, optical systems such as specular reflection, boundary reflection, and coaxial reflection may be used to detect defects on the inspection object through which light is not transmitted. However, such an inspection method uses several types of defects ( For example, there is a problem that a scratch defect) cannot be detected properly. Therefore, a technique for more accurately detecting such a defect with a given imaging device is required in the reflection optical system inspection.
大韓民国公開特許公報第２００９-０１１３８８５号 Korean Published Patent Publication No. 2009-0113885
本発明は、光が透過されにくい検査対象体上の欠陥（例えば、スクラッチ欠陥）に対する検出力が向上した欠陥検出システムを提供することを目的とする。 SUMMARY OF THE INVENTION An object of the present invention is to provide a defect detection system having improved detection power for defects (for example, scratch defects) on an inspection object that is difficult to transmit light.
本発明は、そのような欠陥検出方法を提供することを目的とする。 An object of the present invention is to provide such a defect detection method.
１．光反射率より光透過率の低い検査対象体上の欠陥を検出するためのシステムとして、前記検査対象体に光を照射する光源と、前記光源と前記検査対象体との間に配置された光遮断マスクと、前記検査対象体から反射される光を受容して前記検査対象体の映像を捕捉する撮像機器とを含む、欠陥検出システム。 1. As a system for detecting a defect on an inspection object having a light transmittance lower than the light reflectance, a light source for irradiating the inspection object with light, and light disposed between the light source and the inspection object A defect detection system comprising: a shielding mask; and an imaging device that receives light reflected from the inspection object and captures an image of the inspection object.
２．上の１において、前記光源と前記光遮断マスクとの間に配置された集光レンズをさらに含む、欠陥検出システム。 2. The defect detection system according to the above 1, further comprising a condenser lens disposed between the light source and the light blocking mask.
３．上の１において、前記検査対象体はＩＴＯ層を含む、欠陥検出システム。 3. In the above 1, the defect detection system, wherein the inspection object includes an ITO layer.
４．上の３において、前記検査対象体の表面に対する前記光源の光照射角度は３０゜〜６０゜であり、前記表面に対する前記撮像機器の撮像角度は３０゜〜６０゜である、欠陥検出システム。 4). In 3 above, the light irradiation angle of the light source with respect to the surface of the inspection object is 30 ° to 60 °, and the imaging angle of the imaging device with respect to the surface is 30 ° to 60 °.
５．上の１において、前記映像から前記検査対象体上の欠陥を検出する欠陥検出部をさらに含む、欠陥検出システム。 5. In the above 1, the defect detection system further comprising a defect detection unit that detects a defect on the inspection object from the video.
６．上の５において、前記欠陥はスクラッチ欠陥である、欠陥検出システム。 6). In the above 5, the defect detection system, wherein the defect is a scratch defect.
７．上の１において、前記光源はＬＥＤ光源である、欠陥検出システム。 7). In the above 1, the defect detection system, wherein the light source is an LED light source.
８．光反射率より光透過率の低い検査対象体上の欠陥を検出するための方法として、前記検査対象体に光を照射する光源を提供する段階と、前記光源と前記検査対象体との間に光遮断マスクを配置する段階と、前記検査対象体から反射される光を受容する撮像機器を用いて前記検査対象体の映像を獲得する段階とを含む、欠陥検出方法。 8). As a method for detecting a defect on an inspection object having a light transmittance lower than a light reflectance, a step of providing a light source for irradiating the inspection object with light, and between the light source and the inspection object A defect detection method comprising: arranging a light blocking mask; and acquiring an image of the inspection object using an imaging device that receives light reflected from the inspection object.
９．上の８において、前記光源と前記光遮断マスクとの間に集光レンズを配置する段階をさらに含む、欠陥検出方法。 9. 8. The defect detection method according to the above 8, further comprising disposing a condenser lens between the light source and the light blocking mask.
１０．上の８において、前記検査対象体はＩＴＯ層を含む、欠陥検出方法。 10. 8. The defect detection method according to 8, wherein the inspection object includes an ITO layer.
１１．上の１０において、前記検査対象体の表面に対する前記光源の光照射角度は３０゜〜６０゜であり、前記表面に対する前記撮像機器の撮像角度は３０゜〜６０゜である、欠陥検出方法。 11. 10. The defect detection method according to 10, wherein a light irradiation angle of the light source with respect to the surface of the inspection object is 30 ° to 60 °, and an imaging angle of the imaging device with respect to the surface is 30 ° to 60 °.
１２．上の８において、前記映像から前記検査対象体上の欠陥を検出する段階をさらに含む、欠陥検出方法。 12 8. The defect detection method according to 8, further comprising detecting a defect on the inspection object from the video.
１３．上の１２において、前記欠陥はスクラッチ欠陥である、欠陥検出方法。 13. In the above 12, the defect detection method, wherein the defect is a scratch defect.
１４．上の８において、前記光源はＬＥＤ光源である、欠陥検出方法。 14 8. The defect detection method as set forth in 8, wherein the light source is an LED light source.
本発明による欠陥検出システム及び方法は、光が透過されにくい検査対象体上の欠陥（例えば、スクラッチ欠陥）を検出するための反射光学系検査の性能を極大化することができる。 The defect detection system and method according to the present invention can maximize the performance of a reflection optical system inspection for detecting a defect (for example, a scratch defect) on an inspection object that is difficult to transmit light.
以下、図面を参照して本発明の具体的な実施例を説明する。しかし、これは例示に過ぎず、本発明はこれに制限されない。 Hereinafter, specific embodiments of the present invention will be described with reference to the drawings. However, this is merely an example, and the present invention is not limited to this.
本発明の実施例の説明において、本発明と関連する公知の技術に対する具体的な説明が本発明の要旨を不必要に曖昧にし得ると判断される場合にはその詳細な説明を省略する。そして、後述される用語は、本発明においての機能を考慮して定義された用語であり、これはユーザー、運用者の意図または慣例などにより変わることがある。したがって、その定義は、本明細書の全般にわたった内容を基にしなければならない。 In the description of the embodiments of the present invention, when it is determined that a specific description of a known technique related to the present invention can unnecessarily obscure the gist of the present invention, a detailed description thereof will be omitted. The terms described later are terms that are defined in consideration of the functions in the present invention, and this may vary depending on the user's, operator's intention or custom. Therefore, the definition must be based on the entire contents of this specification.
本発明の一実施例による欠陥検出システムは、光反射率より光透過率の低い検査対象体（例えば、不透明材料）上の欠陥を検出するためのシステムとして、前記検査対象体に光を照射する光源；前記光源と前記検査対象体との間に配置された光遮断マスク；及び前記検査対象体から反射される光を受容して前記検査対象体の映像を捕捉する撮像機器を含み、光が透過されにくい検査対象体上の欠陥（例えば、スクラッチ欠陥）を検出するための反射光学系検査の性能を極大化することができる。 A defect detection system according to an embodiment of the present invention irradiates light on an inspection object as a system for detecting a defect on an inspection object (for example, an opaque material) whose light transmittance is lower than light reflectance. A light blocking mask disposed between the light source and the inspection object; and an imaging device that receives light reflected from the inspection object and captures an image of the inspection object; It is possible to maximize the performance of the reflection optical system inspection for detecting a defect (for example, a scratch defect) on the inspection object that is not easily transmitted.
図１は、本発明の一実施例による欠陥検出システムを示す図である。図１は、検査対象体１５０の幅方向から欠陥検出システム１００を見た側面図である。 FIG. 1 is a diagram illustrating a defect detection system according to an embodiment of the present invention. FIG. 1 is a side view of the defect detection system 100 as viewed from the width direction of the inspection object 150.
図１の欠陥検出システム１００は、検査対象体１５０を検査して検査対象体１５０上の欠陥を検出することに適合する。例えば、図１において、欠陥検出システム１００は、検査対象体１５０を（例えば、不透明なコンベヤーベルトのような移送手段を用いて右側に）移動させながら検査対象体１５０を検査することができる。また、検査対象体１５０の光反射率が検査対象体１５０の光透過率より大きい場合（例えば、検査対象体１５０が不透明材料の場合）、欠陥検出システム１００を利用した反射光学系検査が、透過光学系検査よりさらに正確な欠陥検出を可能とする。例えば、検査対象体１５０はＩＴＯ（Ｉｎｄｉｕｍ Ｔｉｎ Ｏｘｉｄｅ）層を含んだ基板であり得る。 The defect detection system 100 of FIG. 1 is suitable for inspecting the inspection object 150 and detecting defects on the inspection object 150. For example, in FIG. 1, the defect detection system 100 can inspect the inspection object 150 while moving the inspection object 150 (for example, to the right side using a transfer means such as an opaque conveyor belt). Further, when the light reflectance of the inspection object 150 is larger than the light transmittance of the inspection object 150 (for example, when the inspection object 150 is an opaque material), the reflection optical system inspection using the defect detection system 100 is transmitted. Defect detection more accurate than optical system inspection is possible. For example, the inspection object 150 may be a substrate including an ITO (Indium Tin Oxide) layer.
図１に図示されたように、欠陥検出システム１００は、光源１１０、光遮断マスク１２０及び撮像機器１３０を含む。また、欠陥検出システム１００は、集光レンズ１４０をさらに含むことができる。 As illustrated in FIG. 1, the defect detection system 100 includes a light source 110, a light blocking mask 120, and an imaging device 130. In addition, the defect detection system 100 may further include a condenser lens 140.
光源１１０は、検査対象体１５０に光を照射するように構成される。したがって、撮像機器１３０の撮像のために、欠陥検出システム１００は光源１１０を用いて検査対象体１５０を照明することができる。例えば、欠陥検出システム１００は、制御部（図示せず）をさらに含むことができ、その制御部は、光源１１０をして、検査対象体１５０に光を提供させるようにする。いくつかの実施例において、このような制御部は、光源１１０の光量の調節、光源１１０の光照射角度の調節などのように、光源１１０を制御するためのユーザー入力の受信に適合したユーザーインターフェースを提供することができる。 The light source 110 is configured to irradiate the inspection object 150 with light. Therefore, the defect detection system 100 can illuminate the inspection object 150 using the light source 110 for imaging by the imaging device 130. For example, the defect detection system 100 may further include a control unit (not shown), and the control unit causes the light source 110 to provide light to the inspection object 150. In some embodiments, such a controller includes a user interface adapted to receive user input for controlling the light source 110, such as adjusting the amount of light of the light source 110, adjusting the light illumination angle of the light source 110, etc. Can be provided.
関連分野において、光学検査に使用される光源が、特別な制限なく光源１１０として使用され得る。例えば、ＬＥＤランプ（Ｌｉｇｈｔ Ｅｍｉｔｔｉｎｇ Ｄｉｏｄｅ Ｌａｍｐ）、メタルハライドランプ（Ｍｅｔａｌ Ｈａｌｉｄｅ Ｌａｍｐ）のようなハロゲンランプ、蛍光灯、白熱電球などが光源１１０として使用され得る。また、光源１１０から照射される光の種類は、特に限定されず、例として白色光、緑色光、青色光、赤色光、赤外線、これらの適切な組合せなどを挙げることができる。さらに、光源１１０は、長辺または短辺がシート状製品の幅以上の長さを有するか、一辺がシート状製品の幅以上の長さを有する正方形状であり得る。一方、検査対象体１５０の移送速度によって光源１１０から光の照射される時区間が調節され得る。 In the related field, a light source used for optical inspection can be used as the light source 110 without any particular limitation. For example, a halogen lamp such as an LED lamp (Light Emitting Diode Lamp) or a metal halide lamp, a fluorescent lamp, an incandescent lamp, or the like can be used as the light source 110. Moreover, the kind of light irradiated from the light source 110 is not specifically limited, As an example, white light, green light, blue light, red light, infrared rays, these suitable combinations, etc. can be mentioned. Furthermore, the light source 110 may have a square shape in which a long side or a short side has a length equal to or greater than the width of the sheet-like product, or a side having a length equal to or greater than the width of the sheet-like product. Meanwhile, the time interval in which light is emitted from the light source 110 may be adjusted according to the transfer speed of the inspection object 150.
いくつかの実施例によると、光源１１０から出射された光を集めるための集光レンズ１４０が使用され得る。このような集光レンズ１４０は、光源１１０と光遮断マスク１２０との間に配置される。集光レンズ１４０の形態、材質及び焦点距離のような光学的特性は、適切に選択され得、特に制限されるものではない。 According to some embodiments, a condenser lens 140 for collecting light emitted from the light source 110 may be used. Such a condenser lens 140 is disposed between the light source 110 and the light blocking mask 120. The optical characteristics such as the shape, material, and focal length of the condenser lens 140 can be appropriately selected and are not particularly limited.
図１に図示されたように、光遮断マスク１２０は、光源１１０と検査対象体１５０との間に配置される。光遮断マスク１２０は、光源１１０から放出された光の一部を遮断することに適合したものであれば、その種類と形態が特に限定されない。例えば、光遮断マスク１２０は適切な幅の黒色スロットであり得る。 As shown in FIG. 1, the light blocking mask 120 is disposed between the light source 110 and the inspection object 150. The type and form of the light blocking mask 120 are not particularly limited as long as they are suitable for blocking a part of the light emitted from the light source 110. For example, the light blocking mask 120 may be a black slot with an appropriate width.
図２は、本発明の一実施例による欠陥検出システムにおいて、光源からの光が光遮断マスクにより散乱されることを説明するための図である。 FIG. 2 is a diagram for explaining that light from a light source is scattered by a light blocking mask in a defect detection system according to an embodiment of the present invention.
図２に図示されたように、光遮断マスク１２０は、集光レンズ１４０を経て光遮断マスク１２０に入射される直進光２１０を遮断する。光遮断マスク１２０の幅方向の両側面では光散乱２２０が発生する。集光レンズ１４０の両側面で散乱された光（クロス光）２３０は、検査対象体１５０に向かって進行する。これにより、光遮断マスク１２０と検査対象体１５０との間には暗部２５０が生じることがある。 As shown in FIG. 2, the light blocking mask 120 blocks the straight light 210 incident on the light blocking mask 120 through the condenser lens 140. Light scattering 220 occurs on both side surfaces of the light blocking mask 120 in the width direction. Light (cross light) 230 scattered on both side surfaces of the condenser lens 140 travels toward the inspection object 150. As a result, a dark portion 250 may be generated between the light shielding mask 120 and the inspection object 150.
上のように、光散乱により検査対象体１５０上の欠陥（例えば、スクラッチ欠陥）の視認性が向上され得る。検査対象体１５０に散乱光を入射させることにより、検査対象体１５０に入射された光が検査対象体１５０上の欠陥により屈折されてはじめてその光が撮像機器１３０に到逹する可能性を高めることができるためである。 As described above, the visibility of defects (for example, scratch defects) on the inspection object 150 can be improved by light scattering. Increasing the possibility that the light reaches the imaging device 130 only when the light incident on the inspection object 150 is refracted by a defect on the inspection object 150 by making the scattered light incident on the inspection object 150. It is because it can do.
撮像機器１３０は、検査対象体１５０から反射される光を受容して検査対象体１５０の映像を捕捉するように構成される。したがって、欠陥検出システム１００は、撮像機器１３０を用いて検査対象体１５０の映像を獲得することができる。例えば、欠陥検出システム１００の制御部は、撮像機器１３０に、検査対象体１５０を撮像して検査対象体１５０の映像を獲得させるようにする。いくつかの実施例において、上の制御部は、撮像機器１３０の撮像時間及び/または撮像角度の調節などのように、撮像機器１３０を制御するためのユーザー入力の受信に適合したユーザーインターフェースを提供することができる。 The imaging device 130 is configured to receive light reflected from the inspection object 150 and capture an image of the inspection object 150. Therefore, the defect detection system 100 can acquire an image of the inspection object 150 using the imaging device 130. For example, the control unit of the defect detection system 100 causes the imaging device 130 to capture an image of the inspection object 150 and acquire an image of the inspection object 150. In some embodiments, the above control provides a user interface adapted to receive user input for controlling the imaging device 130, such as adjusting the imaging time and / or angle of the imaging device 130, etc. can do.
撮像機器１３０は、検査対象体１５０から反射される光があれば、これを受容して検査対象体１５０の映像が捕捉できるものであり、その種類は特に限定されない。例えば、撮像機器１３０は、カメラ（例えば、ＣＣＤ（Ｃｈａｒｇｅ−Ｃｏｕｐｌｅｄ Ｄｅｖｉｃｅ）カメラ）、光センサーなどを含むことができる。 If there is light reflected from the inspection object 150, the imaging device 130 can receive the light and capture an image of the inspection object 150, and the type thereof is not particularly limited. For example, the imaging device 130 may include a camera (for example, a charge-coupled device (CCD) camera), an optical sensor, and the like.
延いては、欠陥検出システム１００は、欠陥検出部１６０をさらに含むことができる。欠陥検出部１６０は、撮像機器１３０による検査対象体１５０の撮像を介して獲得した映像を分析して検査対象体１５０の欠陥を検出する。例えば、欠陥検出部１６０は、獲得された映像のグレーレベル値を算出することができ、算出されたグレーレベル値を予め設定された臨界値と比べて検査対象体１５０の欠陥を検出することができる。欠陥検出部１６０は、多様なハードウェアモジュール及びソフトウェアモジュールを含むコンピュータ装置で具現され得る。 As a result, the defect detection system 100 may further include a defect detection unit 160. The defect detection unit 160 analyzes the video acquired through the imaging of the inspection object 150 by the imaging device 130 and detects the defect of the inspection object 150. For example, the defect detection unit 160 can calculate the gray level value of the acquired image, and detect the defect of the inspection object 150 by comparing the calculated gray level value with a preset critical value. it can. The defect detection unit 160 may be implemented by a computer device including various hardware modules and software modules.
また、本発明の他の実施例は、光反射率より光透過率が低い検査対象体上の欠陥を検出するための方法として、前記検査対象体に光を照射する光源を提供する段階；前記光源と前記検査対象体との間に光遮断マスクを配置する段階；及び前記検査対象体から反射される光を受容する撮像機器を用いて前記検査対象体の映像を獲得する段階を含む。 In another embodiment of the present invention, as a method for detecting a defect on an inspection object having a light transmittance lower than a light reflectance, a light source for irradiating the inspection object with light is provided; Placing a light blocking mask between a light source and the inspection object; and obtaining an image of the inspection object using an imaging device that receives light reflected from the inspection object.
図３は、本発明の一実施例による欠陥検出システムを用いて検査対象体の欠陥を検出した結果を説明するための図である。 FIG. 3 is a diagram for explaining a result of detecting a defect of an inspection object using a defect detection system according to an embodiment of the present invention.
比較のために、図１に図示されたように検査対象体と光源との間に光遮断マスクを配置して光源と光遮断マスクとの間に集光レンズを配置した場合に撮像機器が検査対象体を撮像して獲得した映像３２０及びそうではない場合に撮像機器が検査対象体を撮像した映像３１０が図３に提示された。 For comparison, the imaging device inspects when a light blocking mask is arranged between the inspection object and the light source and a condenser lens is arranged between the light source and the light blocking mask as shown in FIG. An image 320 obtained by imaging the object and an image 310 obtained by imaging the object to be inspected by the imaging device when the image 320 is not displayed are presented in FIG.
検査対象体としてスクラッチ欠陥が生じたタッチパネル（ＩＴＯ層を含む）を使用した。また、照明表面から７０ｍｍ離れた地点で測定した照度が９０万ｌｕｘの緑色ＬＥＤを光源として使用し、検査対象体と７０ｍｍ離隔された距離から、検査対象体に光を、検査対象体の表面に対して４５゜の光照射角度で照射した。検査対象体の光照射領域で幅方向への照度差は別に測定されなかった。 A touch panel (including an ITO layer) having a scratch defect was used as an inspection object. In addition, a green LED with an illuminance of 900,000 lux measured at a point 70 mm away from the illumination surface is used as a light source, and light is applied to the inspection object from the distance 70 mm away from the inspection object. The light was irradiated at a light irradiation angle of 45 °. The illuminance difference in the width direction was not measured separately in the light irradiation region of the inspection object.
光遮断マスクとしては、幅６ｍｍの黒色コーティングされた耐熱材（照明が熱いため）がスリット状で使用され、集光レンズとしては、ガラス材質の集光型レンズが使用された。光遮断マスクと集光レンズとは１〜２ｍｍ離隔され、集光レンズと光源とは離隔されないように配置された。 As the light blocking mask, a black-coated heat-resistant material having a width of 6 mm (because the illumination is hot) was used in a slit shape, and a condensing lens made of glass was used as the condensing lens. The light blocking mask and the condensing lens were separated by 1 to 2 mm, and the condensing lens and the light source were arranged so as not to be separated.
検査対象体と１９０ｍｍ離隔された距離から検査対象体の表面に対して４５゜の撮像角度で検査対象体を撮像するように撮像機器を設置した後撮像を行った。 Imaging was performed after the imaging device was installed so as to image the inspection object at an imaging angle of 45 ° with respect to the surface of the inspection object from a distance of 190 mm from the inspection object.
図３に提示された映像３１０、３２０に見られるように、ＩＴＯ層を含む検査対象体により反射された光を撮像機器が受容して検査対象体の映像を捕捉する反射光学系検査において、検査対象体と光源との間に光遮断マスクを配置すれば、検査対象体のスクラッチにより発生する欠陥が検査対象体の映像からさらに明確に検出され得る。 As shown in the images 310 and 320 presented in FIG. 3, in the reflection optical system inspection in which the imaging device receives the light reflected by the inspection object including the ITO layer and captures the image of the inspection object. If a light blocking mask is disposed between the object and the light source, defects caused by scratches on the inspection object can be more clearly detected from the image of the inspection object.
図４〜図６は、本発明の一実施例による欠陥検出システムにおいて、光遮断マスクの幅、検査対象体と光源との間の距離及び光源からの光量を調節しながら検査対象体の欠陥を検出した結果を説明するための図である。 4 to 6 show defects in the inspection object in the defect detection system according to the embodiment of the present invention, while adjusting the width of the light blocking mask, the distance between the inspection object and the light source, and the light quantity from the light source. It is a figure for demonstrating the detected result.
図４は、前述したことと同一の実験条件で光遮断マスクの幅だけをそれぞれ１８ｍｍ、１５ｍｍ、１２ｍｍ、９ｍｍ及び６ｍｍに変化させたとき、検査対象体が撮像された映像を示す。図４において、各映像下端に表示された結果値は、その映像のすべてのグレーレベル値を示す。図４に示すように、光遮断マスクの幅が６ｍｍ〜１２ｍｍであるとき、特にその幅が９ｍｍであるとき良好な結果が出た。 FIG. 4 shows an image in which an inspection object is imaged when only the width of the light blocking mask is changed to 18 mm, 15 mm, 12 mm, 9 mm, and 6 mm, respectively, under the same experimental conditions as described above. In FIG. 4, the result values displayed at the bottom of each video indicate all gray level values of that video. As shown in FIG. 4, good results were obtained when the width of the light shielding mask was 6 mm to 12 mm, particularly when the width was 9 mm.
図５は、前述したことと同一の実験条件で検査対象体と光源との間の距離だけをそれぞれ３０ｍｍ、４０ｍｍ、５０ｍｍ、６０ｍｍ、７０ｍｍ及び８０ｍｍに変化させたとき、検査対象体が撮像された映像を示す。図５においても、各映像下端に表示された結果値は、その映像のすべてのグレーレベル値を示す。図５に示すように、検査対象体と光源との間の距離が４０ｍｍ〜７０ｍｍであるとき、特にその幅が５０ｍｍ〜７０ｍｍであるとき良好な結果が出た。 FIG. 5 shows that the test object was imaged when only the distance between the test object and the light source was changed to 30 mm, 40 mm, 50 mm, 60 mm, 70 mm, and 80 mm, respectively, under the same experimental conditions as described above. Show the picture. Also in FIG. 5, the result value displayed at the lower end of each video indicates all gray level values of the video. As shown in FIG. 5, good results were obtained when the distance between the test object and the light source was 40 mm to 70 mm, particularly when the width was 50 mm to 70 mm.
図６は、前述したことと同一の実験条件で光源の光量だけを最大可能光量（９０万ｌｕｘ）の５０％及び１００％に変化させたとき、検査対象体が撮像された映像を示す。図６においても、各映像下端に表示された結果値は、その映像のすべてのグレーレベル値を示す。図６に示すように、光量が増加するほど良好な結果が出た。 FIG. 6 shows an image in which the inspection object is imaged when only the light amount of the light source is changed to 50% and 100% of the maximum possible light amount (900,000 lux) under the same experimental conditions as described above. Also in FIG. 6, the result value displayed at the lower end of each video indicates all gray level values of the video. As shown in FIG. 6, a better result was obtained as the amount of light increased.
図７は、本発明の一実施例による欠陥検出システムにおいて、光照射角度及び撮像角度を調節しながら検査対象体の欠陥を検出した結果を説明するための図である。 FIG. 7 is a diagram for explaining a result of detecting a defect of an inspection object while adjusting a light irradiation angle and an imaging angle in a defect detection system according to an embodiment of the present invention.
図７を参照すれば、検査対象体の表面に対する光の照射角度が３０゜〜６０゜であり、その表面に対する撮像機器の撮像角度が３０゜〜６０゜の場合、スクラッチ欠陥が鮮明に現れる映像が獲得されたことを確認することができる。 Referring to FIG. 7, when the light irradiation angle with respect to the surface of the object to be inspected is 30 ° to 60 °, and the imaging angle of the imaging device with respect to the surface is 30 ° to 60 °, an image in which scratch defects appear clearly. Can be confirmed.
以上、本発明の代表的な実施例を詳細に説明したが、本発明が属する技術分野で通常の知識を有した者は、上述した実施例に対して本発明の範疇から外れない限度内で多様な変形が可能であることが理解できる。したがって、本発明の権利範囲は、説明された実施例に限って定められてはならず、後述する特許請求範囲だけではなくこの特許請求範囲と均等なものなどにより定められなければならない。 As described above, the representative embodiments of the present invention have been described in detail. However, those having ordinary knowledge in the technical field to which the present invention belongs can be applied to the above-described embodiments within the scope of the present invention. It can be understood that various modifications are possible. Accordingly, the scope of the present invention should not be defined only by the embodiments described, but should be defined not only by the claims described later, but also by the equivalents of the claims.
１００：欠陥検出システム
１１０：光源
１２０：光遮断マスク
１３０：撮像機器
１４０：集光レンズ
１５０：検査対象体
１６０：欠陥検出部
２１０：直進光
２２０、２３０：散乱光
２５０：暗部
100: Defect detection system 110: Light source 120: Light blocking mask 130: Imaging device 140: Condensing lens 150: Inspection object 160: Defect detection unit 210: Straight light 220, 230: Scattered light 250: Dark part
Claims (14)
前記検査対象体に光を照射する光源と、
前記光源と前記検査対象体との間に配置された光遮断マスクと、
前記検査対象体から反射される光を受容して前記検査対象体の映像を捕捉する撮像機器とを含む、欠陥検出システム。 As a system for detecting defects on inspection objects whose light transmittance is lower than light reflectance,
A light source for irradiating the inspection object with light;
A light blocking mask disposed between the light source and the inspection object;
A defect detection system comprising: an imaging device that receives light reflected from the inspection object and captures an image of the inspection object.
前記検査対象体に光を照射する光源を提供する段階と、
前記光源と前記検査対象体との間に光遮断マスクを配置する段階と、
前記検査対象体から反射される光を受容する撮像機器を用いて前記検査対象体の映像を獲得する段階とを含む、欠陥検出方法。 As a method for detecting defects on an inspection object whose light transmittance is lower than light reflectance,
Providing a light source for irradiating the inspection object with light;
Arranging a light blocking mask between the light source and the inspection object;
Obtaining an image of the inspection object using an imaging device that receives light reflected from the inspection object.
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| CN116465826B (en) * | 2023-03-15 | 2023-10-24 | 东阳市诰源闪光材料有限公司 | Device and method for testing polarization rate of optical film |
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| CN105548193A (en) | 2016-05-04 |
| KR20160047360A (en) | 2016-05-02 |
| TW201616123A (en) | 2016-05-01 |
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