JP2014169988A - Defect inspection device of transparent body or reflection body - Google Patents

Defect inspection device of transparent body or reflection body Download PDF

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JP2014169988A
JP2014169988A JP2013057207A JP2013057207A JP2014169988A JP 2014169988 A JP2014169988 A JP 2014169988A JP 2013057207 A JP2013057207 A JP 2013057207A JP 2013057207 A JP2013057207 A JP 2013057207A JP 2014169988 A JP2014169988 A JP 2014169988A
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defect
inspected
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defect inspection
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Yasuhiro Kuwabara
康浩 桑原
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DCT LAB CO Ltd
DCT LABORATORY CO Ltd
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DCT LAB CO Ltd
DCT LABORATORY CO Ltd
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Abstract

PROBLEM TO BE SOLVED: To provide a defect inspection device configured to detect a defect of light-shielding performance or light diffusion performance of a transparent body or a tabular body of a mirror surface and a defect of transparency including ametropia, in the same optical condition.SOLUTION: A defect inspection device of a transparent body or a mirror-surface body irradiates an object to be inspected through a mask body having light-shielding parts and transparent parts alternately with light emitted from a lighting device arranged on one side of the object, images the object by an imaging apparatus arranged on the other side of the object, and detects a defect by means of image processing means. The defect inspection device adjusts lens aperture of the imaging apparatus and a distance between the mask body and the object, while the imaging apparatus focuses the object, to form a background image having a luminance waveform in which dark gray and light gray successively occur with small changes around a gray level center, without extremely changing the waveform.

Description

本発明は、透過体(例えば、ガラスや樹脂や蒸着形成した鏡などの透過性を示すことができる物)または反射体(例えば、ミラー面や艶面などの反射面を有し透過性を有しない物)の欠陥検査装置に関し、特に「異物」「汚れ」「キズ」などの遮光性(光の進行が遮えぎられてしまう)または光拡散性(光の進行が多方向に変えられてしまう)の欠陥と、「気泡」「ヘコミ」「ヒケ」などの屈折性(光の進行が曲げられてしまう)の欠陥を光学的に検出する欠陥検査装置に関する。  The present invention provides a transparent body (for example, an object that can exhibit transparency such as glass, resin, or a deposited mirror) or a reflective body (for example, a reflective surface such as a mirror surface or a glossy surface). In particular, it is related to defect inspection equipment, such as “foreign matter”, “dirt”, “scratches”, etc., with light-shielding properties (light travel is blocked) or light-diffusing properties (light travel is changed in multiple directions) The present invention relates to a defect inspection apparatus that optically detects defects such as “bubbles”, “dents”, “sink marks”, and the like, and refractive defects (the light travels bends).

板状などの透過体または反射体に存在する遮光性および光拡散性の欠陥と屈折性の欠陥の検出方法に関する技術としては、欠陥を光の陰影としてとらえるものや、欠陥の反射光を利用するもの、また欠陥における光の屈折の違いを利用して背景の線の歪みをとらえるものなどが挙げられる。以下、従来の透過体または反射体に存在する遮光性および光拡散性および屈折性の欠陥の検出方法に関する技術について説明する。  Techniques for detecting light-blocking and light-diffusing defects and refractive defects present in a plate-like transmissive body or reflector, such as detecting defects as light shadows, or using reflected light from defects And those that capture the distortion of the background lines by utilizing the difference in light refraction at the defect. Hereinafter, a technique relating to a conventional method for detecting a light-blocking property, a light diffusing property, and a refractive property existing in a transmissive body or a reflective body will be described.

特開平07−11490号公報Japanese Patent Application Laid-Open No. 07-11490 特開平07−110302号公報Japanese Patent Laid-Open No. 07-110302 特開平08−220021号公報Japanese Patent Laid-Open No. 08-220021 特開平10−111252号公報JP-A-10-1112252 特開2002−286656号公報JP 2002-286656 A 特開2012−2792号公報JP2012-2792A

屈折性の欠陥を検出するための従来の手段として、透明部と不透明部を交互に繰り返すストライプ状のマスクやスリット等を通して照明する提案がいくつかある。特許文献1や特許文献3で提案されている欠陥に対して欠陥点のレンズ効果(屈折異常)を利用して、特定の欠陥を抽出する技術では、歪みという特定の欠陥を発見する用途には優れるが、焦点が被検査体に合っていないため汚れや鋭利なキズ等の欠陥検出は困難である。  As a conventional means for detecting a refractive defect, there are some proposals that illuminate through a striped mask or slit that alternately repeats a transparent portion and an opaque portion. In the technique of extracting a specific defect by utilizing the lens effect (refractive abnormality) of the defect point with respect to the defect proposed in Patent Document 1 or Patent Document 3, there is an application for finding a specific defect called distortion. It is excellent, but it is difficult to detect defects such as dirt and sharp scratches because the focus is not on the object to be inspected.

特許文献2で提案されている技術では、焦点は被検査体に合っているが、明領域では欠陥の検出ができるが、暗領域では検出力を持たない。このため、全領域を検査するためには複数回の撮像が必要となる。  In the technique proposed in Patent Document 2, the focus is on the object to be inspected, but the defect can be detected in the bright region, but has no detection power in the dark region. For this reason, in order to inspect the entire region, it is necessary to perform imaging a plurality of times.

特許文献6で提案されている格子状チャートのチャート線歪みを検出して欠陥を検出する技術では、歪みに対しては高い効果を発揮するが、レンズ作用の発生しない、もしくはチャートに掛からない埃や異物の混入による欠陥は検出困難である。  The technique for detecting the defect by detecting the chart line distortion of the grid chart proposed in Patent Document 6 exhibits a high effect on the distortion, but does not generate a lens action or dust that does not hang on the chart. It is difficult to detect defects due to contamination with foreign matter.

特許文献4で提案されている技術はスレッドラインと呼ばれる微細な筋状の欠陥を効率よく抽出するものだが、帯光源の幅と間隔が5〜50mmと広くスレッドラインの欠陥検出に限定されたものである。  The technique proposed in Patent Document 4 efficiently extracts fine streak defects called thread lines, but the width and interval of the band light source is as wide as 5 to 50 mm, and is limited to thread line defect detection. It is.

特許文献5で提案されている技術はガラス基板上に発生する線状のクレーターと呼ばれる微細な突起物の欠陥を効率よく検出でき、屈折や散乱を伴う欠陥の検出は出来るが、スリットによる暗領域での遮光性欠陥の検出は困難である。  The technique proposed in Patent Document 5 can efficiently detect a defect of a fine projection called a linear crater generated on a glass substrate and can detect a defect accompanied by refraction or scattering, but a dark region due to a slit. It is difficult to detect a light-shielding defect at.

前記のように、従来の手段では、特定(歪み、スレッドライン、クレーターなど)の屈折異常を有する欠陥しか検出できなかったり、遮光性または光拡散性の欠陥と屈折性の欠陥の両方を検出するために、光学系を変更して複数回の撮像が必要であったりした。すなわち、従来の方法では、「異物」「汚れ」「キズ」などの遮光性または光拡散性の欠陥と、「気泡」「ヘコミ」「ヒケ」などの屈折性(光の進行が曲げられてしまう)の欠陥を同一光学条件で検出することは困難であった。  As described above, the conventional means can detect only defects having specific refractive anomalies (distortion, thread line, crater, etc.), or detect both light-shielding or light-diffusing defects and refractive defects. Therefore, it was necessary to change the optical system and perform multiple imaging. That is, in the conventional method, defects such as “foreign matter”, “dirt”, and “scratch”, and light-reflective or light-diffusing defects, and refractive properties such as “bubbles”, “dents”, and “sinks” (the progression of light is bent). It was difficult to detect the defect (1) under the same optical conditions.

本発明では、従来困難であった「異物」「汚れ」「キズ」などの遮光性または光拡散性の欠陥と、屈折異常を含む「気泡」「ヘコミ」「ヒケ」などの屈折性の欠陥などの各種欠陥を同一光学条件で被検査物を一度撮像することで検出できるようにした透過体または反射体の欠陥検査装置の提供を目的とする。  In the present invention, light-blocking or light-diffusing defects such as “foreign matter”, “dirt”, and “scratches” that have been difficult in the past, and refractive defects such as “bubbles”, “dents”, and “sinks” that include refractive errors It is an object of the present invention to provide a defect inspection apparatus for a transmissive body or a reflector that can detect various defects of the above by imaging the inspection object once under the same optical conditions.

本発明は、前記目的を達成するために、請求項1の発明では、照明装置から照射される光を、交互に繰り返す遮光部と透光部をもつマスク体を介して被検査物に照射し、被検査物を挟んで前記照明装置とは対向する位置に配置した撮像装置により被検査物を撮像し、画像処理装置により欠陥を検出する欠陥検査装置において、被検査体に撮像装置の焦点を合わせた状態で、撮像される輝度波形が濃淡レベルの中心であるグレーの状態に対して、その近傍の濃いグレーと薄いグレーが連続的に起きる背景像とすることにより、透過体に存在する遮光性および光拡散性の欠陥と屈折性の欠陥を検査する様にしたことを特徴とする。In order to achieve the above object, according to the first aspect of the present invention, in the invention of claim 1, the light to be inspected is irradiated to the object to be inspected through a mask body having alternately light-shielding portions and light-transmitting portions. In the defect inspection apparatus in which the inspection object is imaged by an imaging apparatus disposed at a position opposite to the illumination apparatus with the inspection object interposed therebetween, and the defect is detected by the image processing apparatus, the focus of the imaging apparatus is focused on the inspection object. In the combined state, the imaged luminance waveform is a gray image that is the center of the light and shade level. It is characterized by inspecting defects of light and light diffusivity and refractive defects.

請求項2の発明では、請求項1の発明において、前記マスク体を被検査物と照明装置との間で光軸方向に進退移動可能に設けたことを特徴とする。  According to a second aspect of the present invention, in the first aspect of the present invention, the mask body is provided so as to be movable back and forth in the optical axis direction between the inspection object and the illumination device.

請求項3の発明では、照明装置から照射される光を、交互に繰り返す遮光部と透光部をもつマスク体を介して被検査物に照射し、被検査物からの反射光を撮像する撮像装置を有し、画像処理装置により欠陥を検出する欠陥検査装置において、被検査体に撮像装置の焦点を合わせた状態で、撮像される輝度波形が濃淡レベルの中心であるグレーの状態に対して、その近傍の濃いグレーと薄いグレーが連続的に起きる背景像とすることにより、反射体に存在する遮光性および光拡散性の欠陥と屈折性の欠陥を検査する様にしたことを特徴とする。  According to the third aspect of the present invention, imaging is performed by irradiating the object to be inspected with the light irradiated from the illumination device through a mask body having alternately light-shielding portions and light-transmitting portions, and imaging reflected light from the object to be inspected. In a defect inspection apparatus having an apparatus and detecting a defect by an image processing apparatus, with respect to a gray state where a luminance waveform to be imaged is in the center of a gray level in a state where the imaging apparatus is focused on an object to be inspected The background image in which the dark gray and the light gray in the vicinity continuously occur is used to inspect the light shielding and light diffusing defects and the refractive defects existing in the reflector. .

請求項4の発明では、請求項3の発明において、前記マスク体を被検査物と照明装置との間で光軸方向に進退移動可能に設けたことを特徴とする。  According to a fourth aspect of the present invention, in the third aspect of the present invention, the mask body is provided so as to be movable back and forth in the optical axis direction between the object to be inspected and the illumination device.

請求項1の発明によれば、同一光学条件で、被検査物である透過体を一度撮像することで、遮光性または光拡散性の欠陥と屈折性の欠陥などの各種欠陥を撮像領域の全域で検出可能となるので、欠陥の種類に限定されることなく、透過体に含まれる各種欠陥を短時間で検出できる欠陥検査装置を提供できる。  According to the first aspect of the present invention, various defects such as a light-blocking or light-diffusing defect and a refractive defect are captured in the entire imaging region by once imaging a transmission body as an inspection object under the same optical conditions. Therefore, it is possible to provide a defect inspection apparatus that can detect various types of defects contained in the transmission body in a short time without being limited to the types of defects.

請求項2の発明によれば、請求項1の発明において、マスク体を被検査物と照明装置との間で光軸方向に進退可能に設けたことにより、屈折率や厚さの違う透過体を同じ欠陥検査装置で検査することができる。  According to the invention of claim 2, in the invention of claim 1, the mask body is provided between the object to be inspected and the illuminating device so as to be movable back and forth in the optical axis direction, so that the transparent body having different refractive index and thickness is provided. Can be inspected by the same defect inspection apparatus.

請求項3の発明によれば、同一光学条件で、被検査物である反射体を一度撮像することで、光拡散性の欠陥と屈折性の欠陥などの各種欠陥を撮像領域の全域で検出可能となるので、欠陥の種類に限定されることなく、反射体に含まれる各種欠陥を短時間で検出できる欠陥検査装置を提供できる。  According to the invention of claim 3, various defects such as a light diffusive defect and a refractive defect can be detected in the entire imaging region by once imaging a reflector as an inspection object under the same optical conditions. Therefore, without being limited to the type of defect, it is possible to provide a defect inspection apparatus that can detect various defects included in the reflector in a short time.

請求項4の発明によれば、請求項3の発明において、マスク体を被検査物と照明装置との間で光軸方向に進退可能に設けたことにより、屈折率や厚さの違う反射体を同じ欠陥検査装置で検査することができる。  According to the invention of claim 4, in the invention of claim 3, the mask body is provided so as to be able to advance and retract in the optical axis direction between the object to be inspected and the illumination device, so that the reflector having a different refractive index and thickness is provided. Can be inspected by the same defect inspection apparatus.

本発明の欠陥検査装置の構成図Configuration diagram of defect inspection apparatus of the present invention 本発明の実施例1における欠陥検査装置の要部斜視図The principal part perspective view of the defect inspection apparatus in Example 1 of this invention 本発明の実施例2における欠陥検査装置の要部斜視図The principal part perspective view of the defect inspection apparatus in Example 2 of this invention 被検査物焦点での透光および遮光状態が極端な輝度波形Luminance waveform with extreme translucency and shading at the object focus 本発明で提案する濃いグレー、薄いグレー状態に調整した輝度波形Brightness waveform adjusted to dark gray and light gray as proposed in the present invention 欠陥検出処理部10の処理のフローを示すチャートA chart showing a processing flow of the defect detection processing unit 10

以下、本発明に係る欠陥検査装置の一実施形態について図面を参照しながら説明する。なお、本明細書において参照する各図は、本発明の理解を容易にするために一部の構成要素を誇張して表すなど模式的に表している。このため、各構成要素間の寸法や比率などは異なっていることがある。  Hereinafter, an embodiment of a defect inspection apparatus according to the present invention will be described with reference to the drawings. Note that each drawing referred to in the present specification is schematically represented by exaggerating some of the components in order to facilitate understanding of the present invention. For this reason, the dimension, ratio, etc. between each component may differ.

図1は本発明に係る欠陥検査装置の構成図である。図1に示すように欠陥検査装置はライン状光源2、マスク体4および、一次元撮像装置1、欠陥検出処理部10および、制御部11、また、本発明の主旨に直接影響しないため図示しないが、被検査物を把持して搬送する装置を備えている。  FIG. 1 is a block diagram of a defect inspection apparatus according to the present invention. As shown in FIG. 1, the defect inspection apparatus is not shown because it does not directly affect the gist of the present invention, since the line light source 2, the mask body 4, the one-dimensional imaging apparatus 1, the defect detection processing section 10, and the control section 11 are not directly affected. However, it is equipped with a device for gripping and transporting an object to be inspected.

図2は本発明の実施形態の一つであり、一次元撮像装置1とライン状光源2とを被検査物3を挟んで対向配置した透過光学系の構成例である。  FIG. 2 shows an embodiment of the present invention, which is a configuration example of a transmission optical system in which a one-dimensional imaging device 1 and a line-shaped light source 2 are arranged to face each other with an inspection object 3 interposed therebetween.

ライン状光源2は被検査物3に向けて拡散光を照射するものであり、被検査物3が搬送される方向Aに対して直交する方向に延びる直方体状に形成されている。この場合、ライン状光源2は検査対象物3の検査対象領域の幅方向長さよりも長く形成されている。  The line-shaped light source 2 irradiates diffused light toward the inspection object 3 and is formed in a rectangular parallelepiped shape extending in a direction orthogonal to the direction A in which the inspection object 3 is conveyed. In this case, the line light source 2 is formed longer than the length in the width direction of the inspection target region of the inspection target 3.

また、ライン状光源2の発光面には拡散板(図示せず)が取り付けられており、これにより照射される光は均一な明るさとなっている。このライン状光源2は白色LEDを内蔵して構成されており、後述する制御部11によって明るさが制御される。なお、ライン状光源2はLED以外の発光体、例えばハロゲンランプやメタルハライドランプなどでもよい。すなわち、このライン状光源2が本発明に係る照明装置に相当する。  Further, a diffusion plate (not shown) is attached to the light emitting surface of the line-shaped light source 2, so that the irradiated light has a uniform brightness. The line light source 2 is configured by incorporating a white LED, and the brightness is controlled by a control unit 11 described later. The line light source 2 may be a light emitter other than an LED, such as a halogen lamp or a metal halide lamp. That is, the line light source 2 corresponds to the illumination device according to the present invention.

ライン状光源2の上方には発光面を覆うようにマスク体4が光軸方向Bに進退可能な状態で設けられている。マスク体4はライン状光源2から投光された光の一部を透過させるとともに他の一部を遮るものであり、濃いグレーと薄いグレーが連続的に起きる背景像を形成するための板状の部材である。より具体的には、マスク体4は、透明な樹脂製の板材をライン状光源2の発光面に対応する長方形状に形成されている。そしてマスク体4の表面には長手方向に直交する方向(被検査物の搬送方向)に延びた遮光部4aと透光部4bとがマスク体4の長手方向に沿って交互に繰り返し形成されている。  A mask body 4 is provided above the line light source 2 so as to be able to advance and retract in the optical axis direction B so as to cover the light emitting surface. The mask body 4 transmits a part of the light projected from the line light source 2 and blocks the other part, and is a plate shape for forming a background image in which dark gray and light gray continuously occur. It is a member. More specifically, the mask body 4 is formed of a transparent resin plate having a rectangular shape corresponding to the light emitting surface of the line light source 2. Then, on the surface of the mask body 4, light shielding portions 4 a and light transmitting portions 4 b extending in the direction orthogonal to the longitudinal direction (inspected object transport direction) are alternately and repeatedly formed along the longitudinal direction of the mask body 4. Yes.

遮光部4aはライン状光源2から照射された光を遮って遮光する部分であり、黒色に着色されている。一方透光部4bはライン状光源2から照射された光をそのまま透過させる透明な部分である。本実施形態では遮光部4aは例えば0.75mm、透光部4bは0.25mmに形成されている。なお、マスク体4の遮光部4aと透光部4bの幅は、検出対象となる欠陥や一次元撮像装置1を構成するレンズの開口や配置などの各条件に基づいて種々決定されるものであり、前記のように遮光部4aを0.75mm、透光部4bを0.25mmに限定するものではない。  The light shielding portion 4a is a portion that shields and blocks light emitted from the line light source 2, and is colored black. On the other hand, the translucent part 4b is a transparent part that transmits the light emitted from the line light source 2 as it is. In the present embodiment, the light shielding portion 4a is formed to 0.75 mm, for example, and the light transmitting portion 4b is formed to 0.25 mm. The widths of the light-shielding part 4a and the light-transmitting part 4b of the mask body 4 are variously determined based on the respective conditions such as the defect to be detected and the opening and arrangement of the lenses constituting the one-dimensional imaging device 1. Yes, as described above, the light shielding portion 4a is not limited to 0.75 mm, and the light transmitting portion 4b is not limited to 0.25 mm.

このマスク体4の上方には、一次元撮像装置1が対向配置されている。一次元撮像装置1は、ライン状光源2およびマスク体4の上方に配置されてライン状光源2からマスク体4を介して光を照射された被検査物3を搬送させながら走査することで撮像をおこない撮像画像を表す電気信号を出力する光学機器である。本実施形態においては、一次元撮像装置1はラインCCDまたはCMOSイメージセンサおよびレンズによって構成されている。この一次元撮像装置1は図示しない支持体によってマスク体4の上方に支持されている。  Above the mask body 4, the one-dimensional imaging device 1 is disposed oppositely. The one-dimensional imaging device 1 is imaged by scanning while transporting the inspection object 3 that is arranged above the line light source 2 and the mask body 4 and irradiated with light from the line light source 2 through the mask body 4. It is an optical device that performs electrical output and outputs an electrical signal representing a captured image. In the present embodiment, the one-dimensional imaging device 1 is configured by a line CCD or CMOS image sensor and a lens. The one-dimensional imaging apparatus 1 is supported above the mask body 4 by a support body (not shown).

また、この場合、一次元撮像装置1は、図示しない搬送装置で搬送される被検査物3に焦点が合うように調整され、撮像分解能が例えば20μmとなるように設置されている。なお、一次元撮像装置1の撮像分解能は検出対象となる欠陥や検査対象物3の検査対象範囲の大きさなど各条件に基づいて決定されるもので、前記のように20μmに限定されるものではない。すなわち、この一次元撮像装置1が、本発明に係る撮像装置に相当する。  In this case, the one-dimensional imaging device 1 is adjusted so as to be focused on the inspection object 3 conveyed by a conveyance device (not shown), and is installed so that the imaging resolution is, for example, 20 μm. Note that the imaging resolution of the one-dimensional imaging apparatus 1 is determined based on various conditions such as the defect to be detected and the size of the inspection target range of the inspection target 3, and is limited to 20 μm as described above. is not. That is, the one-dimensional imaging device 1 corresponds to the imaging device according to the present invention.

欠陥検出処理部10は一次元撮像装置1から出力される画像信号を処理して欠陥の検出をおこなうものである。また欠陥検出処理部10には、図示しない表示モニタが接続されており、欠陥検出結果の表示や一次元撮像装置1から出力される画像信号を輝度波形として連続的に表示することができる。すなわち、この欠陥検出処理部10が、本発明に係る画像処理装置に相当する。  The defect detection processing unit 10 processes an image signal output from the one-dimensional imaging device 1 to detect a defect. The defect detection processing unit 10 is connected to a display monitor (not shown), and can display a defect detection result and an image signal output from the one-dimensional imaging device 1 continuously as a luminance waveform. That is, the defect detection processing unit 10 corresponds to the image processing apparatus according to the present invention.

被検査物3は図示しない搬送装置により直接または図示しないワークフォルダを介して保持され一次元撮像装置1とマスク体4の間の高さで、ライン状光源2の長手方向に直交する方向Aに搬送される。ワークフォルダは被検査物3を脱着自在に1つまたは複数保持するものであり、樹脂製の板材などに被検査物3の検査対象となる部分に対応した貫通孔が形成されて構成されている。  The object to be inspected 3 is held by a conveying device (not shown) directly or via a work folder (not shown) and is at a height between the one-dimensional imaging device 1 and the mask body 4 in a direction A perpendicular to the longitudinal direction of the line light source 2. Be transported. The work folder holds one or a plurality of inspection objects 3 in a detachable manner, and is configured by forming a through-hole corresponding to a portion to be inspected of the inspection objects 3 on a resin plate or the like. .

図示しない搬送装置は被検査物3を保持して一次元撮像装置1の走査周期と撮像分解能に対応する速度で搬送をおこない、被検査物3の先端から終端まですべてが一次元撮像装置1の下方を通過するように制御部11によって動作が制御される。  A conveyance device (not shown) holds the object 3 and conveys it at a speed corresponding to the scanning period and imaging resolution of the one-dimensional imaging device 1, and everything from the front end to the end of the inspection object 3 is the same as that of the one-dimensional imaging device 1. The operation is controlled by the control unit 11 so as to pass below.

制御部11は操作者の指示に従ってあらかじめ記憶された制御プログラムを実行する事により、欠陥検査装置の各種動作を制御する。具体的には、制御部11は図示しない搬送装置、一次元撮像装置1、ライン状光源2、欠陥検出処理部10の各動作を制御する。たとえば、制御部11は図示しない搬送装置を制御して、被検査物3を搬送するとともに欠陥検出処理部10の一次元撮像装置1から出力される画像信号の処理開始や終了の制御をおこなう。  The control unit 11 controls various operations of the defect inspection apparatus by executing a control program stored in advance according to an instruction from the operator. Specifically, the control unit 11 controls each operation of a conveyance device (not shown), the one-dimensional imaging device 1, the line light source 2, and the defect detection processing unit 10. For example, the control unit 11 controls a transport device (not shown) to transport the inspection object 3 and to control the start and end of processing of an image signal output from the one-dimensional imaging device 1 of the defect detection processing unit 10.

次に本発明に係る欠陥検査装置の検出原理について説明する。まず、被検査物3を撮像して、濃いグレーと薄いグレーが連続的に起きる背景像の調整をおこなう。具体的には被検査物3を搬送装置により移動させて、被検査物3の検査対象領域を一次元撮像装置1の下方に位置決めさせる。次いで、ライン状光源2から光を照射させるとともに、一次元撮像装置1から出力される画像信号の輝度波形を観測する。これにより、ライン状光源2から照射された光が、マスク体4における透光部4bを透過した光と遮光部4aによって光を遮光された影とによって明部と暗部を交互に繰り返す方形波状の輝度波形が観測される。  Next, the detection principle of the defect inspection apparatus according to the present invention will be described. First, the inspection object 3 is imaged, and a background image in which dark gray and light gray are continuously generated is adjusted. Specifically, the inspection object 3 is moved by the transport device, and the inspection target area of the inspection object 3 is positioned below the one-dimensional imaging apparatus 1. Next, light is emitted from the line light source 2 and the luminance waveform of the image signal output from the one-dimensional imaging device 1 is observed. As a result, the light emitted from the line-shaped light source 2 has a square wave shape in which light and dark portions are alternately repeated by the light transmitted through the light transmitting portion 4b in the mask body 4 and the shadow blocked by the light shielding portion 4a. A luminance waveform is observed.

この場合、輝度波形において、図4の波形のように平均輝度に対して明部と暗部の輝度差が大きな場合には、ライン状光源2の明るさや、一次元撮像装置1のレンズ開口、マスク体4と被検査物3との距離を調整することで、図5の波形のように平均輝度に対して明部Xと暗部Yの輝度差が小さくなるようにする。本実施形態では輝度波形の平均輝度が最大階調の中間になるようにし、かつ明部Xと暗部Yの輝度差が最大輝度階調の約10%程度の範囲に収まるように調整をおこなった。なお、輝度波形の平均輝度と、明部Xと暗部Yの差は欠陥検出処理部10の検出したい欠陥の特性や検出条件などにより適宜調整されるものであり、前記のように平均輝度や明部Xと暗部Yの輝度差は本実施形態の数値に限定されるものではない。  In this case, in the luminance waveform, when the luminance difference between the bright part and the dark part is large with respect to the average luminance as in the waveform of FIG. 4, the brightness of the line light source 2, the lens aperture of the one-dimensional imaging device 1, the mask By adjusting the distance between the body 4 and the object 3 to be inspected, the brightness difference between the bright part X and the dark part Y is reduced with respect to the average brightness as shown in the waveform of FIG. In the present embodiment, adjustment is performed so that the average luminance of the luminance waveform is in the middle of the maximum gradation, and the luminance difference between the bright portion X and the dark portion Y is within a range of about 10% of the maximum luminance gradation. . The average luminance of the luminance waveform and the difference between the bright part X and the dark part Y are appropriately adjusted according to the characteristics of the defect desired to be detected by the defect detection processing unit 10 and the detection conditions. The luminance difference between the part X and the dark part Y is not limited to the numerical value of the present embodiment.

このように、輝度の明部Xと暗部Yの差を小さくすることで埃や異物などの遮光性欠陥のように輝度レベルが暗くなる欠陥から、拡散により輝度レベルが明るくなる欠陥まで、明部X領域、暗部Y領域、中間領域の全領域において感度を保ったまま、マスク体4の効果による屈折異常をもつ欠陥にもコントラストが生じるため、前記欠陥をすべて検出することができる。  Thus, by reducing the difference between the bright part X and the dark part Y of the brightness, the bright part ranges from a defect whose brightness level becomes dark like a light-shielding defect such as dust or foreign matter to a defect whose brightness level becomes brighter due to diffusion. Since the contrast is also generated in the defect having the refractive error due to the effect of the mask body 4 while maintaining the sensitivity in the entire region of the X region, the dark portion Y region, and the intermediate region, all the defects can be detected.

前記のように輝度波形を調整したのちに、被検査物3を所定の搬送をおこない被検査物3の先端から終端までの撮像をおこない、その画像を欠陥検出処理部10において欠陥検出処理を行う。図6は本実施形態の欠陥検出処理部10における欠陥検出処理のフローを示すチャートである。フローは画像データ取得、フィルタ処理、しきい値処理、欠陥データ処理、分類処理の順でおこなわれる。  After adjusting the luminance waveform as described above, the inspection object 3 is transported in a predetermined manner, and imaging from the front end to the end of the inspection object 3 is performed, and the defect detection processing unit 10 performs defect detection processing on the image. . FIG. 6 is a chart showing a flow of defect detection processing in the defect detection processing unit 10 of the present embodiment. The flow is performed in the order of image data acquisition, filter processing, threshold processing, defect data processing, and classification processing.

フィルタ処理により暗部Yに対応する濃いグレーと明部Xに対応する薄いグレーの背景をキャンセルし、所定以上の異常な画像を検出するしきい値処理をすることで欠陥の検出をおこなう。また、一次元撮像装置1の焦点が被検査物3に合わされているため、欠陥の位置座標や寸法、面積などの特徴量が正確に取得できるため、欠陥データ処理、分類処理にて特徴量を処理することで、欠陥種の識別や分類をおこなうことが可能である。  The defect detection is performed by canceling a dark gray background corresponding to the dark portion Y and a light gray background corresponding to the bright portion X by the filter processing and performing threshold processing for detecting an abnormal image of a predetermined level or more. In addition, since the focus of the one-dimensional imaging device 1 is focused on the inspection object 3, feature quantities such as defect position coordinates, dimensions, and areas can be accurately acquired. By processing, it is possible to identify and classify defect types.

図3に示すようにライン状光源2を被検査物3の上方に長手方向を軸に傾けて配置し、マスク体4を介して被検査物3に照射された光の反射光を一次元撮像装置1で撮像するように配置した反射光学系の構成例であり、主旨は実施例1と同じである。この場合、被検査物3が反射体であっても、表面(上面)に付着する遮光性または光拡散性の欠陥や、屈折性の欠陥を実施例1と同様に検出することができる。このように、透過体に限らず反射体にも利用することができる。  As shown in FIG. 3, the linear light source 2 is disposed above the inspection object 3 with the longitudinal direction inclined as an axis, and the reflected light of the light irradiated onto the inspection object 3 through the mask body 4 is one-dimensionally imaged. This is a configuration example of a reflection optical system arranged so as to capture an image with the apparatus 1, and the main point is the same as that of the first embodiment. In this case, even if the inspection object 3 is a reflector, a light-blocking or light-diffusing defect or a refractive defect adhering to the surface (upper surface) can be detected in the same manner as in the first embodiment. Thus, it can be used not only for a transmissive body but also for a reflective body.

前記2つの実施形態においてマスク体4は透明な樹脂製の板材を使用しているが、透明な素材であればガラスなどの他の素材であってもよい。  In the two embodiments, the mask body 4 uses a transparent resin plate, but may be another material such as glass as long as it is a transparent material.

また、前記2つの実施形態のマスク体4の遮光部4aは被検査物3の搬送方向と平行に形成されているが、これに限定されるものではなく、被検査物3の搬送方向と所定の角度で交差するものや格子状のものであってもよい。つまり、マスク体4の長手方向に遮光部と透光部が交互に繰り返し形成されたものであればよい。  Further, although the light shielding portion 4a of the mask body 4 of the two embodiments is formed in parallel with the transport direction of the inspection object 3, the invention is not limited to this. It may be one that intersects at an angle or a lattice. That is, it is only necessary that the light shielding portions and the light transmitting portions are alternately and repeatedly formed in the longitudinal direction of the mask body 4.

1・・・一次元撮像装置
2・・・ライン状光源
3・・・被検査物(透過性または鏡面の板状体)
4・・・マスク体
4a・・・遮光部
4b・・・透光部
10・・・欠陥検出処理部
11・・・制御部
A・・・被検査物3が搬送される方向
B・・・光軸方向
X・・・明部(薄いグレー)
Y・・・暗部(濃いグレー)
DESCRIPTION OF SYMBOLS 1 ... One-dimensional imaging device 2 ... Line-shaped light source 3 ... Inspected object (transmissible or mirror-like plate-shaped body)
DESCRIPTION OF SYMBOLS 4 ... Mask body 4a ... Light-shielding part 4b ... Translucent part 10 ... Defect detection process part 11 ... Control part A ... Direction B in which the to-be-inspected object 3 is conveyed ... Optical axis direction X ... Bright part (light gray)
Y ... dark part (dark gray)

Claims (4)

照明装置から照射される光を、交互に繰り返す遮光部と透光部をもつマスク体を介して被検査物に照射し、被検査物を挟んで前記照明装置とは対向する位置に配置した撮像装置により被検査物を撮像し、画像処理装置により欠陥を検出する欠陥検査装置において、被検査体に撮像装置の焦点を合わせた状態で、撮像される輝度波形が濃淡レベルの中心であるグレーの状態に対して、その近傍の濃いグレーと薄いグレーが連続的に起きる背景像とすることにより、透過体に存在する遮光性および光拡散性の欠陥と屈折性の欠陥を検査する様にしたことを特徴とする透過体の欠陥検査装置。  Imaging in which light irradiated from an illuminating device is irradiated to an object to be inspected through a mask body having alternately light-shielding portions and light-transmitting portions, and arranged at a position facing the illuminating device with the object to be inspected in between In a defect inspection apparatus that images an object to be inspected by an apparatus and detects a defect by an image processing apparatus, a luminance waveform to be imaged is a gray color that is the center of a gray level in a state where the object to be inspected is in focus. By using a background image in which dark gray and light gray in the vicinity of the state continuously occur, the light shielding and light diffusing defects and refractive defects present in the transmissive body were inspected. A defect inspection apparatus for a transparent body characterized by the above. 前記マスク体を被検査物と照明装置との間で光軸方向に進退移動可能に設けたことを特徴とする請求項1の透過体の欠陥検査装置。  2. The defect inspection apparatus for a transmissive body according to claim 1, wherein the mask body is provided so as to be movable back and forth in the optical axis direction between the inspection object and the illumination device. 照明装置から照射される光を、交互に繰り返す遮光部と透光部をもつマスク体を介して被検査物に照射し、被検査物からの反射光を撮像する撮像装置を有し、画像処理装置により欠陥を検出する欠陥検査装置において、被検査体に撮像装置の焦点を合わせた状態で、撮像される輝度波形が濃淡レベルの中心であるグレーの状態に対して、その近傍の濃いグレーと薄いグレーが連続的に起きる背景像とすることにより、反射体に存在する遮光性および光拡散性の欠陥と屈折性の欠陥を検査する様にしたことを特徴とする反射体の欠陥検査装置。  The image processing apparatus includes an imaging device that irradiates light to be inspected through a mask body having alternately light-shielding portions and light-transmitting portions and illuminates light reflected from the inspection device, and images reflected light from the inspection object. In the defect inspection apparatus for detecting defects by the apparatus, in the state in which the imaging apparatus is focused on the object to be inspected, the dark waveform in the vicinity of the gray state where the luminance waveform to be imaged is the center of the gray level and A reflector defect inspection apparatus characterized by inspecting light-blocking and light-diffusing defects and refractive defects existing in a reflector by using a background image in which light gray is continuously generated. 前記マスク体を被検査物と照明装置との間で光軸方向に進退移動可能に設けたことを特徴とする請求項3の反射体の欠陥検査装置。  4. The reflector defect inspection apparatus according to claim 3, wherein the mask body is provided so as to be movable back and forth in the optical axis direction between the object to be inspected and the illumination device.
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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016080662A (en) * 2014-10-22 2016-05-16 株式会社豊田中央研究所 Surface inspection device
JP2020051959A (en) * 2018-09-28 2020-04-02 シチズンファインデバイス株式会社 Surface inspection device, component manufacturing method, and program
TWI796103B (en) * 2021-02-10 2023-03-11 日商Towa股份有限公司 Inspection device, resin molding device, cutting device, method of manufacturing resin molded product, and method of manufacturing cut product

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016080662A (en) * 2014-10-22 2016-05-16 株式会社豊田中央研究所 Surface inspection device
JP2020051959A (en) * 2018-09-28 2020-04-02 シチズンファインデバイス株式会社 Surface inspection device, component manufacturing method, and program
JP7049970B2 (en) 2018-09-28 2022-04-07 シチズンファインデバイス株式会社 Surface inspection equipment, parts manufacturing methods and programs
TWI796103B (en) * 2021-02-10 2023-03-11 日商Towa股份有限公司 Inspection device, resin molding device, cutting device, method of manufacturing resin molded product, and method of manufacturing cut product

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