JP2016050311A5 - - Google Patents

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Publication number
JP2016050311A5
JP2016050311A5 JP2015154928A JP2015154928A JP2016050311A5 JP 2016050311 A5 JP2016050311 A5 JP 2016050311A5 JP 2015154928 A JP2015154928 A JP 2015154928A JP 2015154928 A JP2015154928 A JP 2015154928A JP 2016050311 A5 JP2016050311 A5 JP 2016050311A5
Authority
JP
Japan
Prior art keywords
composition
solvent
formula
shear rate
monoalkyl ether
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2015154928A
Other languages
English (en)
Japanese (ja)
Other versions
JP2016050311A (ja
Filing date
Publication date
Priority claimed from US14/471,893 external-priority patent/US9796864B2/en
Application filed filed Critical
Publication of JP2016050311A publication Critical patent/JP2016050311A/ja
Publication of JP2016050311A5 publication Critical patent/JP2016050311A5/ja
Pending legal-status Critical Current

Links

JP2015154928A 2014-08-28 2015-08-05 ソルダマスクインク組成物 Pending JP2016050311A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US14/471,893 US9796864B2 (en) 2014-08-28 2014-08-28 Solder mask ink composition
US14/471,893 2014-08-28

Publications (2)

Publication Number Publication Date
JP2016050311A JP2016050311A (ja) 2016-04-11
JP2016050311A5 true JP2016050311A5 (enExample) 2018-08-09

Family

ID=55312447

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015154928A Pending JP2016050311A (ja) 2014-08-28 2015-08-05 ソルダマスクインク組成物

Country Status (9)

Country Link
US (1) US9796864B2 (enExample)
JP (1) JP2016050311A (enExample)
KR (1) KR102196867B1 (enExample)
BR (1) BR102015018917A2 (enExample)
CA (1) CA2901003C (enExample)
DE (1) DE102015215957B4 (enExample)
MX (1) MX382880B (enExample)
RU (1) RU2672441C2 (enExample)
TW (1) TW201607996A (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9606430B2 (en) 2014-08-28 2017-03-28 Xerox Corporation Method of aerosol printing a solder mask ink composition
CN113549369A (zh) * 2021-07-05 2021-10-26 江苏海田电子材料有限公司 抗裂纹阻焊塞孔油墨及其制备方法
CN116694128B (zh) * 2023-06-28 2023-11-24 鹤山市炎墨科技有限公司 一种含有嵌段共聚物的防焊油墨及其制备方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SU1105851A1 (ru) * 1982-01-06 1984-07-30 Горьковский государственный университет им.Н.И.Лобачевского Фотополимеризующа с композици
DE3374413D1 (en) * 1982-06-24 1987-12-17 Ciba Geigy Ag Photopolymerisable coating, photopolymerisable material and its use
JPS5975955A (ja) * 1982-10-22 1984-04-28 Kansai Paint Co Ltd 自己熱硬化性塗料用樹脂組成物
IL94474A (en) * 1989-06-09 1993-07-08 Morton Int Inc Photoimageable compositions
JPH0338330A (ja) * 1989-07-05 1991-02-19 Hitachi Chem Co Ltd エポキシ樹脂積層板の製造方法
US6458509B1 (en) * 1999-04-30 2002-10-01 Toagosei Co., Ltd. Resist compositions
JP2002336993A (ja) * 2001-03-16 2002-11-26 Tamura Kaken Co Ltd ソルダペースト組成物及びリフローはんだ付方法
JP2002338612A (ja) * 2001-05-11 2002-11-27 Toyobo Co Ltd 光硬化性組成物およびその硬化方法
JP2004087336A (ja) * 2002-08-27 2004-03-18 Sumitomo Bakelite Co Ltd 絶縁膜用材料、絶縁膜用コーティングワニス、及びこれを用いた絶縁膜
JP2007219384A (ja) * 2006-02-20 2007-08-30 Fujifilm Corp パターン形成方法
JP5256645B2 (ja) * 2006-05-31 2013-08-07 三菱化学株式会社 保護膜用熱硬化性組成物、硬化物、及び液晶表示装置
US7964032B2 (en) * 2006-10-17 2011-06-21 Momentive Performance Materials Inc. Fluorine-free trisiloxane surfactant compositions for use in coatings and printing ink compositions
JP5545217B2 (ja) * 2008-10-20 2014-07-09 住友ベークライト株式会社 スプレー塗布用ポジ型感光性樹脂組成物及びそれを用いた貫通電極の製造方法
JP5569216B2 (ja) * 2010-07-27 2014-08-13 Jnc株式会社 熱硬化性組成物およびその用途
EP2592098A1 (de) * 2011-11-10 2013-05-15 Sika Technology AG Pyridinylgruppen aufweisende Härter für Epoxidharze

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