JP2016012678A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2016012678A5 JP2016012678A5 JP2014133924A JP2014133924A JP2016012678A5 JP 2016012678 A5 JP2016012678 A5 JP 2016012678A5 JP 2014133924 A JP2014133924 A JP 2014133924A JP 2014133924 A JP2014133924 A JP 2014133924A JP 2016012678 A5 JP2016012678 A5 JP 2016012678A5
- Authority
- JP
- Japan
- Prior art keywords
- processing
- processing gas
- gas
- light transmission
- ultraviolet rays
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000007789 gas Substances 0.000 claims description 38
- 238000010926 purge Methods 0.000 claims description 16
- 238000000034 method Methods 0.000 claims description 15
- 230000005540 biological transmission Effects 0.000 claims description 14
- 238000006243 chemical reaction Methods 0.000 claims description 12
- 230000001678 irradiating effect Effects 0.000 claims description 7
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical group O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims description 4
- 229910001882 dioxygen Inorganic materials 0.000 claims description 4
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 claims description 2
- 239000000203 mixture Substances 0.000 claims description 2
- 238000003672 processing method Methods 0.000 claims 1
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014133924A JP6102842B2 (ja) | 2014-06-30 | 2014-06-30 | デスミア処理方法およびデスミア処理装置 |
| PCT/JP2015/058190 WO2016002266A1 (ja) | 2014-06-30 | 2015-03-19 | デスミア処理装置およびデスミア処理方法 |
| US15/321,163 US20170156217A1 (en) | 2014-06-30 | 2015-03-19 | Desmear treatment device and desmear treatment method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014133924A JP6102842B2 (ja) | 2014-06-30 | 2014-06-30 | デスミア処理方法およびデスミア処理装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016012678A JP2016012678A (ja) | 2016-01-21 |
| JP2016012678A5 true JP2016012678A5 (enExample) | 2016-12-08 |
| JP6102842B2 JP6102842B2 (ja) | 2017-03-29 |
Family
ID=55018826
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014133924A Active JP6102842B2 (ja) | 2014-06-30 | 2014-06-30 | デスミア処理方法およびデスミア処理装置 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US20170156217A1 (enExample) |
| JP (1) | JP6102842B2 (enExample) |
| WO (1) | WO2016002266A1 (enExample) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113518510B (zh) * | 2020-04-10 | 2022-10-11 | 南通深南电路有限公司 | 一种pcb板除胶装置和方法 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4328081A (en) * | 1980-02-25 | 1982-05-04 | Micro-Plate, Inc. | Plasma desmearing apparatus and method |
| JPS6320833A (ja) * | 1986-07-14 | 1988-01-28 | Toshiba Corp | アツシング装置 |
| JPH05109674A (ja) * | 1991-10-18 | 1993-04-30 | Ushio Inc | レジスト膜の灰化方法と灰化装置 |
| JPH08180757A (ja) * | 1994-12-21 | 1996-07-12 | Nitto Denko Corp | 接点部の形成方法 |
| JPH10280151A (ja) * | 1997-04-08 | 1998-10-20 | Fujitsu Ltd | Ｃｖｄ装置のクリーニング方法 |
| US7566664B2 (en) * | 2006-08-02 | 2009-07-28 | Qualcomm Mems Technologies, Inc. | Selective etching of MEMS using gaseous halides and reactive co-etchants |
| JP2010027702A (ja) * | 2008-07-16 | 2010-02-04 | Hitachi Kokusai Electric Inc | 基板処理装置及び薄膜生成方法 |
-
2014
- 2014-06-30 JP JP2014133924A patent/JP6102842B2/ja active Active
-
2015
- 2015-03-19 US US15/321,163 patent/US20170156217A1/en not_active Abandoned
- 2015-03-19 WO PCT/JP2015/058190 patent/WO2016002266A1/ja not_active Ceased
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| RU2015120796A (ru) | Обработка текстильного изделия | |
| WO2016070006A3 (en) | Object decontamination apparatus and method | |
| JP2016500770A5 (enExample) | ||
| JP2012531979A5 (enExample) | ||
| ATE442095T1 (de) | Gerät zur überwachung und kontrolle von laserinduzierter gewebebehandlung | |
| WO2010022871A8 (en) | Non-thermal plasma for wound treatment and associated apparatus and method | |
| CN111920993A (zh) | 作业室的无菌环境维持方法、无菌环境维持装置 | |
| MY160529A (en) | Method for treating diamond material and product obtained | |
| ATE524953T1 (de) | Verfahren und vorrichtung zur behandlung oder beschichtung von oberflachen | |
| EP2100814A4 (en) | CONTAINER STERILIZATION DEVICE | |
| EP2642507A3 (en) | Method and apparatus for actively monitoring an inductively-coupled plasma ion source using an optical spectrometer | |
| KR20180084642A (ko) | 기판 처리 장치, 기판 처리 방법 및 기억 매체 | |
| RU2014147115A (ru) | Устройство для стерилизации и способ стерилизации с использованием такого устройства | |
| GB2554606A (en) | Advanced oxidation process methods for degasification of reactor vessel | |
| TW201613433A (en) | Desmearing apparatus and desmearing method | |
| JP2018500462A5 (enExample) | ||
| EP3505194A3 (en) | Process and apparatus for cleaning, disinfection, sterilization, or combinations thereof | |
| WO2016023884A3 (de) | Verfahren zur in-situ-regenerierung von mit trihalomethanen beladenen aktivkohlen durch alkalische hydrolyse | |
| JP2016012678A5 (enExample) | ||
| JP2015159212A5 (enExample) | ||
| JP6135764B2 (ja) | デスミア処理装置 | |
| IN2012DN03809A (enExample) | ||
| TWI875721B (zh) | 紫外線處理方法及系統 | |
| PH12018000272A1 (en) | Gas treating apparatus and gas treating method | |
| GB201104932D0 (en) | Application of treatment fluids to components |