JP2015534256A - 液体試薬の超高純度保存および分注 - Google Patents
液体試薬の超高純度保存および分注 Download PDFInfo
- Publication number
- JP2015534256A JP2015534256A JP2015526681A JP2015526681A JP2015534256A JP 2015534256 A JP2015534256 A JP 2015534256A JP 2015526681 A JP2015526681 A JP 2015526681A JP 2015526681 A JP2015526681 A JP 2015526681A JP 2015534256 A JP2015534256 A JP 2015534256A
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- JP
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- Prior art keywords
- high purity
- ultra
- supply
- supply tank
- coating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 239000003153 chemical reaction reagent Substances 0.000 title claims abstract description 32
- 239000007788 liquid Substances 0.000 title description 9
- 238000003860 storage Methods 0.000 title description 4
- 239000011248 coating agent Substances 0.000 claims abstract description 25
- 238000000576 coating method Methods 0.000 claims abstract description 25
- 229910052751 metal Inorganic materials 0.000 claims abstract description 22
- 239000002184 metal Substances 0.000 claims abstract description 22
- 238000004519 manufacturing process Methods 0.000 claims abstract description 11
- 239000004065 semiconductor Substances 0.000 claims abstract description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 6
- 239000008367 deionised water Substances 0.000 claims description 5
- 229910021641 deionized water Inorganic materials 0.000 claims description 5
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 3
- 229910052782 aluminium Inorganic materials 0.000 claims description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- 239000010936 titanium Substances 0.000 claims description 3
- 229910000831 Steel Inorganic materials 0.000 claims description 2
- 238000004891 communication Methods 0.000 claims description 2
- 238000002347 injection Methods 0.000 claims description 2
- 239000007924 injection Substances 0.000 claims description 2
- 229910001220 stainless steel Inorganic materials 0.000 claims description 2
- 239000010935 stainless steel Substances 0.000 claims description 2
- 239000010959 steel Substances 0.000 claims description 2
- 239000012530 fluid Substances 0.000 description 6
- 239000000203 mixture Substances 0.000 description 5
- 239000003708 ampul Substances 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 4
- 239000000356 contaminant Substances 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 239000011247 coating layer Substances 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 3
- 239000004810 polytetrafluoroethylene Substances 0.000 description 3
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 238000011049 filling Methods 0.000 description 2
- 229910052733 gallium Inorganic materials 0.000 description 2
- 230000001404 mediated effect Effects 0.000 description 2
- 239000002905 metal composite material Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- ZSLUVFAKFWKJRC-IGMARMGPSA-N 232Th Chemical compound [232Th] ZSLUVFAKFWKJRC-IGMARMGPSA-N 0.000 description 1
- 229910000619 316 stainless steel Inorganic materials 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 229910052776 Thorium Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 229910052770 Uranium Inorganic materials 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 238000000429 assembly Methods 0.000 description 1
- 230000000712 assembly Effects 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- 229910052790 beryllium Inorganic materials 0.000 description 1
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 239000012707 chemical precursor Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000012459 cleaning agent Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 239000003344 environmental pollutant Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000011344 liquid material Substances 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 239000002086 nanomaterial Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 231100000719 pollutant Toxicity 0.000 description 1
- -1 polytetrafluoroethylene Polymers 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
- 239000008247 solid mixture Substances 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- JFALSRSLKYAFGM-UHFFFAOYSA-N uranium(0) Chemical compound [U] JFALSRSLKYAFGM-UHFFFAOYSA-N 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Images
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
- B65D25/00—Details of other kinds or types of rigid or semi-rigid containers
- B65D25/14—Linings or internal coatings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67023—Apparatus for fluid treatment for general liquid treatment, e.g. etching followed by cleaning
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/02—Apparatus characterised by being constructed of material selected for its chemically-resistant properties
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J4/00—Feed or outlet devices; Feed or outlet control devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
- B65D25/00—Details of other kinds or types of rigid or semi-rigid containers
- B65D25/38—Devices for discharging contents
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
- B65D43/00—Lids or covers for rigid or semi-rigid containers
- B65D43/02—Removable lids or covers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
- B65D85/00—Containers, packaging elements or packages, specially adapted for particular articles or materials
- B65D85/70—Containers, packaging elements or packages, specially adapted for particular articles or materials for materials not otherwise provided for
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/02—Apparatus characterised by their chemically-resistant properties
- B01J2219/0204—Apparatus characterised by their chemically-resistant properties comprising coatings on the surfaces in direct contact with the reactive components
- B01J2219/0245—Apparatus characterised by their chemically-resistant properties comprising coatings on the surfaces in direct contact with the reactive components of synthetic organic material
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Filling Or Discharging Of Gas Storage Vessels (AREA)
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
- Details Of Rigid Or Semi-Rigid Containers (AREA)
- General Engineering & Computer Science (AREA)
- Chemical Vapour Deposition (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
Description
内部表面構造を含む封入可能な内部容積を画定する金属容器であって、内部表面構造は超高純度有効ポリパーフルオロアルコキシエチレン被膜で被覆されている、金属容器
を含む、超高純度化学試薬の分注のための供給槽に関する。
Claims (10)
- 内部表面構造を含む封入可能な内部容積を画定する金属容器であって、内部表面構造は超高純度有効ポリパーフルオロアルコキシエチレン被膜で被覆されている、金属容器を含む、超高純度化学試薬の分注のための供給槽。
- 超高純度有効ポリパーフルオロアルコキシエチレン被膜が15から50ミルの範囲の厚さを有する、請求項1に記載の供給槽。
- 容器が、その外部表面上を超高純度有効ポリパーフルオロアルコキシエチレン被膜で付加的に被覆されている、請求項1に記載の供給槽。
- 容器が、離間した入口および出口通路を内部に含む取り外し可能カバーを含む、請求項1に記載の供給槽。
- 出口通路が、カバーに接合されて供給槽の内部容積の下部内まで延在する排出導管と連通している、請求項4に記載の供給槽。
- 金属容器が、鋼、チタン、およびアルミニウムから成る群より選択される金属で製造されている、請求項1に記載の供給槽。
- 金属容器がステンレス鋼で製造されている、請求項1に記載の供給槽。
- 超高純度有効ポリパーフルオロアルコキシエチレン被膜が2.5から12ミルの範囲の厚さを有する、請求項1に記載の供給槽。
- 超高純度脱イオン水分注装置に含まれる、請求項1に記載の供給槽。
- 半導体製造ツールに含まれる、請求項1に記載の供給槽。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201261681510P | 2012-08-09 | 2012-08-09 | |
US61/681,510 | 2012-08-09 | ||
PCT/US2013/054025 WO2014025937A1 (en) | 2012-08-09 | 2013-08-07 | Ultra-high purity storage and dispensing of liquid reagents |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2015534256A true JP2015534256A (ja) | 2015-11-26 |
JP6490582B2 JP6490582B2 (ja) | 2019-03-27 |
Family
ID=50068554
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2015526681A Active JP6490582B2 (ja) | 2012-08-09 | 2013-08-07 | 液体試薬の超高純度保存および分注 |
Country Status (8)
Country | Link |
---|---|
US (1) | US10358263B2 (ja) |
EP (1) | EP2883238A4 (ja) |
JP (1) | JP6490582B2 (ja) |
KR (1) | KR102082165B1 (ja) |
CN (1) | CN104769701B (ja) |
SG (2) | SG10201700892QA (ja) |
TW (1) | TWI622527B (ja) |
WO (1) | WO2014025937A1 (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2883238A4 (en) | 2012-08-09 | 2016-03-16 | Entegris Inc | ULTRAHOULAR STORAGE AND EXPOSURE OF LIQUID REAGENTS |
CN109071104B (zh) | 2016-03-31 | 2020-03-31 | 富士胶片株式会社 | 半导体制造用处理液、收容有半导体制造用处理液的收容容器、图案形成方法及电子器件的制造方法 |
CN112198755B (zh) * | 2020-10-20 | 2024-05-24 | 江苏高光半导体材料有限公司 | 一种掩膜版存储使用一体装载盒 |
KR102373773B1 (ko) * | 2021-10-16 | 2022-03-14 | 엔비스아나(주) | 케미컬 내압용기 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5046638A (en) * | 1990-03-22 | 1991-09-10 | Fluoroware, Inc. | Seamless pressure vessel with recessed indentation |
JPH04101838A (ja) * | 1990-08-22 | 1992-04-03 | Nippon Carbide Ind Co Inc | 新規な容器及びそれに使用する資材 |
JPH10273193A (ja) * | 1997-03-31 | 1998-10-13 | Mitsubishi Gas Chem Co Inc | 高純度薬液輸送用大型容器 |
US5928743A (en) * | 1997-07-24 | 1999-07-27 | Purepak Technology Corporation | Pressurized gas vessel having internal chemical surface |
JP2001341794A (ja) * | 2000-05-31 | 2001-12-11 | Sumitomo Chem Co Ltd | 超高純度過酸化水素水用容器 |
US20030015249A1 (en) * | 2001-07-13 | 2003-01-23 | Jursich Gregory M. | Methods and apparatus for delivering high purity liquids with low vapor pressure |
JP2005236050A (ja) * | 2004-02-19 | 2005-09-02 | Az Electronic Materials Kk | 電子デバイス製造用薬液の供給装置および容器交換方法 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1986006705A1 (en) | 1985-05-17 | 1986-11-20 | J.C. Schumacher Company | Disposable chemical container |
JP3559062B2 (ja) | 1993-06-30 | 2004-08-25 | 三井・デュポンフロロケミカル株式会社 | テトラフルオロエチレン/フルオロアルコキシトリフルオロエチレン共重合体組成物 |
JPH09318497A (ja) | 1996-05-30 | 1997-12-12 | Nomura Micro Sci Co Ltd | 試料容器、超純水製造管理システムおよび超純水分析方法 |
JPH10119973A (ja) | 1996-10-18 | 1998-05-12 | Mitsubishi Gas Chem Co Inc | サンプリング口を有する薬液容器 |
US8313821B2 (en) | 2006-06-02 | 2012-11-20 | Advanced Technology Materials, Inc. | Barrier fluoropolymer film-based liners and packaging comprising same |
US8002247B2 (en) * | 2008-08-22 | 2011-08-23 | Air Products And Chemicals, Inc. | Cross purge valve and container assembly |
US8162296B2 (en) * | 2009-03-19 | 2012-04-24 | Air Products And Chemicals, Inc. | Splashguard for high flow vacuum bubbler vessel |
EP2883238A4 (en) | 2012-08-09 | 2016-03-16 | Entegris Inc | ULTRAHOULAR STORAGE AND EXPOSURE OF LIQUID REAGENTS |
-
2013
- 2013-08-07 EP EP13828292.6A patent/EP2883238A4/en not_active Withdrawn
- 2013-08-07 KR KR1020157006081A patent/KR102082165B1/ko active IP Right Grant
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- 2013-08-07 US US14/419,458 patent/US10358263B2/en active Active
- 2013-08-07 CN CN201380051543.XA patent/CN104769701B/zh active Active
- 2013-08-07 SG SG10201700892QA patent/SG10201700892QA/en unknown
- 2013-08-07 WO PCT/US2013/054025 patent/WO2014025937A1/en active Application Filing
- 2013-08-07 SG SG11201501002QA patent/SG11201501002QA/en unknown
- 2013-08-09 TW TW102128681A patent/TWI622527B/zh active
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5046638A (en) * | 1990-03-22 | 1991-09-10 | Fluoroware, Inc. | Seamless pressure vessel with recessed indentation |
JPH04101838A (ja) * | 1990-08-22 | 1992-04-03 | Nippon Carbide Ind Co Inc | 新規な容器及びそれに使用する資材 |
JPH10273193A (ja) * | 1997-03-31 | 1998-10-13 | Mitsubishi Gas Chem Co Inc | 高純度薬液輸送用大型容器 |
US5928743A (en) * | 1997-07-24 | 1999-07-27 | Purepak Technology Corporation | Pressurized gas vessel having internal chemical surface |
JP2001341794A (ja) * | 2000-05-31 | 2001-12-11 | Sumitomo Chem Co Ltd | 超高純度過酸化水素水用容器 |
US20030015249A1 (en) * | 2001-07-13 | 2003-01-23 | Jursich Gregory M. | Methods and apparatus for delivering high purity liquids with low vapor pressure |
JP2005236050A (ja) * | 2004-02-19 | 2005-09-02 | Az Electronic Materials Kk | 電子デバイス製造用薬液の供給装置および容器交換方法 |
Also Published As
Publication number | Publication date |
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CN104769701A (zh) | 2015-07-08 |
SG11201501002QA (en) | 2015-04-29 |
JP6490582B2 (ja) | 2019-03-27 |
EP2883238A1 (en) | 2015-06-17 |
EP2883238A4 (en) | 2016-03-16 |
WO2014025937A1 (en) | 2014-02-13 |
SG10201700892QA (en) | 2017-04-27 |
US20150210430A1 (en) | 2015-07-30 |
TWI622527B (zh) | 2018-05-01 |
US10358263B2 (en) | 2019-07-23 |
KR20150046097A (ko) | 2015-04-29 |
KR102082165B1 (ko) | 2020-02-27 |
TW201420435A (zh) | 2014-06-01 |
CN104769701B (zh) | 2018-05-29 |
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