JP2015532341A - ポリアニリン膜ならびにその用途および方法 - Google Patents
ポリアニリン膜ならびにその用途および方法 Download PDFInfo
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- JP2015532341A JP2015532341A JP2015536961A JP2015536961A JP2015532341A JP 2015532341 A JP2015532341 A JP 2015532341A JP 2015536961 A JP2015536961 A JP 2015536961A JP 2015536961 A JP2015536961 A JP 2015536961A JP 2015532341 A JP2015532341 A JP 2015532341A
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- 229920000767 polyaniline Polymers 0.000 title claims abstract description 132
- 238000000034 method Methods 0.000 title claims abstract description 52
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- 239000003795 chemical substances by application Substances 0.000 claims abstract description 24
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- DCAYPVUWAIABOU-UHFFFAOYSA-N hexadecane Chemical compound CCCCCCCCCCCCCCCC DCAYPVUWAIABOU-UHFFFAOYSA-N 0.000 claims description 60
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- MIOPJNTWMNEORI-UHFFFAOYSA-N camphorsulfonic acid Chemical compound C1CC2(CS(O)(=O)=O)C(=O)CC1C2(C)C MIOPJNTWMNEORI-UHFFFAOYSA-N 0.000 claims description 7
- RXYPXQSKLGGKOL-UHFFFAOYSA-N 1,4-dimethylpiperazine Chemical compound CN1CCN(C)CC1 RXYPXQSKLGGKOL-UHFFFAOYSA-N 0.000 claims description 6
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- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 claims description 3
- 229940092714 benzenesulfonic acid Drugs 0.000 claims description 3
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- CJMZLCRLBNZJQR-UHFFFAOYSA-N ethyl 2-amino-4-(4-fluorophenyl)thiophene-3-carboxylate Chemical compound CCOC(=O)C1=C(N)SC=C1C1=CC=C(F)C=C1 CJMZLCRLBNZJQR-UHFFFAOYSA-N 0.000 claims description 3
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- YFSUTJLHUFNCNZ-UHFFFAOYSA-N perfluorooctane-1-sulfonic acid Chemical compound OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F YFSUTJLHUFNCNZ-UHFFFAOYSA-N 0.000 claims description 3
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- 239000011970 polystyrene sulfonate Substances 0.000 claims description 3
- 229960002796 polystyrene sulfonate Drugs 0.000 claims description 3
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- TXQDHQBSNAJSHQ-UHFFFAOYSA-N 2,5-dimethyl-2,5-dihydro-1h-pyrrole Chemical compound CC1NC(C)C=C1 TXQDHQBSNAJSHQ-UHFFFAOYSA-N 0.000 claims description 2
- 229940043279 diisopropylamine Drugs 0.000 claims description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 claims 2
- WGQKYBSKWIADBV-UHFFFAOYSA-N benzylamine Chemical compound NCC1=CC=CC=C1 WGQKYBSKWIADBV-UHFFFAOYSA-N 0.000 claims 2
- QBDAFARLDLCWAT-UHFFFAOYSA-N 2,3-dihydropyran-6-one Chemical compound O=C1OCCC=C1 QBDAFARLDLCWAT-UHFFFAOYSA-N 0.000 claims 1
- 238000012216 screening Methods 0.000 abstract 1
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- MIOPJNTWMNEORI-GMSGAONNSA-N (S)-camphorsulfonic acid Chemical compound C1C[C@@]2(CS(O)(=O)=O)C(=O)C[C@@H]1C2(C)C MIOPJNTWMNEORI-GMSGAONNSA-N 0.000 description 60
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- OZDGMOYKSFPLSE-UHFFFAOYSA-N 2-Methylaziridine Chemical compound CC1CN1 OZDGMOYKSFPLSE-UHFFFAOYSA-N 0.000 description 1
- WBIQQQGBSDOWNP-UHFFFAOYSA-N 2-dodecylbenzenesulfonic acid Chemical compound CCCCCCCCCCCCC1=CC=CC=C1S(O)(=O)=O WBIQQQGBSDOWNP-UHFFFAOYSA-N 0.000 description 1
- GELMWIVBBPAMIO-UHFFFAOYSA-N 2-methylbutan-2-amine Chemical compound CCC(C)(C)N GELMWIVBBPAMIO-UHFFFAOYSA-N 0.000 description 1
- IDWRJRPUIXRFRX-UHFFFAOYSA-N 3,5-dimethylpiperidine Chemical compound CC1CNCC(C)C1 IDWRJRPUIXRFRX-UHFFFAOYSA-N 0.000 description 1
- FTAHXMZRJCZXDL-UHFFFAOYSA-N 3-piperideine Chemical compound C1CC=CCN1 FTAHXMZRJCZXDL-UHFFFAOYSA-N 0.000 description 1
- JVQIKJMSUIMUDI-UHFFFAOYSA-N 3-pyrroline Chemical compound C1NCC=C1 JVQIKJMSUIMUDI-UHFFFAOYSA-N 0.000 description 1
- QJMLZAWFWIPNOD-UHFFFAOYSA-N 4-ethyl-2-methyl-2-(3-methylbutyl)-1,3-oxazolidine Chemical compound CCC1COC(C)(CCC(C)C)N1 QJMLZAWFWIPNOD-UHFFFAOYSA-N 0.000 description 1
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- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 239000005700 Putrescine Substances 0.000 description 1
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- 125000003118 aryl group Chemical group 0.000 description 1
- UGBKOURNNQREPE-UHFFFAOYSA-N azepan-1-amine Chemical compound NN1CCCCCC1 UGBKOURNNQREPE-UHFFFAOYSA-N 0.000 description 1
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- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
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- HSOHBWMXECKEKV-UHFFFAOYSA-N cyclooctanamine Chemical compound NC1CCCCCCC1 HSOHBWMXECKEKV-UHFFFAOYSA-N 0.000 description 1
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- 238000006731 degradation reaction Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000010612 desalination reaction Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- WEHWNAOGRSTTBQ-UHFFFAOYSA-N dipropylamine Chemical compound CCCNCCC WEHWNAOGRSTTBQ-UHFFFAOYSA-N 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- VFNGKCDDZUSWLR-UHFFFAOYSA-L disulfate(2-) Chemical compound [O-]S(=O)(=O)OS([O-])(=O)=O VFNGKCDDZUSWLR-UHFFFAOYSA-L 0.000 description 1
- 229940060296 dodecylbenzenesulfonic acid Drugs 0.000 description 1
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- 239000013022 formulation composition Substances 0.000 description 1
- 239000013505 freshwater Substances 0.000 description 1
- DDRPCXLAQZKBJP-UHFFFAOYSA-N furfurylamine Chemical compound NCC1=CC=CO1 DDRPCXLAQZKBJP-UHFFFAOYSA-N 0.000 description 1
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- 238000010438 heat treatment Methods 0.000 description 1
- 238000004128 high performance liquid chromatography Methods 0.000 description 1
- 230000036571 hydration Effects 0.000 description 1
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- 125000001165 hydrophobic group Chemical group 0.000 description 1
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- 230000005764 inhibitory process Effects 0.000 description 1
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- 150000002500 ions Chemical class 0.000 description 1
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- 150000007517 lewis acids Chemical class 0.000 description 1
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- 238000012423 maintenance Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- MKQLBNJQQZRQJU-UHFFFAOYSA-N morpholin-4-amine Chemical compound NN1CCOCC1 MKQLBNJQQZRQJU-UHFFFAOYSA-N 0.000 description 1
- XRYGCVVVDCEPRL-UHFFFAOYSA-N n,1-dimethylpiperidin-4-amine Chemical compound CNC1CCN(C)CC1 XRYGCVVVDCEPRL-UHFFFAOYSA-N 0.000 description 1
- MBHINSULENHCMF-UHFFFAOYSA-N n,n-dimethylpropanamide Chemical compound CCC(=O)N(C)C MBHINSULENHCMF-UHFFFAOYSA-N 0.000 description 1
- RWIVICVCHVMHMU-UHFFFAOYSA-N n-aminoethylmorpholine Chemical compound NCCN1CCOCC1 RWIVICVCHVMHMU-UHFFFAOYSA-N 0.000 description 1
- HVAAHUDGWQAAOJ-UHFFFAOYSA-N n-benzylethanamine Chemical compound CCNCC1=CC=CC=C1 HVAAHUDGWQAAOJ-UHFFFAOYSA-N 0.000 description 1
- PZYDAVFRVJXFHS-UHFFFAOYSA-N n-cyclohexyl-2-pyrrolidone Chemical compound O=C1CCCN1C1CCCCC1 PZYDAVFRVJXFHS-UHFFFAOYSA-N 0.000 description 1
- 239000002121 nanofiber Substances 0.000 description 1
- PSZYNBSKGUBXEH-UHFFFAOYSA-N naphthalene-1-sulfonic acid Chemical compound C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1 PSZYNBSKGUBXEH-UHFFFAOYSA-N 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- 230000008520 organization Effects 0.000 description 1
- YNOGYQAEJGADFJ-UHFFFAOYSA-N oxolan-2-ylmethanamine Chemical compound NCC1CCCO1 YNOGYQAEJGADFJ-UHFFFAOYSA-N 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- DPBLXKKOBLCELK-UHFFFAOYSA-N pentan-1-amine Chemical compound CCCCCN DPBLXKKOBLCELK-UHFFFAOYSA-N 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- LWMPFIOTEAXAGV-UHFFFAOYSA-N piperidin-1-amine Chemical compound NN1CCCCC1 LWMPFIOTEAXAGV-UHFFFAOYSA-N 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- QLNJFJADRCOGBJ-UHFFFAOYSA-N propionamide Chemical compound CCC(N)=O QLNJFJADRCOGBJ-UHFFFAOYSA-N 0.000 description 1
- 229940080818 propionamide Drugs 0.000 description 1
- AOHJOMMDDJHIJH-UHFFFAOYSA-N propylenediamine Chemical compound CC(N)CN AOHJOMMDDJHIJH-UHFFFAOYSA-N 0.000 description 1
- JHHZLHWJQPUNKB-UHFFFAOYSA-N pyrrolidin-3-ol Chemical compound OC1CCNC1 JHHZLHWJQPUNKB-UHFFFAOYSA-N 0.000 description 1
- 238000011002 quantification Methods 0.000 description 1
- 229920005604 random copolymer Polymers 0.000 description 1
- 230000008707 rearrangement Effects 0.000 description 1
- 238000010079 rubber tapping Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 239000013535 sea water Substances 0.000 description 1
- SBIBMFFZSBJNJF-UHFFFAOYSA-N selenium;zinc Chemical compound [Se]=[Zn] SBIBMFFZSBJNJF-UHFFFAOYSA-N 0.000 description 1
- 239000010865 sewage Substances 0.000 description 1
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- 238000010183 spectrum analysis Methods 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
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- 150000003457 sulfones Chemical class 0.000 description 1
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- 239000002352 surface water Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- BRNULMACUQOKMR-UHFFFAOYSA-N thiomorpholine Chemical compound C1CSCCN1 BRNULMACUQOKMR-UHFFFAOYSA-N 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 229910021642 ultra pure water Inorganic materials 0.000 description 1
- 239000012498 ultrapure water Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
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Classifications
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- B01D71/58—Other polymers having nitrogen in the main chain, with or without oxygen or carbon only
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- B01D71/76—Macromolecular material not specifically provided for in a single one of groups B01D71/08 - B01D71/74
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- C—CHEMISTRY; METALLURGY
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- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
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Abstract
Description
本出願は、2012年10月12日に出願された米国仮出願第61/713,439号の恩典を主張するものであり、これはその全体が参照により本明細書に組み込まれる。
したがって、膜、膜を作る方法、および膜の用途が本明細書で説明され、このゲル抑制剤で生成される膜は、膜の親水性を増すように処理されている。
本明細書および添付の特許請求の範囲で用いられる、「a」、「an」、および「the」は、文脈がそうでないと明瞭に示さない限り、複数の指示対象を含む。したがって、例えば、「機能グループ」、「アルキル」、または「残留物」に対する言及は、2つ以上のこのような機能グループ、アルキル、または残留物などの混合物を含む。
固体材料の濡れ性。「親液性」または「湿潤」の古典的な定義は、90度未満の液体接触角度であり、他方、「疎液性」または「非湿潤」とは、90度を超える液体接触角度である。Dupreの式によれば、固体−液体の界面自由エネルギーは、固体(1)と、液体(3)、と固体−液体(13)の界面張力との間での差に由来する。(A.Dupre,Theorie Mecanique de la Chaleur;Gauthier−Villars:Paris,1869)。固体−液体界面自由エネルギーは、Young−Dupre式を用いて液体接触角度から直接的に計算される。
ポリアニリンの操作性は、NMPおよびN,N’−ジメチルプロピレン尿素(DMPU)に一般に限られる溶媒の選定では関心事であった[13、14]。PANiのエメラルジン塩基形態中のイミン窒素とアミン窒素間での鎖間および鎖内の水素結合は、凝集、そして最後にはゲルの形成をもたらす。3〜4もの水素結合が、NMP溶液中のPANiエメラルジン塩基中の四量体繰り返し単位間に形成され得る[15]。ゲル化が、1重量%未満のPANiの濃度で発生しかねず[16〜18]、しばしば、非常に短い時間間隔で発生する[19〜21]、したがって、膜形成にとって望ましい高濃度(約15〜25%)は、ほとんど例外なく一般には不可能である。
また、ポリアニリン、ポリアニリン誘導体、またはそのコポリマーを含む膜が開示され、膜は本明細書に開示する方法の1つを受けている。例えば、ポリアニリンまたはそのコポリマーを含む膜が、本明細書に開示する方法を受けている。
また、本明細書に開示する膜のうちの1つ以上を含む製造物品を開示する。
例えば、製造物品は、本明細書に開示する膜を含み得る。
また、水を浄化するための方法であって、(a)本明細書に開示する膜を提供するステップであって、膜は第1の面および第2の面を有する、提供するステップと、(b)膜の第1の面を第1の圧力で第1の塩分濃度を有する第1の容積の第1の溶液と接触させるステップと、(c)膜の第2の面を第2の圧力で第2の塩分濃度を有する第2の容積の第2の溶液と接触させるステップであって、第1の溶液が、膜を介して第2の溶液と連通する、ステップと、を含み、第1の塩分濃度が、第2の塩分濃度よりも高く、それにより、膜を通して浸透圧を作成し、第1の圧力が、浸透圧を克服するのに十分なほど第2の圧力より高く、それにより、第2の溶液を増加させ、第1の溶液を減少させる、方法が本明細書に開示される。
ゲル抑制剤である4−メチルピペリジン(4MP)、ポリアニリン(PANi)/1−メチル−2−ピロジニノン(NMP)の混合物の添加は、高いポリマー濃度で安定したポリマー溶液を生成した。NMP−4MP溶液中の18ポリマー重量%PANiからの膜キャスティング物は、98%少ない水透過性であったが、NMP中の18ポリマー重量%PANiからのそれらのキャスティング物よりも91%大きいタンパク質拒絶反応を示した。脱イオン水を用いた位相反転後は、PANi−NMP膜は、24°の水接触角度を有し、PANi−NMP−4MP膜は、42°の接触角度を有していた。膜の親水性のこの減少は、水素結合と環置換した4MP/ポリアニリンの会合の組み合わせから発した。異なる酸溶媒と塩基溶媒とによる化学的後処理は、様々な水分流動、タンパク質拒絶反応、界面親水性、および機械的特性を生成した。カンファースルホン酸による後処理は、ポリマーマトリックスから4MPの水素結合断片を改善に除去し、膜の親水性を回復するにあたって最も効果的であった。純粋のポリアニリンの限外濾過膜が、ゲル抑制剤および化学的後処理の使用によって、卓越した機械的特性、界面特性、および分離特性を持つように作成することが可能であると推測される。
(i)材料
超純水18MΩ脱イオン(DI)水が、逆浸透システム(RODI−C−12BL、Aqua Solutions、Inc.)によって生成された。硫酸(Sigma−Aldrich、No.320501)、アンモニウム過酸化二硫酸塩(Fisher、No.A682)、水酸化ナトリウム(Fisher、No.S612)、メタノール(Sigma−Aldrich、No.322415)、NMP(Sigma−Aldrich、No.443778)、4MP(Sigma−Aldrich、No.M73206)、塩酸(Sigma−Aldrich、No.258148)、p−トルエンスルホン酸一水和物(PTSA)(Fisher、No.AC17178)、(+/−)樟脳−10−スルホン酸(CSA)(AlfaAesar、No.A12620)、4−デオドシルベンゼンスルホン酸(DBSA)(Sigma−Aldrich、No.44198)、水酸化アンモニウム(Sigma−Aldrich、No.320145))、ウシ血清アルブミン(BSA)(Sigma−Aldrich、No.A9647)、塩化ナトリウム(Fisher、No.S271))、ジメチルスルホキシド−d6(ケンブリッジ同位元素研究所、No.DLM−10)、および塩化カリウム(Fisher、No.P217)が、すべて受領された状態で使用された。
ポリアニリンが、以前に詳細に報告されたように、我々の研究所で合成された[12]。ポリアニリンは、溶媒に添加されるのに先立って、一晩50℃で、真空オーブン(約25Hg)で乾燥された。ポリマー溶液は、18重量%の粉砕されたPANi粉末を、82重量%のNMP(PANi−NMP)もしくは72重量%NMPと10重量%の4MP(PANi−NMP−4MP)、すなわち2モルの4MPとの混合物、モルPANiエメラルジン塩基四量体、0.547gの4MP/gPANiエメラルジン塩基に添加することによって準備された[15、22、26〜28]。PANiは、激しく攪拌しながら1時間にわたって溶媒に添加される。ポリマー溶液は、緊密に閉られたバイアル中に、3日にわたって攪拌された。
PANi UF膜は、100mMのHCl、H2SO4、PTSA、CSA、DBSA、またはNH4OHの150mlの水溶液を含むビーカー中に膜クーポンを配置することによって後処理された。類似した後処理が、50℃で脱イオン水を用いて実行された。おとなしい攪拌が、125rpmに維持された。CSAを膜から除去する意図を持った特殊な後処理が、おとなしい攪拌で3時間にわたって50℃で100mMのNH4OH中で実行された。CSA後処理は、別様に記載ない限り、1時間にわたって50℃で100mM CSAを用いて実行された。
膜のサンプルが、25mmのパンチ(Osborneのアーチパンチ、OS−149−m25、Campbell Bosworth Machinery Co.)を用いて性能試験のために切り取られた。サンプルは、湿った状態に維持され、3.5cm2の膜面積(Am)を持つ端末攪拌されたセル(UHP−25、Advance MFS,Inc.)中に配置された。透過容積流量が、デジタル式のHPLC液体流量計(FlowCal5000、Tovatech,LLC)を用いて測定された。膜は、30分にわたって5%未満の浸透性の減少が達成されるまで、20℃で20psiの膜透過圧力下で脱イオン水によって圧縮された。透過容積流量(Qp)が、次に、20、10、および5psiの膜透過圧力(Δp)で記録された。膜の純水透過性(Lp)が、次式から計算された[46]。
(i)PANi操作性に対する4MPの影響
2:1モルの4MP:PANiエメラルジン塩基四量体の比で4MPを添加することは、ポリマー溶液の品質を向上させる。72重量%のNMPと10重量%の4MPとを含む18重量%のPANi混合物は、1日内で実行可能なポリマー溶液を生成する。実行可能なポリマー溶液とは、本明細書では、膜をそれからキャスティングすることが可能なポリマーと溶媒との混合物であると定義され、膜にキャスティングすることが不可能な実行不可能なポリマー溶液は、数秒以内でゲルを形成する。4MP:PANiエメラルジン塩基が2:1モル比である我々の合成したPANiを含むポリマー溶液は、数ヶ月にわたってゲル化しない。しかしながら、4MP無しのPANi−NMP混合物は、実行可能なポリマー溶液を生成するには2日を要し、このポリマー溶液は、ゲル形成前に2〜5日にわたって実行可能状態に留まる。4MPの添加は、PANiの完全な溶解を可能とし、ポリマー溶液の実行可能性の窓を大いに拡張する。
(ii)PANI膜の親水性に対する化学的後処理の影響
純水透過性が、未処理と、CSA処理とのPANi−NMP−4MP膜に対して測定され、表3に要約する。4MPを含まない18重量%PANi−82重量%のNMP膜に対する0%のBSA拒絶反応を持つ1050μms−1バール−1の膜の純水透過性が既に報告されている[12]。膜の透過性は、ポリマー溶液に対する10重量%の4MP添加後に98%減少する。PANi−NMP−4MP膜のBSAタンパク質拒絶反応は、0%から91%まで増加する。50℃での1時間にわたる100mMのCSAでのPANi―NMP−4MP膜の後処理は、約15%だけBSA拒絶反応を減少させ、透過性は少し減少する。
不織布支持織物および膜の厚さおよび引っ張り係数を、表4に示す。乾燥された支持織物は、湿ったサンプルよりも約13%薄い。PANi膜の内で、未処理PANi−NMP膜のみが、厚さのわずかな減少(7%)を示した。50℃で100mMのCSAを用いる後処理は、膜の厚さに影響はなかった。CSA処理済みと未処理との双方のPANi−NMP−4MP膜は、湿潤/乾燥の厚さに違いは示さなかった。引っ張り強度は、PANi層を支持織物に追加することによって増加する。PANi−NMP膜は、不織布織物支持体の約2倍の破壊強度を有する。PANi−NMP−4MP膜中の引っ張り強度は減少するが、なおも、支持織物よりも大きい。PANi−NMP−4MPのCSA処理された膜は、最大の引っ張り係数を有する。この傾向は、湿った膜/乾いた膜に対して同一であり、乾燥した膜がより大きい破壊強度を有する。
フーリエ変換赤外線(FTIR)スペクトル分析が、18重量%PANi−82重量%NMP膜(PANi−NMP)、18重量%−72重量%NMP−10重量%4MP膜(PANi−NMP−4MP)、50℃で100mMのCSA中で1時間にわたって処理された18重量%PANi−72重量%NMP−10重量%4MP膜、50℃で3時間にわたって100mMのNH4OHでさらに処理されたCSA処理された18重量%PANi−72重量%NMP−10重量%4MP膜(PANi−NMP−4MPCSA+NH4OH処理済み)、および純水CSAに対して実行された。これらのスペクトルを、図4に示す。カルボニル(C=O)、キノイド環(Q)、およびベンゾノイド環(B)のピークの輪郭が示されている。このスペクトルは、前の研究[27、50〜53]で報告されたそれと非常に近接に一致する。CSA処理されたPANi−NMP−4MP膜のスペクトルは、1740cm−1当たりでピークを示すが、これは、CSAのC=O結合の存在に対応し得る。このピークは、純粋CSA中で傑出しており、NH4OH処理後には大いに減少している。各々の膜に対するキノイド環対ベンゾノイド環のピークの位置および比を、表5に示す。PANi−NMP膜のキノイド(1587cm−1)対ベンゾノイド(1495cm−1)のピークの比(Q/B)は0.87であり、これは、他社によって発見されたQ/B比の値と一致する[27、28]。PANi−NMP−4MP膜のQ/B比は、0.52まで減少する。PANi−NMP膜とPANi−NMP−4MP膜との間でのQピークのシフトはない。
PANi−NMP、PANi−NMP−4MP、およびPANi−NMP−4MPのCSA処理された膜に対する膜表面電荷を、図6に示す。荷電電流測定値は、4MPの添加が、4.5から5.8への等電点の移動で示されるように、より正に荷電された膜を生成することを示す。PANi−NMP膜は、pH7で−50mVのゼータ電位を有し、未処理とCSA処理済みとの双方のPANi−NMP−4MP膜はpH7で−20〜−25mVのゼータ電位を有する。CSA後処理は、膜のゼータ電位の大きさを減少させる。
PANi−NMP、PANi−NMP−4MP、およびCSA処理されたPANi−NMP−4MPの膜の表面および断面SEM画像を、図6に示す。SEMの断面形状は、これらの膜が、指状のマクロ空隙を持つ非対称性の構造を有することを示す。4MPの添加は、PANi−NMP膜と比較してより少ない空隙スペースを持つ膜を生成する。CSAの後処理は、膜の空隙構造に影響するとは思われない。膜表面の多孔率および平均の孔直径を、表6に提示する。表面の多孔率および平均の孔直径は、4MPを添加すると減少する。CSA後処理は、表面の多孔率および平均の孔直径の双方を増加させる。
PANi−NMPポリマー溶液に対する4MPの添加は、鎖環および鎖内のPANi水素結合を崩壊させる点を超えてPANiに影響する。4MPの強い塩基性(pKa=11.3)およびサイズ(7.29Å)は、それぞれ、pKa=11.2および7.16Åのサイズを有するヘプタメチレンイミン(HPMI)に非常に類似している[28]。HPMIは、PANi EB中のキノイド構造を環置換によってベンゾノイドに還元することが示されているPANiゲル抑制剤である[27]。4MPを用いてキャスティングされた膜の0.87から0.52へのFTIR Q/B比の減少は、一部の環置換が存在し得ることを示すが、しかしながら、Qピークシフトの欠如は、共有結合がないことを示し得る。
(a)ポリマー膜上の極性液体および無極性液体の接触角度の測定
微生物細胞の表面張力は、別のところで説明されるように、0.1μmのワットマン濾過紙上で濾過された微生物芝生上の脱イオン化水、エチレングリコール、グリセロール、およびジイオドメタンの液滴接触角度(VCA−1000、AST Products Inc.、Billerica、MA)から決定された。(G.A.Burks,et al.,Langmuir 2003,19,2366−2371)コロイド粒子(シリカ、アルミナ、およびカルボキシル変性ラテックス)は、前に出版された源からのものであった。(J.A.Brant,et al.,Journal of Membrane Science 2004,241,235−248)ポリアニリンおよび後処理されたポリマー膜の表面張力は、両面テープでガラススライド上に搭載された膜サンプル上の脱イオン化水、エチレングリコール、グリセロール、およびジイオドメタンの液滴接触角度を測定することによって決定された。この研究のために直接的に得られた各々のサンプルに対して少なくとも12の平衡接触角度が、測定され、この平衡角度は、右および左との角度の平均から決定された。最高値および最低値は、平均および標準偏差を取る間に切り捨てられた。他の膜材料の接触角度および対応する表面張力は、前に出版された研究から得られた。(E.R.Cornelissen,et al.,Colloids and Surfaces A:Physicochemical and Engineering Aspects 1998,138,283−289)
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Claims (20)
- 膜の親水性を増す方法であって、
a)ポリアニリン、ポリアニリン誘導体、またはそのコポリマー、ならびに1つ以上のゲル抑制剤を含む膜を提供するステップと、
b)前記膜を1つ以上の親水性回復剤で処理し、それにより、前記膜の親水性を増すステップと、を含む、方法。 - 前記処理が、前記膜を少なくとも60分にわたって前記親水性回復剤と接触させることを含む、請求項1に記載の方法。
- 前記処理が、前記膜を1つ以上の親水性回復剤を用いて濾過することを含む、請求項1に記載の方法。
- 前記濾過が、前記1つ以上の親水性回復剤を少なくとも60分にわたって濾過することを含む、請求項3に記載の方法。
- 前記1つ以上のゲル抑制剤が、第一級アミン、第二級アミン、もしくは第三級アミン、またはこれらの組み合わせを含む、請求項1〜4のいずれか一項に記載の方法。
- 前記1つ以上のゲル抑制剤が、4−メチルピペリジン、n−ブチルアミン、2,5−ジメチル−3−ピロリン、3,3−ジメチルピペリジン、ヘプタメチレンイミン、ジイソプロピルアミン、ヘキサメチレンイミン、N−エチルベンジルアミン、ピペラジン、2,6−ジメチルモルホリン、ピペリジン、ジブチルアミン、N−メチルピペリジン、N,N’−ジメチルピペラジン、トリエチルアミン、もしくはジエチルニペコチンアミド(diethylnipecotinamide)、またはこれらの組み合わせを含む、請求項1〜4のいずれか一項に記載の方法。
- 前記1つ以上の親水性回復剤が、(+/−)樟脳−10−スルホン酸、硫酸、メタンスルホン酸、エタンスルホン酸、プロパンスルホン酸、ペルフルオロプロパンスルホン酸、ブタンスルホン酸、ペルフルオロブタンスルホン酸、ヘキサンスルホン酸、ペルフルオロヘキサンスルホン酸、ペルフルオロオクタンスルホン酸、ベンゼンスルホン酸、トルエンスルホン酸、ドデシルベンゼン、スルホン酸、タウリン(2−アミノエタンスルホン酸)、ホモタウリン(3−アミノプロパンスルホン酸)、ナフタレンスルホン酸、2,5−ナフタレンジスルホン酸、ジノニルナフタレンスルホン酸、ジノニルナフタレンジスルホン酸、ポリビニルスルホン酸塩、もしくはポリスチレンスルホン酸塩、またはこれらの組み合わせを含む、請求項1〜6のいずれか一項に記載の方法。
- 前記1つ以上の親水性回復剤が、(+/−)樟脳−10−スルホン酸を含む、請求項1〜6のいずれか一項に記載の方法。
- 前記膜が、処理後に、少なくとも5、10、15、20、25、30、50、75、または100mJ/m2の増加した
- 前記膜が、処理後に、正の
- 前記膜が、処理後に、少なくとも5、10、15、20、25、30、または50mJ/m2の正の
- 前記膜が、処理後に、少なくとも5、10、15、20、25、30、50、75、または100mJ/m2の増加した
- 前記膜が、処理後に、正の
- 前記膜が、処理後に、シリカ、ポリエチレングリコール(PEG)、ヒト血清アルブミン(HSA)、ヘキサデカン、大腸菌、出芽酵母、およびプチダ菌に対して測定したときに正の
- ポリアニリン、ポリアニリン誘導体、またはそのコポリマーを含む膜であって、請求項1〜14のいずれか一項に記載の方法を受けた、膜。
- 正の
- 少なくとも5、10、15、20、25、30、または50mJ/m2の正の
- シリカ、PEG、HSA、ヘキサデカン、大腸菌、出芽酵母、およびプチダ菌に対して測定したときに正の
- シリカ、PEG、HSA、ヘキサデカン、大腸菌、出芽酵母、もしくはプチダ菌、またはそれらの組み合わせに対して測定したときに正の
- 請求項15〜19のいずれか一項に記載の膜を含む、製造物品。
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CA2887556A1 (en) | 2014-04-17 |
US20150273404A1 (en) | 2015-10-01 |
CN104884490B (zh) | 2018-11-23 |
US10780404B2 (en) | 2020-09-22 |
BR112015008023A2 (pt) | 2017-07-04 |
BR112015008023B1 (pt) | 2022-03-03 |
RU2673883C2 (ru) | 2018-12-03 |
JP6546094B2 (ja) | 2019-07-17 |
RU2015117605A (ru) | 2016-12-10 |
US20190217254A1 (en) | 2019-07-18 |
WO2014059339A1 (en) | 2014-04-17 |
EP2906608A4 (en) | 2016-05-25 |
US10265662B2 (en) | 2019-04-23 |
CN104884490A (zh) | 2015-09-02 |
SG10201703030WA (en) | 2017-06-29 |
CA2887556C (en) | 2021-01-12 |
KR20150070219A (ko) | 2015-06-24 |
EP2906608A1 (en) | 2015-08-19 |
IL238187B (en) | 2020-08-31 |
SG11201502787XA (en) | 2015-05-28 |
AU2013329013A1 (en) | 2015-05-07 |
AU2013329013B2 (en) | 2017-06-15 |
KR102226776B1 (ko) | 2021-03-10 |
IL238187A0 (en) | 2015-05-31 |
HK1214285A1 (zh) | 2016-07-22 |
MX2015004624A (es) | 2015-10-22 |
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