JP2015529840A5 - - Google Patents
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- Publication number
- JP2015529840A5 JP2015529840A5 JP2015521102A JP2015521102A JP2015529840A5 JP 2015529840 A5 JP2015529840 A5 JP 2015529840A5 JP 2015521102 A JP2015521102 A JP 2015521102A JP 2015521102 A JP2015521102 A JP 2015521102A JP 2015529840 A5 JP2015529840 A5 JP 2015529840A5
- Authority
- JP
- Japan
- Prior art keywords
- branched
- linear
- alkyl
- substrate
- photoresist layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 claims 18
- 229920002120 photoresistant polymer Polymers 0.000 claims 13
- 239000000758 substrate Substances 0.000 claims 10
- 125000000217 alkyl group Chemical group 0.000 claims 8
- 125000003118 aryl group Chemical group 0.000 claims 5
- -1 hexane-1,6-diyl Chemical group 0.000 claims 5
- 239000000203 mixture Substances 0.000 claims 5
- 150000003839 salts Chemical class 0.000 claims 5
- 239000000243 solution Substances 0.000 claims 5
- 239000000654 additive Substances 0.000 claims 4
- 238000004140 cleaning Methods 0.000 claims 4
- 125000000753 cycloalkyl group Chemical group 0.000 claims 4
- 238000007654 immersion Methods 0.000 claims 4
- 239000000463 material Substances 0.000 claims 4
- 239000000126 substance Substances 0.000 claims 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 claims 3
- 230000000996 additive effect Effects 0.000 claims 3
- 229920001577 copolymer Polymers 0.000 claims 3
- 230000007547 defect Effects 0.000 claims 3
- 125000005842 heteroatom Chemical group 0.000 claims 3
- 229920001519 homopolymer Polymers 0.000 claims 3
- 125000002768 hydroxyalkyl group Chemical group 0.000 claims 3
- 230000010354 integration Effects 0.000 claims 3
- 239000004065 semiconductor Substances 0.000 claims 3
- 125000006737 (C6-C20) arylalkyl group Chemical group 0.000 claims 2
- 125000002877 alkyl aryl group Chemical group 0.000 claims 2
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 claims 2
- 239000007788 liquid Substances 0.000 claims 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims 2
- 238000000206 photolithography Methods 0.000 claims 2
- 230000005855 radiation Effects 0.000 claims 2
- 229910019142 PO4 Inorganic materials 0.000 claims 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 claims 1
- 150000001408 amides Chemical class 0.000 claims 1
- 150000001412 amines Chemical class 0.000 claims 1
- 239000007864 aqueous solution Substances 0.000 claims 1
- 125000003710 aryl alkyl group Chemical group 0.000 claims 1
- 125000004429 atom Chemical group 0.000 claims 1
- 230000004888 barrier function Effects 0.000 claims 1
- 230000003796 beauty Effects 0.000 claims 1
- 125000004432 carbon atom Chemical group C* 0.000 claims 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims 1
- 239000003989 dielectric material Substances 0.000 claims 1
- 238000001035 drying Methods 0.000 claims 1
- 238000010894 electron beam technology Methods 0.000 claims 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 1
- 150000002500 ions Chemical class 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 claims 1
- 230000003287 optical effect Effects 0.000 claims 1
- 125000000962 organic group Chemical group 0.000 claims 1
- 125000005702 oxyalkylene group Chemical group 0.000 claims 1
- 239000002245 particle Substances 0.000 claims 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 claims 1
- 239000010452 phosphate Substances 0.000 claims 1
- UEZVMMHDMIWARA-UHFFFAOYSA-M phosphonate Chemical compound [O-]P(=O)=O UEZVMMHDMIWARA-UHFFFAOYSA-M 0.000 claims 1
- 229940124530 sulfonamide Drugs 0.000 claims 1
- 150000003456 sulfonamides Chemical class 0.000 claims 1
- 150000003460 sulfonic acids Chemical class 0.000 claims 1
- 239000004094 surface-active agent Substances 0.000 claims 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201261669686P | 2012-07-10 | 2012-07-10 | |
| US61/669,686 | 2012-07-10 | ||
| PCT/IB2013/055392 WO2014009847A1 (en) | 2012-07-10 | 2013-07-01 | Compositions for anti pattern collapse treatment comprising gemini additives |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015529840A JP2015529840A (ja) | 2015-10-08 |
| JP2015529840A5 true JP2015529840A5 (https=) | 2016-08-18 |
| JP6324955B2 JP6324955B2 (ja) | 2018-05-16 |
Family
ID=49915473
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015521102A Active JP6324955B2 (ja) | 2012-07-10 | 2013-07-01 | ジェミニ添加剤を含む抗パターン崩壊処理用組成物 |
Country Status (11)
| Country | Link |
|---|---|
| US (1) | US10385295B2 (https=) |
| EP (2) | EP2872948B1 (https=) |
| JP (1) | JP6324955B2 (https=) |
| KR (1) | KR102107367B1 (https=) |
| CN (1) | CN104428716B (https=) |
| IL (1) | IL236408B (https=) |
| MY (1) | MY184912A (https=) |
| RU (1) | RU2015104112A (https=) |
| SG (1) | SG11201500098XA (https=) |
| TW (1) | TWI611274B (https=) |
| WO (1) | WO2014009847A1 (https=) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2015168680A (ja) * | 2014-03-11 | 2015-09-28 | 東ソー株式会社 | ジェミニ型界面活性剤 |
| JP6325464B2 (ja) * | 2015-01-05 | 2018-05-16 | 信越化学工業株式会社 | 現像液及びこれを用いたパターン形成方法 |
| JP2016139774A (ja) * | 2015-01-23 | 2016-08-04 | 富士フイルム株式会社 | パターン処理方法、半導体基板製品の製造方法およびパターン構造の前処理液 |
| EP3717609B1 (en) * | 2017-11-28 | 2023-10-18 | Basf Se | Composition comprising a primary and a secondary surfactant, for cleaning or rinsing a product |
| US10994544B2 (en) * | 2018-05-08 | 2021-05-04 | Nippon Kayaku Kabushiki Kaisha | Cleaning liquid and method of cleaning ink-jet printer |
| WO2022008306A1 (en) * | 2020-07-09 | 2022-01-13 | Basf Se | Composition comprising a siloxane and an alkane for avoiding pattern collapse when treating patterned materials with line-space dimensions of 50 nm or below |
| JP7802644B2 (ja) * | 2021-11-09 | 2026-01-20 | 信越化学工業株式会社 | 半導体基板パターン倒壊抑制用充填膜形成材料及び半導体基板の処理方法 |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4027494B2 (ja) * | 1998-04-07 | 2007-12-26 | 花王株式会社 | リンス剤組成物 |
| US7129199B2 (en) | 2002-08-12 | 2006-10-31 | Air Products And Chemicals, Inc. | Process solutions containing surfactants |
| TW558736B (en) | 2000-02-26 | 2003-10-21 | Shipley Co Llc | Method of reducing defects |
| KR20030012692A (ko) * | 2001-08-03 | 2003-02-12 | 주식회사 엘지생활건강 | 계면활성제 시스템 |
| US20050164903A1 (en) * | 2001-08-03 | 2005-07-28 | Ki-Hwan Ko | Complexed surfactant system |
| US6641986B1 (en) | 2002-08-12 | 2003-11-04 | Air Products And Chemicals, Inc. | Acetylenic diol surfactant solutions and methods of using same |
| WO2004088428A1 (ja) * | 2003-03-28 | 2004-10-14 | Tokyo Ohka Kogyo Co. Ltd. | ホトレジスト組成物及びそれを用いたレジストパターン形成方法 |
| US20040259371A1 (en) | 2003-06-18 | 2004-12-23 | Zhijian Lu | Reduction of resist defects |
| EP1553454A2 (en) | 2003-12-22 | 2005-07-13 | Matsushita Electric Industrial Co., Ltd. | Pattern formation method |
| KR100574349B1 (ko) * | 2004-02-03 | 2006-04-27 | 삼성전자주식회사 | 세정액 조성물 및 이를 이용한 반도체 장치의 세정방법 |
| US20080299487A1 (en) | 2007-05-31 | 2008-12-04 | Taiwan Semiconductor Manufacturing Company, Ltd. | Lithography material and lithography process |
| CN101236357B (zh) * | 2007-01-30 | 2012-07-04 | 住友化学株式会社 | 化学放大型抗蚀剂组合物 |
| US20080280230A1 (en) | 2007-05-10 | 2008-11-13 | Taiwan Semiconductor Manufacturing Company, Ltd. | Photolithography process including a chemical rinse |
| JP2009237169A (ja) * | 2008-03-26 | 2009-10-15 | Fujifilm Corp | 平版印刷版の作製方法 |
| JP2009237168A (ja) | 2008-03-26 | 2009-10-15 | Fujifilm Corp | 平版印刷版の作製方法 |
| CN101766973B (zh) * | 2009-01-07 | 2012-06-13 | 湖北大学 | 一种对称型阳离子表面活性剂及其制备方法 |
| JP5624753B2 (ja) | 2009-03-31 | 2014-11-12 | 東京応化工業株式会社 | リソグラフィー用洗浄液及びこれを用いたレジストパターンの形成方法 |
| EP2668248B1 (en) | 2011-01-25 | 2019-02-27 | Basf Se | Use of surfactants having at least three short-chain perfluorinated groups for manufacturing integrated circuits having patterns with line-space dimensions below 50nm |
| RU2585322C2 (ru) | 2011-03-18 | 2016-05-27 | Басф Се | Способ получения интегральных схем, оптических устройств, микромашин и механических высокоточных устройств, имеющих слои структурированного материала со строчным интервалом 50 нм и менее |
| RU2015128132A (ru) * | 2012-12-14 | 2017-01-18 | Басф Се | Применение композиций, содержащих поверхностно-активное вещество и средство придания гидрофобности, для предохранения рельефа от разрушения при обработке рельефных материалов с линейными размерами, равными 50 нм или менее |
-
2013
- 2013-07-01 SG SG11201500098XA patent/SG11201500098XA/en unknown
- 2013-07-01 US US14/412,737 patent/US10385295B2/en active Active
- 2013-07-01 KR KR1020157003355A patent/KR102107367B1/ko active Active
- 2013-07-01 WO PCT/IB2013/055392 patent/WO2014009847A1/en not_active Ceased
- 2013-07-01 MY MYPI2015000032A patent/MY184912A/en unknown
- 2013-07-01 RU RU2015104112A patent/RU2015104112A/ru not_active Application Discontinuation
- 2013-07-01 EP EP13816602.0A patent/EP2872948B1/en not_active Not-in-force
- 2013-07-01 JP JP2015521102A patent/JP6324955B2/ja active Active
- 2013-07-01 EP EP17195200.5A patent/EP3299891B1/en active Active
- 2013-07-01 CN CN201380035822.7A patent/CN104428716B/zh active Active
- 2013-07-08 TW TW102124316A patent/TWI611274B/zh active
-
2014
- 2014-12-23 IL IL236408A patent/IL236408B/en active IP Right Grant
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