JP2015528060A5 - - Google Patents
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- Publication number
- JP2015528060A5 JP2015528060A5 JP2015521651A JP2015521651A JP2015528060A5 JP 2015528060 A5 JP2015528060 A5 JP 2015528060A5 JP 2015521651 A JP2015521651 A JP 2015521651A JP 2015521651 A JP2015521651 A JP 2015521651A JP 2015528060 A5 JP2015528060 A5 JP 2015528060A5
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- wafer
- substrate
- gas
- chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000007789 gas Substances 0.000 description 7
- 239000000758 substrate Substances 0.000 description 5
- 238000000034 method Methods 0.000 description 4
- 150000002500 ions Chemical class 0.000 description 3
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 2
- 230000004907 flux Effects 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 238000002513 implantation Methods 0.000 description 1
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201261670654P | 2012-07-12 | 2012-07-12 | |
| US61/670,654 | 2012-07-12 | ||
| US13/918,033 US10232324B2 (en) | 2012-07-12 | 2013-06-14 | Gas mixing apparatus |
| US13/918,033 | 2013-06-14 | ||
| PCT/US2013/048855 WO2014011423A1 (en) | 2012-07-12 | 2013-07-01 | Gas mixing apparatus |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015528060A JP2015528060A (ja) | 2015-09-24 |
| JP2015528060A5 true JP2015528060A5 (https=) | 2016-08-18 |
| JP6227642B2 JP6227642B2 (ja) | 2017-11-08 |
Family
ID=49912928
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015521651A Active JP6227642B2 (ja) | 2012-07-12 | 2013-07-01 | ガス混合装置 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US10232324B2 (https=) |
| JP (1) | JP6227642B2 (https=) |
| KR (1) | KR102125764B1 (https=) |
| CN (1) | CN104471672B (https=) |
| TW (1) | TWI611458B (https=) |
| WO (1) | WO2014011423A1 (https=) |
Families Citing this family (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102014106523A1 (de) * | 2014-05-09 | 2015-11-12 | Aixtron Se | Vorrichtung und Verfahren zum Versorgen einer CVD- oder PVD-Beschichtungseinrichtung mit einem Prozessgasgemisch |
| KR20160147482A (ko) * | 2015-06-15 | 2016-12-23 | 삼성전자주식회사 | 가스 혼합부를 갖는 반도체 소자 제조 설비 |
| KR102159868B1 (ko) * | 2015-10-06 | 2020-09-24 | 가부시키가이샤 알박 | 혼합기, 진공 처리 장치 |
| CN105546348A (zh) * | 2015-12-09 | 2016-05-04 | 无锡拓能自动化科技有限公司 | 应用于气体灌装站的高效混合气体灌装管道 |
| CN105546349A (zh) * | 2015-12-09 | 2016-05-04 | 无锡拓能自动化科技有限公司 | 应用于气体灌装站的气体灌装管道 |
| US10256075B2 (en) * | 2016-01-22 | 2019-04-09 | Applied Materials, Inc. | Gas splitting by time average injection into different zones by fast gas valves |
| JP6419745B2 (ja) * | 2016-03-15 | 2018-11-07 | 株式会社東芝 | ミキサ構造、流体通路装置、および処理装置 |
| US11164737B2 (en) * | 2017-08-30 | 2021-11-02 | Applied Materials, Inc. | Integrated epitaxy and preclean system |
| CN107413218B (zh) * | 2017-09-11 | 2020-11-24 | 张家口新金石科技发展有限公司 | 二氧化碳和氧气气体混合装置及混合气体助燃污染气体零排放系统 |
| CN112739451B (zh) * | 2018-09-20 | 2023-04-04 | 诺拉姆工程及建造有限公司 | 流体混合装置 |
| CN109609929A (zh) * | 2018-11-20 | 2019-04-12 | 沈阳拓荆科技有限公司 | 混气结构及反应设备 |
| CN113196444B (zh) | 2018-12-20 | 2024-07-02 | 应用材料公司 | 用于供应改良的气流至处理腔室的处理空间的方法和设备 |
| TWI765795B (zh) | 2019-04-24 | 2022-05-21 | 美商應用材料股份有限公司 | 具有旋轉葉片與氣體注入之用於在固定腔室中塗覆粒子的反應器 |
| CN110237734A (zh) * | 2019-06-10 | 2019-09-17 | 中国石油大学(北京) | 气体混合器及废气处理装置 |
| ES2974412T3 (es) | 2019-11-29 | 2024-06-27 | Dow Silicones Corp | Mezclador estático y sistema de fabricación aditiva que comprende el mezclador estático |
| CN112928008B (zh) * | 2019-12-06 | 2023-03-24 | 中微半导体设备(上海)股份有限公司 | 气体供应系统及其气体输送方法、等离子体处理装置 |
| KR102781656B1 (ko) * | 2020-04-06 | 2025-03-13 | 램 리써치 코포레이션 | 가스 주입기들을 위한 세라믹 애디티브 제작 (additive manufacturing) 기법들 |
| CN113430502B (zh) * | 2021-06-18 | 2022-07-22 | 北京北方华创微电子装备有限公司 | 半导体工艺设备及其混合进气装置 |
| KR20230016923A (ko) * | 2021-07-27 | 2023-02-03 | 삼성전자주식회사 | 증착 장치 |
| JP2026502736A (ja) * | 2023-01-20 | 2026-01-26 | トプソー・アクチエゼルスカベット | ブルーアンモニアの製造方法 |
| US20240383201A1 (en) | 2023-05-19 | 2024-11-21 | Ut-Battelle, Llc | Static mixing nozzles for fiber randomization in large scale additive manufacturing applications |
Family Cites Families (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4520757A (en) * | 1982-10-27 | 1985-06-04 | Energy Conversion Devices, Inc. | Process gas introduction, confinement and evacuation system for glow discharge deposition apparatus |
| JP2922910B2 (ja) | 1988-12-14 | 1999-07-26 | ソニー株式会社 | 低温成膜装置 |
| JP2939823B2 (ja) | 1990-07-20 | 1999-08-25 | 日本酸素株式会社 | 有機金属気相成長装置 |
| JPH0610138A (ja) | 1991-07-01 | 1994-01-18 | Kokusai Chodendo Sangyo Gijutsu Kenkyu Center | Ｍｏｃｖｄ法による酸化物超電導体の製造方法 |
| US5523063A (en) * | 1992-12-02 | 1996-06-04 | Applied Materials, Inc. | Apparatus for the turbulent mixing of gases |
| JPH07211643A (ja) | 1994-01-20 | 1995-08-11 | Hitachi Electron Eng Co Ltd | Ｃｖｄ装置の反応ガス混合器 |
| KR100296494B1 (ko) | 1999-03-31 | 2001-07-03 | 윤영환 | 수소산소 혼합가스 발생장치 |
| JP2003133300A (ja) | 2001-10-26 | 2003-05-09 | Tokyo Electron Ltd | 成膜装置及び成膜方法 |
| US7780789B2 (en) * | 2001-10-26 | 2010-08-24 | Applied Materials, Inc. | Vortex chamber lids for atomic layer deposition |
| US7017514B1 (en) * | 2001-12-03 | 2006-03-28 | Novellus Systems, Inc. | Method and apparatus for plasma optimization in water processing |
| US6933010B2 (en) | 2001-12-03 | 2005-08-23 | Ulvac, Inc | Mixer, and device and method for manufacturing thin-film |
| JP4002768B2 (ja) | 2002-02-14 | 2007-11-07 | 株式会社アルバック | 成膜装置 |
| US6684719B2 (en) * | 2002-05-03 | 2004-02-03 | Caterpillar Inc | Method and apparatus for mixing gases |
| JP2004323894A (ja) | 2003-04-23 | 2004-11-18 | Sekisui Chem Co Ltd | ガス供給安定化器、気相成長装置および気相成長方法 |
| US20050252449A1 (en) * | 2004-05-12 | 2005-11-17 | Nguyen Son T | Control of gas flow and delivery to suppress the formation of particles in an MOCVD/ALD system |
| US20060042754A1 (en) * | 2004-07-30 | 2006-03-02 | Tokyo Electron Limited | Plasma etching apparatus |
| GB2447381B (en) | 2005-12-23 | 2010-02-24 | Mks Instr Inc | Methods and apparatus for downstream dissociation of gases |
| JP2007335755A (ja) | 2006-06-16 | 2007-12-27 | Matsushita Electric Ind Co Ltd | 基板処理装置および基板処理方法 |
| US8821637B2 (en) * | 2007-01-29 | 2014-09-02 | Applied Materials, Inc. | Temperature controlled lid assembly for tungsten nitride deposition |
| US8123902B2 (en) * | 2007-03-21 | 2012-02-28 | Applied Materials, Inc. | Gas flow diffuser |
| US8512509B2 (en) * | 2007-12-19 | 2013-08-20 | Applied Materials, Inc. | Plasma reactor gas distribution plate with radially distributed path splitting manifold |
| TW201112886A (en) * | 2009-01-09 | 2011-04-01 | Ulvac Inc | Plasma treatment apparatus |
| CN102414794B (zh) | 2009-04-21 | 2015-01-28 | 应用材料公司 | 改良膜厚度不均匀性与粒子表现的cvd设备 |
| US20110203560A1 (en) | 2010-02-23 | 2011-08-25 | Wallace William K | Fuel conditioning vacuum module |
| JP6101698B2 (ja) * | 2011-09-30 | 2017-03-22 | ライフ テクノロジーズ コーポレイション | フィルムスパージャを有する容器 |
-
2013
- 2013-06-14 US US13/918,033 patent/US10232324B2/en not_active Expired - Fee Related
- 2013-06-18 TW TW102121573A patent/TWI611458B/zh active
- 2013-07-01 KR KR1020157003744A patent/KR102125764B1/ko active Active
- 2013-07-01 CN CN201380036866.1A patent/CN104471672B/zh active Active
- 2013-07-01 WO PCT/US2013/048855 patent/WO2014011423A1/en not_active Ceased
- 2013-07-01 JP JP2015521651A patent/JP6227642B2/ja active Active
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