JP2015528060A5 - - Google Patents

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Publication number
JP2015528060A5
JP2015528060A5 JP2015521651A JP2015521651A JP2015528060A5 JP 2015528060 A5 JP2015528060 A5 JP 2015528060A5 JP 2015521651 A JP2015521651 A JP 2015521651A JP 2015521651 A JP2015521651 A JP 2015521651A JP 2015528060 A5 JP2015528060 A5 JP 2015528060A5
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JP
Japan
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plasma
wafer
substrate
gas
chamber
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JP2015521651A
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English (en)
Japanese (ja)
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JP6227642B2 (ja
JP2015528060A (ja
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Priority claimed from US13/918,033 external-priority patent/US10232324B2/en
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JP2015521651A 2012-07-12 2013-07-01 ガス混合装置 Active JP6227642B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201261670654P 2012-07-12 2012-07-12
US61/670,654 2012-07-12
US13/918,033 US10232324B2 (en) 2012-07-12 2013-06-14 Gas mixing apparatus
US13/918,033 2013-06-14
PCT/US2013/048855 WO2014011423A1 (en) 2012-07-12 2013-07-01 Gas mixing apparatus

Publications (3)

Publication Number Publication Date
JP2015528060A JP2015528060A (ja) 2015-09-24
JP2015528060A5 true JP2015528060A5 (cg-RX-API-DMAC7.html) 2016-08-18
JP6227642B2 JP6227642B2 (ja) 2017-11-08

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JP2015521651A Active JP6227642B2 (ja) 2012-07-12 2013-07-01 ガス混合装置

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US (1) US10232324B2 (cg-RX-API-DMAC7.html)
JP (1) JP6227642B2 (cg-RX-API-DMAC7.html)
KR (1) KR102125764B1 (cg-RX-API-DMAC7.html)
CN (1) CN104471672B (cg-RX-API-DMAC7.html)
TW (1) TWI611458B (cg-RX-API-DMAC7.html)
WO (1) WO2014011423A1 (cg-RX-API-DMAC7.html)

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CN105546349A (zh) * 2015-12-09 2016-05-04 无锡拓能自动化科技有限公司 应用于气体灌装站的气体灌装管道
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JP6419745B2 (ja) * 2016-03-15 2018-11-07 株式会社東芝 ミキサ構造、流体通路装置、および処理装置
US11164737B2 (en) * 2017-08-30 2021-11-02 Applied Materials, Inc. Integrated epitaxy and preclean system
CN107413218B (zh) * 2017-09-11 2020-11-24 张家口新金石科技发展有限公司 二氧化碳和氧气气体混合装置及混合气体助燃污染气体零排放系统
KR102608001B1 (ko) * 2018-09-20 2023-12-01 노람 엔지니어링 앤드 콘스트럭터스 엘티디. 유체 혼합 장치
CN109609929A (zh) * 2018-11-20 2019-04-12 沈阳拓荆科技有限公司 混气结构及反应设备
CN113196444B (zh) * 2018-12-20 2024-07-02 应用材料公司 用于供应改良的气流至处理腔室的处理空间的方法和设备
TWI738301B (zh) 2019-04-24 2021-09-01 美商應用材料股份有限公司 具有旋轉葉片與氣體注入之用於在固定腔室中塗覆粒子的反應器
CN110237734A (zh) * 2019-06-10 2019-09-17 中国石油大学(北京) 气体混合器及废气处理装置
CN112928008B (zh) * 2019-12-06 2023-03-24 中微半导体设备(上海)股份有限公司 气体供应系统及其气体输送方法、等离子体处理装置
WO2021206950A1 (en) * 2020-04-06 2021-10-14 Lam Research Corporation Ceramic additive manufacturing techniques for gas injectors
CN113430502B (zh) * 2021-06-18 2022-07-22 北京北方华创微电子装备有限公司 半导体工艺设备及其混合进气装置
KR20230016923A (ko) * 2021-07-27 2023-02-03 삼성전자주식회사 증착 장치
TW202440463A (zh) * 2023-01-20 2024-10-16 丹麥商托普索公司 藍氨的製造方法
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