JP2015524987A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2015524987A5 JP2015524987A5 JP2015525521A JP2015525521A JP2015524987A5 JP 2015524987 A5 JP2015524987 A5 JP 2015524987A5 JP 2015525521 A JP2015525521 A JP 2015525521A JP 2015525521 A JP2015525521 A JP 2015525521A JP 2015524987 A5 JP2015524987 A5 JP 2015524987A5
- Authority
- JP
- Japan
- Prior art keywords
- gas
- workpiece
- shroud
- gas concentration
- charged particle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 claims description 11
- 239000002245 particle Substances 0.000 claims 19
- 150000002500 ions Chemical class 0.000 claims 5
- 230000003472 neutralizing effect Effects 0.000 claims 3
- 238000002347 injection Methods 0.000 claims 2
- 239000007924 injection Substances 0.000 claims 2
- 239000012141 concentrate Substances 0.000 claims 1
- 239000007789 gas Substances 0.000 description 11
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- GQPLMRYTRLFLPF-UHFFFAOYSA-N Nitrous Oxide Chemical compound [O-][N+]#N GQPLMRYTRLFLPF-UHFFFAOYSA-N 0.000 description 2
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 230000003321 amplification Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000005591 charge neutralization Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000001272 nitrous oxide Substances 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910001868 water Inorganic materials 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201261677226P | 2012-07-30 | 2012-07-30 | |
| US61/677,226 | 2012-07-30 | ||
| PCT/US2013/052777 WO2014022429A1 (en) | 2012-07-30 | 2013-07-30 | Environmental sem gas injection system |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015524987A JP2015524987A (ja) | 2015-08-27 |
| JP2015524987A5 true JP2015524987A5 (https=) | 2016-09-23 |
| JP6224710B2 JP6224710B2 (ja) | 2017-11-01 |
Family
ID=50024551
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015525521A Active JP6224710B2 (ja) | 2012-07-30 | 2013-07-30 | 環境制御型ｓｅｍガス注入システム |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US9070533B2 (https=) |
| EP (1) | EP2880675A4 (https=) |
| JP (1) | JP6224710B2 (https=) |
| CN (1) | CN104508791B (https=) |
| WO (1) | WO2014022429A1 (https=) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9799490B2 (en) * | 2015-03-31 | 2017-10-24 | Fei Company | Charged particle beam processing using process gas and cooled surface |
| US9633816B2 (en) * | 2015-05-18 | 2017-04-25 | Fei Company | Electron beam microscope with improved imaging gas and method of use |
| DE102017201706B4 (de) * | 2017-02-02 | 2025-10-23 | Carl Zeiss Microscopy Gmbh | Teilchenstrahlgerät mit einer Abbildungseinrichtung zur Abbildung eines Objekts und zur Abbildung einer Baueinheit in dem Teilchenstrahlgerät sowie Verfahren zum Betrieb des Teilchenstrahlgeräts |
| US20210285899A1 (en) * | 2017-06-26 | 2021-09-16 | Gerasimos Daniel Danilatos | Specimen control means for particle beam microscopy |
| US20220305584A1 (en) * | 2021-03-24 | 2022-09-29 | Fei Company | In-situ laser redeposition reduction by a controlled gas flow and a system for reducing contamination |
| DE102022208597B4 (de) | 2022-08-18 | 2026-03-05 | Carl Zeiss Microscopy Gmbh | Vorrichtung zum Abbilden und Bearbeiten einer Probe mit einem fokussierten Teilchenstrahl |
| CN118712038B (zh) * | 2024-05-31 | 2025-09-23 | 国仪量子技术(合肥)股份有限公司 | 气体注入装置 |
Family Cites Families (38)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4785182A (en) | 1987-05-21 | 1988-11-15 | Electroscan Corporation | Secondary electron detector for use in a gaseous atmosphere |
| US5149974A (en) * | 1990-10-29 | 1992-09-22 | International Business Machines Corporation | Gas delivery for ion beam deposition and etching |
| JP3038901B2 (ja) * | 1990-11-26 | 2000-05-08 | 株式会社ニコン | 環境制御型走査電子顕微鏡 |
| JPH07262959A (ja) * | 1994-03-24 | 1995-10-13 | Nikon Corp | 走査型電子顕微鏡 |
| JP3310136B2 (ja) * | 1994-09-17 | 2002-07-29 | 株式会社東芝 | 荷電ビーム装置 |
| US5828064A (en) | 1995-08-11 | 1998-10-27 | Philips Electronics North America Corporation | Field emission environmental scanning electron microscope |
| US5851413A (en) | 1996-06-19 | 1998-12-22 | Micrion Corporation | Gas delivery systems for particle beam processing |
| GB9623768D0 (en) * | 1996-11-15 | 1997-01-08 | Leo Electron Microscopy Limite | Scanning electron microscope |
| EP0969493A1 (en) * | 1998-07-03 | 2000-01-05 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Apparatus and method for examining specimen with a charged particle beam |
| EP1047104A1 (en) * | 1999-04-19 | 2000-10-25 | Advantest Corporation | Apparatus for particle beam induced modification of a specimen |
| US6683320B2 (en) | 2000-05-18 | 2004-01-27 | Fei Company | Through-the-lens neutralization for charged particle beam system |
| DE10032607B4 (de) * | 2000-07-07 | 2004-08-12 | Leo Elektronenmikroskopie Gmbh | Teilchenstrahlgerät mit einer im Ultrahochvakuum zu betreibenden Teilchenquelle und kaskadenförmige Pumpanordnung für ein solches Teilchenstrahlgerät |
| CZ302126B6 (cs) | 2000-07-07 | 2010-11-03 | Leo Elektronenmikroskopie Gmbh | Detektor pro prístroje vyzarující korpuskulární zárení, prístroj vyzarující korpuskulární zárení a zpusob detekování existence produktu vzájemného pusobení v tomto prístroji |
| US6838380B2 (en) * | 2001-01-26 | 2005-01-04 | Fei Company | Fabrication of high resistivity structures using focused ion beams |
| US6753538B2 (en) | 2001-07-27 | 2004-06-22 | Fei Company | Electron beam processing |
| US20050103272A1 (en) * | 2002-02-25 | 2005-05-19 | Leo Elektronenmikroskopie Gmbh | Material processing system and method |
| EP1367630B1 (en) | 2002-05-31 | 2011-09-14 | Carl Zeiss SMT Limited | Improvements in or relating to particle detectors |
| CZ20022105A3 (cs) | 2002-06-17 | 2004-02-18 | Tescan, S. R. O. | Detektor sekundárních elektronů, zejména v rastrovacím elektronovém mikroskopu |
| AU2003275028A1 (en) * | 2002-09-18 | 2004-04-08 | Fei Company | Particle-optical device and detection means |
| US6979822B1 (en) * | 2002-09-18 | 2005-12-27 | Fei Company | Charged particle beam system |
| PL207199B1 (pl) | 2003-04-17 | 2010-11-30 | Politechnika Wroclawska | Układ detekcyjny elektronów wtórnych do skaningowego mikroskopu elektronowego |
| GB2411763B (en) * | 2004-03-05 | 2009-02-18 | Thermo Electron Corp | Flood gun for charge neutralization |
| US7205237B2 (en) * | 2005-07-05 | 2007-04-17 | International Business Machines Corporation | Apparatus and method for selected site backside unlayering of si, GaAs, GaxAlyAszof SOI technologies for scanning probe microscopy and atomic force probing characterization |
| US8466415B2 (en) | 2005-11-07 | 2013-06-18 | Fibics Incorporated | Methods for performing circuit edit operations with low landing energy electron beams |
| US7541580B2 (en) | 2006-03-31 | 2009-06-02 | Fei Company | Detector for charged particle beam instrument |
| WO2008098084A1 (en) | 2007-02-06 | 2008-08-14 | Fei Company | High pressure charged particle beam system |
| US8303833B2 (en) * | 2007-06-21 | 2012-11-06 | Fei Company | High resolution plasma etch |
| EP2105944A1 (en) | 2008-03-28 | 2009-09-30 | FEI Company | Environmental cell for a particle-optical apparatus |
| US7791020B2 (en) | 2008-03-31 | 2010-09-07 | Fei Company | Multistage gas cascade amplifier |
| JP5179253B2 (ja) | 2008-05-16 | 2013-04-10 | 株式会社日立ハイテクノロジーズ | 電極ユニット、及び荷電粒子線装置 |
| US8013300B2 (en) | 2008-06-20 | 2011-09-06 | Carl Zeiss Nts, Llc | Sample decontamination |
| DE102008040426B4 (de) | 2008-07-15 | 2015-12-24 | Carl Zeiss Microscopy Gmbh | Verfahren zur Untersuchung einer Oberfläche eines Objekts |
| US8207499B2 (en) * | 2008-09-24 | 2012-06-26 | Applied Materials Israel, Ltd. | Variable rate scanning in an electron microscope |
| US8299432B2 (en) | 2008-11-04 | 2012-10-30 | Fei Company | Scanning transmission electron microscope using gas amplification |
| JP2011034695A (ja) * | 2009-07-30 | 2011-02-17 | Hitachi High-Technologies Corp | 走査電子顕微鏡 |
| US8524139B2 (en) * | 2009-08-10 | 2013-09-03 | FEI Compay | Gas-assisted laser ablation |
| JP5564403B2 (ja) * | 2010-11-01 | 2014-07-30 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置 |
| US9679741B2 (en) * | 2010-11-09 | 2017-06-13 | Fei Company | Environmental cell for charged particle beam system |
-
2013
- 2013-07-30 WO PCT/US2013/052777 patent/WO2014022429A1/en not_active Ceased
- 2013-07-30 CN CN201380040374.XA patent/CN104508791B/zh active Active
- 2013-07-30 JP JP2015525521A patent/JP6224710B2/ja active Active
- 2013-07-30 EP EP13825971.8A patent/EP2880675A4/en not_active Withdrawn
- 2013-07-30 US US13/954,838 patent/US9070533B2/en active Active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2015524987A5 (https=) | ||
| JP5098079B2 (ja) | イオン化分析方法および装置 | |
| JP6717990B2 (ja) | イオン化装置およびそれを有する質量分析計 | |
| JP2008518407A5 (https=) | ||
| JP4636897B2 (ja) | 走査電子顕微鏡 | |
| JP2015213020A (ja) | 計測装置を備えたプラズマ発生装置及びプラズマ推進器 | |
| JP6220749B2 (ja) | イオンガン及びイオンミリング装置、イオンミリング方法 | |
| JP2013115047A5 (ja) | 分光分析用の電子ビーム源としてのプラズマ源 | |
| CN103650096A (zh) | 带电粒子束装置 | |
| US7755065B2 (en) | Focused ion beam apparatus | |
| JP6224710B2 (ja) | 環境制御型ｓｅｍガス注入システム | |
| JP2005276618A (ja) | マイクロプラズマ生成装置および方法 | |
| US20110215256A1 (en) | Focused ion beam apparatus | |
| JP5989959B2 (ja) | 集束イオンビーム装置 | |
| JP2009037910A5 (https=) | ||
| CN112086330B (zh) | 高能量离子源 | |
| JP5118241B1 (ja) | イオン発生装置及びこれを備えた空気清浄装置 | |
| JP2006269095A (ja) | プラズマ生成装置 | |
| JP5564403B2 (ja) | 荷電粒子線装置 | |
| JP2011086471A (ja) | クラスターイオンビーム装置及びクラスターイオンビーム装置の調整方法 | |
| JP2010205446A (ja) | イオン源 | |
| US20170062196A1 (en) | Charged particle image measuring device and imaging mass spectrometry apparatus | |
| JP2009059627A (ja) | イオン源 | |
| JP2008117690A (ja) | ガス増幅形検出器およびそれを用いた電子線応用装置 | |
| JP2007024849A (ja) | 多極型冷陰極電離真空計 |