JP2015524618A5 - - Google Patents

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Publication number
JP2015524618A5
JP2015524618A5 JP2015524306A JP2015524306A JP2015524618A5 JP 2015524618 A5 JP2015524618 A5 JP 2015524618A5 JP 2015524306 A JP2015524306 A JP 2015524306A JP 2015524306 A JP2015524306 A JP 2015524306A JP 2015524618 A5 JP2015524618 A5 JP 2015524618A5
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JP
Japan
Prior art keywords
semiconductor layer
gate electrode
control signal
conductive
response
Prior art date
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Application number
JP2015524306A
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English (en)
Japanese (ja)
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JP5946966B2 (ja
JP2015524618A (ja
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Publication date
Priority claimed from US13/557,039 external-priority patent/US9105728B2/en
Application filed filed Critical
Publication of JP2015524618A publication Critical patent/JP2015524618A/ja
Publication of JP2015524618A5 publication Critical patent/JP2015524618A5/ja
Application granted granted Critical
Publication of JP5946966B2 publication Critical patent/JP5946966B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2015524306A 2012-07-24 2013-07-12 マルチゲート薄膜トランジスタ Expired - Fee Related JP5946966B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US13/557,039 2012-07-24
US13/557,039 US9105728B2 (en) 2012-07-24 2012-07-24 Multi-gate thin-film transistor
PCT/US2013/050273 WO2014018282A1 (en) 2012-07-24 2013-07-12 Multi-gate thin-film transistor

Publications (3)

Publication Number Publication Date
JP2015524618A JP2015524618A (ja) 2015-08-24
JP2015524618A5 true JP2015524618A5 (cg-RX-API-DMAC7.html) 2015-11-26
JP5946966B2 JP5946966B2 (ja) 2016-07-06

Family

ID=48874539

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015524306A Expired - Fee Related JP5946966B2 (ja) 2012-07-24 2013-07-12 マルチゲート薄膜トランジスタ

Country Status (6)

Country Link
US (1) US9105728B2 (cg-RX-API-DMAC7.html)
JP (1) JP5946966B2 (cg-RX-API-DMAC7.html)
KR (1) KR101662733B1 (cg-RX-API-DMAC7.html)
CN (1) CN104508829B (cg-RX-API-DMAC7.html)
TW (1) TWI590458B (cg-RX-API-DMAC7.html)
WO (1) WO2014018282A1 (cg-RX-API-DMAC7.html)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8945981B2 (en) * 2008-07-31 2015-02-03 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and manufacturing method thereof
EP2887692B1 (en) * 2013-12-20 2019-07-10 Valencell, Inc. A fitting system for a headphone with physiological sensor
IN2014DE00708A (cg-RX-API-DMAC7.html) * 2014-03-12 2015-09-18 Indian Inst Technology Kanpur
US20150366678A1 (en) * 2014-06-20 2015-12-24 Fillauer Llc Modular forearm
CN106662899B (zh) * 2015-06-26 2018-05-11 沙特基础工业全球技术公司 用于触摸输入和触觉反馈应用的集成式压电悬臂致动器和晶体管
GB201819570D0 (en) * 2018-11-30 2019-01-16 Univ Surrey Multiple-gate transistor
KR102879031B1 (ko) 2020-01-15 2025-10-29 삼성전자주식회사 반도체 소자 및 이의 제조 방법
US11469321B2 (en) 2020-02-27 2022-10-11 Taiwan Semiconductor Manufacturing Company, Ltd. Semiconductor device
JP2025514022A (ja) * 2022-05-16 2025-05-02 オーレッドワークス エルエルシー 静電気放電保護付き分割oled

Family Cites Families (16)

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Publication number Priority date Publication date Assignee Title
JPH0682834A (ja) * 1992-09-02 1994-03-25 Fuji Xerox Co Ltd アクティブマトリクスパネル
US5929464A (en) 1995-01-20 1999-07-27 Semiconductor Energy Laboratory Co., Ltd. Active matrix electro-optical device
JP3409542B2 (ja) 1995-11-21 2003-05-26 ソニー株式会社 半導体装置の製造方法
TW463384B (en) 2000-06-15 2001-11-11 Shr Min Thin film transistor having subgate and Schottky source/drain and the manufacturing method thereof
US6580633B2 (en) 2000-09-28 2003-06-17 Seiko Epson Corporation Nonvolatile semiconductor memory device
KR100485531B1 (ko) * 2002-04-15 2005-04-27 엘지.필립스 엘시디 주식회사 다결정 실리콘 박막트랜지스터와 그 제조방법
CN100449779C (zh) 2002-10-07 2009-01-07 株式会社半导体能源研究所 半导体器件及其制造方法
US7800675B2 (en) 2004-08-25 2010-09-21 Aptina Imaging Corporation Method of operating a storage gate pixel
KR100614653B1 (ko) 2004-11-18 2006-08-22 삼성전자주식회사 백점 및 오버플로우의 문제없이 글로벌 노출이 가능한씨모스 이미지 센서 및 그 제조 방법
KR100790586B1 (ko) 2006-05-25 2008-01-02 (주) 픽셀플러스 Cmos 이미지 센서 액티브 픽셀 및 그 신호 감지 방법
US7459755B2 (en) 2006-05-25 2008-12-02 Walker Andrew J Dual-gate semiconductor devices with enhanced scalability
US8102443B2 (en) 2007-03-13 2012-01-24 Renesas Electronics Corporation CCD image sensor having charge storage section between photodiode section and charge transfer section
US20090072313A1 (en) 2007-09-19 2009-03-19 International Business Machines Corporation Hardened transistors in soi devices
US20120153289A1 (en) * 2009-09-01 2012-06-21 Sharp Kabushiki Kaisha Semiconductor device, active matrix substrate, and display device
KR101056229B1 (ko) 2009-10-12 2011-08-11 삼성모바일디스플레이주식회사 박막 트랜지스터, 그의 제조 방법 및 박막 트랜지스터를 구비하는 유기전계발광 표시 장치
DE102010002455B4 (de) 2010-02-26 2017-06-01 Globalfoundries Dresden Module One Limited Liability Company & Co. Kg Nichtflüchtiger Speichertransistor und Verfahren zu dessen Herstellung

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