JP2015519219A - コーティングされた物品及び化学蒸着方法 - Google Patents
コーティングされた物品及び化学蒸着方法 Download PDFInfo
- Publication number
- JP2015519219A JP2015519219A JP2015503450A JP2015503450A JP2015519219A JP 2015519219 A JP2015519219 A JP 2015519219A JP 2015503450 A JP2015503450 A JP 2015503450A JP 2015503450 A JP2015503450 A JP 2015503450A JP 2015519219 A JP2015519219 A JP 2015519219A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- vapor deposition
- chemical vapor
- deposition method
- functionalized
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005229 chemical vapour deposition Methods 0.000 title claims abstract description 56
- 238000000034 method Methods 0.000 title claims abstract description 55
- 238000007254 oxidation reaction Methods 0.000 claims abstract description 89
- 238000011282 treatment Methods 0.000 claims abstract description 54
- XPBBUZJBQWWFFJ-UHFFFAOYSA-N fluorosilane Chemical compound [SiH3]F XPBBUZJBQWWFFJ-UHFFFAOYSA-N 0.000 claims abstract description 11
- PQDJYEQOELDLCP-UHFFFAOYSA-N trimethylsilane Chemical compound C[SiH](C)C PQDJYEQOELDLCP-UHFFFAOYSA-N 0.000 claims abstract description 11
- COWKRCCNQSQUGJ-UHFFFAOYSA-N 1,1,2,2,3-pentafluoropropan-1-ol Chemical compound OC(F)(F)C(F)(F)CF COWKRCCNQSQUGJ-UHFFFAOYSA-N 0.000 claims abstract description 10
- FXUHCQHWDACOKK-UHFFFAOYSA-N 1,1,1,2,3,3,3-heptafluoro-2-prop-2-enoxypropane Chemical compound FC(F)(F)C(F)(C(F)(F)F)OCC=C FXUHCQHWDACOKK-UHFFFAOYSA-N 0.000 claims abstract description 9
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 claims abstract description 9
- 239000005977 Ethylene Substances 0.000 claims abstract description 9
- GVEUEBXMTMZVSD-UHFFFAOYSA-N 3,3,4,4,5,5,6,6,6-nonafluorohex-1-ene Chemical group FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C=C GVEUEBXMTMZVSD-UHFFFAOYSA-N 0.000 claims abstract description 8
- NKAMGQZDVMQEJL-UHFFFAOYSA-N 3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-heptadecafluorodec-1-ene Chemical group FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C=C NKAMGQZDVMQEJL-UHFFFAOYSA-N 0.000 claims abstract description 8
- 125000005010 perfluoroalkyl group Chemical group 0.000 claims abstract description 7
- 230000003647 oxidation Effects 0.000 claims description 56
- 239000000758 substrate Substances 0.000 claims description 52
- 239000000463 material Substances 0.000 claims description 47
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 40
- 230000001590 oxidative effect Effects 0.000 claims description 24
- UBHZUDXTHNMNLD-UHFFFAOYSA-N dimethylsilane Chemical compound C[SiH2]C UBHZUDXTHNMNLD-UHFFFAOYSA-N 0.000 claims description 22
- 238000000354 decomposition reaction Methods 0.000 claims description 15
- 150000002430 hydrocarbons Chemical class 0.000 claims description 13
- -1 allyl halide Chemical class 0.000 claims description 11
- 239000002184 metal Substances 0.000 claims description 11
- 229910052751 metal Inorganic materials 0.000 claims description 11
- 239000000446 fuel Substances 0.000 claims description 10
- 238000000682 scanning probe acoustic microscopy Methods 0.000 claims description 10
- 239000011521 glass Substances 0.000 claims description 9
- 229930195733 hydrocarbon Natural products 0.000 claims description 9
- 239000000203 mixture Substances 0.000 claims description 9
- 125000000524 functional group Chemical group 0.000 claims description 8
- 238000002485 combustion reaction Methods 0.000 claims description 7
- 238000010438 heat treatment Methods 0.000 claims description 7
- 125000003545 alkoxy group Chemical group 0.000 claims description 6
- 125000000217 alkyl group Chemical group 0.000 claims description 6
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 claims description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 4
- 238000009825 accumulation Methods 0.000 claims description 4
- 239000000919 ceramic Substances 0.000 claims description 4
- 239000000571 coke Substances 0.000 claims description 4
- 238000002347 injection Methods 0.000 claims description 4
- 239000007924 injection Substances 0.000 claims description 4
- 229910001220 stainless steel Inorganic materials 0.000 claims description 4
- 239000010935 stainless steel Substances 0.000 claims description 4
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 claims description 3
- 239000004593 Epoxy Substances 0.000 claims description 3
- 125000002252 acyl group Chemical group 0.000 claims description 3
- 150000001299 aldehydes Chemical class 0.000 claims description 3
- 150000001350 alkyl halides Chemical class 0.000 claims description 3
- 210000001124 body fluid Anatomy 0.000 claims description 3
- 239000010839 body fluid Substances 0.000 claims description 3
- 239000003575 carbonaceous material Substances 0.000 claims description 3
- 239000011153 ceramic matrix composite Substances 0.000 claims description 3
- 239000002131 composite material Substances 0.000 claims description 3
- 239000000835 fiber Substances 0.000 claims description 3
- 239000011888 foil Substances 0.000 claims description 3
- 206010022000 influenza Diseases 0.000 claims description 3
- 150000002576 ketones Chemical class 0.000 claims description 3
- 125000002524 organometallic group Chemical group 0.000 claims description 3
- 102000004169 proteins and genes Human genes 0.000 claims description 3
- 108090000623 proteins and genes Proteins 0.000 claims description 3
- 239000004071 soot Substances 0.000 claims description 2
- 238000005297 material degradation process Methods 0.000 claims 1
- 239000012528 membrane Substances 0.000 claims 1
- 239000010902 straw Substances 0.000 claims 1
- 238000000576 coating method Methods 0.000 abstract description 68
- 239000011248 coating agent Substances 0.000 abstract description 50
- 150000004678 hydrides Chemical class 0.000 abstract description 5
- 239000003153 chemical reaction reagent Substances 0.000 description 35
- 238000007306 functionalization reaction Methods 0.000 description 34
- 238000000157 electrochemical-induced impedance spectroscopy Methods 0.000 description 17
- 239000010963 304 stainless steel Substances 0.000 description 16
- 229910000589 SAE 304 stainless steel Inorganic materials 0.000 description 16
- 239000007789 gas Substances 0.000 description 16
- 239000008367 deionised water Substances 0.000 description 12
- 229910021641 deionized water Inorganic materials 0.000 description 12
- 230000002829 reductive effect Effects 0.000 description 11
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 10
- 239000002243 precursor Substances 0.000 description 10
- 230000007423 decrease Effects 0.000 description 9
- 238000000151 deposition Methods 0.000 description 9
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 8
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 8
- 230000015556 catabolic process Effects 0.000 description 8
- 230000007797 corrosion Effects 0.000 description 8
- 238000005260 corrosion Methods 0.000 description 8
- 238000006731 degradation reaction Methods 0.000 description 8
- 230000008021 deposition Effects 0.000 description 8
- 238000000197 pyrolysis Methods 0.000 description 8
- 229910002808 Si–O–Si Inorganic materials 0.000 description 7
- 230000008901 benefit Effects 0.000 description 7
- 230000000694 effects Effects 0.000 description 7
- 239000003921 oil Substances 0.000 description 7
- 230000036961 partial effect Effects 0.000 description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 6
- 230000003247 decreasing effect Effects 0.000 description 6
- 238000009792 diffusion process Methods 0.000 description 6
- 229910008051 Si-OH Inorganic materials 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- 229910006358 Si—OH Inorganic materials 0.000 description 5
- 229910052799 carbon Inorganic materials 0.000 description 5
- 238000004140 cleaning Methods 0.000 description 5
- 239000011261 inert gas Substances 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- 239000004215 Carbon black (E152) Substances 0.000 description 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- 229910018540 Si C Inorganic materials 0.000 description 4
- 239000011230 binding agent Substances 0.000 description 4
- YENOLDYITNSPMQ-UHFFFAOYSA-N carboxysilicon Chemical compound OC([Si])=O YENOLDYITNSPMQ-UHFFFAOYSA-N 0.000 description 4
- 239000012530 fluid Substances 0.000 description 4
- 238000006459 hydrosilylation reaction Methods 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- 238000012986 modification Methods 0.000 description 4
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 4
- 239000004810 polytetrafluoroethylene Substances 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 229910010271 silicon carbide Inorganic materials 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 229930195735 unsaturated hydrocarbon Natural products 0.000 description 4
- PSQZJKGXDGNDFP-UHFFFAOYSA-N 2,2,3,3,3-pentafluoropropan-1-ol Chemical compound OCC(F)(F)C(F)(F)F PSQZJKGXDGNDFP-UHFFFAOYSA-N 0.000 description 3
- 229910000619 316 stainless steel Inorganic materials 0.000 description 3
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 3
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 3
- 238000005299 abrasion Methods 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 3
- 229910000037 hydrogen sulfide Inorganic materials 0.000 description 3
- 239000000314 lubricant Substances 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 230000007246 mechanism Effects 0.000 description 3
- 230000009257 reactivity Effects 0.000 description 3
- 229910052990 silicon hydride Inorganic materials 0.000 description 3
- FYQFWFHDPNXORA-UHFFFAOYSA-N 3,3,4,4,5,5,6,6,7,7,8,8,8-tridecafluorooct-1-ene Chemical group FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C=C FYQFWFHDPNXORA-UHFFFAOYSA-N 0.000 description 2
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- GQPLMRYTRLFLPF-UHFFFAOYSA-N Nitrous Oxide Chemical compound [O-][N+]#N GQPLMRYTRLFLPF-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 150000001336 alkenes Chemical class 0.000 description 2
- 125000005103 alkyl silyl group Chemical group 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 239000005388 borosilicate glass Substances 0.000 description 2
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 2
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 230000003197 catalytic effect Effects 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 238000004939 coking Methods 0.000 description 2
- 238000005336 cracking Methods 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 150000002118 epoxides Chemical class 0.000 description 2
- 230000003628 erosive effect Effects 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 239000012634 fragment Substances 0.000 description 2
- 239000001307 helium Substances 0.000 description 2
- 229910052734 helium Inorganic materials 0.000 description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 230000007774 longterm Effects 0.000 description 2
- 239000010687 lubricating oil Substances 0.000 description 2
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- HMDDXIMCDZRSNE-UHFFFAOYSA-N [C].[Si] Chemical compound [C].[Si] HMDDXIMCDZRSNE-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 238000007792 addition Methods 0.000 description 1
- 230000000274 adsorptive effect Effects 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 230000000844 anti-bacterial effect Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 238000006555 catalytic reaction Methods 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000013626 chemical specie Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 238000004320 controlled atmosphere Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 150000004696 coordination complex Chemical class 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 230000032798 delamination Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 230000005661 hydrophobic surface Effects 0.000 description 1
- 125000004356 hydroxy functional group Chemical group O* 0.000 description 1
- 239000003701 inert diluent Substances 0.000 description 1
- 238000011221 initial treatment Methods 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 230000002427 irreversible effect Effects 0.000 description 1
- 230000000670 limiting effect Effects 0.000 description 1
- 238000004020 luminiscence type Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- UIUXUFNYAYAMOE-UHFFFAOYSA-N methylsilane Chemical compound [SiH3]C UIUXUFNYAYAMOE-UHFFFAOYSA-N 0.000 description 1
- 239000002103 nanocoating Substances 0.000 description 1
- 239000001272 nitrous oxide Substances 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 230000008520 organization Effects 0.000 description 1
- 150000001282 organosilanes Chemical class 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 239000000546 pharmaceutical excipient Substances 0.000 description 1
- 230000036314 physical performance Effects 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000003642 reactive oxygen metabolite Substances 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000002940 repellent Effects 0.000 description 1
- 239000005871 repellent Substances 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000000527 sonication Methods 0.000 description 1
- 238000012306 spectroscopic technique Methods 0.000 description 1
- 238000006557 surface reaction Methods 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000002230 thermal chemical vapour deposition Methods 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 125000000725 trifluoropropyl group Chemical group [H]C([H])(*)C([H])([H])C(F)(F)F 0.000 description 1
- JLGNHOJUQFHYEZ-UHFFFAOYSA-N trimethoxy(3,3,3-trifluoropropyl)silane Chemical compound CO[Si](OC)(OC)CCC(F)(F)F JLGNHOJUQFHYEZ-UHFFFAOYSA-N 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/60—Deposition of organic layers from vapour phase
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0209—Pretreatment of the material to be coated by heating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/46—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/3154—Of fluorinated addition polymer from unsaturated monomers
- Y10T428/31544—Addition polymer is perhalogenated
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31652—Of asbestos
- Y10T428/31663—As siloxane, silicone or silane
Landscapes
- Chemical & Material Sciences (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Laminated Bodies (AREA)
- Physical Vapour Deposition (AREA)
- Chemically Coating (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
Abstract
Description
(実施例1)
(実施例2)
(実施例3)
(実施例4)
(実施例5)
(実施例6)
(実施例7)
(実施例8)
(実施例9)
(実施例10)
(実施例11)
(実施例12)
(実施例13)
(実施例14)
(実施例15)
(実施例16)
(実施例17)
(実施例18)
(実施例19)
(実施例20)
(実施例21)
(実施例22)
Claims (35)
- コーティングされた物品であって、
化学蒸着により前記コーティングされた物品に適用された官能化層を含み、
前記官能化層は、酸化後官能化層、オルガノフルオロ処理層、フルオロシラン処理層、トリメチルシラン処理層、オルガノフルオロトリアルコキシシラン処理層、オルガノフルオロシリルヒドリド処理層、オルガノフルオロシリル処理層、トリデカフルオロ1,1,2,2−テトラヒドロオクチルシラン処理層、オルガノフルオロアルコール処理層、ペンタフルオロプロパノール処理層、アリルヘプタフルオロイソプロピルエーテル処理層、(ペルフルオロブチル)エチレン処理層、(ペルフルオロオクチル)エチレン処理層、(ペルフルオロアルキル)エチレン処理層、及びそれらの組み合わせからなる群より選択される層である
コーティングされた物品。 - 請求項1に記載のコーティングされた物品であって、
前記官能化層は、酸化層、前処理層、材料の分解により堆積された層、又はそれらの組み合わせに適用される
コーティングされた物品。 - 請求項2に記載のコーティングされた物品であって、
前記酸化層は、酸化カルボシラン材料を含み、又は
前記酸化層は、水、ゼロ空気、又はその組み合わせにより形成される
コーティングされた物品。 - 請求項1〜3のいずれか1項に記載のコーティングされた物品であって、
前記官能化層は、450℃の温度、7〜10時間、又は450℃の温度で7〜10時間、前記コーティングされた物品に適用される
コーティングされた物品。 - 請求項1に記載のコーティングされた物品であって、
前記コーティングされた物品は、図10のオージェ電子分光法のプロットで示される組成を有する
コーティングされた物品。 - 請求項1〜5のいずれか1項に記載のコーティングされた物品であって、
前記コーティングされた物品は、ステンレス鋼基材、鉄金属基材、非鉄金属基材、ステンレス鋼基材、ガラス基材、セラミック基材、セラミックマトリックス複合基材、複合金属基材、コーティングされた基材、繊維基材、箔基材、膜、又はそれらの組み合わせを含む
コーティングされた物品。 - 請求項1に記載のコーティングされた物品であって、
前記官能化層はオルガノフルオロ処理を施すことにより形成され、前記オルガノフルオロ処理は、(R)1−3Si(X)1−3(Rはオルガノフルオロ基であり、Xはアルキル基又はアルコキシ基である-H、−OH、−OR'、又はR'であり、R及びR'は、アルキル、アリル、ハロゲン化アルキル、ハロゲン化アリル、ケトン、アルデヒド、アシル、アルコール、エポキシ、ニトロ―オルガノ基、オルガノ金属官能基、又はその組み合わせである)で示される
コーティングされた物品。 - 請求項1に記載のコーティングされた物品であって、
前記官能化層は、トリデカフルオロ1,1,2,2−テトラヒドロオクチルシラン又はペンタフルオロプロパノールを含むオルガノフルオロ処理により形成される
コーティングされた物品。 - 請求項1に記載のコーティングされた物品であって、
前記官能化層は、以下の一般式を有するフルオロシランにより形成される
コーティングされた物品。
- 請求項1に記載のコーティングされた物品であって、
前記コーティングされた物品は、タービン翼、シリンダーヘッド、クランク軸、カム軸、マニホールド、バルブ、煙道、煙突、蒸発器、凝縮器、コイル、燃焼室、固定部品、燃料燃焼室、熱交換システム、熱交換成分、排気システム、燃料システム、燃料噴射システム、又はその組み合わせである
コーティングされた物品。 - 請求項1に記載のコーティングされた物品であって、
前記官能化層は、炭素質材料、煤、コークス、熱分解炭化水素、タンパク質、生体分子、体液、又はそれらの組み合わせの蓄積を防止する
コーティングされた物品。 - 請求項1に記載のコーティングされた物品であって、
前記物品は、前記官能化層が形成される前に前処理され、前記前処理は、100℃を超える所定の温度、1気圧を超える所定の圧力、及び少なくとも3分の所定の時間実施される
コーティングされた物品。 - 請求項12に記載のコーティングされた物品であって、
前記所定の温度は450℃であり、前記所定の圧力は3気圧であり、前記所定の時間は15時間である
コーティングされた物品。 - 請求項1に記載のコーティングされた物品を形成する方法。
- 化学蒸着により、物品に官能化層を適用する化学蒸着方法であって、
前記官能化層は、酸化後官能化層、オルガノフルオロ処理層、フルオロシラン処理層、トリメチルシラン処理層、オルガノフルオロトリアルコキシシラン処理層、オルガノフルオロシリルヒドリド処理層、オルガノフルオロシリル処理層、トリデカフルオロ1,1,2,2−テトラヒドロオクチルシラン処理層、オルガノフルオロアルコール処理層、ペンタフルオロプロパノール処理層、アリルヘプタフルオロイソプロピルエーテル処理層、(ペルフルオロブチル)エチレン処理層、(ペルフルオロオクチル)エチレン処理層、(ペルフルオロアルキル)エチレン処理層、及びそれらの組み合わせからなる群より選択される層である
化学蒸着方法。 - 請求項15に記載の化学蒸着方法であって、
前記官能化層は、酸化層、前処理層、又はその組み合わせに適用される
化学蒸着方法。 - 請求項16に記載の化学蒸着方法であって、
前記酸化層は、酸化カルボシラン材料を含む
化学蒸着方法。 - 請求項16に記載の化学蒸着方法であって、
前記酸化層は、水、ゼロ空気、又はその組み合わせにより形成される
化学蒸着方法。 - 請求項15に記載の化学蒸着方法であって、
前記官能化層は、材料の分解により蒸着された層に適用される
化学蒸着方法。 - 請求項19に記載の化学蒸着方法であって、
前記材料は、ジメチルシランを含む
化学蒸着方法。 - 請求項15に記載の化学蒸着方法であって、
前記官能化層は、450℃の温度、7〜14時間、又は450℃の温度で7〜14時間、前記物品に適用される
化学蒸着方法。 - 請求項15に記載の化学蒸着方法であって、
前記物品は、図10のオージェ電子分光法のプロットで示す組成を有する
化学蒸着方法。 - 請求項16に記載の化学蒸着方法によって形成された物品。
- 請求項15に記載の化学蒸着方法であって、
前記物品は、ステンレス鋼基材、鉄金属基材、非鉄金属基材、ガラス基材、セラミック基材、セラミックマトリックス複合基材、複合金属基材、コーティングされた基材、繊維基材、箔基材、膜、又はその組み合わせを含む
化学蒸着方法。 - 請求項15に記載の化学蒸着方法であって、
前記官能化層はオルガノフルオロ処理を施すことにより形成され、前記オルガノフルオロ処理は、(R)1−3Si(X)1−3(Rはオルガノフルオロ基であり、Xはアルキル基又はアルコキシ基である-H、−OH、−OR'、又はR'である)で示される
化学蒸着方法。 - 請求項25に記載の化学蒸着方法であって、
R及びR'のうちの1つ又はその両方は、アルキル、アリル、ハロゲン化アルキル、ハロゲン化アリル、ケトン、アルデヒド、アシル、アルコール、エポキシ、ニトロ―オルガノ基、オルガノ金属官能基、又はその組み合わせに対応する
化学蒸着方法。 - 請求項15に記載の化学蒸着方法であって、
前記官能化層は、トリデカフルオロ1,1,2,2−テトラヒドロオクチルシラン又はペンタフルオロプロパノールを含むオルガノフルオロ処理により形成される
化学蒸着方法。 - 請求項15に記載の化学蒸着方法であって、
前記官能化層は、以下の一般式を有するフルオロシランにより形成される
化学蒸着方法。
- 請求項15に記載の化学蒸着方法であって、
前記物品は、タービン翼、シリンダーヘッド、クランク軸、カム軸、マニホールド、バルブ、煙道、煙突、蒸発器、凝縮器、コイル、燃焼室、固定部品、燃料燃焼室、熱交換システム、熱交換成分、排気システム、燃料システム、燃料噴射システム、又はその組み合わせを含む
化学蒸着方法。 - 請求項15に記載の化学蒸着方法であって、
前記官能化層は、炭素質材料、煤、コークス、熱分解炭化水素、タンパク質、生体分子、体液、又はその組み合わせの蓄積を防止する
化学蒸着方法。 - 材料を分解して物品上に層を形成し、
前記層を酸化して酸化層を形成し、
前記酸化層を官能化する
化学蒸着方法であって、
前記官能化層は、酸化後官能化層、オルガノフルオロ処理層、フルオロシラン処理層、トリメチルシラン処理層、オルガノフルオロトリアルコキシシラン処理層、オルガノフルオロシリルヒドリド処理層、オルガノフルオロシリル処理層、トリデカフルオロ1,1,2,2−テトラヒドロオクチルシラン処理層、オルガノフルオロアルコール処理層、ペンタフルオロプロパノール処理層、アリルヘプタフルオロイソプロピルエーテル処理層、(ペルフルオロブチル)エチレン処理層、(ペルフルオロオクチル)エチレン処理層、(ペルフルオロアルキル)エチレン処理層、及びそれらの組み合わせからなる群より選択される層である
化学蒸着方法。 - 1気圧を超える所定の圧力で、少なくとも3分の所定の時間、100℃を超える所定の温度まで物品を加熱することにより、前記物品を前処理し、
材料を分解して物品上に層を形成し、
前記層を酸化して酸化層を形成し、
前記酸化層を官能化する
化学蒸着方法。 - 請求項32に記載の化学蒸着方法であって
前記所定の温度は、450℃である
化学蒸着方法。 - 請求項32に記載の化学蒸着方法であって
前記所定の圧力は、3気圧である
化学蒸着方法。 - 請求項32に記載の化学蒸着方法であって
前記所定の時間は、15時間である
化学蒸着方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201261615559P | 2012-03-26 | 2012-03-26 | |
US61/615,559 | 2012-03-26 | ||
PCT/US2013/033807 WO2014011251A2 (en) | 2012-03-26 | 2013-03-26 | Coated article and chemical vapor deposition process |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2017228743A Division JP2018040064A (ja) | 2012-03-26 | 2017-11-29 | コーティングされた物品及び化学蒸着方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2015519219A true JP2015519219A (ja) | 2015-07-09 |
JP6256953B2 JP6256953B2 (ja) | 2018-01-10 |
Family
ID=49553800
Family Applications (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2015503450A Active JP6256953B2 (ja) | 2012-03-26 | 2013-03-26 | コーティングされた物品及び化学蒸着方法 |
JP2017228743A Pending JP2018040064A (ja) | 2012-03-26 | 2017-11-29 | コーティングされた物品及び化学蒸着方法 |
JP2020203560A Pending JP2021038471A (ja) | 2012-03-26 | 2020-12-08 | コーティングされた物品及び化学蒸着方法 |
Family Applications After (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2017228743A Pending JP2018040064A (ja) | 2012-03-26 | 2017-11-29 | コーティングされた物品及び化学蒸着方法 |
JP2020203560A Pending JP2021038471A (ja) | 2012-03-26 | 2020-12-08 | コーティングされた物品及び化学蒸着方法 |
Country Status (5)
Country | Link |
---|---|
US (2) | US20150298165A1 (ja) |
EP (1) | EP2830781A2 (ja) |
JP (3) | JP6256953B2 (ja) |
KR (2) | KR20140148409A (ja) |
WO (1) | WO2014011251A2 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2022539616A (ja) * | 2019-07-26 | 2022-09-12 | チャンスー フェイヴァード ナノテクノロジー カンパニー リミテッド | 疎水性表面コーティング層及びその製造方法 |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101911196B1 (ko) | 2009-10-27 | 2018-10-24 | 실코텍 코포레이션 | 화학적 증기 증착 코팅, 물품, 및 방법 |
KR101790206B1 (ko) | 2010-10-05 | 2017-10-25 | 실코텍 코포레이션 | 내마모성 코팅, 물건 및 방법 |
WO2014081817A2 (en) * | 2012-11-20 | 2014-05-30 | Massachusetts Institute Of Technology | Fabrication and passivation of silicon surfaces |
US9975143B2 (en) | 2013-05-14 | 2018-05-22 | Silcotek Corp. | Chemical vapor deposition functionalization |
US11292924B2 (en) | 2014-04-08 | 2022-04-05 | Silcotek Corp. | Thermal chemical vapor deposition coated article and process |
US9915001B2 (en) | 2014-09-03 | 2018-03-13 | Silcotek Corp. | Chemical vapor deposition process and coated article |
US10316408B2 (en) | 2014-12-12 | 2019-06-11 | Silcotek Corp. | Delivery device, manufacturing system and process of manufacturing |
DE102015209794B4 (de) * | 2015-05-28 | 2017-07-27 | Carl Zeiss Vision International Gmbh | Verfahren zur Herstellung eines optischen Glases mit Antifog-Beschichtung und optisches Glas mit Antifog-Beschichtung |
WO2017040623A1 (en) * | 2015-09-01 | 2017-03-09 | Silcotek Corp. | Thermal chemical vapor deposition coating |
US10323321B1 (en) | 2016-01-08 | 2019-06-18 | Silcotek Corp. | Thermal chemical vapor deposition process and coated article |
US20170283943A1 (en) * | 2016-03-29 | 2017-10-05 | Silcotek Corp. | Treated article, system having treated article, and process incorporating treated article |
GB2550135B (en) * | 2016-05-09 | 2021-08-25 | Ultra Electronics Ltd | Axially Loaded spherical Joint assembly |
US20170335451A1 (en) * | 2016-05-23 | 2017-11-23 | Silcotek Corp. | Static thermal chemical vapor deposition with liquid precursor |
US10487403B2 (en) * | 2016-12-13 | 2019-11-26 | Silcotek Corp | Fluoro-containing thermal chemical vapor deposition process and article |
US11709156B2 (en) | 2017-09-18 | 2023-07-25 | Waters Technologies Corporation | Use of vapor deposition coated flow paths for improved analytical analysis |
US11709155B2 (en) | 2017-09-18 | 2023-07-25 | Waters Technologies Corporation | Use of vapor deposition coated flow paths for improved chromatography of metal interacting analytes |
WO2020252306A1 (en) | 2019-06-14 | 2020-12-17 | Silcotek Corp. | Nano-wire growth |
KR102224067B1 (ko) * | 2020-01-09 | 2021-03-08 | 주식회사 이지티엠 | 표면 보호 물질을 이용한 박막 형성 방법 |
US11918936B2 (en) | 2020-01-17 | 2024-03-05 | Waters Technologies Corporation | Performance and dynamic range for oligonucleotide bioanalysis through reduction of non specific binding |
Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2001036190A1 (fr) * | 1999-11-16 | 2001-05-25 | Center For Advanced Science And Technology Incubation, Ltd. | Structure et film dont la surface presente une durete elevee et favorise le glissement de l'eau, et procede de preparation associe |
JP2001298024A (ja) * | 2000-02-08 | 2001-10-26 | Asm Japan Kk | 低比誘電率材料及びプロセス |
JP2002009071A (ja) * | 2000-04-28 | 2002-01-11 | Asm Japan Kk | フッ素含有材料及び処理 |
JP2003342731A (ja) * | 2002-05-24 | 2003-12-03 | Dainippon Printing Co Ltd | 積層体およびその製造方法 |
JP2007523776A (ja) * | 2004-02-24 | 2007-08-23 | サン−ゴバン グラス フランス | 疎水性表面を有し、当該疎水性の耐久性が改良されたガラス基材などの基材 |
WO2008013314A1 (fr) * | 2006-07-28 | 2008-01-31 | Toyo Seikan Kaisha, Ltd. | Article moulé en matière plastique comprenant un film de dépôt en phase vapeur formé par un procédé de dépôt chimique en phase vapeur sous plasma |
WO2010125926A1 (ja) * | 2009-04-30 | 2010-11-04 | コニカミノルタホールディングス株式会社 | 防汚性積層体 |
WO2011056550A1 (en) * | 2009-10-27 | 2011-05-12 | Silcotek Corp. | Chemical vapor deposition coating, article, and method |
JP2011230505A (ja) * | 2010-04-09 | 2011-11-17 | Taiyo Kagaku Kogyo Kk | 表面濡れ性改質を行った非晶質炭素膜構造体、およびその製造方法 |
WO2012169540A1 (ja) * | 2011-06-06 | 2012-12-13 | 太陽化学工業株式会社 | 非晶質炭素膜層への撥水撥油層を固定する方法及び該方法により形成された積層体 |
Family Cites Families (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3206332B2 (ja) * | 1994-10-07 | 2001-09-10 | トヨタ自動車株式会社 | 内燃機関の燃焼室を構成する部材及びその製造方法 |
JPH09116011A (ja) * | 1995-10-23 | 1997-05-02 | Mitsubishi Electric Corp | 半導体装置およびその製造方法 |
JPH1081859A (ja) * | 1996-09-09 | 1998-03-31 | Toyo Ink Mfg Co Ltd | アルミニウム粘着シート |
JP3225860B2 (ja) * | 1996-11-29 | 2001-11-05 | トヨタ自動車株式会社 | 撥液膜の形成方法 |
BR9812768A (pt) * | 1997-09-12 | 2000-12-12 | Asahi Glass Co Ltd | Composição de tratamento de superficie, método de tratamento de superfìcie, substrato e artigo |
JP3933777B2 (ja) * | 1997-12-03 | 2007-06-20 | 株式会社Kri | 基材の表面改質方法 |
US6444326B1 (en) | 1999-03-05 | 2002-09-03 | Restek Corporation | Surface modification of solid supports through the thermal decomposition and functionalization of silanes |
JP2001064664A (ja) * | 1999-08-27 | 2001-03-13 | Univ Nagoya | 高潤滑表面部材の製造方法及び高潤滑表面部材 |
DE10016485A1 (de) * | 2000-04-01 | 2001-10-11 | Dmc2 Degussa Metals Catalysts | Glas-, Keramik- und Metall-Substrate mit selbstreinigender Oberfläche, Verfahren zu deren Herstellung und deren Verwendung |
KR20010106905A (ko) * | 2000-05-24 | 2001-12-07 | 황 철 주 | 저유전율 SiOC 박막의 형성방법 |
US20020192472A1 (en) * | 2001-05-25 | 2002-12-19 | Bernd Metz | Easily cleanable coating |
JP2003001746A (ja) * | 2001-06-27 | 2003-01-08 | Hitachi Ltd | 親水性、撥水性を有する銅部材およびその製造方法、並びに伝熱管 |
JP3870253B2 (ja) * | 2002-02-04 | 2007-01-17 | 独立行政法人産業技術総合研究所 | 無機−有機ハイブリッド薄膜及びその製造方法 |
US20050271893A1 (en) * | 2004-06-04 | 2005-12-08 | Applied Microstructures, Inc. | Controlled vapor deposition of multilayered coatings adhered by an oxide layer |
US8286561B2 (en) * | 2008-06-27 | 2012-10-16 | Ssw Holding Company, Inc. | Spill containing refrigerator shelf assembly |
AU2009302806B9 (en) * | 2008-10-07 | 2015-10-01 | Ross Technology Corporation | Highly durable superhydrophobic, oleophobic and anti-icing coatings and methods and compositions for their preparation |
US20100096113A1 (en) * | 2008-10-20 | 2010-04-22 | General Electric Company | Hybrid surfaces that promote dropwise condensation for two-phase heat exchange |
FR2940966B1 (fr) * | 2009-01-09 | 2011-03-04 | Saint Gobain | Substrat hydrophobe comprenant un primage du type oxycarbure de silicium active par plasma |
US9340880B2 (en) * | 2009-10-27 | 2016-05-17 | Silcotek Corp. | Semiconductor fabrication process |
TWI432191B (zh) * | 2010-06-11 | 2014-04-01 | Taiwan Sunpan Biotechnology Dev Co Ltd | 分離自藤黃樹脂的化合物以及包含有此等化合物的藥學組成物 |
JP2012035411A (ja) * | 2010-08-03 | 2012-02-23 | Nsk Ltd | 表面改質構造 |
US20130181331A1 (en) * | 2010-09-28 | 2013-07-18 | Ndsu Research Foundation | Atmospheric-pressure plasma-enhanced chemical vapor deposition |
-
2013
- 2013-03-26 WO PCT/US2013/033807 patent/WO2014011251A2/en active Application Filing
- 2013-03-26 JP JP2015503450A patent/JP6256953B2/ja active Active
- 2013-03-26 EP EP13789056.2A patent/EP2830781A2/en not_active Withdrawn
- 2013-03-26 US US14/381,616 patent/US20150298165A1/en not_active Abandoned
- 2013-03-26 KR KR1020147027941A patent/KR20140148409A/ko active Application Filing
- 2013-03-26 KR KR1020167036725A patent/KR102018241B1/ko active IP Right Grant
-
2014
- 2014-08-28 US US14/471,137 patent/US20140370300A1/en not_active Abandoned
-
2017
- 2017-11-29 JP JP2017228743A patent/JP2018040064A/ja active Pending
-
2020
- 2020-12-08 JP JP2020203560A patent/JP2021038471A/ja active Pending
Patent Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2001036190A1 (fr) * | 1999-11-16 | 2001-05-25 | Center For Advanced Science And Technology Incubation, Ltd. | Structure et film dont la surface presente une durete elevee et favorise le glissement de l'eau, et procede de preparation associe |
JP2001298024A (ja) * | 2000-02-08 | 2001-10-26 | Asm Japan Kk | 低比誘電率材料及びプロセス |
JP2002009071A (ja) * | 2000-04-28 | 2002-01-11 | Asm Japan Kk | フッ素含有材料及び処理 |
JP2003342731A (ja) * | 2002-05-24 | 2003-12-03 | Dainippon Printing Co Ltd | 積層体およびその製造方法 |
JP2007523776A (ja) * | 2004-02-24 | 2007-08-23 | サン−ゴバン グラス フランス | 疎水性表面を有し、当該疎水性の耐久性が改良されたガラス基材などの基材 |
WO2008013314A1 (fr) * | 2006-07-28 | 2008-01-31 | Toyo Seikan Kaisha, Ltd. | Article moulé en matière plastique comprenant un film de dépôt en phase vapeur formé par un procédé de dépôt chimique en phase vapeur sous plasma |
WO2010125926A1 (ja) * | 2009-04-30 | 2010-11-04 | コニカミノルタホールディングス株式会社 | 防汚性積層体 |
WO2011056550A1 (en) * | 2009-10-27 | 2011-05-12 | Silcotek Corp. | Chemical vapor deposition coating, article, and method |
JP2013508563A (ja) * | 2009-10-27 | 2013-03-07 | シルコテック コーポレイション | 化学気相成長コーティング、物品、及び方法 |
JP2011230505A (ja) * | 2010-04-09 | 2011-11-17 | Taiyo Kagaku Kogyo Kk | 表面濡れ性改質を行った非晶質炭素膜構造体、およびその製造方法 |
WO2012169540A1 (ja) * | 2011-06-06 | 2012-12-13 | 太陽化学工業株式会社 | 非晶質炭素膜層への撥水撥油層を固定する方法及び該方法により形成された積層体 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2022539616A (ja) * | 2019-07-26 | 2022-09-12 | チャンスー フェイヴァード ナノテクノロジー カンパニー リミテッド | 疎水性表面コーティング層及びその製造方法 |
JP7360531B2 (ja) | 2019-07-26 | 2023-10-12 | チャンスー フェイヴァード ナノテクノロジー カンパニー リミテッド | 疎水性表面コーティング層及びその製造方法 |
Also Published As
Publication number | Publication date |
---|---|
US20140370300A1 (en) | 2014-12-18 |
JP6256953B2 (ja) | 2018-01-10 |
KR20170003729A (ko) | 2017-01-09 |
KR20140148409A (ko) | 2014-12-31 |
US20150298165A1 (en) | 2015-10-22 |
JP2021038471A (ja) | 2021-03-11 |
WO2014011251A3 (en) | 2014-05-08 |
EP2830781A2 (en) | 2015-02-04 |
WO2014011251A2 (en) | 2014-01-16 |
KR102018241B1 (ko) | 2019-09-04 |
JP2018040064A (ja) | 2018-03-15 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6256953B2 (ja) | コーティングされた物品及び化学蒸着方法 | |
US11807777B2 (en) | Amorphous coating | |
US20150030885A1 (en) | Coated article and chemical vapor deposition process | |
US20190032201A1 (en) | Coated article | |
US20150064376A1 (en) | Coated automotive article | |
US9340880B2 (en) | Semiconductor fabrication process | |
JP2008527172A (ja) | 腐食および汚れを低減する低エネルギー表面 | |
US9975143B2 (en) | Chemical vapor deposition functionalization | |
TWI659121B (zh) | 半導體製造方法 | |
JP2016046533A5 (ja) |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20151020 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20151021 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20160118 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20160705 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20160929 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20170307 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20170426 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20170926 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20170929 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20171107 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20171129 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6256953 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |